摘要:
An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.
摘要:
A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要:
An optical measuring system is provided with a measuring machine that has at least one measuring element for determining locations and at least one measuring element for determining angles. At least one common reference surface is provided for the location-determining measuring element and the angle-determining measuring element.
摘要:
Arranged in a system for setting and maintaining a gas atmosphere in an objective having at least one optical element is a first, inner gas compartment that is separated from a second, outer gas compartment by an inner casing. Both gas compartments are provided with gas inlet and gas outlet openings. At least one of the two gas compartments is under a pressure that is higher than the ambient pressure.
摘要:
In the case of a mounting apparatus, an optical element having an inner mount and an outer mount, in particular a lens in a projection lens system for semiconductor lithography, the inner mount is connected to the outer mount via three circumferentially distributed articulations. Manipulators, whereby said inner mount is displaceable, act on the articulations. The articulations comprise a mechanism which transforms a radial movement into an axial movement.
摘要:
In the case of an adjusting apparatus for an optical element in a lens system, in particular a lens in a projection lens system for semiconductor lithography, for producing tilting movements, having at least one actuator, the optical element is connected via elastic connecting members, directly or indirectly via an inner mount, to an outer mount. The elastic connecting members or the at least one actuator are/is provided in each case with bearing bridges which have bearing locations for a connection to the optical element or to the inner mount, and bridge arms which are connected to the bearing locations. The bridge arms are provided with piezoceramic elements in plate or sheet form which undergo changes in length upon activation. The piezoceramic elements of the various bearing bridges can be activated individually or together.
摘要:
In a method of straightening the supporting surfaces (5) of supporting elements (3) for optical elements (1), in particular in lens systems of microlithography projection exposure equipment, the supporting elements (3) and/or at least one bearing part (2, 6) connected to the supporting elements (3) for the optical elements (1) are deformed by a laser beam (A, B, C, D) produced by a laser (7) in such a way that the supporting surfaces (5) are at least approximately aligned with a common supporting plane or some other prescribed distribution.
摘要:
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
摘要:
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
摘要:
A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.