公开(公告)号：US07109497B2

公开(公告)日：2006-09-19

申请号：US10381945

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G21G6/00

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075

摘要： There is provided an illumination system, particularly for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements have negative optical power.

摘要翻译： 提供了一种照明系统，特别适用于波长<= 193nm的微光刻。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到图像平面中，产生至少部分地叠加在图像平面中的场上的多个图像。 多个第一光栅元件具有负光焦度。

公开(公告)号：US06947120B2

公开(公告)日：2005-09-20

申请号：US10381626

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G21K1/06 ,  G03B27/42 ,  G03B27/54 ,  G21K5/00

CPC分类号： B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06

摘要： There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.

摘要翻译： 提供了一种用于微波光刻的照明系统，其波长<= 193nm。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在图像平面中的场上的多个图像。 第二光学部件包括第一光学系统，其包括具有正光焦度的至少第三场反射镜和包括至少具有正光焦度的第二场反射镜的第二光学系统。 第一光学系统在第一光学系统和第二光学系统之间的平面内成像多个次级光源，形成多个第三光源，并且第二光学系统在出射光瞳中成像多个第三光源。

公开(公告)号：US06858853B2

公开(公告)日：2005-02-22

申请号：US10381624

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358

摘要： There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.

摘要翻译： 提供了包括初级光源，第一光学部件，第二光学部件，图像平面和出射光瞳的波长<= 193nm的微光刻照明系统。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学元件和第二光学元件是反射性的。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，至少部分地叠加在图像平面中的场上产生多个图像。 第一光学部件包括收集器单元和具有多个第二光栅元件的第二光学元件。 所述照明系统还包括在所述收集单元与所述第一光学元件之间的第一光轴，所述第一光学元件和所述第二光学元件之间的第二光轴以及所述第二光学元件和所述第二光学元件之间的第三光轴。 第一光轴的方向矢量和第二光轴的方向矢量限定一个平面，并且其中第一和第二光学元件被倾斜以使第三光轴的投影与平面交叉，并且第一光学 轴。

公开(公告)号：USRE42065E1

公开(公告)日：2011-01-25

申请号：US11981032

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G03B27/42 ,  G03B27/54 ,  G21K5/00

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

摘要： There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.

摘要翻译： 提供了一种用于具有波长＆nlE; 193nm的微光刻的照明系统。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在像平面中的场上的多个图像。 第二光学部件包括第一光学系统，其包括具有正光焦度的至少第三场反射镜和包括至少具有正光焦度的第二场反射镜的第二光学系统。 第一光学系统在第一光学系统和第二光学系统之间的平面内成像多个次级光源，形成多个第三光源，并且第二光学系统在出射光瞳中成像多个第三光源。

公开(公告)号：USRE41667E1

公开(公告)日：2010-09-14

申请号：US11981033

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G21K5/04 ,  G21K1/06

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

摘要： There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.

摘要翻译： 提供了一种用于微波光刻的照明系统，其具有包括初级光源，第一光学部件，第二光学部件，图像平面和出射光瞳的波长＆amp; 193nm。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学元件和第二光学元件是反射性的。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，至少部分地叠加在图像平面中的场上产生多个图像。 第一光学部件包括收集器单元和具有多个第二光栅元件的第二光学元件。 所述照明系统还包括在所述收集单元与所述第一光学元件之间的第一光轴，所述第一光学元件和所述第二光学元件之间的第二光轴以及所述第二光学元件和所述第二光学元件之间的第三光轴。 第一光轴的方向矢量和第二光轴的方向矢量限定一个平面，并且其中第一和第二光学元件被倾斜以使第三光轴的投影与平面交叉，并且第一光学 轴。

公开(公告)号：US20080225258A1

公开(公告)日：2008-09-18

申请号：US12072592

申请日：2008-02-27

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

IPC分类号： G03B27/54

CPC分类号： B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

摘要翻译： 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

公开(公告)号：US06927403B2

公开(公告)日：2005-08-09

申请号：US10216547

申请日：2002-08-09

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Wilhelm Egle ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Wilhelm Egle ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

IPC分类号： G02B5/08 ,  G02B5/10 ,  G02B17/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  G01N21/64

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70275

摘要： There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the conjugated plane. The first collector focuses a beam bundle of rays from the object plane in the conjugated plane. At least one of the first and second collectors includes a mirror shell. The rays strike the mirror shell at an angle of incidence of less than 20° relative to a surface tangent of the mirror shell.

摘要翻译： 提供了波长<= 193nm的照明系统。 照明系统包括物平面，与物平面共轭的平面，物平面和共轭平面之间的第一集电体，以及共轭平面之后的第二集电体。 第一个收集器将来自物平面的光束束聚焦在共轭平面中。 第一和第二收集器中的至少一个包括镜壳。 射线以相对于镜壳的表面切线小于20°的入射角撞击镜壳。

公开(公告)号：US06840640B2

公开(公告)日：2005-01-11

申请号：US10060909

申请日：2002-01-30

申请人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jörg Schultz

发明人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jörg Schultz

IPC分类号： G02B13/18 ,  G02B13/24 ,  G02B17/00 ,  G02B17/06 ,  G02B19/00 ,  G02B27/00 ,  G02B27/09 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027 ,  G02B5/10 ,  G21K5/00

CPC分类号： G02B27/0983 ,  G02B17/0621 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70233 ,  Y10S359/90

摘要： There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.

摘要翻译： 为波长<= 193nm的照明系统提供了多镜系统。 多镜系统包括（a）具有第一反射镜和第二反射镜的成像系统，（b）物体平面，（c）成像系统形成物体的图像的图像平面，（d） 在图像平面中的弧形场，其中弧形场的中间的径向方向限定扫描方向。 第一和第二反射镜被布置成使得弧形场的边缘锐度在扫描方向上小于5mm。 从物体行进到图像平面的光线相对于反射镜的表面法线<= 30°或> = 60°的入射角撞击第一和第二反射镜的使用区域。

公开(公告)号：US20050002090A1

公开(公告)日：2005-01-06

申请号：US10876898

申请日：2004-06-25

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G02B17/00

CPC分类号： B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

摘要翻译： 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

公开(公告)号：US06366410B1

公开(公告)日：2002-04-02

申请号：US09125621

申请日：1999-08-12

申请人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster

发明人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster

IPC分类号： G02B300

CPC分类号： G03F7/70066 ,  G02B13/143 ,  G03F7/70225

摘要： A REMA objective is realized by introduction of a few (1 to 5 units) aspherical surfaces of high-quality correction with a low number of lenses (no more than 10), and low path in glass (maximum 25% to 30%) of the object-reticle distance, thus enhancing efficiency.

摘要翻译： REMA的目标是通过引入低质量校正的几个（1至5个单位）非球面表面，具有低数量的透镜（不超过10个）和玻璃中的低通道（最大25％至30％）的 对象 - 标线距离，从而提高效率。