公开(公告)号：US20050016685A1

公开(公告)日：2005-01-27

申请号：US10879074

申请日：2004-06-30

申请人： Keiji Emoto ,  Atsushi Ito

发明人： Keiji Emoto ,  Atsushi Ito

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/683 ,  H01L21/306 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70708 ,  G03F7/707 ,  H01L21/6831

摘要： Disclosed is a stage system that includes a stage for supporting and moving a substrate, and a probe for measuring a potential of a substrate without contact thereto, the probe being supported by the stage so as to be opposed to one of a bottom face and a side face of the substrate. Also disclosed is a stage system that includes a substrate holding member for holding a substrate, the substrate holding member having a protrusion and a first electrode, the first electrode being provided inside the substrate holding member and adjacent said protrusion, a terminal for adjusting a potential of said first electrode, and a stage for supporting and moving the substrate holding member through the terminal. Further, a substrate holding system is disclosed, that includes a plurality of protrusions to be supported by a stage, and a plurality of first electrodes disposed adjacent the plurality of protrusions, respectively, and for electrostatically attracting the stage.

摘要翻译： 公开了一种舞台系统，其包括用于支撑和移动衬底的台，以及用于测量衬底的电位而不与其接触的探针，所述探针由所述台支撑以与底面和 基板的侧面。 还公开了一种舞台系统，其包括用于保持衬底的衬底保持构件，所述衬底保持构件具有突起和第一电极，所述第一电极设置在衬底保持构件内部并且邻近所述突起，用于调节电位的端子 的第一电极，以及用于通过端子支撑和移动衬底保持构件的台。 此外，公开了一种基板保持系统，其包括由台架支撑的多个突起和分别邻近多个突起设置并用于静电吸引台的多个第一电极。

公开(公告)号：US06791670B2

公开(公告)日：2004-09-14

申请号：US10022506

申请日：2001-12-20

申请人： Yoshikazu Miyajima ,  Kazuhito Outuka ,  Keiji Emoto

发明人： Yoshikazu Miyajima ,  Kazuhito Outuka ,  Keiji Emoto

IPC分类号： G03B2742

CPC分类号： G03F7/70758 ,  G03F7/709 ,  H02K3/04 ,  H02K3/47 ,  H02K41/03

摘要： A linear motor apparatus includes a movable member having a magnet, and a coil wound about the magnet so as to generate a drive force for driving the movable member and having a multi-layer structure formed by winding a foil-like conductor and an insulating layer. The foil-like conductor (i) has a plurality of partial coils having identical current application/rotation directions, and the plurality of partial coils are formed in such a way that the foil-like conductor forms a continuous, seamless strip, and (ii) is continuously wound in a multilayered, aligned state to form the coil, and adjacent layers of the foil-like conductor are insulated by the insulating layer.

摘要翻译： 线性电动机装置包括具有磁体的可动部件和缠绕在磁体上的线圈，以产生用于驱动可动部件的驱动力，并具有通过卷绕箔状导体和绝缘层而形成的多层结构 。 箔状导体（i）具有多个具有相同电流施加/旋转方向的部分线圈，并且多个部分线圈形成为使得箔状导体形成连续的无缝条带，并且（ii ）以多层排列状态连续卷绕以形成线圈，并且箔状导体的相邻层被绝缘层绝缘。

公开(公告)号：US09104121B2

公开(公告)日：2015-08-11

申请号：US13546131

申请日：2012-07-11

申请人： Keiji Emoto ,  Tosiya Asano

发明人： Keiji Emoto ,  Tosiya Asano

IPC分类号： G03F7/20 ,  H01L21/67 ,  H01L21/687

CPC分类号： G03F7/70725 ,  G03F7/70766 ,  H01L21/6719 ,  H01L21/67288 ,  H01L21/68785

摘要： An exposure apparatus includes: a substrate stage configured to move upon holding the substrate; a structural member configured to support a substrate stage; a first counter mass stage configured to cancel a driving reaction force that is generated due to driving of the substrate stage and acts on the structural member; a substrate stage driver configured to generate a force between the substrate stage and the first counter mass stage; a first counter mass driver configured to generate a force between the structural member and the first counter mass stage; a controller configured to control the first counter mass driver so as to cancel the force that acts on the structural member by generating a force between the structural member and the first counter mass stage using the first counter mass driver.

摘要翻译： 曝光装置包括：衬底台，被配置为在保持衬底时移动; 构造成支撑衬底台的结构构件; 构造成抵消由于基板台的驱动而产生的驱动反作用力并作用在所述结构构件上的第一反质量台; 衬底台驱动器，其被配置为在所述衬底台和所述第一对质量台之间产生力; 配置为在所述结构构件和所述第一反质量段之间产生力的第一反质量驱动器; 控制器，其被配置为控制所述第一反质量驱动器，以便通过使用所述第一计数器质量驱动器在所述结构构件和所述第一计数器质量级之间产生力来抵消作用在所述结构构件上的力。

公开(公告)号：US07660098B2

公开(公告)日：2010-02-09

申请号：US12334697

申请日：2008-12-15

申请人： Atsushi Ito ,  Keiji Emoto

发明人： Atsushi Ito ,  Keiji Emoto

IPC分类号： H01T23/00

CPC分类号： H01L21/683 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/6838

摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

摘要翻译： 一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起， 支撑轮辋内的基底。 静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

公开(公告)号：US20090135383A1

公开(公告)日：2009-05-28

申请号：US12129273

申请日：2008-05-29

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/52

CPC分类号： G03F7/70858 ,  G03F7/70725

摘要： An exposure apparatus including a moving member movable with a substrate, an interferometer configured to measure a position of the moving member, a blower device for blowing temperature-conditioned air, a plurality of supply openings communicating with the blower device, and a flow rate adjusting device configured to adjust a gas flow rate blown through the plurality of supply openings based on an operation of the moving member.

摘要翻译： 一种曝光装置，包括可移动的基板的移动部件，被配置为测量移动部件的位置的干涉仪，用于吹送温度调节的空气的鼓风装置，与鼓风装置连通的多个供给开口，以及流量调节 被配置为基于所述移动构件的操作来调节吹过所述多个供给口的气体流量。

公开(公告)号：US20090103232A1

公开(公告)日：2009-04-23

申请号：US12334697

申请日：2008-12-15

申请人： Atsushi Ito ,  Keiji Emoto

发明人： Atsushi Ito ,  Keiji Emoto

IPC分类号： H01L21/683

CPC分类号： H01L21/683 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/6838

摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

摘要翻译： 一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起，被配置为 支撑轮辋内的基底。 静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

公开(公告)号：US20070247780A1

公开(公告)日：2007-10-25

申请号：US11770979

申请日：2007-06-29

申请人： Atsushi ITO ,  Keiji Emoto

发明人： Atsushi ITO ,  Keiji Emoto

IPC分类号： H01L21/683

CPC分类号： H01L21/683 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/6838

摘要： A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

摘要翻译： 一种用于基于真空吸引和静电吸引保持基板的基板保持系统，包括构造成支撑基板的边缘，用于静电吸引的突起，被配置为将基板支撑在边缘内，以及用于真空吸引的突起， 支撑轮辋内的基底。 静电吸引突起的基板支撑表面积大于用于真空吸引的突起的基板支撑表面积。

公开(公告)号：US07282820B2

公开(公告)日：2007-10-16

申请号：US11074642

申请日：2005-03-09

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： H02K41/00 ,  G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70758 ,  Y10T74/20201

摘要： An exposure apparatus which aligns a substrate by a stage device for driving a movable element, mounted with a substrate thereon, by using a plane motor. The stage device includes (i) a stator unit having a coil group, and (ii) the movable element, which moves on the stator unit. The stator unit includes (a) an exposure region where the substrate is to be subjected to a process of exposing the substrate, and (b) a measurement region where the substrate is to be subjected to a process of measuring a position of the substrate. The coil group in the stator unit is temperature-controlled independently between the exposure region and the measurement region.

摘要翻译： 一种曝光装置，其通过使用平面电动机的用于驱动安装有基板的可动元件的平台装置对准基板。 舞台装置包括（i）具有线圈组的定子单元和（ii）在定子单元上移动的可移动元件。 定子单元包括（a）基板经受暴露基板的处理的曝光区域，以及（b）要对基板进行测量基板位置的处理的测量区域。 定子单元中的线圈组在曝光区域和测量区域之间独立地进行温度控制。

公开(公告)号：US07218020B2

公开(公告)日：2007-05-15

申请号：US11133292

申请日：2005-05-20

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： H02K41/00

CPC分类号： H02K41/031 ,  H02K9/22

摘要： Outflow of heat generated by a linear motor to the outside is suppressed. A linear motor according to the present invention is a linear motor used in a vacuum atmosphere, including a stator, a movable element movable relative to the stator, and a metal film formed on the surface of at least one of the stator and the movable element. This decreases the emissivity and reduces the outflow of heat by radiation from the linear motor.

摘要翻译： 由线性电动机向外部产生的热量的流出被抑制。 根据本发明的线性电动机是在真空环境中使用的线性电动机，其包括定子，可相对于定子移动的可动元件和形成在定子和可动元件中的至少一个的表面上的金属膜 。 这降低了发射率，并且通过来自线性电动机的辐射减少了热量的流出。

公开(公告)号：US07177007B2

公开(公告)日：2007-02-13

申请号：US11407059

申请日：2006-04-20

申请人： Keiji Emoto

发明人： Keiji Emoto

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70525 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70891

摘要： An exposure apparatus including an illumination optical unit for irradiating exposure light, a stage for mounting a substrate and moving the substrate, a driving unit for driving the stage, a heater for applying heat to the stage, and a heat generation amount control unit for controlling heat generation amount to suppress a temperature change of the stage before or after driving of the driving unit or a temperature change of the stage before or after irradiating of the illumination optical unit.

摘要翻译： 一种曝光装置，包括用于照射曝光光的照明光学单元，用于安装基板并移动基板的台，用于驱动平台的驱动单元，向台架施加热量的加热器和用于控制的发热量控制单元 用于抑制在驱动单元驱动之前或之后的台的温度变化或在照明光学单元的照射之前或之后的台的温度变化的发热量。