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    Optical element for forming an arc-shaped illumination field
    3.
    发明申请
    Optical element for forming an arc-shaped illumination field 审中-公开
    用于形成弧形照明场的光学元件

    公开(公告)号：US20050207039A1

    公开(公告)日：2005-09-22

    申请号：US10903817

    申请日：2004-07-30

    申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Isabel Escudero Sanz

    发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Isabel Escudero Sanz

    IPC分类号： G02B5/10 ,  G02B17/06

    CPC分类号： G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095

    摘要： There is provided an optical element for forming an arc-shaped field in a field plane of an illumination system for light having a wavelength of less than or equal to about 193 nanometers. The optical element includes a plurality of mirror surfaces, each having an array of aspherical reflecting elements. The array of aspherical reflecting elements has a plurality of cylindrical mirrors with aspheric curvature in an x-direction. The plurality of mirror surfaces form a nested mirror and includes a pair of adjacent mirror surfaces that have a spacing dspace therebetween. The arc-shaped field has an axis of symmetry. The field plane is defined by a vector in a y-direction that is parallel to the axis of symmetry, and a vector in the x-direction, which is orthogonal to the axis of symmetry.

    摘要翻译： 提供了一种用于在具有小于或等于约193纳米的波长的光的照明系统的场平面中形成弧形场的光学元件。 光学元件包括多个镜面，每个具有非球面反射元件阵列。 非球面反射元件阵列具有在x方向上具有非球面曲率的多个圆柱形反射镜。 多个镜面形成嵌套反射镜并且包括一对在其间具有间隔dspace的相邻镜面。 弧形场具有对称轴。 场平面由平行于对称轴的y方向的矢量和与对称轴正交的x方向的矢量限定。

    Illumination system particularly for microlithography
    8.
    发明授权
    Illumination system particularly for microlithography 有权
    照明系统特别适用于微光刻

    公开(公告)号：US06438199B1

    公开(公告)日：2002-08-20

    申请号：US09679718

    申请日：2000-09-29

    申请人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

    发明人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

    IPC分类号： G21K504

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

    摘要： The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.

    摘要翻译： 本发明涉及一种照明系统，特别是对于具有波长<= 193nm的微光刻，其包括光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像。 第一光栅元件以第一偏转角偏转入射光束，其中第一偏转角中的至少两个是不同的。 第一光栅元件优选地是矩形的，其中该场是环的一段。 为了将第一光栅元件的矩形图像变换成环形的区段，第二光学部件包括用于将场成形为环形部分的第一场镜。