公开(公告)号：US20080252866A1

公开(公告)日：2008-10-16

申请号：US12213149

申请日：2008-06-16

申请人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

发明人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.

摘要翻译： 光刻设备包括：投影系统，被配置为将图案化的辐射束投影到由衬底台支撑的衬底上; 液体供应系统，被配置为用液体在所述投影系统和所述基板之间提供空间; 闭合表面，其构造成为由液体供应系统提供的液体提供代替基底的液体的限制表面; 以及封闭面定位装置，其构造成在所述液体供应系统和所述封闭表面之间产生并保持间隙，使得当所述封闭表面用于限制由所述液体供应系统供应的液体时，所述液体在所述间隙中流动。

公开(公告)号：US20080192219A1

公开(公告)日：2008-08-14

申请号：US12081291

申请日：2008-04-14

申请人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F9/7034 ,  G03F7/70341

摘要： A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.

摘要翻译： 在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。

公开(公告)号：US20080187874A1

公开(公告)日：2008-08-07

申请号：US12078846

申请日：2008-04-07

申请人： Martinus Cornelis Maria Verhagen ,  Roelof Frederik De Graaf ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

发明人： Martinus Cornelis Maria Verhagen ,  Roelof Frederik De Graaf ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

IPC分类号： G03F7/26 ,  C01B5/00 ,  B01D37/00

CPC分类号： B01D37/04 ,  Y10S210/90

摘要： A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.

公开(公告)号：US07403261B2

公开(公告)日：2008-07-22

申请号：US11012061

申请日：2004-12-15

申请人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

发明人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.

摘要翻译： 本发明涉及当封闭表面用于将液体限制在液体供应系统中时，减少光刻设备中浸没液的污染的方法。 为了避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒污染，闭合表面保持离开液体供应系统一定距离，使得闭合表面和液体供应系统之间没有碰撞，但是 液体仍然受到限制。

公开(公告)号：US07248334B2

公开(公告)日：2007-07-24

申请号：US11005500

申请日：2004-12-07

申请人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

摘要： The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.

摘要翻译： 光刻设备包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 所述光刻设备还包括被配置为保持基板的基板台，配置成将所述图案化的光束投影到所述基板的目标部分上的投影系统;被配置为测量（a）所述基板台的参数的测量系统，或（b ）基板，或（c）由投影系统投影的图像，或（d）（a） - （c）的任何组合，以及被配置为将液体供应到基板和投影件之间的空间的液体供应系统 系统。 光刻设备还包括设置在测量系统的一部分附近并被配置为将测量系统的部分与液体隔离的屏蔽件。

公开(公告)号：US07184122B2

公开(公告)日：2007-02-27

申请号：US10888514

申请日：2004-07-12

申请人： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

发明人： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20070041001A1

公开(公告)日：2007-02-22

申请号：US11499855

申请日：2006-08-07

申请人： Hans Jansen ,  Christiaan Hoogendam ,  Timotheus Sengers ,  Anthonie Kuijper

发明人： Hans Jansen ,  Christiaan Hoogendam ,  Timotheus Sengers ,  Anthonie Kuijper

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70616

摘要： A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.

摘要翻译： 一种光刻投影装置，其中液体供应系统和基板上的物体的几何形状被布置以避免流过传感器的高速浸没液体。

公开(公告)号：US20060290908A1

公开(公告)日：2006-12-28

申请号：US11167563

申请日：2005-06-28

申请人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

公开(公告)号：US20060186057A1

公开(公告)日：2006-08-24

申请号：US11062764

申请日：2005-02-22

申请人： Martinus Verhagen ,  Roelof De Graaf ,  Johannes Henricus Jacobs ,  Hans Jansen ,  Marco Stavenga ,  Jacobus Johannus Leonardus Verspay

发明人： Martinus Verhagen ,  Roelof De Graaf ,  Johannes Henricus Jacobs ,  Hans Jansen ,  Marco Stavenga ,  Jacobus Johannus Leonardus Verspay

IPC分类号： B01D37/00

CPC分类号： B01D37/04 ,  Y10S210/90

摘要： A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.

摘要翻译： 描述了用于过滤流体以获得具有已知纯度的流体的方法。 流体用过滤系统过滤，并且在过滤系统的最终过滤阶段的上游，测量流体的纯度。 通过过滤系统过滤的流体的纯度通过用最终过滤阶段的过滤行为校正测量的纯度来确定。 在一个实施例中，流体包括用作光刻设备中的浸没液体的超纯水。

公开(公告)号：US20050231694A1

公开(公告)日：2005-10-20

申请号：US10823777

申请日：2004-04-14

申请人： Aleksey Kolesnychenko ,  Johannes Jacobus Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Felix Peeters ,  Bob Streefkerk ,  Franciscus Johannes Teunissen ,  Helmar Santen

发明人： Aleksey Kolesnychenko ,  Johannes Jacobus Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Felix Peeters ,  Bob Streefkerk ,  Franciscus Johannes Teunissen ,  Helmar Santen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。