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公开(公告)号：US20070262318A1
公开(公告)日：2007-11-15
申请号：US11826815
申请日：2007-07-18
申请人： Hironobu Shoji , Shinji Maekawa , Kensuke Yoshizumi , Tatsuya Honda , Yukie Suzuki , Ikuko Kawamata , Shunpei Yamazaki
发明人： Hironobu Shoji , Shinji Maekawa , Kensuke Yoshizumi , Tatsuya Honda , Yukie Suzuki , Ikuko Kawamata , Shunpei Yamazaki
IPC分类号： H01L29/04
CPC分类号： H01L51/56 , H01L27/1277 , H01L27/1292 , H01L27/322 , H01L27/3244 , H01L27/3246 , H01L27/3262 , H01L27/3276 , H01L29/42384 , H01L29/458 , H01L29/66757 , H01L29/78675 , H01L29/78696 , H01L51/0005 , H01L51/524 , H01L51/5253 , H01L51/5281 , H01L51/529 , H01L2251/5315 , H01L2251/5323 , Y02P80/30
摘要： The present invention provides a method for manufacturing a display device having a TFT that can be operated at high speed while using a small number of photomasks and improving the utilization efficiency of materials, where the threshold value is difficult to be varied. In the invention, a catalytic element is applied to an amorphous semiconductor film and the amorphous semiconductor film is heated to form a crystalline semiconductor film. After removing the catalytic element from the crystalline semiconductor film, a top-gate type thin film transistor with a planar structure is manufactured. Moreover, by using the droplet discharging method where an element of a display device is formed selectively, the process can be simplified, and loss of materials can be reduced.
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公开(公告)号：US07247529B2
公开(公告)日：2007-07-24
申请号：US11205220
申请日：2005-08-17
申请人： Hironobu Shoji , Shinji Maekawa , Kensuke Yoshizumi , Tatsuya Honda , Yukie Suzuki , Ikuko Kawamata , Shunpei Yamazaki
发明人： Hironobu Shoji , Shinji Maekawa , Kensuke Yoshizumi , Tatsuya Honda , Yukie Suzuki , Ikuko Kawamata , Shunpei Yamazaki
IPC分类号： H01L21/00
CPC分类号： H01L51/56 , H01L27/1277 , H01L27/1292 , H01L27/322 , H01L27/3244 , H01L27/3246 , H01L27/3262 , H01L27/3276 , H01L29/42384 , H01L29/458 , H01L29/66757 , H01L29/78675 , H01L29/78696 , H01L51/0005 , H01L51/524 , H01L51/5253 , H01L51/5281 , H01L51/529 , H01L2251/5315 , H01L2251/5323 , Y02P80/30
摘要： The present invention provides a method for manufacturing a display device having a TFT that can be operated at high speed while using a small number of photomasks and improving the utilization efficiency of materials, where the threshold value is difficult to be varied. In the invention, a catalytic element is applied to an amorphous semiconductor film and the amorphous semiconductor film is heated to form a crystalline semiconductor film. After removing the catalytic element from the crystalline semiconductor film, a top-gate type thin film transistor with a planar structure is manufactured. Moreover, by using the droplet discharging method where an element of a display device is formed selectively, the process can be simplified, and loss of materials can be reduced.
摘要翻译： 本发明提供了一种用于制造具有TFT的显示装置的方法，所述显示装置可以在使用少量光掩模的情况下高速运转并且提高难以改变阈值的材料的利用效率。 在本发明中，将催化元件施加到非晶半导体膜上，并加热非晶半导体膜以形成结晶半导体膜。 在从晶体半导体膜去除催化元素之后，制造具有平面结构的顶栅型薄膜晶体管。 此外，通过使用选择性地形成显示装置的元件的液滴喷射方法，可以简化该过程，并且可以减少材料的损失。
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公开(公告)号：US07229862B2
公开(公告)日：2007-06-12
申请号：US10885636
申请日：2004-07-08
IPC分类号： H01L21/84
CPC分类号： H01L27/12 , H01L27/1292 , H01L29/42384 , H01L29/66765
摘要： An object of the present invention is to provide a method for manufacturing a semiconductor device of which manufacturing process is simplified by improving usage rate of a material. A method for manufacturing a semiconductor device of the invention comprises the steps of: forming gate electrodes with a droplet discharge method on a substrate having an insulating surface; laminating gate insulating layers, semiconductor layers, and a semiconductor layer containing one-conductivity type impurity over the gate electrodes; forming first conductive layers serving as masks with a droplet discharge method in a position overlapping the gate electrodes, etching the semiconductor layer and the semiconductor layer containing one-conductivity type impurity with the first conductive layers, forming a second conductive layer serving as a source wiring or a drain wiring with a droplet discharge method over the first conductive layers; and etching the first conductive layers and the semiconductor layer containing one-conductivity type impurity, using the second conductive layers as masks.
摘要翻译： 本发明的目的是提供一种通过提高材料的使用率来简化制造工艺的半导体器件的制造方法。 本发明的半导体器件的制造方法包括以下步骤：在具有绝缘表面的基板上形成具有液滴喷射法的栅电极; 在栅电极上层叠栅绝缘层，半导体层和含有一导电型杂质的半导体层; 在与栅电极重叠的位置处形成用作液滴喷射法的掩模的第一导电层，用第一导电层蚀刻半导体层和含有一导电型杂质的半导体层，形成用作源极布线的第二导电层 或在第一导电层上具有液滴喷射方法的漏极布线; 并且使用第二导电层作为掩模来蚀刻第一导电层和含有一种导电型杂质的半导体层。
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44.发明授权Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate 有权一种发光器件的制造方法，包括使所述气相沉积源平行于所述衬底移动公开(公告)号：US07211454B2
公开(公告)日：2007-05-01
申请号：US10894434
申请日：2004-07-20
申请人： Shunpei Yamazaki , Keitaro Imai , Shinji Maekawa , Makoto Furuno , Osamu Nakamura , Masakazu Murakami
发明人： Shunpei Yamazaki , Keitaro Imai , Shinji Maekawa , Makoto Furuno , Osamu Nakamura , Masakazu Murakami
CPC分类号： H01L51/56 , H01L27/3244
摘要： The present invention provides an active matrix substrate which can be fabricated at a lower cost and a light emitting device having a large display area fabricated by a vapor deposition system which makes a film with uniform thickness for a large substrate. According to the invention, an organic light-emitting device can be fabricated by performing vapor deposition toward a large substrate provided with a pixel portion (and a driver circuit) including an n-channel TFT having a amorphous silicon film, semi-amorphous semiconductor film or an organic semiconductor film as an active layer.
摘要翻译： 本发明提供了一种能够以较低成本制造的有源矩阵基板和具有由气相沉积系统制造的具有大的显示面积的发光器件，该气相沉积系统制造了具有均匀厚度的薄膜用于大基片。 根据本发明，可以通过向具有包括具有非晶硅膜，半非晶半导体膜的n沟道TFT的像素部分（和驱动电路）的大型衬底进行气相沉积来制造有机发光器件 或有机半导体膜作为活性层。
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45.发明申请公开(公告)号：US20070051952A1
公开(公告)日：2007-03-08
申请号：US10574829
申请日：2004-10-25
IPC分类号： H01L29/04
CPC分类号： H01L33/08 , G02F1/1368 , G02F2001/136295 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L29/66765 , H01L2924/0002 , Y10T428/24421 , H01L2924/00
摘要： At least one or more of a conductive layer which forms a wiring or an electrode and a pattern necessary for manufacturing a display panel such as a mask for forming a predetermined pattern is formed by a method capable of selectively forming a pattern to manufacture a liquid crystal display device. A droplet discharge method capable of forming a predetermined pattern by selectively discharging a droplet of a composition in accordance with a particular object is used as a method capable of selectively forming a pattern in forming a conductive layer, an insulating layer, or the like.
摘要翻译： 通过能够选择性地形成图案以制造液晶的方法形成至少一个或多个形成布线或电极的导电层和制造用于形成预定图案的掩模等显示面板所需的图案 显示设备。 使用能够通过根据特定目的选择性地排出组合物的液滴来形成预定图案的液滴喷射方法作为能够在形成导电层，绝缘层等中选择性地形成图案的方法。
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公开(公告)号：US20070040971A1
公开(公告)日：2007-02-22
申请号：US10577058
申请日：2004-11-05
IPC分类号： G02F1/1333 , G02F1/136
CPC分类号： G02F1/1368 , H01L2224/16225 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/48464 , H01L2224/73204 , H01L2224/73265 , H01L2924/181 , H01L2924/00014 , H01L2924/00012 , H01L2924/00
摘要： By using one photo mask in the manufacturing steps of a liquid crystal display device, steps such as resist coating, prebaking, exposure, development, and postbaking, as well as the formation of a covering film, etching, resist peeling, rinsing, drying and the like before and after the aforementioned steps are required, which make the process complicated. To solve the problem, a channel-etch type bottom gate TFT (inverted staggered TFT) is employed to pattern source and drain regions and a pixel electrode with the same mask. Moreover, according to the invention, among the patterns required to form a liquid crystal display device such as a conductive layer for a wiring layer or an electrode, a mask for forming a predetermined pattern and the like, at least one or more of them is formed by a method by which a pattern can selectively be formed, thereby manufacturing a liquid crystal display device.
摘要翻译： 通过在液晶显示装置的制造步骤中使用一个光掩模，诸如抗蚀涂层，预烘烤，曝光，显影和后烘烤之类的步骤，以及形成覆盖膜，蚀刻，抗蚀剂剥离，漂洗，干燥和 需要上述步骤之前和之后，这使得该过程变得复杂。 为了解决这个问题，采用沟道蚀刻型底栅TFT（反交错TFT）来对源极和漏极区域以及具有相同掩模的像素电极进行图案化。 此外，根据本发明，形成布线层或电极用导电层等液晶显示装置所需的图案，形成规定图案的掩模等，其中至少一个或多个是 通过可以选择性地形成图案的方法形成，从而制造液晶显示装置。
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公开(公告)号：US08629442B2
公开(公告)日：2014-01-14
申请号：US13085750
申请日：2011-04-13
IPC分类号： H01L29/04
CPC分类号： H01L33/08 , G02F1/1368 , G02F2001/136295 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L29/66765 , H01L2924/0002 , Y10T428/24421 , H01L2924/00
摘要： At least one or more of a conductive layer which forms a wiring or an electrode and a pattern necessary for manufacturing a display panel such as a mask for forming a predetermined pattern is formed by a method capable of selectively forming a pattern to manufacture a liquid crystal display device. A droplet discharge method capable of forming a predetermined pattern by selectively discharging a droplet of a composition in accordance with a particular object is used as a method capable of selectively forming a pattern in forming a conductive layer, an insulating layer, or the like.
摘要翻译： 通过能够选择性地形成图案以制造液晶的方法形成至少一个或多个形成布线或电极的导电层和制造用于形成预定图案的掩模等显示面板所需的图案 显示设备。 使用能够通过根据特定目的选择性地排出组合物的液滴来形成预定图案的液滴喷射方法作为能够在形成导电层，绝缘层等中选择性地形成图案的方法。
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公开(公告)号：US08547315B2
公开(公告)日：2013-10-01
申请号：US13540664
申请日：2012-07-03
IPC分类号： G09G3/36
CPC分类号： H01L27/156 , H01L21/288 , H01L21/76838 , H01L27/1285 , H01L27/1292 , H01L27/3248 , H01L27/3276
摘要： The invention provides an active matrix EL display device which can perform a clear multi-gray scale color display. In particular, the invention provides a large active matrix EL display device at low cost by a manufacturing method which can selectively form a pattern. Power supply lines in a pixel portion are arranged in matrix by the manufacturing method which can selectively form a pattern. Further, capacitance between wirings is reduced by providing a longer distance between adjacent wirings by the manufacturing method which can selectively form a pattern.
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公开(公告)号：US08102347B2
公开(公告)日：2012-01-24
申请号：US12784063
申请日：2010-05-20
IPC分类号： G09G3/36
CPC分类号： H01L27/156 , H01L21/288 , H01L21/76838 , H01L27/1285 , H01L27/1292 , H01L27/3248 , H01L27/3276
摘要： The invention provides an active matrix EL display device which can perform a clear multi-gray scale color display. In particular, the invention provides a large active matrix EL display device at low cost by a manufacturing method which can selectively form a pattern. Power supply lines in a pixel portion are arranged in matrix by the manufacturing method which can selectively form a pattern. Further, capacitance between wirings is reduced by providing a longer distance between adjacent wirings by the manufacturing method which can selectively form a pattern.
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50.发明授权公开(公告)号：US08101467B2
公开(公告)日：2012-01-24
申请号：US10574829
申请日：2004-10-25
IPC分类号： H01L21/00
CPC分类号： H01L33/08 , G02F1/1368 , G02F2001/136295 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L29/66765 , H01L2924/0002 , Y10T428/24421 , H01L2924/00
摘要： At least one or more of a conductive layer which forms a wiring or an electrode and a pattern necessary for manufacturing a display panel such as a mask for forming a predetermined pattern is formed by a method capable of selectively forming a pattern to manufacture a liquid crystal display device. A droplet discharge method capable of forming a predetermined pattern by selectively discharging a droplet of a composition in accordance with a particular object is used as a method capable of selectively forming a pattern in forming a conductive layer, an insulating layer, or the like.
摘要翻译： 通过能够选择性地形成图案以制造液晶的方法形成至少一个或多个形成布线或电极的导电层和制造用于形成预定图案的掩模等显示面板所需的图案 显示设备。 使用能够通过根据特定目的选择性地排出组合物的液滴来形成预定图案的液滴喷射方法作为能够在形成导电层，绝缘层等中选择性地形成图案的方法。
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