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公开(公告)号：US6120972A
公开(公告)日：2000-09-19
申请号：US136051
申请日：1998-08-18
CPC分类号： G03F7/0045 , G03F7/039
摘要： A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator. The radiation-sensitive resin composition exhibits excellent sensitivity and resolution, fewer effect from the swing curves, excellent pattern profile, and superior heat resistance, high sensitivity to ultraviolet rays, far ultraviolet rays, X-rays, and various types of radiation such as charged particle rays, and is useful as a chemically amplified positive tone resist used in the manufacture of integrated circuit devices.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）共聚物，其包含（a）通过裂解具有一个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的重复单元（I）和（b）重复 通过裂解具有两个或多个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的单元（II）和由下式（1）或（2）的酸分解的至少一个二价基团，其中 R1，R2，R3和R4分别是具有1-5个碳原子的烷基或具有6-14个碳原子的芳基，所述单体具有其中每个碳 - 碳双键通过所述二价基团结合的结构和（ B）光致酸发生器。 辐射敏感性树脂组合物表现出优异的灵敏度和分辨率，较少的挥发曲线影响，优异的图案轮廓和优异的耐热性，对紫外线，远紫外线，X射线以及各种类型的辐射如带电的高灵敏度 粒子射线，并且可用作用于制造集成电路器件的化学放大正色调抗蚀剂。
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公开(公告)号：US6114086A
公开(公告)日：2000-09-05
申请号：US288848
申请日：1999-04-09
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
摘要翻译： 正色调和负色度化学放大抗蚀剂组合物，其包含：（a-1）封端树脂，（a-2）碱溶性树脂和溶解控制剂的组合，或（a-3） 碱溶性树脂和交联剂，（b）光致酸发生剂，和（c）特定种类的溶剂。 正色调和负色调抗蚀剂组合物显示出优异的灵敏度，高分辨能力和优异的储存稳定性，并且可以通过旋涂来优异地应用于大尺寸基材，以通过照射制造出优异的图案。 组合物可以有利地用作制造半导体器件或集成电路（IC）的化学放大抗蚀剂。
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公开(公告)号：US5916729A
公开(公告)日：1999-06-29
申请号：US799566
申请日：1997-02-12
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
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公开(公告)号：US5376498A
公开(公告)日：1994-12-27
申请号：US975713
申请日：1992-11-13
申请人： Toru Kajita , Eiichi Kobayashi , Toshiyuki Ota , Takao Miura
发明人： Toru Kajita , Eiichi Kobayashi , Toshiyuki Ota , Takao Miura
IPC分类号： C07C37/16 , G03F7/004 , G03F7/022 , G03F7/029 , G03F7/038 , G03F7/075 , H01L21/027 , G03C1/52
CPC分类号： G03F7/0755 , C07C37/16 , C07C37/20 , G03F7/0045 , G03F7/0226 , G03F7/038
摘要： A negative type radiation-sensitive resin composition which comprises (A) an alkali-soluble resin, (B) a compound which generates an acid upon irradiation, and (C) an aromatic compound having, as functional groups, an --OR group and a --CH.sub.2 OX group, both directly bonded to the aromatic ring in which R represents a substituted methyl group, a substituted ethyl group, a silyl group, an alkoxycarbonyl group or an acyl group and in which X represents a hydrogen atom, an alkyl group having 1-5 carbon atoms or an R group which is as defined above, said aromatic compound being capable of cross-linking the alkali-soluble resin (A) in the presence of an acid, and optionally (D) a specific phenolic compound. The negative type radiation-sensitive resin composition is excellent in developability, pattern-formation, resolution and thermal durability.
摘要翻译： 一种负型辐射敏感性树脂组合物，其包含（A）碱溶性树脂，（B）照射时产生酸的化合物和（C）具有作为官能团的-OR基团和 -CH 2 X基团，其直接键合到其中R表示取代的甲基，取代的乙基，甲硅烷基，烷氧基羰基或酰基的芳环，其中X表示氢原子，具有1个 -5个碳原子或如上所定义的R基团，所述芳香族化合物能够在酸的存在下交联碱溶性树脂（A），和任选地（D）特定的酚类化合物。 负型辐射敏感性树脂组合物的显影性，图案形成，分辨率和热耐久性优异。
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公开(公告)号：US5233158A
公开(公告)日：1993-08-03
申请号：US674331
申请日：1991-04-15
申请人： Tatsuo Karakama , Eiichi Kobayashi
发明人： Tatsuo Karakama , Eiichi Kobayashi
CPC分类号： B23K9/0956 , B23K9/073
摘要： A control method capable of effecting satisfactory arc welding by automatically controlling arc welding current and voltage. A processor calculates (106, 112) errors (.epsilon.I, .epsilon.V) between mean value (I, V) of actual welding currents and voltages periodically detected a predetermined number of times and target values IO, VO) of the welding current and voltage. If the welding current error falls outside an allowable range, a wire feeding speed correction amount is determined (.DELTA.FW) (109) by substituting the mean value (I) of the welding currents and a welding current correction amount (.DELTA.I) equivalent to the product of the calculated welding current error and a current gain into a calculation formula containing a first-degree polynomial (g'(I)) for the welding current and a welding current change amount (.DELTA.I) as variables. The wire feeding speed correction amount is input to a welding machine. If the welding voltage error falls outside an allowable range, the processor determines a power supply output correction amount (.DELTA.U) (115) by substituting the welding current correction amount (.DELTA.I) and a welding voltage correction amount (.DELTA.V) equivalent to the product of the calculated welding voltage error and a voltage gain into a calculation formula containing welding current and voltage charge amounts (.DELTA.I, .DELTA.V) as variables. The power supply output correction amount is input to the welding machine. The welding machine adjusts the wire feeding speed and power supply output, to rationalize the welding current and voltage.
摘要翻译： PCT No.PCT / JP90 / 00989 Sec。 371日期：1991年4月15日 102（e）日期1991年4月15日PCT提交1990年8月2日PCT公布。 公开号WO91 / 03351 日期1991年3月21日。一种能够通过自动控制电弧焊接电流和电压来实现令人满意的电弧焊接的控制方法。 处理器计算焊接电流和电压的实际焊接电流的平均值（I，V）和周期性检测到的电压预定次数和目标值IO，VO之间的（106,112）误差（ε，ε，ε） 。 如果焊接电流误差在容许范围之外，则通过将焊接电流的平均值（I）和相当于焊接电流的焊接电流校正量（DELTA I）代入，确定送丝速度校正量（DELTA FW）（109） 将计算出的焊接电流误差和电流增益的产物计算为包含用于焊接电流的一次多项式（g'（I））和焊接电流变化量（DELTA I））作为变量的计算公式。 送丝速度修正量被输入焊接机。 如果焊接电压误差超出允许范围，则处理器通过将焊接电流校正量（DELTA I）和焊接电压校正量（DELTA V）相当的焊接电流校正量（DELTA V）来代替电源输出校正量（DELTA U）（115） 将计算出的焊接电压误差和电压增益乘以包含焊接电流和电压电荷量（DELTA I，DELTA V）的计算公式的乘积作为变量。 电源输出校正量被输入焊接机。 焊机调整送丝速度和电源输出，使焊接电流和电压合理化。
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公开(公告)号：US3940378A
公开(公告)日：1976-02-24
申请号：US478730
申请日：1974-06-12
申请人： Junji Furukawa , Kazuo Haga , Eiichi Kobayashi
发明人： Junji Furukawa , Kazuo Haga , Eiichi Kobayashi
IPC分类号： C08F210/06 , C08F236/04 , C08F2/06 , C08F4/52 , C08F36/06
CPC分类号： C08F236/04 , C08F210/06
摘要： A method for manufacturing a high molecular weight, elastic and random type butadiene-propylene copolymer whose propylene content is in the range of 3 to 45 mol%, which comprises copolymerizing butadiene and propylene in the molar ratio ranging from 1/10 to 10/1 at a temperature in the range of 0.degree. to 80.degree.C in the presence of a catalyst system consisting of (1) at least one compound selected from the group consisting of titanium tetrachloride, titanium tetrabromide and vanadyl trichloride, (2) an organoaluminum compound having the general formula, ALR.sup.1 R.sup.2 R.sup.3 wherein R.sup.1, R.sup.2 and R.sup.3 represent a hydrocarbon radical and (3) phosgene, in which said components (2) and (3) are mixed at room temperature prior to the addition of other catalyst components and of monomers. The resulting random butadiene-propylene copolymer is highly elastic and superior to cis-1,4-polybutadiene in resistance to thermal aging.
摘要翻译： 丙烯含量为3〜45摩尔％的高分子量弹性无规型丁二烯 - 丙烯共聚物的制造方法，其特征在于，使丙烯与丙烯的摩尔比为1/10〜10/1 在由（1）至少一种选自四氯化钛，四溴化钛和三氯化钒组成的组中的化合物的存在下，在0℃至80℃的温度范围内，（2）有机铝化合物 具有通式的ALR1R2R3其中R1，R2和R3代表烃基，和（3）光气，其中所述组分（2）和（3）在加入其它催化剂组分和单体之前在室温下混合。 所得到的无规丁二烯 - 丙烯共聚物具有高弹性，优于顺式-1,4-聚丁二烯耐热老化性能。
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公开(公告)号：US07938773B2
公开(公告)日：2011-05-10
申请号：US11708596
申请日：2007-02-20
IPC分类号： A61B1/00
CPC分类号： A61B1/0052 , A61B1/00059 , A61B1/0016 , G02B23/2476
摘要： At startup, a main CPU renders and copies various types of unique parameters stored in an SRAM card corresponding to an ID unique to endoscopes to DPRAM and SDRAM and enables the endoscopes to be used with these parameters. Also in the event of desiring to change the set parameters, the user requests a change via an HMI, whereby the changed parameters are copied to the SDRAM via the DPRAM, and electrically-operated curving actions of the endoscope can be performed with the changed parameters.
摘要翻译： 在启动时，主CPU将存储在SRAM卡中的各种类型的独特参数呈现并复制到与DPRAM和SDRAM相同的内窥镜唯一ID，并使内窥镜与这些参数一起使用。 此外，在希望改变设定参数的情况下，用户通过HMI请求改变，由此通过DPRAM将改变的参数复制到SDRAM，并且可以利用改变的参数来执行内窥镜的电动弯曲动作 。
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公开(公告)号：US20100017445A1
公开(公告)日：2010-01-21
申请号：US12569566
申请日：2009-09-29
申请人： Eiichi Kobayashi
发明人： Eiichi Kobayashi
CPC分类号： G06F11/1466 , G06F11/1461
摘要： A backup control unit controls a normal backup process of backing up a file stored in a NAS device at file system level according to a task schedule set in advance, and controls a forcible backup process of forcibly backing up the file stored in the NAS device at file level upon being triggered by detection of file close of a file stored in a forcible-backup-target file list by an access monitoring unit.
摘要翻译： 备份控制单元根据预先设定的任务进度控制在文件系统级别备份存储在NAS设备中的文件的正常备份过程，并且控制强制备份存储在NAS设备中的文件的强制备份过程 通过由访问监视单元检测到存储在强制备份目标文件列表中的文件的文件关闭来触发文件级别。
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公开(公告)号：US07638261B2
公开(公告)日：2009-12-29
申请号：US12348171
申请日：2009-01-02
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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公开(公告)号：US20090148790A1
公开(公告)日：2009-06-11
申请号：US12348171
申请日：2009-01-02
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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