公开(公告)号：US20100270768A1

公开(公告)日：2010-10-28

申请号：US12626253

申请日：2009-11-25

申请人： John Holland ,  Tomas McCabe

发明人： John Holland ,  Tomas McCabe

IPC分类号： B60G3/18 ,  B60G3/00

CPC分类号： B60G3/20 ,  B60G7/02 ,  B60G11/16 ,  B60G2200/144 ,  B60G2204/1244 ,  B60G2206/0114 ,  B60G2206/50 ,  B60G2206/60

摘要： An independent suspension system for mounting on a vehicle chassis which includes a pair of spaced-apart longitudinal chassis rails has a U-shaped support frame for attachment to the vehicle chassis rails. The support frame has a pair of side frame members, upper ends of which are adapted for engagement with the chassis rails. Lower ends of the side frame members are interconnected by a pair of spaced-apart cross members which are demountably secured between the side frame members. Each cross member has an elongate tubular body with flanged ends having through holes for reception of mounting bolts to secure the cross member to the side frame members.

摘要翻译： 用于安装在包括一对间隔开的纵向底盘轨道的车辆底盘上的独立悬架系统具有用于附接到车辆底盘轨道的U形支撑框架。 支撑框架具有一对侧框架构件，其上端适于与底盘轨道接合。 侧框架构件的下端通过一对间隔开的横向构件相互连接，该横向构件可拆卸地固定在侧框架构件之间。 每个横向构件具有细长的管状体，其具有法兰端部，其具有用于接收安装螺栓以将横梁固定到侧框架构件的通孔。

公开(公告)号：US07779974B2

公开(公告)日：2010-08-24

申请号：US11506846

申请日：2006-08-21

申请人： Sean Timoney ,  John Holland

发明人： Sean Timoney ,  John Holland

IPC分类号： F16F9/00

CPC分类号： B60G17/0432 ,  B60G17/0162 ,  B60G17/0164 ,  B60G17/08 ,  B60G2202/154 ,  B60G2400/104 ,  B60G2400/1042 ,  B60G2400/106 ,  B60G2400/204 ,  B60G2400/39 ,  B60G2400/41 ,  B60G2500/10 ,  B60G2500/20 ,  B60G2500/206 ,  B60G2800/012 ,  B60G2800/014 ,  B60G2800/702 ,  B60G2800/912 ,  F16F9/06

摘要： A vehicle suspension spring system for a vehicle wheel station includes a hydraulic cylinder or strut having a piston which divides the cylinder volume into a main oil volume and an annular oil volume. The main oil volume communicates via a first oil passage with a first accumulator having a main gas volume. The annular oil volume communicates via a second oil passage with a second accumulator having an auxiliary gas volume. The oil in each accumulator is separated from the gas by a separator piston or diaphragm. A third oil passage with an isolating valve interconnects said first and second oil passages. Operation of the isolating valve is regulated by a controller. At least one sensor for sensing a parameter associated with vehicle attitude is connected to the controller. The controller is operable for switching the isolating valve between open and closed positions for altering spring stiffness of the strut in response to said sensed vehicle attitude parameter when the vehicle is in motion.

摘要翻译： 用于车轮车站的车辆悬架弹簧系统包括具有活塞的液压缸或支柱，所述活塞将气缸容积分成主油量和环形油体积。 主油量通过第一油通道与具有主气体体积的第一储液器连通。 环形油体积经由第二油路与具有辅助气体体积的第二蓄液器连通。 每个蓄能器中的油通过分离器活塞或隔膜与气体分离。 具有隔离阀的第三油路将所述第一和第二油通道相互连接。 隔离阀的操作由控制器调节。 用于感测与车辆姿态相关联的参数的至少一个传感器连接到控制器。 控制器可操作用于在打开和关闭位置之间切换隔离阀，以在车辆运动时响应于所感测的车辆姿态参数改变支柱的弹簧刚度。

公开(公告)号：US20100105999A1

公开(公告)日：2010-04-29

申请号：US12622310

申请日：2009-11-19

申请人： Lynn Dixon ,  Jonathan Fern ,  Juli Goldstein ,  Nicole J. Walker ,  Samuel Mason Curry ,  William Matievich, JR. ,  John Holland ,  Daniel Khalili

发明人： Lynn Dixon ,  Jonathan Fern ,  Juli Goldstein ,  Nicole J. Walker ,  Samuel Mason Curry ,  William Matievich, JR. ,  John Holland ,  Daniel Khalili

IPC分类号： A61B5/145

CPC分类号： A61B5/157 ,  A61B5/14532 ,  A61B5/150022 ,  A61B5/150305 ,  A61B5/150358 ,  A61B5/150412 ,  A61B5/150503 ,  A61B5/150549 ,  A61B5/150618 ,  A61B5/150717 ,  A61B5/15146 ,  A61B5/15186 ,  A61B5/7435 ,  A61B2560/045 ,  G06F19/3456 ,  G16H40/63

摘要： Graphical user interfaces (GUIs) for a medical device such as a blood glucose meter, systems and methods are provided. Embodiments include GUIs in which a user may navigate between icons and select certain display outputs which summarize all or certain glucose data over particular time periods. In certain embodiments, animated icons and/or graphs and/or text summaries may be provided.

摘要翻译： 提供了诸如血糖仪，系统和方法之类的医疗设备的图形用户界面（GUI）。 实施例包括GUI，其中用户可以在图标之间导航并且选择在特定时间段内汇总全部或某些葡萄糖数据的某些显示输出。 在某些实施例中，可以提供动画图标和/或图形和/或文本摘要。

公开(公告)号：US07363687B2

公开(公告)日：2008-04-29

申请号：US11040752

申请日：2005-01-21

申请人： Stephanie Kraus ,  Chris Heatherly ,  Randal Ouye ,  Julie Nishioka ,  John Holland ,  Jeffrey Sand

发明人： Stephanie Kraus ,  Chris Heatherly ,  Randal Ouye ,  Julie Nishioka ,  John Holland ,  Jeffrey Sand

IPC分类号： A44B21/00

CPC分类号： G04B37/1486 ,  A44C5/14 ,  A44C5/2071 ,  A44D2203/00 ,  Y10T24/32 ,  Y10T24/4782 ,  Y10T29/49609 ,  Y10T29/49798

摘要： A magnet assembly connectable to a metal assembly in an engaging fashion, a metal assembly connectable with the magnet assembly in an engaging fashion and a snapping mechanism comprising the magnet assembly and the metal assembly are disclosed, to be used with a strap and a watch case. A leaf spring element and a base element to be used with a watch case are also disclosed, together with manufacturing processes and a system and method to teach the concept of time.

摘要翻译： 公开了一种以接合方式连接到金属组件的磁体组件，可与接合方式与磁体组件连接的金属组件以及包括磁体组件和金属组件的卡扣机构，用于带和表壳 。 还公开了一种与表壳一起使用的板簧元件和基座元件，以及制造工艺和用于教导时间概念的系统和方法。

公开(公告)号：US20080023443A1

公开(公告)日：2008-01-31

申请号：US11766067

申请日：2007-06-20

申请人： Alexander Paterson ,  Elizabeth Pavel ,  Valentin Todorow ,  Huong Nguyen ,  Thomas Kropewnicki ,  Brian Hatcher ,  John Holland

发明人： Alexander Paterson ,  Elizabeth Pavel ,  Valentin Todorow ,  Huong Nguyen ,  Thomas Kropewnicki ,  Brian Hatcher ,  John Holland

IPC分类号： C23F1/00

CPC分类号： H01J37/32091 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165

摘要： Embodiments of the invention generally provide etch or CVD plasma processing methods and apparatus used to generate a uniform plasma across the surface of a substrate by modulation pulsing the power delivered to a plurality of plasma controlling devices found in a plasma processing chamber. The plasma generated and/or sustained in the plasma processing chamber is created by the one or more plasma controlling devices that are used to control, generate, enhance, and/or shape the plasma during the plasma processing steps by use of energy delivered from a RF power source. Plasma controlling devices may include, for example, one or more coils (inductively coupled plasma), one or more electrodes (capacitively coupled plasma), and/or any other energy inputting device such as a microwave source.

摘要翻译： 本发明的实施例通常提供蚀刻或CVD等离子体处理方法和装置，用于通过调制脉冲输送到在等离子体处理室中发现的多个等离子体控制装置的功率来在衬底的表面上产生均匀的等离子体。 在等离子体处理室中产生和/或维持的等离子体是由一个或多个等离子体控制装置产生的，这些等离子体控制装置用于在等离子体处理步骤期间通过使用从等离子体处理室输送的能量来控制，产生，增强和/或形成等离子体 射频电源。 等离子体控制装置可以包括例如一个或多个线圈（电感耦合等离子体），一个或多个电极（电容耦合等离子体）和/或任何其它能量输入装置，例如微波源。

公开(公告)号：US20070246443A1

公开(公告)日：2007-10-25

申请号：US11410827

申请日：2006-04-24

申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

IPC分类号： C23F1/00

CPC分类号： H01J37/32935 ,  H01J37/32082 ,  H01L21/32138

摘要： A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, simultaneously (a) capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer, and (b) inductively coupling RF plasma source power into the process region, and adjusting the extent of dissociation of species in the plasma by adjusting the ratio between the amounts of the capacitively coupled VHF power and the inductively coupled power. The method may further include controlling plasma ion density in the chamber by controlling the total amount of plasma source power capacitively and inductively coupled into the process region.

摘要翻译： 在等离子体反应器的腔室中处理工件的方法包括将工艺气体引入到腔室中，同时（a）将VHF等离子体源功率电容耦合到覆盖在晶片上的腔室的工艺区域中，以及（b）电感耦合 RF等离子体源功率进入过程区域，并且通过调节电容耦合VHF功率和感应耦合功率之间的比率来调节物质在等离子体中的解离程度。 该方法还可以包括通过控制电容性和电感耦合到处理区域中的等离子体源功率的总量来控制腔室中的等离子体离子密度。

公开(公告)号：US20070246163A1

公开(公告)日：2007-10-25

申请号：US11410784

申请日：2006-04-24

申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/5096 ,  C23C16/458 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32165

摘要： A plasma reactor for processing a workpiece includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, an inductively coupled plasma source power applicator overlying the ceiling, and an RF power generator coupled to the inductively coupled source power applicator, and a capacitively coupled plasma source power applicator comprising a source power electrode at one of: (a) the ceiling (b) the workpiece support, and a VHF power generator coupled to the capacitively coupled source power applicator. The reactor further includes a plasma bias power applicator comprising a bias power electrode in the workpiece support and at least a first RF bias power generator coupled to the plasma bias power applicator, process gas distribution apparatus comprising a gas distribution showerhead in the ceiling, a vacuum pump for evacuating the chamber, and a first controller capable of adjusting the relative amounts of power simultaneously coupled to plasma in the chamber by the inductively coupled plasma source power applicator and the capacitively coupled plasma source power applicator.

摘要翻译： 用于处理工件的等离子体反应器包括反应室和腔室内的工件支撑件，腔室具有面向工件支撑件的天花板，覆盖天花板的电感耦合等离子体源功率施加器，以及耦合到感应耦合的RF功率发生器 源电源施加器和电容耦合的等离子体源功率施加器，其包括源功率电极，其以下之一：（a）天花板（b）工件支撑件以及耦合到电容耦合的源功率施加器的VHF发电机。 反应器还包括等离子体偏置功率施加器，其包括工件支撑件中的偏置功率电极和耦合到等离子体偏置功率施加器的至少第一RF偏置功率发生器，处理气体分配装置包括天花板中的气体分配喷头，真空 泵，以及第一控制器，其能够通过电感耦合等离子体源功率施加器和电容耦合等离子体源功率施加器来调节同时耦合到腔室中的等离子体的功率的相对量。

公开(公告)号：US20070246162A1

公开(公告)日：2007-10-25

申请号：US11410864

申请日：2006-04-24

申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

IPC分类号： C23F1/00

CPC分类号： H01J37/32165 ,  H01J37/32091 ,  H01J37/321

摘要： A plasma reactor for processing a workpiece includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, an inductively coupled plasma source power applicator overlying the ceiling, and an RF power generator coupled to the inductively coupled source power applicator, a capacitively coupled plasma source power applicator comprising a source power electrode at one of: (a) the ceiling (b) the workpiece support, and plural VHF power generators of different fixed frequencies coupled to the capacitively coupled source power applicator, and a controller for independently controlling the power output levels of the plural VHF generators so as to control an effective VHF frequency applied to the source power electrode. In a preferred embodiment, the reactor further includes a plasma bias power applicator including a bias power electrode in the workpiece support and one or more RF bias power generators of different frequencies coupled to the plasma bias power applicator.

摘要翻译： 用于处理工件的等离子体反应器包括反应室和腔室内的工件支撑件，腔室具有面向工件支撑件的天花板，覆盖天花板的电感耦合等离子体源功率施加器，以及耦合到感应耦合的RF功率发生器 源电源施加器，电容耦合等离子体源功率施加器，其包括源功率电极，其以下之一：（a）天花板（b）工件支撑件以及耦合到电容耦合的源电力施加器的不同固定频率的多个VHF发电机， 以及控制器，用于独立地控制多个VHF发生器的功率输出电平，以便控制施加到源极功率电极的有效VHF频率。 在优选实施例中，反应器还包括等离子体偏置功率施加器，其包括工件支撑件中的偏置功率电极和耦合到等离子体偏置功率施加器的不同频率的一个或多个RF偏置功率发生器。

公开(公告)号：US20070246161A1

公开(公告)日：2007-10-25

申请号：US11410863

申请日：2006-04-24

申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

IPC分类号： C23F1/00

CPC分类号： H01J37/32165 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32706

摘要： A plasma reactor for processing a workpiece includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, a toroidal plasma source comprising a hollow reentrant conduit external of the chamber and having a pair of ends connected to the interior of the chamber and forming a closed toroidal path extending through the conduit and across the diameter of the workpiece support, and an RF power applicator adjacent a portion of the reentrant external conduit, and an RF source power generator coupled to the RF power applicator of the toroidal plasma source. The reactor further includes a capacitively coupled plasma source power applicator comprising a source power electrode at one of: (a) the ceiling (b) the workpiece support, and plural VHF power generators of different fixed frequencies coupled to the capacitively coupled source power applicator, and a controller for independently controlling the power output levels of the plural VHF generators so as to control an effective VHF frequency applied to the source power electrode.

摘要翻译： 用于处理工件的等离子体反应器包括反应室和腔室内的工件支撑件，腔室具有面向工件支撑件的天花板，环形等离子体源，其包括腔室外部的空心折返导管，并且具有连接到 腔室的内部并且形成延伸穿过导管并跨越工件支撑件的直径的封闭的环形路径，以及邻近可折入的外部导管的一部分的RF功率施加器，以及耦合到RF功率施加器的RF源功率发生器 的环形等离子体源。 反应器还包括电容耦合的等离子体源功率施加器，其包括源功率电极，其特征在于：（a）天花板（b）工件支架，以及耦合到电容耦合源功率施加器的不同固定频率的多个VHF发电机， 以及控制器，用于独立地控制多个VHF发生器的功率输出电平，以便控制施加到源极功率电极的有效VHF频率。

公开(公告)号：US20070245959A1

公开(公告)日：2007-10-25

申请号：US11410717

申请日：2006-04-24

申请人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

发明人： Alexander Paterson ,  Valentin Todorow ,  Theodoros Panagopoulos ,  Brian Hatcher ,  Dan Katz ,  Edward Hammond ,  John Holland ,  Alexander Matyushkin

IPC分类号： C23C16/00

CPC分类号： H01J37/321 ,  H01J37/32091 ,  H01J37/32165

摘要： A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, simultaneously (a) capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer, and (b) inductively coupling RF plasma source power into the process region, and controlling plasma ion density by controlling the effective frequency of the VHF source power. In a preferred embodiment, the step of coupling VHF source power is performed by coupling VHF source power from different generators having different VHF frequencies, and the step of controlling the effective frequency is performed by controlling the ratio of power coupled by the different generators.

摘要翻译： 在等离子体反应器的腔室中处理工件的方法包括将工艺气体引入到腔室中，同时（a）将VHF等离子体源功率电容耦合到覆盖在晶片上的腔室的工艺区域中，以及（b）电感耦合 RF等离子体源功率进入工艺区域，并通过控制VHF源功率的有效频率来控制等离子体离子密度。 在优选实施例中，通过耦合具有不同VHF频率的不同发生器的VHF源功率来执行耦合VHF源功率的步骤，并且通过控制由不同发生器耦合的功率比来执行控制有效频率的步骤。