公开(公告)号：US07684348B2

公开(公告)日：2010-03-23

申请号：US11568311

申请日：2006-05-17

申请人： Fan Zhang ,  Feng Liu

发明人： Fan Zhang ,  Feng Liu

IPC分类号： G01R31/08 ,  H04L12/28

CPC分类号： H04L47/25 ,  H04L12/437 ,  H04L47/11 ,  H04L47/215 ,  H04L47/2408 ,  Y10S370/909

摘要： The present invention discloses a method for ensuring service classes of packet services, which includes limiting the rate of services with different service classes uploaded to a ringlet from an RPR station in accordance with the RPR physical packet lengths; monitoring, in real time, the rate of non-class A0 services uploaded to the ringlet from the RPR station and forwarded by the RPR station in accordance with the RPR physical packet lengths, and when the rate of the non-class A0 services exceeds the un-reserved rate of the RPR network, reporting a congestion message and adjusting the rate of the non-class A0 services uploaded to the ringlet from the RPR stations in the congestion domain. A method of rate limitation is also disclosed, by which rate limitation is conducted based on a Token Bucket according to the total length of the sent packet after encapsulation. The methods, by means of rate limitation and rate monitoring of the services uploaded to the ringlet from each RPR station according to the RPR physical packet length, can effectively overcome the shortcoming that the reserved bandwidth in the RPR can not be ensured because forwarded services unexpected occupy the bandwidth of the services uploaded to the ringlet at a downstream RPR station due to the physical layer encapsulation overhead.

摘要翻译： 本发明公开了一种确保分组业务等级的方法，其中包括根据RPR物理分组长度，限制从RPR站上传到小环的不同业务类别的业务速率; 实时监控从RPR站上传到小环的非A0类业务的速率，并根据RPR物理分组长度由RPR站转发，当非A0业务的速率超过 RPR网络的未保留速率，报告拥塞消息，并调整从拥塞域中的RPR站上传到小环的非A0级业务的速率。 还公开了速率限制的方法，通过该方法，根据封装后发送的分组的总长度，基于令牌桶进行速率限制。 根据RPR物理分组长度，通过对每个RPR站上传到小环的业务的速率限制和速率监控方法，可以有效地克服RPR中保留带宽无法保证的缺点，因为转发业务意外 占用由于物理层封装开销而在下游RPR站上载到小环的业务的带宽。

公开(公告)号：US20100056952A1

公开(公告)日：2010-03-04

申请号：US12594859

申请日：2008-02-29

申请人： Feng Liu

发明人： Feng Liu

IPC分类号： A61B5/00

CPC分类号： G01L9/0092 ,  A61B3/16 ,  A61B5/03 ,  G01L9/0001 ,  G01L9/0002

摘要： Methods, systems, and devices for detecting and quantifying pressure and pressure changes within a system are provided. In one aspect, a pressure sensing device is provided that includes a sensing tube having an interior volume and at least one wall, the wall being configured to deform in response to an external pressure that is greater than an external pressure threshold. The at least one wall is further configured to deform as a function of the external pressure. The device may also include a transducer operably coupled to the sensing tube, the transducer being configured to detect changes in the interior volume as a result of deformation of the at least one wall.

摘要翻译： 提供了用于检测和量化系统内的压力和压力变化的方法，系统和装置。 在一个方面，提供一种压力感测装置，其包括具有内部容积和至少一个壁的传感管，所述壁被配置为响应于大于外部压力阈值的外部压力而变形。 所述至少一个壁进一步构造成根据外部压力变形。 该装置还可以包括可操作地耦合到感测管的传感器，换能器被配置为检测作为至少一个壁的变形的结果的内部体积的变化。

公开(公告)号：US20080208972A1

公开(公告)日：2008-08-28

申请号：US12035983

申请日：2008-02-22

申请人： Wu Chou ,  Li Li ,  Dan Zhuo ,  Feng Liu

发明人： Wu Chou ,  Li Li ,  Dan Zhuo ,  Feng Liu

IPC分类号： G06F15/16

CPC分类号： H04L67/14 ,  H04L67/02 ,  H04L67/142 ,  H04L67/28 ,  H04L67/2823

摘要： A web services enablement system includes a computer adapted to send and receive information to and from a first service, to send and receive information to and from a second service, which may not be a web service, to manage a connection with a third, stateful, service and to send and receive information via the stateful service based on information received from the first service or the second service. Also a method of enabling two-way web services and stateful transactions that includes steps of providing an architecture of base services and meta-services, defining a first base service comprising a core component and an extension component, combining the first base service and a meta-service to create a first usable service, managing a relationship between the first usable service and a second service through dependency or binding or utility, and performing a stateful transaction using the first usable service.

摘要翻译： Web服务启用系统包括适于向第一服务发送信息和从第一服务接收信息的计算机，向第二服务发送和接收来自可能不是web服务的第二服务的信息来管理与第三服务有状态的连接 ，根据从第一个服务或第二个服务收到的信息，通过有状态的服务发送和接收信息。 还有一种实现双向Web服务和有状态事务的方法，其包括提供基本服务和元服务的架构的步骤，定义包括核心组件和扩展组件的第一基本服务，将第一基本服务和元数据 - 创建第一可用服务的服务，通过依赖或绑定或实用程序来管理第一可用服务和第二服务之间的关系，以及使用第一可用服务执行有状态交易。

公开(公告)号：US20080108288A1

公开(公告)日：2008-05-08

申请号：US11934878

申请日：2007-11-05

申请人： Yongqi Hu ,  Yan Wang ,  Alain Duboust ,  Stan Tsai ,  Feng Liu ,  Liang-Yuh Chen ,  Robert Ewald

发明人： Yongqi Hu ,  Yan Wang ,  Alain Duboust ,  Stan Tsai ,  Feng Liu ,  Liang-Yuh Chen ,  Robert Ewald

IPC分类号： B24B39/06 ,  H01L21/3105

CPC分类号： B23H5/08 ,  B23H5/10 ,  B24B37/046 ,  B24B37/14 ,  B24B37/16 ,  B24B37/205 ,  B24B37/22 ,  B24B37/24 ,  B24B37/26 ,  B24B53/017 ,  H01L21/32125

摘要： Embodiments of a polishing article for processing a substrate are provided. In one embodiment, a polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The conductive layer may be comprised of a soft material and, in one embodiment, the exposed surface may be planar.

摘要翻译： 提供了用于处理基板的抛光制品的实施例。 在一个实施例中，用于处理衬底的抛光制品包括其上设置有导电层的织物层。 导电层具有适于抛光衬底的暴露表面。 织物层可以是编织的或非织造的。 导电层可以由软质材料组成，并且在一个实施例中，暴露表面可以是平面的。

公开(公告)号：US20070290166A1

公开(公告)日：2007-12-20

申请号：US11838512

申请日：2007-08-14

申请人： Feng Liu ,  Tianbao Du ,  Alain Duboust ,  Wei-Yung Hsu

发明人： Feng Liu ,  Tianbao Du ,  Alain Duboust ,  Wei-Yung Hsu

IPC分类号： C09K13/04

CPC分类号： C09K3/1463

摘要： Compositions and processes for producing compositions for removing conductive material, such as copper or copper alloys, from a substrate with reduced dishing and reduced insensitivity to overpolishing are provided. Embodiments include polishing compositions for electrochemical mechanical polishing of a substrate surface comprising a conductive material, the compositions having a pH of between about 3.0 to about 9.0, such as between about 4.0 to about 7.0, for example between about 5.0 to about 6.5. The polishing compositions comprise one or more inorganic based electrolytes, such as potassium phosphate monobasic, one or more chelating agents, such as citric acid, imidodiacetic acid, glycine, or salts thereof, such as ammonium citrate, one or more corrosion inhibitors, such as benzotriazole, a basic pH adjusting agent, such as ammonium hydroxide, potassium hydroxide or combinations thereof, one or more oxidizers, such as hydrogen peroxide or ammonium persulphate (APS), and a solvent, such as deionized water.

摘要翻译： 提供了用于从具有减少的凹陷的基底中去除导电材料（例如铜或铜合金）的组合物的组合物和方法，并且降低了对过度抛光的不敏感性。 实施方案包括用于包含导电材料的基底表面的电化学机械抛光的抛光组合物，所述组合物的pH为约3.0至约9.0，例如约4.0至约7.0，例如约5.0至约6.5。 抛光组合物包含一种或多种无机基电解质，例如磷酸二氢钾，一种或多种螯合剂，例如柠檬酸，亚氨基二乙酸，甘氨酸或其盐，例如柠檬酸铵，一种或多种腐蚀抑制剂，例如 苯并三唑，碱性pH调节剂，例如氢氧化铵，氢氧化钾或其组合，一种或多种氧化剂，例如过氧化氢或过硫酸铵（APS），以及溶剂如去离子水。

公开(公告)号：US07281392B2

公开(公告)日：2007-10-16

申请号：US11202559

申请日：2005-08-12

申请人： Feng Liu

发明人： Feng Liu

IPC分类号： F25D3/08

CPC分类号： F25D3/08 ,  B67D3/0009 ,  F25D2303/081 ,  F25D2331/811

摘要： A beverage-cooling device includes a refrigeration unit, a position unit and a switch unit. The refrigeration unit has a housing with a cavity formed therein and a tube disposed inside the cavity. The tube has an inlet and an outlet both secured to the housing, and the inlet is higher than the outlet. The position unit has a base member connecting to the refrigeration unit, a control member pivoted to the base member, and a securing member adjustably assembled onto the control member. The base member has a passage formed therein to communicate with the inlet of the tube. The control member has a through hole communicating with the passage. The securing member orientates a bottle mouth of a bottle to the control member, wherein the bottle mouth communicates with the through hole. The switch unit is secured to the refrigeration unit and connected with the outlet of the tube.

摘要翻译： 饮料冷却装置包括制冷单元，位置单元和开关单元。 制冷单元具有形成有空腔的壳体和设置在空腔内的管。 管具有固定到壳体上的入口和出口，并且入口高于出口。 位置单元具有连接到制冷单元的基座构件，枢转到基座构件的控制构件和可调节地组装到控制构件上的固定构件。 基部构件具有形成在其中以与管的入口连通的通道。 控制构件具有与通道连通的通孔。 固定部件将瓶子的瓶口定向到控制部件，其中瓶口与通孔连通。 开关单元固定到制冷单元并与管的出口连接。

公开(公告)号：US20070235345A1

公开(公告)日：2007-10-11

申请号：US11400454

申请日：2006-04-07

申请人： Tianbao Du ,  Feng Liu ,  May Yu ,  Alan Duboust ,  Wei-Yung Hsu

发明人： Tianbao Du ,  Feng Liu ,  May Yu ,  Alan Duboust ,  Wei-Yung Hsu

IPC分类号： B23H5/08

CPC分类号： B23H5/08 ,  B24B37/04 ,  C25F3/02 ,  H01L21/321 ,  H01L21/32125 ,  H01L21/7684

摘要： An ECMP method that suppresses hillock formation on a substrate includes the step of buffing a substrate before a two-step electrochemical mechanical polishing process. The buffing step prevents hillocks from forming around the features of the substrate and does not interfere with the protrusion formation. The buffing step includes contacting the substrate with a polishing pad and rotating the substrate and the polishing pad in opposite directions.

摘要翻译： 抑制基板上的小丘形成的ECMP方法包括在两步电化学机械抛光工艺之前抛光基板的步骤。 抛光步骤防止小丘围绕衬底的特征形成，并且不会妨碍突起形成。 抛光步骤包括使基板与抛光垫接触，并以相反的方向旋转基板和抛光垫。

公开(公告)号：US20070034506A1

公开(公告)日：2007-02-15

申请号：US11458356

申请日：2006-07-18

申请人： Yongqi Hu ,  Stan Tsai ,  Yan Wang ,  Feng Liu ,  Shou-Sung Chang ,  Liang-Yuh Chen

发明人： Yongqi Hu ,  Stan Tsai ,  Yan Wang ,  Feng Liu ,  Shou-Sung Chang ,  Liang-Yuh Chen

IPC分类号： C25B11/03

CPC分类号： B24B37/26 ,  B23H5/06 ,  B23H5/08 ,  B23H5/10 ,  B24B37/042 ,  B24B37/046 ,  B24B37/22 ,  B24B37/24 ,  B24B49/16 ,  B24B53/017 ,  C25D17/14 ,  H01L21/32125

摘要： Embodiments of a processing pad assembly for processing a substrate are provided. The processing pad assembly includes an upper layer having a processing surface and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side. A first set of holes is formed through the upper layer for exposing the electrode to the processing surface. At least one aperture is formed through the upper layer and the electrode.

摘要翻译： 提供了用于处理衬底的处理衬垫组件的实施例。 处理垫组件包括具有处理表面的上层和具有联接到上层的顶侧和与顶侧相对的底侧的电极。 通过上层形成第一组孔，用于将电极暴露于处理表面。 通过上层和电极形成至少一个孔。

公开(公告)号：US20070033963A1

公开(公告)日：2007-02-15

申请号：US11202559

申请日：2005-08-12

申请人： Feng Liu

发明人： Feng Liu

IPC分类号： F25D3/08

CPC分类号： F25D3/08 ,  B67D3/0009 ,  F25D2303/081 ,  F25D2331/811

摘要： A beverage-cooling device includes a refrigeration unit, a position unit and a switch unit. The refrigeration unit has a housing with a cavity formed therein and a tube disposed inside the cavity. The tube has an inlet and an outlet both secured to the housing, and the inlet is higher than the outlet. The position unit has a base member connecting to the refrigeration unit, a control member pivoted to the base member, and a securing member adjustably assembled onto the control member. The base member has a passage formed therein to communicate with the inlet of the tube. The control member has a through hole communicating with the passage. The securing member orientates a bottle mouth of a bottle to the control member, wherein the bottle mouth communicates with the through hole. The switch unit is secured to the refrigeration unit and connected with the outlet of the tube.

公开(公告)号：US20060260951A1

公开(公告)日：2006-11-23

申请号：US11425682

申请日：2006-06-21

申请人： Feng Liu ,  Liang-Yuh Chen ,  Stan Tsai ,  Yongqi Hu

发明人： Feng Liu ,  Liang-Yuh Chen ,  Stan Tsai ,  Yongqi Hu

IPC分类号： B23H3/02

CPC分类号： B23H5/08 ,  C25F7/00

摘要： A method and apparatus for electrochemically processing metal and barrier materials is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of establishing an electrically-conductive path through an electrolyte between an exposed layer of barrier material on the substrate and an electrode, pressing the substrate against a processing pad assembly, providing motion between the substrate and pad assembly in contact therewith and electrochemically removing a portion of the exposed layer during a first electrochemical processing step in a barrier processing station.

摘要翻译： 提供了一种用于电化学处理金属和阻隔材料的方法和装置。 在一个实施例中，用于电化学处理衬底的方法包括以下步骤：在衬底上的暴露的阻挡材料层与电极之间建立通过电解质的导电路径，将衬底压在处理衬垫组件上， 所述衬底和焊盘组件与其接触并且在屏障处理站中的第一电化学处理步骤期间电化学去除所述暴露层的一部分。