摘要:
A radiation sensitive composition comprising (A) a copolymer comprising recurring units of a p-hydroxystyrene unit and a styrene unit having an acetal group or a ketal group at the p-position, (B) a copolymer comprising recurring units of a t-butyl (meth)acrylate unit and a p-hydroxystyrene unit, and (C) a radiation sensitive acid-generating agent.
摘要:
The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.
摘要:
A backlight apparatus of a sidelight type includes a light guide plate having an incident face on a lateral face and a light source unit having a plurality of substrates. The plurality of the substrates are respectively disposed on the incident face side of the light guide plate such that each of substrate faces of the substrates is parallel with a light exit face of the light guide plate, and the substrates are adjacent to one another in a thickness direction of the light guide plate. A plurality of light emitting devices that emit light along the substrate faces are mounted in columns on each of the substrate faces of the plurality of the substrates such that emitting directions of the light emitting devices are directed to the incident face.
摘要:
To provide a curable liquid composition excelling in storage stability and curability and capable of forming a coat (film) which excels in antistatic properties, hardness, scratch resistance, and transparency on the surface of various substrates, a cured film of the composition, and an antistatic laminate. A curable liquid composition comprising (A) particles including an oxide of at least one element selected from the group consisting of indium, antimony, zinc, and tin as a major component, (B) a compound having at least two polymerizable unsaturated groups in the molecule, (C) a solvent in which solubility of the component (B) is less than 10 wt %, and (D) a solvent in which solubility of the component (B) is 10 wt % or more, the components (A) and (B) being uniformly dispersed or dissolved in the composition.
摘要:
The present invention relates to a radiation-curable resin composition which produces a cured film having low surface resistivity and high transparency, a cured film of the composition, and a laminate including a layer of the cured film. The laminate of the present invention is suitably used as a hard coat material for preventing scratches or stains on a plastic optical part, touch panel, film-type liquid crystal element, plastic container, or flooring material, wall material, or artificial marble as an architectural interior finish; adhesive and sealing material for various substrates; vehicle for printing ink; or the like.
摘要:
Photocurable resin composition for photofabrication of three-dimensional objects comprising (A) 5-80 parts by weight of an oxetane compound, (B) 5-80 parts by weight of an epoxy compound, (C) 0, 1 10 parts by weight of a photoacid generator, (D) 1-35 parts by weight of elastomer particles with an average particle diameter of 10-700 nm, (E) 0-35 parts by weight of a polyol compound, (F) 0-45 parts by weight of an ethylenically unsaturated monomer, and (G) 0-10 parts by weight of a radical photopolymerization initiator.
摘要:
The invention relates to a curable resin composition, cured products thereof, and laminated materials. The curable composition comprises: (A-1) acicular oxide particles, the oxide being an oxide of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium, (B) a compound having two or more polymerizable unsaturated groups, (C) a photopolymerization initiator is provided. After cure, the composition has excellent scratch resistance. In addition, it may have excellent antistatic characteristics and transparency. In a preferred embodiment the composition also comprises (A-2) particles other than the acicular particles (A-1), being oxide of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium.
摘要:
A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer.A process for producing a three-dimensional object which comprises the use of a washing agent having a Hansen-solubility between 27-35 (Mpa)1/2.
摘要:
A polyamide resin composition comprising: (a) 100 parts by weight of a polyamide; (b) from about 1 part to about 80 parts by weight of an aromatic polyamide fiber; (c) from about 3 parts to about 80 parts by weight of a polytetrafluoroethylene; and (d) from about 1 part to about 20 parts by weight of high-density polyethylene is disclosed. The polyamide resin composition can be molded into sliding members, like bearings, bushings and slide rails, that demonstrate excellent mechanical and physical properties, like low frictional force, low self-abrasion, and low abrasion to metals.
摘要:
A light guide plate has a light exit plane and a light entrance plane arranged on the periphery of the light exit plane. Light incident on the light entrance plane is outputted from the light exit plane. The light entrance plane includes a plurality of first end surfaces and a plurality of second end surfaces protruding in an external direction beyond the first end surfaces in plan view. The first end surfaces and the second end surfaces are alternately arranged along the periphery of the light exit plane.