摘要:
A discharge location determination unit includes: discharge detection circuits connected to metal electrodes, respectively, and to which a signal due to discharge is input; and a calculation circuit to which signals output from the discharge detection circuits are input, wherein, if the intensity difference or intensity ratio between the two output signals is within a predetermined value, the calculation circuit determines that the discharge location is inside a tank, otherwise the calculation circuit determines that the discharge location is outside the tank.
摘要:
In a non-volatile storage system, a programming portion of a program-verify iteration has multiple programming pulses, and storage elements along a word line are selected for programming according to a pattern. Unselected storage elements are grouped to benefit from channel-to-channel capacitive coupling from both primary and secondary neighbor storage elements. The coupling is helpful to boost channel regions of the unselected storage elements to a higher channel potential to prevent program disturb. Each selected storage element has a different relative position within its set. For example, during a first programming pulse, first, second and third storage elements are selected in first, second and third sets, respectively. During a second programming pulse, second, third and first storage elements are selected in the first, second and third sets, respectively. During a third programming pulse, third, first and second storage elements are selected in the first, second and third sets, respectively.
摘要:
Provided is a particle beam irradiation apparatus capable of highly reliable measurement of a dose of each beam and capable of highly sensitive measurement of a leakage dose caused by momentary beam emission. The particle beam irradiation apparatus according to the present invention includes: an emission control portion that controls emission and termination of a particle beam; a control portion that sequentially changes an irradiation position of the particle beam relative to an affected area; first and second dosimeters that measure dose rates of the particle beam directed to the affected area; and an abnormality determination portion that accumulates the dose rates output from the first and second dosimeters for each of predetermined determination periods to calculate first and second sectional dose measurement values and that performs second abnormality determination of determining that there is an abnormality and outputs an interlock signal for terminating the emission of the particle beam in at least one of a case in which the first sectional dose measurement value exceeds a predetermined first reference range and a case in which the second sectional dose measurement value exceeds a predetermined second reference range.
摘要:
Methods and devices for operating non-volatile storage are disclosed. One or more programming conditions depend on the location of the word line that is selected for programming, which may reduce or eliminate program disturb. The voltage applied to the gate of a select transistor of a NAND string may depend on the location of the selected word line. This could be either a source side or drain side select transistor. This may prevent or reduce program disturb that could result due to DIBL. This may also prevent or reduce program disturb that could result due to GIDL. A negative bias may be applied to the gate of a source side select transistor when programming at least some of the word lines. In one embodiment, progressively lower voltages are used for the gate of the drain side select transistor when programming progressively higher word lines.
摘要:
Methods and devices for operating non-volatile storage are disclosed. One or more programming conditions depend on the location of the word line that is selected for programming. Applying a selected word line dependent program condition may reduce or eliminate program disturb. The voltage applied to a common source line may depend on the location of the word line that is selected for programming. This may prevent or reduce punch-through conduction, which may prevent or reduce program disturb. The voltage applied to bit lines of unselected NAND strings may depend on the location of the word line that is selected for programming. This may prevent or reduce punch-through conduction.
摘要:
A gate driver turns on/off a switching element Q1 by applying a control signal from a controller to a gate of the switching element. The switching element has the gate, a drain, and a source and contains a wide-bandgap semiconductor. The gate driver includes a parallel circuit that includes a first capacitor C1 and a first resistor R1 and is connected between the controller and the gate of the switching element and a short-circuit unit S4 that is connected between the gate and source of the switching element and short-circuits the gate and source of the switching element after a delay from an OFF pulse of the control signal.
摘要:
Provided is a particle beam irradiation apparatus that can measure and display a dose two-dimensional distribution during scan with a simple configuration, while reducing degradation of a particle beam shape. The particle beam irradiation apparatus according to the present invention includes: a beam generation portion that generates a particle beam; a beam emission control portion that controls emission of the particle beam; a beam scanning portion that two-dimensionally scans the particle beam; a sensor portion including a plurality of first linear electrodes arranged in parallel in a first direction and a plurality of second linear electrodes arranged in parallel in a second direction orthogonal to the first direction; a beam shape calculation portion that calculates a center of gravity of the particle beam from a first signal output from each of the first linear electrodes and a second signal output from each of the second linear electrodes and that obtains a two-dimensional beam shape of the particle beam around the center of gravity; a storage portion that accumulates and stores the two-dimensional beam shapes; and a display portion that displays the two-dimensional beam shapes as a two-dimensional distribution of a dose.
摘要:
A ribbon guide includes a pair of upper and lower plates for limiting upper and lower ends of an ink ribbon. A ribbon guide plate is disposed between the pair of upper and lower plates so as to guide a non-transfer surface of the ink ribbon. Ribbon press bars are suspended between the pair of upper and lower plates so as to guide a transfer surface of the ink ribbon. Cutouts through which the ink ribbon is inserted are formed at the lower plate so as to surround lower end portions of the ribbon press bars.
摘要:
Channel boosting is improved in non-volatile storage to reduce program disturb. A pre-charge module voltage source is used to pre-charge bit lines during a programming operation. The pre-charge module voltage source is coupled to a substrate channel via the bit lines to boost the channel. An additional source of boosting is provided by electromagnetically coupling a voltage from a conductive element to the bit lines and the channel. To achieve this, the bit lines and the channel are allowed to float together by disconnecting the bit lines from the voltage sources. The conductive element can be a source line, power supply line or substrate body, for instance, which receives an increasing voltage during the pre-charging and is proximate to the bit lines.
摘要:
Stacked gate structures for a NAND string are created on a substrate. Source implantations are performed at a first implantation angle to areas between the stacked gate structures. Drain implantations are performed at a second implantation angle to areas between the stacked gate structures. The drain implantations create lower doped regions of a first conductivity type in the substrate on drain sides of the stacked gate structures. The source implantations create higher doped regions of the first conductivity type in the substrate on source sides of the stacked gate structures.