公开(公告)号：US08861084B2

公开(公告)日：2014-10-14

申请号：US12200068

申请日：2008-08-28

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  G02B27/28 ,  F21V9/14 ,  G03B27/72 ,  G03F7/20 ,  G02B1/08 ,  G02F1/01

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second line early polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有如下效果：第一直线偏振光的振荡平面和第二行的早期偏振光的振动平面分别旋转第一旋转角度和第二角度 旋转，第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US08755031B2

公开(公告)日：2014-06-17

申请号：US13005833

申请日：2011-01-13

申请人： Markus Deguenther

发明人： Markus Deguenther

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70141 ,  G02B26/02 ,  G02B26/0833 ,  G02B26/101 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70158 ,  G03F7/702

摘要： An illumination system of a microlithographic projection exposure apparatus includes an optical raster element configured to produce a plurality of secondary light sources located in a system pupil surface. The optical raster element has a plurality of light entrance facets, each being associated with one of the secondary light sources. A beam deflecting device includes a beam deflection array of reflective or transparent beam deflecting elements, each being configured to illuminate a spot on one of the light entrance facets at a position that is variable by changing a deflection angle produced by the beam deflecting element. A control unit is configured to control the beam deflection elements such that variable light patterns assembled from the spots can be formed on at least one of the plurality of light entrance facets.

摘要翻译： 微光刻投影曝光装置的照明系统包括被配置为产生位于系统光瞳表面中的多个次级光源的光栅元件。 光栅元件具有多个光入射面，每个光入射面与二次光源中的一个相关联。 光束偏转装置包括反射或透明光束偏转元件的光束偏转阵列，每个光束偏转阵列被配置为在通过改变由光束偏转元件产生的偏转角可变的位置处照射光入射面中的一个上的光斑。 控制单元被配置为控制光束偏转元件，使得可以在多个光入射面中的至少一个上形成从斑点组装的可变光图案。

公开(公告)号：US08705000B2

公开(公告)日：2014-04-22

申请号：US12846470

申请日：2010-07-29

申请人： Artur Hoegele ,  Markus Deguenther

发明人： Artur Hoegele ,  Markus Deguenther

IPC分类号： G03B27/42

CPC分类号： G03F7/7015 ,  G03F7/70141 ,  G03F7/70191

摘要： An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

摘要翻译： 照明光学器件照射用于微光刻的投影曝光装置的物体场。 照明光学器件包括引导一束有用光的光学部件的聚光器组。 束导向部件的目标组布置在冷凝器组的下游。 冷凝器组的至少一个部件和物镜组的至少一个部件可移位以补偿处于实际照明状态的物场偏离所期望的照明状态。

公开(公告)号：US08294877B2

公开(公告)日：2012-10-23

申请号：US13368430

申请日：2012-02-08

申请人： Johannes Wangler ,  Markus Deguenther ,  Stig Bieling

发明人： Johannes Wangler ,  Markus Deguenther ,  Stig Bieling

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70058

摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.

摘要翻译： 用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。 照明光学单元的瞳孔面镜具有多个光瞳面。 瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。 照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。 单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。 这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

公开(公告)号：US08004656B2

公开(公告)日：2011-08-23

申请号：US11505408

申请日：2006-08-17

申请人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

发明人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/52 ,  G03B27/72

CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

公开(公告)号：US20100045957A1

公开(公告)日：2010-02-25

申请号：US12607438

申请日：2009-10-28

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G03B27/72 ,  G02B5/30

CPC分类号： G02B27/286 ,  G02B7/008

摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.

摘要翻译： 本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到感光基板上的投影物镜，其中所述投影系统包括光学系统 包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中 另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中 有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

公开(公告)号：US07551263B2

公开(公告)日：2009-06-23

申请号：US11409387

申请日：2006-04-13

申请人： Toralf Gruner ,  Markus Deguenther

发明人： Toralf Gruner ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70558

摘要： A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction perpendicularly to a scanning direction of the apparatus, arranged next to one another. Each stop element has an outer surface that absorbs substantially all projection light impinging thereon, and a substantially rectangular circumference. Each stop element furthermore has at least one recess in its circumference or at least one opening through which projection light is allowed to pass. A drive unit individually displaces the stop elements along the scanning direction into a light field.

摘要翻译： 用于调节微光刻投影曝光装置中的感光层上的照射剂量的装置具有多个在与装置的扫描方向垂直的方向上彼此相邻布置的止动元件。 每个停止元件具有吸收基本上所有投射在其上的投射光的外表面和基本上矩形的圆周。 每个止动元件还在其圆周上具有至少一个凹部或至少一个允许投射光通过的开口。 驱动单元将停止元件沿着扫描方向单独移位成光场。

公开(公告)号：US20090002675A1

公开(公告)日：2009-01-01

申请号：US12205572

申请日：2008-09-05

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G03B27/54 ,  F21V9/14 ,  G02B5/30

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US20060291057A1

公开(公告)日：2006-12-28

申请号：US11440479

申请日：2006-05-25

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B27/28

CPC分类号： G02B27/286 ,  G02B7/008

摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.

公开(公告)号：US09086637B2

公开(公告)日：2015-07-21

申请号：US13590673

申请日：2012-08-21

申请人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

发明人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70341 ,  G03F7/70558 ,  G03F7/7085

摘要： A projection exposure system and a method for operating a projection exposure system for microlithography with an illumination system are disclosed. The illumination system includes at least one variably adjustable pupil-defining element. The illumination stress of at least one optical element of the projection exposure system is determined automatically in the case of an adjustment of the at least one variably adjustable pupil-defining element. From the automatically determined illumination stress, the maximum radiant power of the light source is set or determined and/or in which an illumination system is provided with which different illumination settings can be made. Usage of the projection exposure system is recorded and, from the history of the usage, at least one state parameter of at least one optical element of the projection exposure system is determined.

摘要翻译： 公开了一种用于利用照明系统操作用于微光刻的投影曝光系统的投影曝光系统和方法。 所述照明系统包括至少一个可变地调整的光瞳限定元件。 在调整至少一个可变瞳孔限定元件的情况下，自动确定投影曝光系统的至少一个光学元件的照明应力。 根据自动确定的照明应力，设置或确定光源的最大辐射功率，和/或其中提供可以进行不同照明设置的照明系统。 记录投影曝光系统的使用，并且根据使用历史确定投影曝光系统的至少一个光学元件的至少一个状态参数。