MOLDING STATION WITH DEFORMABLE MOLD AND METHOD
    42.
    发明申请
    MOLDING STATION WITH DEFORMABLE MOLD AND METHOD 有权
    具有可变模具和方法的成型站

    公开(公告)号:US20090315216A1

    公开(公告)日:2009-12-24

    申请号:US12519599

    申请日:2007-12-20

    摘要: A molding station and method comprising a hopper having a mouth closable with at least a lower door and a mold to be filled, the hopper and the mold being movable to a filling position in which the hopper is closed by the lower door; the lower door then opening to allow an amount of moldable material to be released into the mold; the mold being made in a deformable material, so that an interior volume of the mold is temporarily reduced when releasing the moldable material into the mold.

    摘要翻译: 一种成型台和方法,包括具有可关闭至少下门的料斗和待填充的模具的料斗,料斗和模具可移动到料斗由下门关闭的填充位置; 下门然后打开以允许一定量的可模制材料被释放到模具中; 模具制成可变形材料,使得当将可模制材料释放到模具中时,模具的内部容积暂时减小。

    Treatment of Conditions Involving Demyelination
    43.
    发明申请
    Treatment of Conditions Involving Demyelination 审中-公开
    治疗涉及脱髓鞘的病症

    公开(公告)号:US20090175872A1

    公开(公告)日:2009-07-09

    申请号:US12095857

    申请日:2006-12-01

    摘要: The invention provides methods of treating diseases, disorders or injuries involving demyelination and dysmyelination, including multiple sclerosis, by the administration of an Sp35 antagonist. Additional methods include methods for inhibiting the binding of the Sp35 polypeptide with the ErbB2 polypeptide and a method for increasing ErbB2 phosphorylation by contacting oligodendrocytes with an effective amount of a composition comprising an Sp35 antagonist of the invention. Further embodiments of the invention include methods of inhibiting the binding of the Sp35 polypeptide with the ErbB2, increasing ErbB2 phosphorylation and promoting oligodendrocyte differentiation comprising contacting oligodendrocyte or oligodendrcoyte progenitor cells with an ErbB2 binding agent.

    摘要翻译: 本发明提供了通过施用Sp35拮抗剂治疗涉及脱髓鞘和髓鞘脱离(包括多发性硬化)的疾病,病症或损伤的方法。 另外的方法包括用于抑制Sp35多肽与ErbB2多肽的结合的方法以及通过使少突胶质细胞与有效量的包含本发明的Sp35拮抗剂的组合物接触来增加ErbB2磷酸化的方法。 本发明的其它实施方案包括抑制Sp35多肽与ErbB2的结合,增加ErbB2磷酸化和促进少突胶质细胞分化的方法,其包括将少突胶质细胞或少突胶质细胞祖细胞与ErbB2结合剂接触。

    Internally colored block and process
    44.
    发明申请
    Internally colored block and process 审中-公开
    内部彩色块和过程

    公开(公告)号:US20090007510A1

    公开(公告)日:2009-01-08

    申请号:US12217673

    申请日:2008-07-09

    IPC分类号: E04C1/42

    CPC分类号: E04B5/46 E04C1/42

    摘要: Internally colored glass and glass-like blocks (10) and the method for making them. No means for coating the internal cavities (26) of clear glass and glass-like hollow blocks has been available. Color coating provides aesthetically pleasing structures. Internally colored glass and glass-like blocks may be used in building internal room dividers, providing colorful building designs and for providing color relief in heretofore otherwise drab structures.

    摘要翻译: 内部彩色玻璃和玻璃状块(10)及其制作方法。 没有用于涂覆透明玻璃和玻璃状中空块的内部空腔(26)的方法已经可用。 彩色涂层提供美观的结构。 内部彩色玻璃和玻璃状块可用于建造室内分隔器,提供丰富多彩的建筑设计,并在迄今为止以其他方式提供彩色浮雕结构。

    METHODS AND APPARATUS FOR COOLING AN ELECTRIC MOTOR
    45.
    发明申请
    METHODS AND APPARATUS FOR COOLING AN ELECTRIC MOTOR 审中-公开
    用于冷却电动机的方法和装置

    公开(公告)号:US20080143201A1

    公开(公告)日:2008-06-19

    申请号:US11612134

    申请日:2006-12-18

    IPC分类号: H02K5/20 H02K9/02

    摘要: An electric motor includes a frame having opposing first and second ends, and an endshield coupled to at least one of the first frame end and the second frame end. The endshield includes a body and at least one endshield channel extending through the body and configured to carry a cooling fluid to facilitate cooling the electric motor.

    摘要翻译: 电动机包括具有相对的第一和第二端部的框架,以及耦合到第一框架端部和第二框架端部中的至少一个的端部框架。 末端罩包括主体和至少一个延伸穿过主体并构造成承载冷却流体以便于冷却电动机的末端通道。

    High throughput electron beam lithography system
    47.
    发明授权
    High throughput electron beam lithography system 失效
    高通量电子束光刻系统

    公开(公告)号:US6014200A

    公开(公告)日:2000-01-11

    申请号:US28721

    申请日:1998-02-24

    摘要: An electron beam lithography system having a beamlet shaping section that includes a first multi-aperture array having m rows and n columns of apertures having a first shape and a second multi-aperture array with m rows and n columns of apertures having a second shape. Electron beamlets formed by the first multi-aperture array are deflected by a deflector unit before passing through the second multi-aperture array. The superposition of the electron beamlets on the second multi-aperture produces electron beamlets having a selected shape. Deflection logic on an active beam aperture array blank selected electron beamlets. The deflection logic can be updated with the next logic pattern as the current logic pattern is being executed. The unblanked electron beamlets are directed onto a surface to be exposed. The deflection logic on the active beam aperture array, and the multi-aperture arrays, are shielded from electrons and x-rays generated by the electrons striking surfaces within the electron beam lithography system. Sensitive deflection logic is radiation hardened to prevent degradation.

    摘要翻译: 一种具有子束成形部分的电子束光刻系统,该子束成形部分包括具有m行和n列的具有第一形状的孔的第一多孔径阵列和具有m行和n列的具有第二形状的孔的第二多孔径阵列。 由第一多孔径阵列形成的电子束由穿过第二多孔径阵列之前的偏转器单元偏转。 电子束在第二多孔上的叠加产生具有选定形状的电子束。 有源光束孔径阵列上的偏转逻辑选择电子束。 随着当前逻辑模式正在执行,偏转逻辑可以用下一个逻辑模式进行更新。 未钝化的电子子束被引导到待暴露的表面上。 有源光束孔径阵列和多孔径阵列上的偏转逻辑与电子束光刻系统内的电子撞击表面产生的电子和x射线屏蔽。 敏感偏转逻辑是辐射硬化以防止退化。