Electron beam lithography method and apparatus
    42.
    发明授权
    Electron beam lithography method and apparatus 失效
    电子束光刻方法及装置

    公开(公告)号:US5008553A

    公开(公告)日:1991-04-16

    申请号:US341977

    申请日:1989-04-24

    申请人: Takayuki Abe

    发明人: Takayuki Abe

    IPC分类号: H01J37/302

    摘要: A charged beam lithography writes a pattern with charged beams on a sample. The pattern involves various shapes. For every position in the shapes in the pattern, degree of exposure due to a proximity effect caused by backward scattering charged from the shapes surrounding the position is calculated. A charged beam emission quantity corresponding to the calculated degree of exposure is subtracted from a set emission quantity to compensate the proximity effect and obtain an optimum charged beam emission quantity for the position. With charged beams of the optimum emission quantities thus obtained, the pattern is written with high dimensional accuracy.

    摘要翻译: 带电光束光刻将带有带电束的图案写在样品上。 该图案涉及各种形状。 对于图案中的形状中的每个位置,计算由于从位置周围的形状进行的向后散射引起的邻近效应引起的曝光程度。 从设定的排放量中减去与计算出的曝光量相对应的带电束光发射量,以补偿邻近效应,并获得该位置的最佳带电束发射量。 利用如此获得的最佳发射量的带电束,以高尺寸精度写入图案。

    Semiconductor device including oxide semiconductor
    43.
    发明授权
    Semiconductor device including oxide semiconductor 有权
    半导体器件包括氧化物半导体

    公开(公告)号:US09012918B2

    公开(公告)日:2015-04-21

    申请号:US12730288

    申请日:2010-03-24

    摘要: The threshold voltage is shifted in a negative or positive direction in some cases by an unspecified factor in a manufacturing process of the thin film transistor. If the amount of shift from 0 V is large, driving voltage is increased, which results in an increase in power consumption of a semiconductor device. Thus, a resin layer having good flatness is formed as a first protective insulating film covering the oxide semiconductor layer, and then a second protective insulating film is formed by a sputtering method or a plasma CVD method under a low power condition over the resin layer. Further, in order to adjust the threshold voltage to a desired value, gate electrodes are provided over and below an oxide semiconductor layer.

    摘要翻译: 在薄膜晶体管的制造过程中,阈值电压在负方向或正方向上偏移一些未指定因子。 如果从0V的偏移量大,则驱动电压增加,这导致半导体器件的功耗的增加。 因此,形成具有良好平坦度的树脂层作为覆盖氧化物半导体层的第一保护绝缘膜,然后通过溅射法或等离子体CVD法在低功率条件下在树脂层上形成第二保护绝缘膜。 此外,为了将阈值电压调整为期望值,在氧化物半导体层的上方和下方设置栅电极。

    Information processing apparatus using updated firmware and system setting method
    44.
    发明授权
    Information processing apparatus using updated firmware and system setting method 有权
    使用更新的固件和系统设置方法的信息处理设备

    公开(公告)号:US08930931B2

    公开(公告)日:2015-01-06

    申请号:US12908997

    申请日:2010-10-21

    IPC分类号: G06F9/44 G06F9/445

    CPC分类号: G06F8/654

    摘要: In an information processing apparatus, a first processor executes firmware and data processing instructions, a second processor conducts management of firmware updating and system settings, first and second memories store current and updated firmware, a third memory stores system settings information, and a switch changes connections of the first and second memories under control of the second processor, to connect one of the first and second memories to a bus connected to the first processor and to connect the other to the second processor. During firmware execution by the first processor, the second processor reads the system settings information from the third memory and provides it to the first processor. The first processor reflects firmware data from updated firmware in the second memory in the system settings information and the second processor stores the system settings information in which updated firmware data is reflected into the third memory.

    摘要翻译: 在信息处理装置中,第一处理器执行固件和数据处理指令,第二处理器执行固件更新和系统设置的管理,第一和第二存储器存储当前和更新的固件,第三存储器存储系统设置信息和开关改变 在第二处理器的控制下的第一和第二存储器的连接,将第一和第二存储器之一连接到连接到第一处理器的总线,并将另一个连接到第二处理器。 在由第一处理器执行固件期间,第二处理器从第三存储器读取系统设置信息并将其提供给第一处理器。 第一处理器在系统设置信息中反映第二存储器中更新的固件的固件数据,而第二处理器将更新的固件数据反映到第三存储器中的系统设置信息存储。

    FLEXIBLE COUPLING AND VEHICLE MOTIVE POWER TRANSMISSION APPARATUS
    45.
    发明申请
    FLEXIBLE COUPLING AND VEHICLE MOTIVE POWER TRANSMISSION APPARATUS 审中-公开
    柔性联轴器和车辆动力传动装置

    公开(公告)号:US20120283028A1

    公开(公告)日:2012-11-08

    申请号:US13518408

    申请日:2010-12-08

    申请人: Takayuki Abe

    发明人: Takayuki Abe

    IPC分类号: F16D3/62

    CPC分类号: F16D3/78 F16D3/62

    摘要: A flexible coupling includes: spool members disposed equidistantly on a circumference; torque transmission lines disposed around adjacent pairs of the spool members; and an annular elastic body in which the spool members and the torque transmission lines are embedded. The torque transmission lines consist of first torque transmission lines, and second torque transmission lines whose total sum of cross-sectional area is a half of that of the first torque transmission lines. The flexible coupling is constructed so that the first torque transmission lines transmit positive torque and the second torque transmission lines transmit negative torque, and is incorporated into a vehicle motive power transmission apparatus that has a hypoid gear whose mesh transmission error is greater during transmission of negative torque than during transmission of positive torque.

    摘要翻译: 柔性联轴器包括:在圆周上等距地设置的线轴构件; 设置在相邻成对的卷轴构件周围的扭矩传输线; 以及其中嵌入有卷轴构件和扭矩传递线的环形弹性体。 转矩传输线由第一转矩传输线和横截面积的总和为第一转矩传输线的总和的第二转矩传输线组成。 柔性联轴器被构造成使得第一扭矩传递线传递正扭矩并且第二扭矩传输线传递负扭矩,并且被并入车辆动力传动装置中,该传动装置具有在传递负片时网格传输误差较大的准双曲面齿轮 扭矩比传递正转矩时。

    Apparatus and method for pattern inspection
    47.
    发明授权
    Apparatus and method for pattern inspection 有权
    模式检查的装置和方法

    公开(公告)号:US07973918B2

    公开(公告)日:2011-07-05

    申请号:US12552108

    申请日:2009-09-01

    IPC分类号: G01N21/00

    CPC分类号: G01N21/956 G01N2021/95676

    摘要: A pattern inspection apparatus includes a pulsed light source configured to emit pulsed light; a stage configured to mount thereon an inspection target object with a pattern formed thereon; a time delay integration (TDI) sensor configured to detect, a plurality of times with a time delay, each pixel value of an optical image of the inspection target object, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and to integrate a detected each pixel value for each pixel of the optical image; a light quantity sensor configured to detect a light quantity of the pulsed light after emitting the pulsed light onto the inspection target object; a light quantity measurement circuit configured to input the light quantity detected by the light quantity sensor, and to measure a light quantity of each pulse while being synchronized with a period of the pulsed light; a correction unit configured to input the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and to correct the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse; and an inspection unit configured to inspect whether there is a defect of the pattern, using the integrated pixel value corrected.

    摘要翻译: 图案检查装置包括被配置为发射脉冲光的脉冲光源; 被配置为在其上安装有形成在其上的图案的检查对象物体的台; 时间延迟积分(TDI)传感器,其被配置为以时间延迟多次检测所述检查对象物体的光学图像的每个像素值,其中通过将所述脉冲光发射到所述检查对象物体上而获取所述光学图像 并且对于所述光学图像的每个像素集成检测到的每个像素值; 光量传感器,被配置为在将所述脉冲光发射到所述检查对象物体上之后检测所述脉冲光的光量; 光量测量电路,被配置为输入由光量传感器检测的光量,并且与脉冲光的周期同步地测量每个脉冲的光量; 校正单元,被配置为输入每个脉冲的光量和从TDI传感器输出的积分像素值,并且对于光学图像的每个像素,校正从TDI传感器输出的积分像素值,使用总光量 相应的每个脉冲的光量; 以及检查单元,被配置为使用校正的积分像素值来检查是否存在图案的缺陷。

    Charged particle beam writing method
    48.
    发明授权
    Charged particle beam writing method 有权
    带电粒子束写入方式

    公开(公告)号:US07759659B2

    公开(公告)日:2010-07-20

    申请号:US12193146

    申请日:2008-08-18

    IPC分类号: G21K1/00 G21K5/10

    摘要: A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.

    摘要翻译: 写入方法包括通过将第一成形孔和第二成形孔通过到目标工件上来发射形成为第一形状的第一带电粒子束; 并且通过穿过所述第一成形孔和所述第二成形孔而发射形成为第二形状的第二带电粒子束,其中所述第二带电粒子束叠加在由所述第一带电粒子束暴露的相同位置上,并且通过使用 相应的第一和第二成形孔的相对侧与用于第一形状的那些相对。

    METHOD AND APPARATUS FOR WRITING
    49.
    发明申请
    METHOD AND APPARATUS FOR WRITING 有权
    书写方法与装置

    公开(公告)号:US20100173235A1

    公开(公告)日:2010-07-08

    申请号:US12649846

    申请日:2009-12-30

    IPC分类号: G03F7/20 G21K5/00 G21K1/00

    摘要: A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose.

    摘要翻译: 一种写入方法包括计算用于校正带电粒子束写入中的邻近效应的邻近效应校正剂量,对于通过将目标对象的写入区域虚拟地分成多个第一网格尺寸的第一网格区域而制成的每个第一网格区域 通过使用计算的邻近效应校正剂量和相对于计算区域的一部分的第一网格尺寸的面积密度来计算雾化效果校正剂量,以计算用于校正雾化效果的起雾效果校正剂量 带电粒子束写入,并且相对于计算区域的剩余部分使用相对于第一网格尺寸大的第二网格尺寸的面积密度,合成每个图像的雾化效果校正剂量和邻近效应校正剂量 第一网格区域,并且基于合成的校正剂量,通过使用带电粒子束将目标物体上的图案写入。

    Method of manufacturing plasma display panel with concave barrier wall portion
    50.
    发明授权
    Method of manufacturing plasma display panel with concave barrier wall portion 失效
    制造具有凹形阻挡壁部分的等离子体显示面板的方法

    公开(公告)号:US07722423B2

    公开(公告)日:2010-05-25

    申请号:US11762879

    申请日:2007-06-14

    IPC分类号: H01J9/00

    摘要: A plasma display panel (PDP) and a method of manufacturing the same suppresses variation in the height of the intersecting barrier walls with a simple method and that prevents cross talk from occurring between the discharge cells. A concave part is formed at a position contacting an intersecting part of a first barrier wall before baking and a second barrier wall before baking orthogonal to the first barrier wall before baking. When such concave part is formed, the values of the surface area per volume of the intersecting part and the surface area per volume of the first barrier wall before baking and the second barrier wall before baking between the intersecting part and the intersecting part adjacent to the intersecting part become substantially equal. As a result, the height of the intersecting part does not become high after baking, a barrier wall of aligned height is obtained, and cross talk does not occur between the discharge cells.

    摘要翻译: 等离子体显示面板(PDP)及其制造方法以简单的方法抑制交叉阻挡壁的高度变化,并且防止在放电单元之间发生串扰。 在烘烤之前,在与第一阻挡壁正交的烘烤前的第一阻挡壁的交叉部与第二阻挡壁接触的位置形成凹部, 当形成这样的凹部时,交叉部分的每个体积的表面积和烘烤前的第一阻挡壁的体积的表面积和烘烤前的交叉部分和邻近的交叉部分的交叉部分之间的值 相交部分变得基本相等。 结果,烘烤后交叉部分的高度不变高,获得排列高度的阻挡壁,并且在放电单元之间不发生串扰。