摘要:
A semiconductor device. The device comprises an active region isolated by an isolation structure on a substrate. The device further comprises a gate electrode extending across the active area and overlying the substrate, a pair of source region and drain region, disposed on either side of the gate electrode on the substrate in the active area, and a gate dielectric layer disposed between the substrate and the gate electrode. The gate dielectric layer comprises a relatively-thicker high voltage (HV) dielectric portion and a relatively-thinner low voltage (LV) dielectric portion, wherein the HV dielectric portion occupies a first intersection among the drain region, the isolation structure, and the gate electrode, and a second intersection among the source region, the isolation structure, and the gate electrode.
摘要:
This invention relates to the synthesis for a precursor of E6020, compound 26, via a β-keto amide alcohol intermediate, compound 22. The synthesis reacts compound 22 with compound 25 and the resultant intermediate is oxidized to produce compound 26, the precursor to E6020. Compounds 22 and 25, and their crystalline forms, represent separate embodiments of the invention. The invention also relates to compounds of formulas (3) and (4) and processes for their preparation. The β-keto amide alcohol intermediate compound 22 is a compound of formula (3). Compound 25 is a compound of formula (4).
摘要:
A hierarchical downlink (DL) synchronization channel (SCH) is provided for wireless OFDM/OFDMA systems. The SCH includes a Primary SCH (P-SCH) for carrying PA-Preambles used for coarse timing and frequency synchronization, and a Secondary SCH (S-SCH) for carrying SA-Preambles used for cell ID detection. The total time length occupied by P-SCH and S-SCH is equal to one OFDM symbol time length of a data channel, and S-SCH is located in front of P-SCH in each DL frame. A perfect multi-period time-domain structure is created and maintained in P-SCH to increase preciseness of frame boundary estimation. With overlapping deployment of macrocells and femtocells, a predefined SCH configuration scheme is provided to separate frequency subbands used for macrocells and femtocells such that interferences in S-SCH can be mitigated. In addition, a self-organized SCH configuration scheme is provided to allow more flexibility for femtocells to avoid or introduce interference in S-SCH.
摘要:
An apparatus and a method for tracking a sampling clock of a multi-carrier communication system are disclosed, the apparatus including a data removal module, a phase estimation module, and a sampling clock offset computation module. The data removal module is for generating a plurality of first and second data removal symbols by removing predetermined transmitted data from a plurality of first and second received symbols, respectively. The phase estimation module for generating a first and a second phase shifts according to correlations of the plurality of first and second data removal symbols. The sampling clock offset computation module for generating a control signal utilized to compensate the sampling clock of a plurality of received symbols according to the first and a second phase shifts.
摘要:
An apparatus and method for tracking a sampling clock are disclosed. The apparatus includes a compensating circuit compensating phases of a first and a second received symbols according to a compensating signal and thereby generating a first and a second compensated symbols; a data removal circuit removing a first predetermined transmitted data from the first compensated symbol, and a second predetermined transmitted data from the second compensated symbol and thereby generating a first and a second data removal symbols; and a computing circuit generating a sampling clock offset according to the first and the second data removal symbols, and adjusting the sampling clock signal according to the sampling clock offset.
摘要:
This invention relates to the synthesis for a precursor of E6020, compound 26, via a β-keto amide alcohol intermediate, compound 22. The synthesis reacts compound 22 with compound 25 and the resultant intermediate is oxidized to produce compound 26, the precursor to E6020. Compounds 22 and 25, and their crystalline forms, represent separate embodiments of the invention. The invention also relates to compounds of formulas (3) and (4) and processes for their preparation. The β-keto amide alcohol intermediate compound 22 is a compound of formula (3). Compound 25 is a compound of formula (4).
摘要:
A semiconductor structure includes a semiconductor substrate; a first well region of a first conductivity type in the semiconductor substrate; a metal-containing layer on the first well region, wherein the metal-containing layer and the first well region form a Schottky barrier; and a first heavily doped region of the first conductivity type in the first well region, wherein the first heavily doped region is horizontally spaced apart from the metal-containing layer.
摘要:
A semiconductor device includes a gate electrode over a semiconductor substrate, wherein the gate electrode has a gate width direction; a source/drain region in the semiconductor substrate and adjacent the gate electrode, wherein the source/drain region has a first width in a direction parallel to the gate width direction; and a bulk pick-up region in the semiconductor substrate and abutting the source/drain region. The bulk pick-up region and the source/drain region have opposite conductivity types. The bulk pick-up region has a second width in the width direction, and wherein the second width is substantially less than the first width.
摘要:
A semiconductor device includes a first doped region disposed on a first well in a semiconductor substrate; a second doped region disposed on a second well adjacent to the first well in the semiconductor substrate, the second doped region having a dopant density higher than that of the second well; and a gate structure overlying parts of the first and second wells for controlling a current flowing between the first and second doped regions. A first spacing distance from an interface between the second doped region and the second well to its closest edge of the gate structure is greater than 200 percent of a second spacing distance from a center point of second doped region to the edge of the gate structure, thereby increasing impedance against an electrostatic discharge (ESD) current flowing between the first and second doped regions during an ESD event.
摘要:
Semiconductor devices and fabrication methods thereof. The semiconductor device includes a semiconductor substrate with a body region of a first doping type. A gate structure is patterned on the semiconductor substrate. A single spacer is formed on a first sidewall of the gate structure. A body region of a first doping type is formed in the semiconductor substrate adjacent to a second sidewall of the gate structure. A source region of a second doping type is formed on the body region and having an edge aligned with the second sidewall of the gate structure. A drain region of the second doping type is formed on the semiconductor substrate and having an edge aligned with an exterior surface of the single sidewall.