IMPACT IONISATION MOSFET METHOD
    42.
    发明申请
    IMPACT IONISATION MOSFET METHOD 失效
    影响发光MOSFET方法

    公开(公告)号:US20100041186A1

    公开(公告)日:2010-02-18

    申请号:US12521963

    申请日:2007-12-12

    申请人: Radu Surdeanu

    发明人: Radu Surdeanu

    IPC分类号: H01L21/336

    摘要: A method of manufacturing an I-MOS device includes forming a semiconductor layer (2) on a buried insulating layer (4). A gate structure (23) including a gate stack (14) is formed on the semiconductor layer, and used to (5) self align the formation of a source region (28) by implantation. Then, an etch step is used to selectively etch the gate structure (23) and this is followed by forming a drain region (36) by implantation. The method can precisely control the i-region length (38) between source region (28) and gate stack (14).

    摘要翻译: 一种制造I-MOS器件的方法包括在掩埋绝缘层(4)上形成半导体层(2)。 在半导体层上形成包括栅叠层(14)的栅结构(23),用于(5)通过注入自对准源极区(28)的形成。 然后,使用蚀刻步骤来选择性地蚀刻栅极结构(23),然后通过注入形成漏极区域(36)。 该方法可以精确控制源极区域(28)和栅极叠层(14)之间的i区域长度(38)。

    Source and Drain Formation in Silicon on Insulator Device
    43.
    发明申请
    Source and Drain Formation in Silicon on Insulator Device 审中-公开
    硅绝缘体器件中的源极和漏极形成

    公开(公告)号:US20080258186A1

    公开(公告)日:2008-10-23

    申请号:US12158104

    申请日:2006-12-12

    IPC分类号: H01L29/00 H01L21/8236

    摘要: A silicon on insulator device has a silicon layer (10) over a buried insulating layer (12). A nickel layer is deposited over a gate (16), on sidewall spacers (22) on the sides of the gate (16), and in a cavity on both sides of the gate (16) in the silicon layer (10). A doped amorphous silicon layer fills the cavity. Annealing then takes place which forms polysilicon (40) over the sidewall spacers (22) and gate (16), but where the nickel is adjacent to single crystal silicon (10) a layer of NiSi (44) migrates to the surface leaving doped single crystal silicon (42) behind, forming in one step a source, drain, and source and drain contacts.

    摘要翻译: 硅绝缘体器件在掩埋绝缘层(12)上方具有硅层(10)。 镍层沉积在栅极(16)上,位于栅极(16)侧面上的侧壁间隔物(22)上,并沉积在硅层(10)中的栅极(16)两侧的空腔中。 掺杂的非晶硅层填充空腔。 然后发生在侧壁间隔物(22)和栅极(16)上形成多晶硅(40)的退火,但是当镍与单晶硅(10)相邻时,一层NiSi(44)迁移到表面,离开掺杂单 晶体硅(42)后面,形成一个源极,漏极以及源极和漏极触点。

    Semiconductor device and method of manufacturing such a semiconductor device
    44.
    发明申请
    Semiconductor device and method of manufacturing such a semiconductor device 审中-公开
    半导体装置及其制造方法

    公开(公告)号:US20070082450A1

    公开(公告)日:2007-04-12

    申请号:US10575288

    申请日:2004-10-07

    IPC分类号: H01L21/336 H01L29/788

    摘要: The invention relates to a semiconductor device (10) with a substrate and a semiconductor body (1) comprising a first FET (3) with a source (2) and a drain (3) that are provided with connection regions (2B, 3B) of a metal silicide, and that are connected to source and drain extensions (2A, 3A) bordering a channel region (4) below a gate (6) and having a smaller thickness and a lower doping concentration than the source (2) and the drain (3). The source (2) and drain (3) and the source and drain extensions (2A, 3A) are connected to each other by means of an intermediate region (2C, 3C) of the first conductivity type having a thickness and a doping concentration ranging between the thickness and doping concentration of the source (2) and drain (3) and the extensions (2A, 3A) thereof. In this way, the occurrence of leakage currents and the risk of a short circuit between the connection regions (2B, 3B) and the substrate is limited, while the advantages of the use of source and drain extensions (2A, 3A) are preserved. Preferably, the intermediate regions (2C, 3C) are positioned below spacers (7) next to the gate (6), and they are preferably formed using a, preferably tilted, ion implantation.

    摘要翻译: 本发明涉及具有衬底和半导体本体(1)的半导体器件(10),该半导体器件(1)包括具有源极(2)和漏极(3)的第一FET(3),所述第一FET(3)设置有连接区域 B),并且连接到与栅极(6)下方的沟道区域(4)接近并且具有比源极更小的厚度和更低的掺杂浓度的源极和漏极延伸部(2A,3A) 2)和排水管(3)。 源极(2)和漏极(3)以及源极和漏极延伸部分(2A,3A)通过具有厚度的第一导电类型的中间区域(2C,3C)彼此连接,并且 源极(2)和漏极(3)的厚度和掺杂浓度之间的掺杂浓度以及其延伸部(2A,3A)之间的掺杂浓度。 以这种方式,漏电流的发生和连接区域(2B,3B)与衬底之间的短路的风险受到限制,而使用源极和漏极延伸部分(2A,3A) )被保留。 优选地,中间区域(2C,3C)位于靠近栅极(6)的隔板(7)的下方,并且它们优选地使用优选倾斜的离子注入形成。

    Exterior vehicle lights
    47.
    发明授权
    Exterior vehicle lights 有权
    外部车灯

    公开(公告)号:US08749142B2

    公开(公告)日:2014-06-10

    申请号:US13378052

    申请日:2010-06-09

    IPC分类号: B60Q1/26 B60Q1/44 B60Q1/30

    摘要: A lighting system for exterior lights of an automobile comprises a first lighting unit (10,12,14,16) primarily for outputting a first automotive light signal and a failure detection system (26) for detecting a failure of the first lighting unit (10,12,14,16). A second lighting unit is primarily for outputting a second automotive light signal. The second lighting unit comprises an LED light unit. A controller (30) is adapted to determine if there is failure of the first lighting unit, and if there is failure of the first lighting unit, to use the second lighting unit to generate the first automotive light signal. This is in response to an output request from the first lighting unit (10,12,14,16).

    摘要翻译: 一种用于汽车外部照明的照明系统,包括主要用于输出第一汽车光信号的第一照明单元(10,12,14,16)和用于检测第一照明单元(10)的故障的故障检测系统(26) ,12,14,16)。 第二照明单元主要用于输出第二汽车光信号。 第二照明单元包括LED灯单元。 控制器(30)适于确定第一照明单元是否有故障,并且如果第一照明单元出现故障,则使用第二照明单元产生第一汽车光信号。 这是响应于来自第一照明单元(10,12,14,16)的输出请求。

    LED driver circuit and method, and system and method for estimating the junction temperature of a light emitting diode
    50.
    发明授权
    LED driver circuit and method, and system and method for estimating the junction temperature of a light emitting diode 有权
    LED驱动电路和方法,以及用于估计发光二极管的结温的系统和方法

    公开(公告)号:US08278831B2

    公开(公告)日:2012-10-02

    申请号:US12864740

    申请日:2009-01-27

    IPC分类号: H05B37/02 H05B39/04 H05B41/36

    CPC分类号: H05B33/0818 G01K7/01

    摘要: A driver circuit (10) for a light emitting diode comprises a first driver circuit (32, 32′, 32′) for generating a first current output for driving the light emitting diode, wherein the first driver circuit has a control switch for interrupting the supply of the first current output. A second driver circuit (50) is for generating a second current output for driving the light emitting diode, and the second driver circuit also has a control switch for interrupting the supply of the second current output. The overall output of the driver circuit comprises a pulse width modulated output current which alternates between a high current (Ihigh) generated by the first driver circuit and a low current (Ilow) generated by the second driver circuit. By providing separate driver circuits for two different current requirements, the circuits can be optimised for each function. For example the high current value can comprise an LED operation current, and the low current value can comprise a non-zero measurement current.

    摘要翻译: 用于发光二极管的驱动电路(10)包括用于产生用于驱动发光二极管的第一电流输出的第一驱动电路(32,32',32'),其中第一驱动电路具有用于中断 提供第一个电流输出。 第二驱动电路(50)用于产生用于驱动发光二极管的第二电流输出,并且第二驱动电路还具有用于中断第二电流输出的供给的控制开关。 驱动电路的总体输出包括在由第一驱动电路产生的高电流(Ihigh)和由第二驱动电路产生的低电流(I low)之间交替的脉宽调制输出电流。 通过为两种不同的电流要求提供单独的驱动电路,可以针对每个功能优化电路。 例如,高电流值可以包括LED操作电流,并且低电流值可以包括非零测量电流。