利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

120 条记录 (耗时 0.042 秒)

    Illumination system particularly for microlithography
    42.
    发明授权
    Illumination system particularly for microlithography 有权
    照明系统特别适用于微光刻

    公开(公告)号：US07142285B2

    公开(公告)日：2006-11-28

    申请号：US10381827

    申请日：2001-09-28

    申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G21K5/04

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/702

    摘要： There is provided an illumination system for microlithography with wavelengths≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The first raster elements that are imaged into the image plane are illuminated almost completely.

    摘要翻译： 提供了一种用于微波光刻的照明系统，其波长<= 193nm。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到图像平面中，产生至少部分地叠加在图像平面中的场上的多个图像。 成像到图像平面中的第一个光栅元素几乎完全照亮。

    ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
    43.
    发明申请
    ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY 有权
    照明系统特别适用于微晶

    公开(公告)号：US20060233300A9

    公开(公告)日：2006-10-19

    申请号：US10381827

    申请日：2001-09-28

    申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G21K5/00

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/702

    摘要： The invention concerns an illumination system, particularly for mircolithography with wavelengths

    摘要翻译： 本发明涉及一种照明系统，特别是用于波长小于193nm的微光刻，包括：一次光源; 第一光学部件; 第二光学部件; 图像平面; 和退学生; 其中所述第一光学部件将所述初级光源转换成由所述出射光瞳中的所述第二光学部件成像的多个次级光源，其中所述第一光学部件包括具有多个第一光栅元件的第一光学元件， 成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像，其中，图像进入图像平面的所述第一光栅元素几乎完全照亮。

    Optical element for forming an arc-shaped illumination field
    45.
    发明申请
    Optical element for forming an arc-shaped illumination field 审中-公开
    用于形成弧形照明场的光学元件

    公开(公告)号：US20050207039A1

    公开(公告)日：2005-09-22

    申请号：US10903817

    申请日：2004-07-30

    申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Isabel Escudero Sanz

    发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Isabel Escudero Sanz

    IPC分类号： G02B5/10 ,  G02B17/06

    CPC分类号： G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095

    摘要： There is provided an optical element for forming an arc-shaped field in a field plane of an illumination system for light having a wavelength of less than or equal to about 193 nanometers. The optical element includes a plurality of mirror surfaces, each having an array of aspherical reflecting elements. The array of aspherical reflecting elements has a plurality of cylindrical mirrors with aspheric curvature in an x-direction. The plurality of mirror surfaces form a nested mirror and includes a pair of adjacent mirror surfaces that have a spacing dspace therebetween. The arc-shaped field has an axis of symmetry. The field plane is defined by a vector in a y-direction that is parallel to the axis of symmetry, and a vector in the x-direction, which is orthogonal to the axis of symmetry.

    摘要翻译： 提供了一种用于在具有小于或等于约193纳米的波长的光的照明系统的场平面中形成弧形场的光学元件。 光学元件包括多个镜面，每个具有非球面反射元件阵列。 非球面反射元件阵列具有在x方向上具有非球面曲率的多个圆柱形反射镜。 多个镜面形成嵌套反射镜并且包括一对在其间具有间隔dspace的相邻镜面。 弧形场具有对称轴。 场平面由平行于对称轴的y方向的矢量和与对称轴正交的x方向的矢量限定。

    Illumination system particularly for microlithography
    46.
    再颁专利
    Illumination system particularly for microlithography 失效
    照明系统特别适用于微光刻

    公开(公告)号：USRE42065E1

    公开(公告)日：2011-01-25

    申请号：US11981032

    申请日：2001-09-28

    申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G03B27/42 ,  G03B27/54 ,  G21K5/00

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

    摘要： There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.

    摘要翻译： 提供了一种用于具有波长＆nlE; 193nm的微光刻的照明系统。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在像平面中的场上的多个图像。 第二光学部件包括第一光学系统，其包括具有正光焦度的至少第三场反射镜和包括至少具有正光焦度的第二场反射镜的第二光学系统。 第一光学系统在第一光学系统和第二光学系统之间的平面内成像多个次级光源，形成多个第三光源，并且第二光学系统在出射光瞳中成像多个第三光源。

    Illumination system particularly for microlithography
    47.
    再颁专利
    Illumination system particularly for microlithography 失效
    照明系统特别适用于微光刻

    公开(公告)号：USRE41667E1

    公开(公告)日：2010-09-14

    申请号：US11981033

    申请日：2001-09-28

    申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G03F7/20 ,  G21K5/04 ,  G21K1/06

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

    摘要： There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.

    摘要翻译： 提供了一种用于微波光刻的照明系统，其具有包括初级光源，第一光学部件，第二光学部件，图像平面和出射光瞳的波长＆amp; 193nm。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学元件和第二光学元件是反射性的。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，至少部分地叠加在图像平面中的场上产生多个图像。 第一光学部件包括收集器单元和具有多个第二光栅元件的第二光学元件。 所述照明系统还包括在所述收集单元与所述第一光学元件之间的第一光轴，所述第一光学元件和所述第二光学元件之间的第二光轴以及所述第二光学元件和所述第二光学元件之间的第三光轴。 第一光轴的方向矢量和第二光轴的方向矢量限定一个平面，并且其中第一和第二光学元件被倾斜以使第三光轴的投影与平面交叉，并且第一光学 轴。