Nitride semiconductor sustrate and method of fabricating the same.
    42.
    发明申请
    Nitride semiconductor sustrate and method of fabricating the same. 有权
    氮化物半导体衬底及其制造方法。

    公开(公告)号:US20100096728A1

    公开(公告)日:2010-04-22

    申请号:US12585109

    申请日:2009-09-03

    CPC classification number: B24B9/065

    Abstract: A nitride semiconductor substrate includes a front surface, a rear surface on an opposite side to the front surface, and a first edge portion including a chamfered edge on the front surface. A ratio of an average surface roughness of the front surface to an average surface roughness of the first edge portion is not more than 0.01. The substrate may include a second edge portion including a chamfered edge on the rear surface. A ratio of an average surface roughness of the rear surface to an average surface roughness of the second edge portion is not more than 0.01. The first edge portion has a visible light transmissivity not more than 0.2 times that of the front surface. The second edge portion has a visible light transmissivity not more than 0.2 times that of the rear surface.

    Abstract translation: 氮化物半导体衬底包括前表面,与前表面相反侧的后表面,以及在前表面上包括倒角边缘的第一边缘部分。 前表面的平均表面粗糙度与第一边缘部分的平均表面粗糙度的比率不大于0.01。 衬底可以包括在后表面上包括倒角边缘的第二边缘部分。 后表面的平均表面粗糙度与第二边缘部分的平均表面粗糙度之比不大于0.01。 第一边缘部分的可见光透射率不超过前表面的0.2倍。 第二边缘部分的可见光透射率不超过背面的0.2倍。

    INTERMEDIATE COMPOUND FOR SYNTHESIZING PHARMACEUTICAL AGENT AND PRODUCTION METHOD THEREOF
    43.
    发明申请
    INTERMEDIATE COMPOUND FOR SYNTHESIZING PHARMACEUTICAL AGENT AND PRODUCTION METHOD THEREOF 失效
    用于合成药物代理的中间体化合物及其生产方法

    公开(公告)号:US20090156804A1

    公开(公告)日:2009-06-18

    申请号:US11996205

    申请日:2006-07-21

    CPC classification number: C07D265/30 C07D265/32

    Abstract: The present invention relates to a production method of an optically active morpholine compound represented by the formula 10, which includes the following steps: wherein each symbol is as defined in the specification.The present invention also relates to a production method of an compound represented by the formula 55, which includes the following steps: wherein each symbol is as defined in the specification.According to the production method of the present invention, an optically active 2-aryl-substituted morpholine compound and 3-oxo-3-(pyrimidin-4-yl)propionate, which are important as starting materials for synthesizing 2-(2-arylmorpholin-4-yl)-1-methyl-1H-[4,4′]bipyrimidinyl-6-one having a tau protein kinase 1 inhibitory activity and useful as a therapeutic drug for Alzheimer's disease and the like, can be produced in a high yield by an industrially advantageous method.

    Abstract translation: 本发明涉及由式10表示的光学活性吗啉化合物的制备方法,其包括以下步骤:其中每个符号如说明书中所定义。 本发明还涉及由式55表示的化合物的制备方法,其包括以下步骤:其中每个符号如说明书中所定义。 根据本发明的制备方法,光学活性2-芳基取代的吗啉化合物和3-氧代-3-(嘧啶-4-基)丙酸酯作为合成2-(2-芳基吗啉) -4-基)-1-甲基-1H- [4,4']二嘧啶基-6-酮,其具有tau蛋白激酶1抑制活性,可用作阿尔茨海默氏病等的治疗药物,可以以高 通过工业上有利的方法得到。

    Scanning probe microscope
    45.
    发明授权
    Scanning probe microscope 失效
    扫描探针显微镜

    公开(公告)号:US07404313B2

    公开(公告)日:2008-07-29

    申请号:US11374842

    申请日:2006-03-14

    CPC classification number: G01Q60/40 G01Q20/04 G01Q60/30

    Abstract: A scanning probe microscope has a self-detection type probe structure including a cantilever having an electrically conductive probe at a distal end thereof, a supporting part, and a piezoresistance element whose resistance value changes depending on the deflection of the cantilever. A detector applies a predetermined voltage to the piezoresistance element and detects the value of the current passing through the piezoresistance element to detect deflection of the cantilever. A sample table mounts a sample such that a surface of the sample confronts a tip of the probe, and a moving mechanism relatively moves the sample table and the probe tip in X, Y and Z directions. A controller controls the moving mechanism to maintain a fixed distance between the probe tip and the sample surface and measures the surface shape of the sample on the basis of the detection result of the detector. A predetermined voltage is applied between the probe and the sample surface, and a measuring part operates simultaneously with the detector and measures electrical property information caused by the applied voltage.

    Abstract translation: 扫描探针显微镜具有自检型探针结构,其包括在其远端具有导电探针的悬臂,支撑部和耐电阻值根据悬臂的偏转而变化的压阻元件。 检测器将预定电压施加到压阻元件,并检测通过压阻元件的电流值,以检测悬臂的偏转。 样品台安装样品,使得样品的表面面对探针的尖端,并且移动机构使样品台和探针尖端在X,Y和Z方向上相对移动。 控制器控制移动机构以在探针尖端和样品表面之间保持固定的距离,并且基于检测器的检测结果测量样品的表面形状。 在探针和样品表面之间施加预定的电压,并且测量部分与检测器同时操作并测量由所施加的电压引起的电特性信息。

    Method of correcting opaque defect of photomask using atomic force microscope fine processing device
    46.
    发明申请
    Method of correcting opaque defect of photomask using atomic force microscope fine processing device 有权
    使用原子力显微镜精细加工装置校正光掩模不透明缺陷的方法

    公开(公告)号:US20070281222A1

    公开(公告)日:2007-12-06

    申请号:US11796996

    申请日:2007-04-27

    CPC classification number: G03F1/72 G01Q10/06 G01Q30/06 G01Q80/00

    Abstract: An opaque defect is processed by scanning with a high load or height fixed mode using a probe harder than a pattern material of a photomask at the time of going scanning, and is observed by scanning with a low load or intermittent contact mode at the time of returning scanning so as to detect an ending point of the opaque defect by the height information. When there is a portion reaching to a glass substrate as an ending point, this portion is not scanned by the high load or height fixed mode in the next processing, and only a portion not reaching to the ending point is scanned by the high load or height fixed mode.

    Abstract translation: 通过使用在扫描时比光掩模的图案材料更硬的探针,以高负载或高度固定模式进行扫描来处理不透明缺陷,并且通过在低负载或间歇接触模式下扫描来观察不透明缺陷 返回扫描,以便通过高度信息检测不透明缺陷的终点。 当到达玻璃基板的部分为终点时,在下一个处理中该部分不被高负载或高度固定模式扫描,并且只有未达到终点的部分被高负载扫描 高度固定模式。

    Processing method using atomic force microscope microfabrication device
    47.
    发明申请
    Processing method using atomic force microscope microfabrication device 审中-公开
    使用原子力显微镜微加工装置的加工方法

    公开(公告)号:US20070278177A1

    公开(公告)日:2007-12-06

    申请号:US11809518

    申请日:2007-06-01

    CPC classification number: C03C19/00 B82Y10/00 G01Q80/00

    Abstract: Under the condition that the height is fixed at a target height by turning off a feedback control system of a Z piezoelectric actuator of a cantilever of an atomic force microscope having a probe, which is harder than a processed material, flexure and twisting of the cantilever when carrying out mechanical processing while selectively repeating scanning only on the processed area (in the case of detecting flexure, parallel with the cantilever and in the case of detecting twisting, vertical with the cantilever) is monitored by a quadrant photodiode position sensing detector and the processing is repeated till a flexure amount or a twisting amount, namely, till an elastic deformation amount of the cantilever becomes not more than a determined threshold. It is not necessary to carry out scanning of the observation in obtaining the height information for detection of an end point, so that it is possible to improve a throughput of processing.

    Abstract translation: 通过关闭具有探针的原子力显微镜的悬臂的Z型压电致动器的反馈控制系统,该高度被固定在目标高度的条件下,其比加工材料更硬,悬臂的弯曲和扭曲 当在被处理区域(在检测弯曲的情况下,与悬臂平行的情况下,并且在检测到扭转的情况下,与悬臂垂直的情况下)进行机械处理时,通过象限光电二极管位置感测检测器监视 重复加工直到挠曲量或扭转量,即直到悬臂的弹性变形量变得不大于确定的阈值。 在获得用于检测终点的高度信息时,不需要进行观察的扫描,从而可以提高处理的吞吐量。

    Fine-adjustment mechanism for scanning probe microscopy
    48.
    发明授权
    Fine-adjustment mechanism for scanning probe microscopy 有权
    扫描探针显微镜微调机构

    公开(公告)号:US07288762B2

    公开(公告)日:2007-10-30

    申请号:US11045916

    申请日:2005-01-28

    CPC classification number: G01Q10/04 Y10S977/872

    Abstract: The invention provides a fine-adjustment mechanism for a scanning probe microscopy with high rigidity and high degree of measurement accuracy wherein a strain gauge displacement sensor which can be installed in a small space is arranged so that temperature compensation is achieved. The fine-adjustment mechanism composed of a piezoelectric device is provided with at least two-piece electrode. One of the electrodes is configured as a dummy electrode, to which no voltage is applied, and the other electrode is configured as an active electrode which generates strain when voltage is applied. One or two resistors are provided on each of the active electrode and dummy electrode, and a bridge circuit is configured by the resistors.

    Abstract translation: 本发明提供了一种用于具有高刚性和高测量精度的扫描探针显微镜的精细调节机构,其中可以安装在小空间中的应变片位移传感器被布置成实现温度补偿。 由压电元件构成的微调机构具有至少两片电极。 其中一个电极被配置为没有施加电压的虚拟电极,另一个电极被配置为当施加电压时产生应变的有源电极。 有源电极和虚拟电极均设置有一个或两个电阻器,桥接电路由电阻器构成。

    Scanning probe microscope
    49.
    发明授权
    Scanning probe microscope 有权
    扫描探针显微镜

    公开(公告)号:US07284415B2

    公开(公告)日:2007-10-23

    申请号:US11076250

    申请日:2005-03-09

    CPC classification number: G01Q30/04 G01Q10/065

    Abstract: A scanning probe microscope has a cantilever having a minute probe on a distal end thereof and a displacement detecting device for detecting displacement of the cantilever. A Z-axis controlling amount calculating mechanism calculates a controlling amount for keeping constant a displacement amount of the cantilever. A Z-axis driving mechanism drives in a Z direction the cantilever or a sample in accordance with the controlling amount from the Z-axis controlling amount calculating mechanism. An XY scanning mechanism relatively moves the probe in a direction of an XY plane with respect to the sample to measure an uneven shape and/or a physical characteristic of the surface of the sample. A controlling range limiting device limits a driving range of the Z-axis driving mechanism. A controlling range setting device optionally sets the driving range of the Z-axis driving mechanism.

    Abstract translation: 扫描探针显微镜具有在其远端具有微小探针的悬臂和用于检测悬臂的位移的位移检测装置。 Z轴控制量计算机构计算用于保持悬臂的位移量恒定的控制量。 Z轴驱动机构根据来自Z轴控制量计算机构的控制量沿Z方向驱动悬臂或样本。 XY扫描机构使探针相对于样品相对于XY平面的方向移动,以测量样品表面的不均匀形状和/或物理特性。 控制范围限制装置限制Z轴驱动机构的驱动范围。 控制范围设定装置可选地设定Z轴驱动机构的驱动范围。

Patent Agency Ranking