公开(公告)号：US06350549B1

公开(公告)日：2002-02-26

申请号：US09375746

申请日：1999-08-17

申请人： Ikuo Sakurai ,  Meguru Kashida

发明人： Ikuo Sakurai ,  Meguru Kashida

IPC分类号： G03F900

CPC分类号： H01L21/67103 ,  G03F1/62 ,  H01L21/68757 ,  Y10T156/108

摘要： There is disclosed a jig for producing a pellicle comprising a support frame having an opening, and an adhesive layer provided at periphery of the opening, wherein the adhesive layer is composed of a polymer material having a glass transition temperature within a range of 0° C. to 300° C. The jig of the present invention can be repeatedly used without reforming the adhesive layer after use.

摘要翻译： 公开了一种用于制造防护薄膜的夹具，其包括具有开口的支撑框架和设置在开口周边的粘合剂层，其中粘合剂层由玻璃化转变温度在0℃范围内的聚合物材料 至300℃。本发明的夹具可以重复使用，而不会在使用后重整粘合剂层。

公开(公告)号：US5729325A

公开(公告)日：1998-03-17

申请号：US789425

申请日：1997-01-29

申请人： Meguru Kashida

发明人： Meguru Kashida

IPC分类号： B08B17/00 ,  G03F1/62 ,  H01L21/027 ,  G03B27/52 ,  G02B7/00 ,  G03B11/04

CPC分类号： G03F1/64 ,  Y10T428/24132

摘要： A pellicle for a mask or substrate including a frame having one end surface and another end surface and a membrane extended over the frame on the one end surface side. A channel is formed in the other end surface of the frame. The channel is filled with a layer of a tackifier capable of expanding upon heating and/or light irradiation such that the tackifier layer does not protrude outward beyond the other end surface of the frame in an unexpanded state, but protrudes outward beyond the other end surface of the frame when expanded. No liner is attached to the tackifier layer.

摘要翻译： 一种用于掩模或基材的防护薄膜组件，包括具有一个端面的框架和另一个端面，以及在所述一个端面侧上在所述框架上延伸的膜。 在框架的另一端面上形成通道。 该通道填充有能够在加热和/或光照射下能够膨胀的增粘剂层，使得增粘剂层不会以非膨胀状态向外突出超过框架的另一端面，而是向外突出超出另一端面 的框架。 没有衬垫附着在增粘剂层上。

公开(公告)号：US5616927A

公开(公告)日：1997-04-01

申请号：US310879

申请日：1994-09-22

申请人： Yoshihiro Kubota ,  Satoshi Kawakami ,  Yuichi Hamada ,  Toru Shirasaki ,  Yoshihiko Nagata ,  Meguru Kashida

发明人： Yoshihiro Kubota ,  Satoshi Kawakami ,  Yuichi Hamada ,  Toru Shirasaki ,  Yoshihiko Nagata ,  Meguru Kashida

IPC分类号： G03F7/20 ,  G03F1/62 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F1/64

摘要： Proposed is an improved frame-supported pellicle, which is an integral body consisting of a rigid frame, a transparent plastic resin film adhesively bonded to one end surface of the frame in a slack-free fashion and a layer of a pressure-sensitive adhesive on the other end surface of the frame. The improvement consists in the use of a specific pressure-sensitive adhesive capable of being imparted with a greatly decreased bonding strength when it is heated at a temperature higher than a critical temperature or irradiated with UV light in a dose exceeding a critical dose so as to facilitate demounting of the frame-supported pellicle from a photomask on which the pellicle is mounted when it is to be replaced with a new pellicle without leaving any fragments of the adhesive adherent to the photomask surface.

摘要翻译： 提出了一种改进的框架支撑防护薄膜，其是由刚性框架，以无松弛的方式粘合到框架的一个端面的透明塑料树脂膜和一层压敏粘合剂组成的整体， 框架的另一端面。 改进在于使用特定的压敏粘合剂，当其在高于临界温度的温度下加热或以超过临界剂量的UV光照射时，可以赋予极大降低的粘合强度，以便 有助于将其从防护薄膜组件安装的光掩模上拆卸下来，当它被新的防护薄膜组件更换，而不会留下附着于光掩模表面的粘合剂的任何碎片。

公开(公告)号：US5382554A

公开(公告)日：1995-01-17

申请号：US150351

申请日：1993-11-10

申请人： Haruyoshi Kuwabara ,  Akio Otsuka ,  Meguru Kashida

发明人： Haruyoshi Kuwabara ,  Akio Otsuka ,  Meguru Kashida

IPC分类号： C01B21/068 ,  C04B35/58 ,  C04B35/584 ,  C04B35/626

CPC分类号： C01B21/0682 ,  C01B21/0687 ,  C04B35/584 ,  C01P2004/03 ,  C01P2004/10 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2006/10 ,  C01P2006/80

摘要： High-packing silicon nitride powder having a tap density of at least about 0.9 g/cm.sup.3 is prepared by reacting a metallic silicon powder having a mean particle size of about 1 to 10 .mu.m, a BET specific surface area of about 1 to 5 m.sup.2 /g, and a purity of at least about 99% with nitrogen in a nitrogen atmosphere containing about 5 to 20% by volume of hydrogen at about 1,350 to 1,450.degree. C., and milling the resulting silicon nitride powder in a dry attritor. The powder is moldable into a compact having a density of at least about 1.70 g/cm.sup.3, from which a sintered part having improved dimensional precision and strength is obtained.

摘要翻译： 具有至少约0.9g / cm 3的振实密度的高填充氮化硅粉末通过使平均粒度为约1-10μm的金属硅粉末，BET比表面积为约1-5m 2 g，纯氮至少约99％，氮气中含有约5至20体积％的氢气，约为1,350至1,450℃，并将得到的氮化硅粉末在干式磨碎机中研磨。 该粉末可模塑成密度为至少约1.70g / cm 3的压块，从而得到具有改善的尺寸精度和强度的烧结部件。

公开(公告)号：US5368675A

公开(公告)日：1994-11-29

申请号：US103928

申请日：1993-08-06

申请人： Yuichi Hamada ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

发明人： Yuichi Hamada ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

IPC分类号： G03F1/62 ,  H01L21/027 ,  H01L21/30 ,  B32B27/00 ,  B32B7/00 ,  G03F9/00

CPC分类号： G03F1/64 ,  Y10T156/1168 ,  Y10T156/1715

摘要： An improvement is proposed in the method for the preparation of a frame-supported pellicle involving a step in which a resin film for the pellicle membrane formed on the surface of a substrate plate by the solution casting method is adhesively bonded to a rigid pellicle frame and then the substrate plate is removed by separating from the resin film by pulling the substrate and the frame apart in a gaseous atmosphere of which the relative humidity is 80% or higher in contrast to the conventional procedures in which this step is conducted either in water or in a gaseous atmosphere of an air-conditioned clean room having a relative humidity never exceeding 60%. By virtue of this unique procedure, an outstandingly small number of dust particles are deposited on the pellicle membrane obtained by the removal of the substrate therefrom along with an advantage of very smooth and easy removal of the substrate not to cause slack or rupture of the membrane.

摘要翻译： 在制备框架支撑薄膜的方法中提出了一种改进，其涉及通过溶液流延法将形成在基板的表面上的防护薄膜组件的树脂膜粘合到刚性防护薄膜框架和 然后通过在相对湿度为80％或更高的气体气氛中将衬底和框架分开拉开衬底和框架而与通过在水或者 在相对湿度不超过60％的空调净化室的气体气氛中。 凭借这一独特的过程，通过从其中除去基材而获得的防护薄膜组件上沉积出极少数量的灰尘颗粒，同时具有非常平滑和容易地除去基底的优点，不会引起膜的松弛或破裂 。

公开(公告)号：US5326649A

公开(公告)日：1994-07-05

申请号：US857838

申请日：1992-03-26

申请人： Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi

发明人： Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi

IPC分类号： G03F1/22 ,  H01L21/027 ,  B32B9/00 ,  G03F9/00

CPC分类号： G03F1/22 ,  Y10T428/161 ,  Y10T428/24488

摘要： Disclosed is an X-ray transmitting frame-supported membrane of silicon nitride suitable as a mask blank of an X-ray lithographic mask having outstandingly high resistance against irradiation with high-energy radiations and high transmission of light of a wavelength of 633 nm. These very desirable properties are obtained as a consequence of the extremely low content, i.e. 1.0 atomic % or less, of hydrogen in the silicon nitride, which can be achieved as a result of the specific preparation procedure by the CVD method in which the reactant gases are silane or disilane and ammonia in a specified mixing ratio to be reacted under a specified pressure and at a specified temperature.

摘要翻译： 本发明公开了一种适合作为X射线光刻掩模掩模板的氮化硅的X射线透射框架支撑膜，其具有对高能辐照和波长为633nm的高透光率的显着高的抗性。 作为氮化硅中极低含量（即1.0原子％或更少）的氢的结果，可获得这些非常理想的性质，其可以通过CVD方法的具体制备方法来实现，其中反应物气体 是指定混合比例的硅烷或乙硅烷和氨，以在规定的压力和规定的温度下反应。

公开(公告)号：US5286567A

公开(公告)日：1994-02-15

申请号：US912792

申请日：1992-07-13

申请人： Yoshihiro Kubota ,  Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi

发明人： Yoshihiro Kubota ,  Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi

IPC分类号： C08F214/06 ,  B29C35/08 ,  B29C59/16 ,  C08F34/00 ,  C08F214/26 ,  C08F234/02 ,  G03F1/40 ,  G03F1/62 ,  H01L21/027 ,  B32B27/00

CPC分类号： G03F1/62 ,  B29C59/16 ,  B29C2035/0827 ,  B29C2035/0838 ,  Y10T428/31544

摘要： A pellicle for dust-proofing of a photolithographic mask used for patterning in the manufacturing process of semiconductor devices. The drawback due to dust deposition can be greatly decreased in the use of a pellicle made from a fluorocarbon resin which is a copolymer of tetrafluoroethylene and another fluorocarbon monomer capable of introducing a cyclic perfluoroether group into the molecule when the pellicle film is rendered antistatically hydrophilic, for example, by a plasma treatment.

摘要翻译： 用于在半导体器件的制造过程中用于图案化的光刻掩模的防尘薄膜组件。 在使用由氟树脂制成的防护薄膜树脂时，由于粉尘沉积的缺点可以大大降低，因为当防护薄膜成为抗静电亲水性时，能够将环状全氟醚基团引入到分子中的四氟乙烯与另一氟碳单体的共聚物， 例如通过等离子体处理。

公开(公告)号：US5234609A

公开(公告)日：1993-08-10

申请号：US899330

申请日：1992-06-16

申请人： Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi

发明人： Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi

IPC分类号： C23C16/01 ,  C23C16/36 ,  G03F1/22 ,  H01L21/027

CPC分类号： G03F1/22 ,  C23C16/01 ,  C23C16/36

摘要： Disclosed is an X-ray-permeable membrane for X-ray lithographic mask for fine patterning in the manufacture of semiconductor devices having good transparency to visible light and exhibiting excellent resistance against high-energy beam irradiation. The membrane has a chemical composition expressed by the formula SiC.sub.x N.sub.y and can be prepared by the thermal CVD method in an atmosphere of a gaseous mixture consisting of gases comprising, as a group, the elements of silicon, carbon and nitrogen such as a ternary combination of silane, propane and ammonia.

摘要翻译： 公开了一种用于X射线光刻掩模的X射线透过膜，用于制造对可见光具有良好透明度并且显示出优异的高能束照射阻力的半导体器件的精细图案化。 膜具有由式SiC x N y表示的化学组成，并且可以在气体混合物气氛中通过热CVD法制备，所述气体混合物由以下组成的气体组成，所述气体包含硅，碳和氮的元素，例如三元组合 硅烷，丙烷和氨。

公开(公告)号：US5118573A

公开(公告)日：1992-06-02

申请号：US601659

申请日：1990-10-25

申请人： Yoshio Tawara ,  Katsushi Tokunaga ,  Tadao Nomura ,  Yoshiaki Shimizu ,  Yoshihiro Kubota ,  Meguru Kashida

发明人： Yoshio Tawara ,  Katsushi Tokunaga ,  Tadao Nomura ,  Yoshiaki Shimizu ,  Yoshihiro Kubota ,  Meguru Kashida

IPC分类号： G11B11/105

CPC分类号： G11B11/10586 ,  Y10S428/90

摘要： An improvement is obtained in the stability and recording density of a magneto-optical recording medium having a laminar structure on a transparent substrate plate successively consisting of a first dielectric layer, a magnetic recording layer, a second dielectric layer and a metallic light-reflecting layer by forming the dielectric layer with a unique and specific dielectric material which is an amorphous composite material comprising boron and hydrogen in a specified weight proportion formed by the method of plasma CVD or sputtering. The dielectric material can be a ternary composite of boron, hydrogen and nitrogen or quaternary composite of boron, hydrogen, nitrogen and silicon or carbon.

公开(公告)号：US5098515A

公开(公告)日：1992-03-24

申请号：US627270

申请日：1990-12-14

申请人： Meguru Kashida ,  Yoshihiro Kubota ,  Yoshihiko Nagata

发明人： Meguru Kashida ,  Yoshihiro Kubota ,  Yoshihiko Nagata

IPC分类号： G03F1/22 ,  G03F1/68 ,  H01L21/027

CPC分类号： G03F1/22

摘要： The inventive method provides a membrane for X-ray lithography compositely composed of silicon carbide and silicon nitride having high performance in respect of stability against high energy beam irradiation and transparency to visible light. The method comprises depositing a composite film of a specified SiC:Si.sub.3 N.sub.4 molar proportion by sputtering on a silicon wafer as the substrate under such conditions that the thus deposited film is under a compressively stressed state, annealing the substrate bearing the composite film deposited thereon at a specified temperature so as to bring the composite film under a tensile internal stress and then removing the substrate by etching leaving a frame portion.