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    TECHNIQUES FOR SELECT-HOLD-RELEASE ELECTRONIC DEVICE NAVIGATION MENU SYSTEM
    41.
    发明申请
    TECHNIQUES FOR SELECT-HOLD-RELEASE ELECTRONIC DEVICE NAVIGATION MENU SYSTEM 审中-公开
    用于选择保持释放电子设备导航菜单系统的技术

    公开(公告)号：US20140007008A1

    公开(公告)日：2014-01-02

    申请号：US13977089

    申请日：2012-06-11

    申请人： Jim S. Baca ,  Mubashir A. Mian ,  David Stanasolovich ,  Mark H. Price

    发明人： Jim S. Baca ,  Mubashir A. Mian ,  David Stanasolovich ,  Mark H. Price

    IPC分类号： G06F3/0482

    摘要： A select-hold-release navigation system is described. An apparatus may comprise a select-hold-release navigation application operative on a processor circuit to present a navigation menu rotationally displaying one or more navigation elements based on user input received at the apparatus. The select-hold-release navigation application may be operative on the processor circuit to present a navigation menu rotationally displaying one or more navigation elements based on navigation input received at the apparatus, the navigation input comprising control directives generated by an input device coupled to the apparatus sustained for a defined duration and being associated with a navigation capable area. Other embodiments are described and claimed.

    摘要翻译： 描述选择保持释放导航系统。 装置可以包括在处理器电路上操作的选择保持释放导航应用，以基于在设备处接收到的用户输入呈现导航菜单，旋转地显示一个或多个导航元素。 选择保持释放导航应用可以在处理器电路上操作，以基于在装置处接收的导航输入呈现导航菜单，该导航菜单旋转地显示一个或多个导航元素，导航输入包括由耦合到 装置持续一段确定的持续时间并与导航能力区域相关联。 描述和要求保护其他实施例。

    Precise endpoint detection for etching processes
    43.
    发明授权
    Precise endpoint detection for etching processes 失效
    蚀刻工艺的精确端点检测

    公开(公告)号：US06258497B1

    公开(公告)日：2001-07-10

    申请号：US08448955

    申请日：1995-05-24

    申请人： Lawrence Andrew Kropp ,  David Stanasolovich ,  Marc Jay Weiss ,  Dennis Sek-On Yee

    发明人： Lawrence Andrew Kropp ,  David Stanasolovich ,  Marc Jay Weiss ,  Dennis Sek-On Yee

    IPC分类号： H01L21306

    CPC分类号： H01J37/32963 ,  H01L21/3065 ,  H01L21/31116

    摘要： A homogeneous marker is formed, possibly by the adsorption of trace amounts of an ambient material such as carbon monoxide gas, at a surface of a deposited material when the plasma in momentarily interrupted during plasma enhanced chemical vapor deposition or other deposition processes involving the presence of a plasma. When the deposited material is etched, the resulting crystal dislocations or adsorbed gas is detected as a marker by optical emission spectroscopy techniques. The accuracy of an end point determination of the etching process can be increased by providing a sequence of such markers within the bulk or volume of the deposited material. The markers, being merely an interface such as a slight crystal dislocation in otherwise homogeneous material, do not affect the electrical, chemical or optical properties of the remainder of the predetermined deposited material and thus the homogeneity of the deposited material is not significantly affected.

    摘要翻译： 当等离子体增强化学气相沉积或涉及存在的等离子体增强化学气相沉积或其他沉积过程中等离子体暂时中断时，可能通过在沉积材料的表面上吸附痕量的环境材料（例如一氧化碳气体）形成均匀的标记物 等离子体 当沉积材料被蚀刻时，通过光发射光谱技术将所得到的晶体位错或吸附气体作为标记物被检测。 可以通过在沉积材料的体积或体积内提供这样的标记的序列来增加蚀刻工艺的终点确定的精度。 仅仅是诸如在其它均匀材料中的轻微晶体位错的界面的标记物不影响剩余的预定沉积材料的电学，化学或光学性质，因此沉积材料的均匀性不会受到显着影响。

    Process of forming a dual overhang collimated lift-off stencil with subsequent metal deposition
    44.
    发明授权
    Process of forming a dual overhang collimated lift-off stencil with subsequent metal deposition 失效
    在随后的金属沉积中形成双悬垂准直剥离模板的工艺

    公开(公告)号：US5258264A

    公开(公告)日：1993-11-02

    申请号：US926659

    申请日：1992-08-06

    申请人： Gangadhara S. Mathad ,  David Stanasolovich ,  Giorgio G. Via

    发明人： Gangadhara S. Mathad ,  David Stanasolovich ,  Giorgio G. Via

    IPC分类号： H01L21/311 ,  H01L21/768 ,  G03F7/36 ,  G03F7/42

    CPC分类号： H01L21/7688 ,  H01L21/31116

    摘要： A process and structure for depositing metal lines in a lift-off process is disclosed. The process comprises the deposition of a four-layer structure or lift-off stencil, comprising a first layer of a lift-off polymer etchable in oxygen plasma, a first barrier layer of hexamethyldisilizane (HMDS) resistant to an oxygenplasma, a second lift-off layer and a second barrier layer. Once these layers are deposited, a layer of photoresist is deposited and lithographically defined with the metal conductor pattern desired. The layers are then sequentially etched with oxygen and CF.sub.4, resulting in a dual overhang lift-off structure. Metal is then deposited by evaporation or sputtering through the lift-off structure. Following metal deposition, the stencil is lifted-off in a solvent such as N-methylpyrroldone (NMP).

    摘要翻译： 公开了一种用于在剥离过程中沉积金属线的工艺和结构。 该方法包括沉积四层结构或剥离模板，其包括可在氧等离子体中蚀刻的剥离聚合物的第一层，耐氧气等级的六甲基二硅烷（HMDS）的第一阻挡层，第二提升 - 剥离层和第二阻挡层。 一旦沉积这些层，就会沉积一层光致抗蚀剂，并用所需的金属导体图案光刻地限定。 然后用氧和CF 4顺序蚀刻各层，得到双悬臂剥离结构。 然后通过蒸发或溅射将金属沉积通过剥离结构。 在金属沉积之后，在诸如N-甲基吡咯酮（NMP）的溶剂中将模板剥离。

    Mechanism for facilitating dynamic adjustments to computing device characteristics in response to changes in user viewing patterns
    45.
    发明授权
    Mechanism for facilitating dynamic adjustments to computing device characteristics in response to changes in user viewing patterns 有权
    用于响应于用户观看模式的变化促进计算设备特性的动态调整的机制

    公开(公告)号：US09450961B2

    公开(公告)日：2016-09-20

    申请号：US14129959

    申请日：2013-08-30

    申请人： David Stanasolovich ,  Joshua Boelter ,  Don G. Meyers ,  Sudip S. Chahai

    发明人： David Stanasolovich ,  Joshua Boelter ,  Don G. Meyers ,  Sudip S. Chahai

    IPC分类号： G06F21/00 ,  H04L29/06 ,  G06F3/00 ,  G06F21/31 ,  G06F21/32

    CPC分类号： H04L63/10 ,  G06F3/00 ,  G06F21/316 ,  G06F21/32 ,  G06F2221/2103 ,  H04L63/08

    摘要： A mechanism is described for facilitating dynamic adjustments to features of computing devices according to one embodiment. A method of embodiments, as described herein, includes automatically monitoring usage patterns relating to a user of computing device. The usage patterns may be based on audio user characteristic or visual user characteristics relating to usage of the computing device. The method may further include automatically monitoring environment patterns relating to the usage of the computing device. The environment patterns may be based on surrounding environment having the user and the computing device. The method may further include facilitating dynamic adjustment of one or more features of the computing device based on one or more of the usage patterns, environment patterns, and user preferences.

    摘要翻译： 描述了根据一个实施例的用于促进对计算设备的特征的动态调整的机制。 如本文所述的实施例的方法包括自动监视与计算设备的用户有关的使用模式。 使用模式可以基于与计算设备的使用相关的音频用户特性或可视用户特性。 该方法还可以包括自动监视与计算设备的使用有关的环境模式。 环境模式可以基于具有用户和计算设备的周围环境。 该方法还可以包括基于一个或多个使用模式，环境模式和用户偏好来促进计算设备的一个或多个特征的动态调整。

    VARIABLE REWARD OFFERS BASED ON TRAVEL ROUTE
    49.
    发明申请
    VARIABLE REWARD OFFERS BASED ON TRAVEL ROUTE 审中-公开
    基于旅行路线的不同优惠

    公开(公告)号：US20140304076A1

    公开(公告)日：2014-10-09

    申请号：US13997199

    申请日：2012-04-17

    申请人： Jim S. Baca ,  David Stanasolovich ,  Mark H. Price

    发明人： Jim S. Baca ,  David Stanasolovich ,  Mark H. Price

    IPC分类号： G06Q30/02

    CPC分类号： G06Q30/0261 ,  G01C21/3415 ,  G01C21/3697 ,  G06Q30/0207 ,  H04L67/306 ,  H04M1/72572 ,  H04W4/024 ,  H04W4/029

    摘要： Generally, this disclosure describes variable reward offers based on travel route. Techniques may include mapping a travel route from a first location to a second location using a mobile device, the mobile device configured to display at least a portion of the travel route; requesting an interest profile from a user, the interest profile comprising a place of interest and a deviation distance; and receiving a reward offer related to the interest profile and the travel route by the mobile device, the reward offer configured to cause the user to deviate a deviation distance from the travel route to redeem the reward.

    摘要翻译： 通常，本公开描述了基于旅行路线的可变奖励优惠。 技术可以包括使用移动设备将旅行路线从第一位置映射到第二位置，移动设备被配置为显示行驶路线的至少一部分; 从用户请求兴趣简档，兴趣简档包括感兴趣的地方和偏离距离; 并且通过所述移动装置接收与所述兴趣简档和所述旅行路线相关的奖励报价，所述奖励报价被配置为使得所述用户偏离所述行进路线的偏离距离以兑换所述奖赏。