摘要:
In the case of a mounting apparatus, an optical element having an inner mount and an outer mount, in particular a lens in a projection lens system for semiconductor lithography, the inner mount is connected to the outer mount via three circumferentially distributed articulations. Manipulators, whereby said inner mount is displaceable, act on the articulations. The articulations comprise a mechanism which transforms a radial movement into an axial movement.
摘要:
In the case of a mounting apparatus, an optical element having an inner mount and an outer mount, in particular a lens in a projection lens system for semiconductor lithography, the inner mount is connected to the outer mount via three circumferentially distributed solid-state articulations. Manipulators, by means of which the inner mount can be displaced, act on the solid-state articulations. The solid-state articulations are T-shaped in cross section with a T-bar and a T-support. Attachment points between the inner mount and the outer mount are located in each case in the region of the outer ends of the T-bar. The manipulators act on the T-support in each case.
摘要:
An optical measuring system is provided with a measuring machine that has at least one measuring element for determining locations and at least one measuring element for determining angles. At least one common reference surface is provided for the location-determining measuring element and the angle-determining measuring element.
摘要:
A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要:
A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.
摘要:
A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要:
An arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要:
A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要:
A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要:
The invention relates to an objective, particularly a projection objective for use in semiconductor lithography, comprising optical elements such as lenses (16) and mirrors (11a). According to the invention, at least a portion of the optical elements (16, 11a) is provided with a reflective surface outside of the optically active area serving as the reference surface (12) for a the optical element inside the objective (8).