公开(公告)号：US07999914B2

公开(公告)日：2011-08-16

申请号：US12081975

申请日：2008-04-24

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Marius Ravensbergen

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Marius Ravensbergen

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70266 ,  G03F7/70825

摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.

摘要翻译： 公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及 围绕可变形透镜元件上的多个子区域处于基本垂直于光轴的轴的局部扭矩。

公开(公告)号：US07116399B2

公开(公告)日：2006-10-03

申请号：US10844570

申请日：2004-05-13

申请人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/42 ,  G03B27/54 ,  G02B7/02

CPC分类号： G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US06977713B2

公开(公告)日：2005-12-20

申请号：US10729376

申请日：2003-12-08

申请人： Bernardus Antonius Johannes Luttikhuis ,  Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Martinus Hendrikus Antonius Leenders ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Bernardus Antonius Johannes Luttikhuis ,  Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Martinus Hendrikus Antonius Leenders ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70858

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，构造成支撑图案形成装置的支撑结构，其用于使投影光束在其横截面上具有图案，用于保持衬底的衬底台，用于保持衬底的突起 将图案化光束投影到基板的目标部分上的系统，以及具有位置传感器并且基板位于其上的参考框架。 该装置还包括具有加热元件的热​​传输系统，其与投影系统和参考框架中的至少一个进行热相互作用，用于传输到投影系统和参考框架中的至少一个的热传递，其中热量 传输系统耦合到与参考系机械隔离的另一帧。

公开(公告)号：US08908144B2

公开(公告)日：2014-12-09

申请号：US11527729

申请日：2006-09-27

申请人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

发明人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

公开(公告)号：US08457385B2

公开(公告)日：2013-06-04

申请号：US13019587

申请日：2011-02-02

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G06K9/00

CPC分类号： G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US20090061361A1

公开(公告)日：2009-03-05

申请号：US12262647

申请日：2008-10-31

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.

摘要翻译： 公开了通过光刻设备制造集成电路的方法。 所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。 在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。 在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。 在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。 这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。

公开(公告)号：US07471373B2

公开(公告)日：2008-12-30

申请号：US10876786

申请日：2004-06-25

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。

公开(公告)号：US07049592B2

公开(公告)日：2006-05-23

申请号：US10615421

申请日：2003-07-09

申请人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

发明人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

IPC分类号： G21K7/00 ,  G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.