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    Uninterruptible Power Supply For Home/Office Networking And Communication System
    43.
    发明申请
    Uninterruptible Power Supply For Home/Office Networking And Communication System 失效
    家庭/办公网络和通信系统不间断电源

    公开(公告)号：US20080179956A1

    公开(公告)日：2008-07-31

    申请号：US11627981

    申请日：2007-01-28

    申请人： Ming Jiang ,  Min Shi

    发明人： Ming Jiang ,  Min Shi

    IPC分类号： H02J9/00

    CPC分类号： H04L12/10 ,  H02J9/061 ,  Y10T307/615 ,  Y10T307/625

    摘要： An uninterruptible power supply for home/office networking and communication system (UPS) comprising: (i) an AC-DC converter, (ii) a battery charger, (iii) a rechargeable battery array, (iv) a control circuit, and (v) a plurality of DC-DC voltage converters/voltage controllers, wherein, in operation, when an AC power supply is available, the UPS provides a plurality of DC voltage outputs to a plurality of loads Li, through the AC-DC converter, the control circuit, and the plurality of the DC-DC voltage converters/voltage controllers, and provides continuous DC charge to the rechargeable battery array, and when the AC power supply becomes unavailable, the control circuit detects the unavailability of the AC power supply, the UPS provides a plurality of DC voltage outputs to the plurality of loads Li, through an DC supply voltage of the rechargeable battery array, the control circuit, and the plurality of the DC-DC voltage converters/voltage controllers.

    摘要翻译： 一种用于家庭/办公网络和通信系统（UPS）的不间断电源，包括：（i）AC-DC转换器，（ii）电池充电器，（iii）可充电电池阵列，（iv）控制电路和（ v）多个DC-DC电压转换器/电压控制器，其中在运行中，当AC电源可用时，UPS通过AC-DC转换器向多个负载Li提供多个DC电压输出， 控制电路和多个DC-DC电压转换器/电压控制器，并且向可再充电电池阵列提供连续的DC电荷，并且当AC电源变得不可用时，控制电路检测到AC电源的不可用性， UPS通过可再充电电池阵列，控制电路和多个DC-DC电压转换器/电压控制器的DC电源电压向多个负载Li提供多个DC电压输出。

    SYSTEMS AND METHODS FOR MULTI-SPECTRAL BIOLUMINESCENCE TOMOGRAPHY
    46.
    发明申请
    SYSTEMS AND METHODS FOR MULTI-SPECTRAL BIOLUMINESCENCE TOMOGRAPHY 有权
    多光谱生物荧光光谱的系统与方法

    公开(公告)号：US20070244395A1

    公开(公告)日：2007-10-18

    申请号：US11619495

    申请日：2007-01-03

    申请人： Ge Wang ,  Alexander Cong ,  Weimin Han ,  Ming Jiang ,  Haiou Shen ,  Wenxiang Cong

    发明人： Ge Wang ,  Alexander Cong ,  Weimin Han ,  Ming Jiang ,  Haiou Shen ,  Wenxiang Cong

    IPC分类号： A61B5/00

    CPC分类号： A61B5/0059 ,  A61B5/0077 ,  A61B6/03 ,  A61B6/4488 ,  A61B6/482 ,  A61B6/508 ,  A61B6/5247 ,  A61B2503/40

    摘要： Bioluminescent imaging has proven to be a valuable tool for monitoring physiological and pathological activities at cellular and molecular levels in living small animals. Using biological techniques, target cells can be tagged with reporters which generate characteristic photons in a wide spectrum covering the infra-red range. Part of the diffused light can reach the body surface of a subject/specimen (e.g., a small animal), be separated into several spectral bands using optical means, and collected by a sensitive camera. Systems and methods are disclosed herein for multi-spectral bioluminescence tomography (MBLT), in which an image of an underlying 3D bioluminescent source distribution is synergistically reconstructed from spectrally resolved datasets externally measured. This MBLT process involves two or multiple imaging modalities that produce structural information of the object and optical properties of the object as well to enable and improve the quality of MBLT.

    摘要翻译： 已经证明生物发光成像是监测活的小动物细胞和分子水平的生理和病理活动的有价值的工具。 使用生物学技术，靶细胞可以用记录器进行标记，记者在覆盖红外范围的广谱中产生特征光子。 扩散光的一部分可以到达对象/标本（例如，小动物）的身体表面，使用光学装置分离成若干光谱带，并由敏感摄像机收集。 本文公开了用于多光谱生物发光断层摄影（MBLT）的系统和方法，其中底层3D生物发光源分布的图像从外部测量的光谱解析数据集协同地重建。 该MBLT过程涉及产生物体的结构信息和对象的光学性质的两个或多个成像模态，以及实现和提高MBLT的质量。

    Method for fabricating thin film magnetic heads using CMP with polishing stop layer
    47.
    发明申请
    Method for fabricating thin film magnetic heads using CMP with polishing stop layer 失效
    使用具有抛光停止层的CMP制造薄膜磁头的方法

    公开(公告)号：US20060043060A1

    公开(公告)日：2006-03-02

    申请号：US10928002

    申请日：2004-08-27

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Hong Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Hong Zhang

    IPC分类号： B44C1/22 ,  C23F1/00

    CPC分类号： B82Y25/00 ,  G11B5/3163 ,  G11B5/3169

    摘要： A method is described for thin film processing using a selected CMP slurry with a silicon dioxide stop layer. The slurry includes an abrasive, preferably alumina, a corrosion inhibitor, preferably benzotriazole (BTA), and an oxidizer preferably hydrogen peroxide. The method is particularly useful for fabricating thin film heads where alumina is used as the dielectric. The method can be used to planarize metal structures surrounded by alumina in magnetic heads. The alumina refill is deposited to the final target height which is slightly below the height of the metal. A thin silicon dioxide stop layer is deposited over the alumina. The CMP is executed using the selected slurry to planarize the wafer down to the stop layer. Preferably only a negligible amount of the stop layer remains and the height of the metal structure is essentially the same as the deposited height of the refilled alumina.

    摘要翻译： 描述了使用具有二氧化硅停止层的所选CMP浆料进行薄膜处理的方法。 浆料包括研磨剂，优选氧化铝，腐蚀抑制剂，优选苯并三唑（BTA）和优选过氧化氢的氧化剂。 该方法对于制造其中使用氧化铝作为电介质的薄膜头特别有用。 该方法可用于平面化由磁头中的氧化铝包围的金属结构。 氧化铝填充物沉积到稍低于金属高度的最终目标高度。 在氧化铝上沉积薄的二氧化硅阻挡层。 使用所选择的浆料执行CMP以将晶片平坦化到停止层。 优选地，仅剩下可忽略量的止挡层，并且金属结构的高度与再填充氧化铝的沉积高度基本相同。

    Methodology of chemical mechanical nanogrinding for ultra precision finishing of workpieces
    48.
    发明申请
    Methodology of chemical mechanical nanogrinding for ultra precision finishing of workpieces 失效
    化学机械纳米研磨方法用于工件超精密加工

    公开(公告)号：US20060021973A1

    公开(公告)日：2006-02-02

    申请号：US10903833

    申请日：2004-07-30

    申请人： Hung-Chin Guthrie ,  Ming Jiang

    发明人： Hung-Chin Guthrie ,  Ming Jiang

    IPC分类号： C03C15/00

    CPC分类号： C03C15/00 ,  C03C19/00 ,  G11B5/8404

    摘要： A chemical-mechanical nanogrinding process achieves near-zero pole tip recession (PTR) to minimize magnetic space loss of the head transducer to media spacing loss, alumina recession/trailing edge profile variation, and smooth surface finish with minimal smearing across multi-layers of thin films and the hard substrate to meet the requirements of high areal density head. With a fine lapping plate with a fixed-abrasive nanogrinding process, PTR can be improved to a mean of about 1.0 nm.

    摘要翻译： 化学机械纳米研磨工艺实现近零极极尖衰退（PTR），以最小化头部换能器的磁空间损失，使介质间隔损耗，氧化铝凹陷/后缘轮廓变化，以及光滑的表面光洁度，同时最小化多层 薄膜和硬质基材满足高密度面的要求。 使用具有固定研磨纳米研磨工艺的精细研磨板，PTR可以提高至约1.0nm的平均值。

    Post chemical mechanical polishing cleaning solution for 2.45T CoFeNi structures of thin film magnetic heads
    49.
    发明授权
    Post chemical mechanical polishing cleaning solution for 2.45T CoFeNi structures of thin film magnetic heads 失效
    用于2.45T薄膜磁头的CoFeNi结构的化学机械抛光清洗溶液

    公开(公告)号：US06984613B1

    公开(公告)日：2006-01-10

    申请号：US10931385

    申请日：2004-08-31

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Nick Lara

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Nick Lara

    IPC分类号： C11D17/00

    CPC分类号： C11D3/0073 ,  C11D9/007 ,  C11D9/30 ,  C11D11/0047

    摘要： The present invention is directed to methods for polishing and cleaning a wafer having CoFeNi structures within alumina fill to achieve corrosion-free, smooth, and planar surface. A preferred chemical mechanical polishing (CMP) method includes a CMP polishing compound including alumina abrasive particulates, 1H-Benzotriazole (BTA), and hydrogen peroxide (H2O2). A cleaning solution for CoFeNi structures in alumina fill of the present invention preferably includes 4-Methyl-1H-Benzotriazole in a concentration range of from 1% to 5%, 5-Methyl-1H-Benzotriazole in a concentration range of from 1% to 5%, hydrogenated 4-Methyl-1H-Benzotriazole in a concentration range of from 1% to 5%, hydrogenated 5-Methyl-1H-Benzotriazole in a concentration range of from 1% to 5%, sodium octanoate in a concentration range of from 5% to 10%, and water in a concentration range of from 65% to 95%. The cleaning solution is typically used with DI water to create an applied solution having a range of from 0.1% to 10% by volume of the cleaning solution.

    摘要翻译： 本发明涉及在氧化铝填充物内抛光和清洗具有CoFeNi结构的晶片以实现无腐蚀，平滑和平坦的表面的方法。 优选的化学机械抛光（CMP）方法包括CMP抛光化合物，其包括氧化铝磨粒，1H-苯并三唑（BTA）和过氧化氢（H 2 O 2 O 2）。 本发明的氧化铝填充物中的CoFeNi结构的清洗液优选含有浓度范围为1％〜5％的4-甲基-1H-苯并三唑，浓度范围为1％〜5％的5-甲基-1H-苯并三唑 5％的浓度范围为1％至5％的氢化的4-甲基-1H-苯并三唑，浓度范围为1％至5％的氢化的5-甲基-1H-苯并三唑，浓度范围为 5％至10％，浓度范围为65％至95％的水。 清洁溶液通常与去离子水一起使用以产生具有0.1至10体积％范围的清洁溶液的施用溶液。