Chemically amplified resist compositions and process for the formation of resist patterns
    43.
    发明授权
    Chemically amplified resist compositions and process for the formation of resist patterns 失效
    化学扩增抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号:US06200725B1

    公开(公告)日:2001-03-13

    申请号:US08969368

    申请日:1997-11-28

    IPC分类号: G03F7039

    CPC分类号: G03F7/039 G03F7/0045

    摘要: Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble compound having a structural unit containing a protected alkali-soluble group in which unit a protective moiety of said protected alkali-soluble group contains an alicyclic hydrocarbon group having bonded to a carbon atom thereof a —CH2—R1′ group wherein R1′ is methyl, ethyl, propyl or isopropyl, and said alkali-soluble group is cleaved upon action of an acid generated from a photoacid generator used in combination with said compound, thereby releasing said protective moiety from the alkali-soluble group and converting said compound to an alkali-soluble one, and a photoacid generator capable of being decomposed upon exposure to a patterning radiation to thereby produce an acid capable of causing cleavage of said protective moiety. The resist composition can exhibit a high sensitivity (not more than 5 mJ/cm2) and therefore is particularly suitable for ArF lithography and also can exhibit stable patterning properties.

    摘要翻译: 碱可显影的化学增幅抗蚀剂组合物,其包含具有包含受保护的碱溶性基团的结构单元的碱不溶性化合物,其中所述被保护的碱溶性基团的保护部分含有与碳原子键合的脂环族烃基 其中R 1'是甲基,乙基,丙基或异丙​​基,并且所述碱溶性基团在与所述化合物组合使用的光致酸产生剂产生的酸作用下被切割,由此释放所述保护部分 从碱溶性基团中转化为碱溶性化合物,以及光致酸发生剂,其能够在暴露于图案化辐射时分解,从而产生能够导致所述保护部分裂解的酸。 抗蚀剂组合物可以表现出高灵敏度(不大于5mJ / cm 2),因此特别适用于ArF光刻,并且还可呈现稳定的图案化性能。

    Flat display apparatus with supplemental biasing
    45.
    发明授权
    Flat display apparatus with supplemental biasing 失效
    具有补充偏置的平面显示装置

    公开(公告)号:US5436530A

    公开(公告)日:1995-07-25

    申请号:US247018

    申请日:1994-05-20

    IPC分类号: H01J29/46 H01J31/12 G09G3/10

    CPC分类号: H01J31/126

    摘要: A flat display apparatus is disclosed which includes a grid interposed between and spaced apart from control electrodes and an electron source. The grid which includes holes has a higher potential applied than the one applied to a cathode so as to enable electrons to pass through the holes. An additional grid may be interposed between and spaced apart from the grid and the control electrodes. Alternatively, a rear electrode is located between adjacent porous cover electrodes to connect them, and a second rear electrode is located near the rear electrode and has a lower potential applied than the one applied to the cover electrodes.

    摘要翻译: 公开了一种平面显示装置,其包括插入在控制电极和电子源之间并与控制电极间隔开的栅极。 包括空穴的栅格具有比施加到阴极的栅极更高的电位,以使电子能够通过孔。 另外的栅格可以插入在栅极和控制电极之间并与栅极和控制电极间隔开。 或者,后电极位于相邻的多孔覆盖电极之间以连接它们,并且第二后电极位于后电极附近,并且施加的电位低于施加到覆盖电极的电位。