摘要:
A radiation sensitive composition comprising (A) a copolymer comprising recurring units of a p-hydroxystyrene unit and a styrene unit having an acetal group or a ketal group at the p-position, (B) a copolymer comprising recurring units of a t-butyl (meth)acrylate unit and a p-hydroxystyrene unit, and (C) a radiation sensitive acid-generating agent.
摘要:
In a surface-area light source device, a light entrance side surface of a light guide plate of a surface-area light source device has a staircase shape having steps in the vertical direction, and light emission diodes are provided at each step. The structure enables the distance between a light emission diode provided at one step and light emission diodes provided at an adjacent step to be maintained greater even if the thickness of the light guide plate is reduced so as to decrease intervals of the light emission diodes in the direction of the thickness of the light guide plate. As a consequence, the amount of transmission and reception of heat produced by the light emission diodes is reduced to prevent an increase in the temperature of the diodes. This allows a reduction in the thickness of the light guide plate with the brightness of light emitted from the light guide plate maintained, enabling the surface-area light source device to be thinned. As a result, a large number of light emitting diodes are provided, so that the brightness of the surface light source device is increased.
摘要:
A backlight apparatus of a sidelight type includes a light guide plate having an incident face on a lateral face and a light source unit having a plurality of substrates. The plurality of the substrates are respectively disposed on the incident face side of the light guide plate such that each of substrate faces of the substrates is parallel with a light exit face of the light guide plate, and the substrates are adjacent to one another in a thickness direction of the light guide plate. A plurality of light emitting devices that emit light along the substrate faces are mounted in columns on each of the substrate faces of the plurality of the substrates such that emitting directions of the light emitting devices are directed to the incident face.
摘要:
A photocurable composition comprising the following components (A) to (D): (A) at least one of the (meth)acrylates having the structures shown by the formulas (1) and (2), wherein R1 represents a hydrogen atom or a halogen atom excluding a fluorine atom, R2 is a hydrogen atom, a halogen atom excluding a fluorine atom, Ph-C(CH3)2—, Ph-, or an alkyl group having 1-20 carbon atoms, and R3 represents —CH2—, —S—, or —C(CH3)2—; (B) a (meth)acrylate having three or more functional groups, excluding the (meth)acrylates of the component (A); (C) a radical photoinitiator; and (D) a polycarbonate polyol having a hydroxyl value of 10-100; wherein 5-50 wt % of the total acrylic components in the composition are methacrylate compounds. A photocurable composition produces a cured product possessing a high refractive index, excelling in heat resistance, showing only a small amount of warping, and being particularly useful as an optical part such as a prism lens sheet.
摘要:
A photo-fabrication apparatus (1) has a stage (2) for holding a base board (9) thereon, a feeding part (3) for feeding photosensitive material onto the base board (9), a layer forming part (4) for smoothly spreading the fed photosensitive material to form a material layer and a light emitting part (5) for emitting a spatially-modulated light beam onto the material layer. The photo-fabrication apparatus (1) forms a lot of elastic microstructures for fine probe and arranges the microstructures at microscopic intervals in a very small range with high positional accuracy on the base board (9) by repeating formation of a material layer and light emission. The microstructures become elastic probes through plating in a later process.
摘要:
To provide a UV-curable resin composition useful for forming optical parts such as optical lenses. A radiation-curable resin composition for optical parts, comprising (A) 5–70 wt % of urethane (meth)acrylate, (B) 0.1–70 wt % of benzyl (meth)acrylate, and (C) 10–70 wt % of an ethylenically unsaturated group-containing compound other than the components (A) and (B).
摘要:
To provide a photocurable liquid resin composition that can produce cured products exhibiting a high refractive index, good shape restorability, and superior adhesion to substrates. The photocurable resin composition comprises (A) 20-80 wt % of a urethane (meth) acrylate obtained by reacting a polyether polyol having an alkyleneoxy structure in the molecule, an organic polyisocyanate compound, and a (meth) acrylate containing a hydroxyl group, (B) 10-70 wt % of a monofunctional ethylenically unsaturated compound, (C) 5-25 wt % of a (meth) acrylate monomer having four or more functional groups, and (D) 0.1-10 wt % of a photoinitiator. Cured products are useful for forming an optical part such as a lens of a lens sheet or a back light using the lens sheet.
摘要:
To provide a radiation-sensitive curable liquid resin composition having excellent applicability and capable of producing a film excelling in hardness, scratch resistance, adhesion, transparency, and appearance of the surface of the film. A curable liquid resin composition comprising: (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium to a specific organic compound which comprises a polymerizable unsaturated group and a group shown by —X—C(═Y)—NH— (wherein X is NH, O, or S, and Y is O or S), and preferably a silanol group, (B) a compound having two or more polymerizable unsaturated groups in the molecule, (C) a specific alkylene glycol organic solvent, and preferably (D) a polymerization initiator.
摘要:
The invention relates to a photocurable resin composition comprising: (A) a di or more functional urethane (meth)acrylate compound; (B) a monofunctional (meth)acrylate; (C) a photoinitiator; and (D) a polyoxyalkylene alkyl ether phosphate represented by the following formula (2): and to cured products obtained from the resins composition.
摘要:
Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.