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公开(公告)号：US07508580B2
公开(公告)日：2009-03-24
申请号：US12012825
申请日：2008-02-06
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light bundles includes light with a wavelength in a range of 10-30 nm. The light is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.
摘要翻译： 投影物镜提供从物体平面中的物场到像平面中的图像场的光束的光路。 投影物镜包括第一镜（S1），第二镜（S2），第三镜（S3），第四镜（S4），第五镜（S5），第六镜（S6），第七镜 S7）和第八反射镜（S8）。 光束包括波长在10-30nm范围内的光。 光通过八个反射镜提供，并且在光路中提供了物场的一个中间图像。
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公开(公告)号：US07456408B2
公开(公告)日：2008-11-25
申请号：US12009984
申请日：2008-01-23
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.
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公开(公告)号：US07348565B2
公开(公告)日：2008-03-25
申请号：US11649199
申请日：2007-01-03
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.
摘要翻译： 提供了使用波长小于或等于193nm的微光刻的投影曝光装置。 该装置包括具有光瞳光栅元件的光学元件和具有真实入射光瞳的投影物镜。 光学元件位于由真正的入射光瞳限定的平面内或附近。
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公开(公告)号：US20050088760A1
公开(公告)日：2005-04-28
申请号：US10919583
申请日：2004-08-17
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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公开(公告)号：US10481500B2
公开(公告)日：2019-11-19
申请号：US13197065
申请日：2011-08-03
摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
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公开(公告)号：US09465300B2
公开(公告)日：2016-10-11
申请号：US13438428
申请日：2012-04-03
IPC分类号： G02B21/00 , G02B3/00 , G02B9/00 , G02B17/00 , G03F7/20 , G02B21/04 , G02B17/08 , G02B13/16 , G02B13/00 , G02B17/06
CPC分类号： G03F7/70233 , G02B13/0065 , G02B13/16 , G02B17/0621 , G02B17/0663 , G02B17/08 , G02B17/0804 , G02B21/04 , G03F7/70308
摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.
摘要翻译： 通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。 微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ成像。 元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。 旋转非对称表面在旋转非对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。
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47.发明授权Imaging optics and projection exposure installation for microlithography with an imaging optics 有权用于具有成像光学元件的微光刻的成像光学和投影曝光安装公开(公告)号：US09057964B2
公开(公告)日：2015-06-16
申请号：US13236873
申请日：2011-09-20
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。
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48.发明授权公开(公告)号：US08605255B2
公开(公告)日：2013-12-10
申请号：US12767627
申请日：2010-04-26
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译： 成像光学系统具有多个反射镜。 这些图像将物体平面中的对象场映射成图像平面中的图像场。 在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。 这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长 小于10nm。
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公开(公告)号：US08169694B2
公开(公告)日：2012-05-01
申请号：US12474247
申请日：2009-05-28
CPC分类号： G03F7/70233 , G02B13/0065 , G02B13/16 , G02B17/0621 , G02B17/0663 , G02B17/08 , G02B17/0804 , G02B21/04 , G03F7/70308
摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.
摘要翻译： 通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。 微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ成像。 元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。 旋转非对称表面在旋转非对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。
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50.发明申请IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS 有权成像光学和投影曝光安装用于成像光学的微观算法公开(公告)号：US20120069315A1
公开(公告)日：2012-03-22
申请号：US13236873
申请日：2011-09-20
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。
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