公开(公告)号：US4544269A

公开(公告)日：1985-10-01

申请号：US284114

申请日：1981-07-16

申请人： Noriyuki Nose ,  Kiyonobu Endo

发明人： Noriyuki Nose ,  Kiyonobu Endo

IPC分类号： G01J1/04 ,  G01J1/42 ,  G03B7/099 ,  G02B5/18

CPC分类号： G01J1/04 ,  G01J1/0407 ,  G01J1/0477 ,  G01J1/4214 ,  G01J1/4228 ,  G03B7/09976

摘要： A device for measuring light incident on an optical system comprises an optical system defining an optical path, a plurality of diffraction lattices arranged in the optical path, each of the diffraction lattices comprising a plurality of periodically arranged semireflecting oblique surfaces, and photodetector means for detecting each of the diffracted lights from the diffraction lattices distinctively. The diffraction lattices are each of different predetermined areas; however, when even light is input, each lattice diffracts the same total quantity of light to its respective detector.

摘要翻译： 用于测量入射在光学系统上的光的装置包括限定光路的光学系统，布置在光路中的多个衍射栅格，每个衍射栅格包括多个周期性布置的半反射倾斜表面，以及用于检测 来自衍射晶格的每个衍射光明显不同。 衍射光栅各自具有不同的预定区域; 然而，当输入均匀的光时，每个晶格将相同的总光量衍射到其相应的检测器。

公开(公告)号：US4486096A

公开(公告)日：1984-12-04

申请号：US285404

申请日：1981-07-20

申请人： Kiyonobu Endo ,  Noriyuki Nose

发明人： Kiyonobu Endo ,  Noriyuki Nose

IPC分类号： G01J1/04 ,  G01J1/42 ,  G02B27/00 ,  G02B27/10 ,  G03B7/099 ,  G03B13/28

CPC分类号： G02B27/108 ,  G01J1/04 ,  G01J1/0407 ,  G01J1/0477 ,  G01J1/4214 ,  G02B27/0018 ,  G02B27/1086 ,  G03B13/28 ,  G03B7/09976

摘要： A system for measuring incident light includes: an optical system defining an optical path; a photodetector; and a plurality of beam splitters, with each beamsplitter having a different, predetermined area and adapted to be disposed in the optical path with, at any one time, only one beam splitter in the optical path; and means for measuring the light received by the photodetector.

摘要翻译： 用于测量入射光的系统包括：限定光路的光学系统; 光检测器; 以及多个分束器，其中每个分束器具有不同的预定面积，并且适于在任何一个时间仅在光路中的一个分束器设置在光路中; 以及用于测量由光电检测器接收的光的装置。

公开(公告)号：US5767962A

公开(公告)日：1998-06-16

申请号：US755352

申请日：1996-11-25

申请人： Masayuki Suzuki ,  Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

发明人： Masayuki Suzuki ,  Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

IPC分类号： G01N21/88 ,  G01B11/30 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  H01L21/66 ,  G01N21/00

CPC分类号： G01N21/94

摘要： An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.

摘要翻译： 检查系统包括光源，用于扫描来自光源的光的扫描装置，其中所述扫描装置包括相对于主扫描方向倾斜设置的光学构件，所述光学构件适于 以提供会聚的光会聚在一起形成与扫描位置可变的距离的光点，以及用于接收来自表面的散射光的光接收装置。

公开(公告)号：US5751426A

公开(公告)日：1998-05-12

申请号：US460708

申请日：1995-06-02

申请人： Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Hiroshi Osawa ,  Koichi Sentoku ,  Toshihiko Tsuji ,  Takahiro Matsumoto

发明人： Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Hiroshi Osawa ,  Koichi Sentoku ,  Toshihiko Tsuji ,  Takahiro Matsumoto

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F7/70633 ,  G03F9/7049

摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

摘要翻译： 用于测量形成在同一物体上的多个衍射光栅之间的位置偏差的装置和方法包括用光束照射多个衍射光栅的照明光学系统，光学系统的照明产生多个衍射光束 来自多个衍射光栅的干涉光学系统，用于形成来自多个衍射光束的至少一个干涉光束，用于检测至少一个干涉光束的检测器，检测结果作为测量的基础 多个衍射光栅之间的位置偏差，以及用于测量照明光学系统和多个衍射光栅之间的相对位置关系的测量部分。

公开(公告)号：US5610718A

公开(公告)日：1997-03-11

申请号：US297511

申请日：1994-08-29

申请人： Koichi Sentoku ,  Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh

发明人： Koichi Sentoku ,  Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F7/70633 ,  G03F9/7049

摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.

摘要翻译： 用于测量第一和第二衍射光栅之间的相对位移的方法和装置包括干涉光学系统，其形成从第一和第二衍射光栅衍射的光的第一和第二干涉光线，并且将第一和第二干涉光线分离在 其偏振方向的差异的基础，用于检测第一干涉光线以产生第一检测信号的第一检测器，用于检测第二干涉光线以产生第二检测信号的第二检测器，以及信号处理部分 用于检测第一和第二检测信号之间的相位差，并且用于基于相位差确定第一和第二衍射光栅之间的相对位移。

公开(公告)号：US5557411A

公开(公告)日：1996-09-17

申请号：US577704

申请日：1995-12-22

申请人： Sakae Houryu ,  Noriyuki Nose

发明人： Sakae Houryu ,  Noriyuki Nose

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An interval detection method for detecting the interval between two marks provided on the surface of a wafer with high accuracy using other two marks provided on the wafer, and a method for detecting the relative positions of a wafer and a mask with high accuracy are provided. The method for detecting the interval includes the steps of projecting a first light beam passing through a first mark on the mask and a fifth mark on the wafer onto a predetermined detection surface, projecting a second light beam passing through a second mark on the mask and a sixth mark on the wafer onto the predetermined detection surface, projecting a third light beam passing through a third mark on the mask and the fifth mark onto the predetermined detection surface, projecting a fourth light beam passing through a fourth mark on the mask and the sixth mark onto the predetermined detection surface, and determining the interval between the first mark and the second mark based on information relating to the incident positions of the first, second, third and fourth light beams on the predetermined detection surface, and the interval between the third mark and the fourth mark.

摘要翻译： 提供了一种使用设置在晶片上的其他两个标记来高精度地检测设置在晶片表面上的两个标记之间的间隔的间隔检测方法，以及用于高精度地检测晶片和掩模的相对位置的方法。 用于检测间隔的方法包括以下步骤：将通过掩模上的第一标记的第一光束和晶片上的第五标记投影到预定检测表面上，将通过第二标记的第二光束投射到掩模上; 在晶片上的第六标记到预定检测表面上，将通过掩模上的第三标记的第三光束和第五标记投影到预定检测表面上，将通过第四标记的第四光束投射在掩模上， 第六标记到预定检测表面上，以及基于与预定检测表面上的第一，第二，第三和第四光束的入射位置相关的信息，确定第一标记和第二标记之间的间隔， 第三标记和第四标记。

公开(公告)号：US5440394A

公开(公告)日：1995-08-08

申请号：US193880

申请日：1994-02-09

申请人： Noriyuki Nose ,  Kenji Saito ,  Mitsuaki Amemiya

发明人： Noriyuki Nose ,  Kenji Saito ,  Mitsuaki Amemiya

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/02 ,  G01B11/26

CPC分类号： G03F7/70616 ,  G03F7/70633 ,  G03F9/7023 ,  G03F9/7049

摘要： A length measuring device for performing length measurement and an exposure apparatus for performing an exposure operation on a first object having a plurality of alignment patterns thereon, includes an alignment detector for detecting the relative positional relation between the first object and a second object having a plurality of reference alignment patterns used for aligning the first object therewith, and for detecting an alignment condition between the alignment patterns of the first and second objects, a movement device for moving the first and second objects relative to each other, a measurement device for measuring the amount of movement of the movement device, and a length measurement device for performing measurement of the space between the plurality of alignment patterns formed on the first object. The length measurement device performs length measurement on the basis of successive alignment conditions detected by successive alignment condition detection operations of the alignment detector between the plurality of reference alignment patterns on the second object and the plurality of alignment patterns on the first object, as well as the amount of movement of the movement device measured by the measurement device during the successive alignment condition detection operations of the alignment detector.

摘要翻译： 用于进行长度测量的长度测量装置和用于对其上具有多个对准图案的第一物体进行曝光操作的曝光装置包括：对准检测器，用于检测第一物体与具有多个对准图案的第二物体之间的相对位置关系; 用于对准第一物体的参考对准图案，并且用于检测第一和第二物体的对准图案之间的对准状态，用于使第一和第二物体相对于彼此移动的移动装置，用于测量第一物体的测量装置 移动装置的移动量，以及用于进行形成在第一物体上的多个排列图案之间的间隔的测量的长度测量装置。 长度测量装置基于通过对准检测器在第二物体上的多个参考对准图案与第一物体上的多个对准图案之间的对准检测器的连续对准条件检测操作检测到的连续对准条件进行长度测量，以及 在对准检测器的连续对准状态检测操作期间由测量装置测量的移动装置的移动量。

公开(公告)号：US5369486A

公开(公告)日：1994-11-29

申请号：US947383

申请日：1992-09-21

申请人： Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Masanobu Hasegawa ,  Koichi Sentoku

发明人： Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Masanobu Hasegawa ,  Koichi Sentoku

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B9/02

CPC分类号： G03F7/70633 ,  G03F9/7049

摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.

摘要翻译： 位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。 照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。 第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。 第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。 第一和第二方向与光栅线方向不同。 检测系统检测干扰光并从其产生第一和第二拍拍信号。 处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

公开(公告)号：US5313272A

公开(公告)日：1994-05-17

申请号：US923500

申请日：1992-08-03

申请人： Noriyuki Nose ,  Kenji Saitoh ,  Hiroshi Osawa ,  Masanobu Hasegawa

发明人： Noriyuki Nose ,  Kenji Saitoh ,  Hiroshi Osawa ,  Masanobu Hasegawa

IPC分类号： G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC分类号： G03F7/70633

摘要： A method and apparatus for measuring the deviation between elements on an object includes the steps of and devices for performing the steps of forming at least a first physicooptical element on the object: forming at least a second physicooptical element on the object, the first and second physicooptical elements having lens functions; projecting light beams onto the first and second physicooptical elements on the object and detecting the incident positions of light beams travelling from the first and second physicooptical elements, having been subjected to the lens functions of the first and second physicooptical elements, on a predetermined surface; and detecting the deviation between the first and second physicooptical elements on the object from the relationship between the detected incident positions of the light beams.

摘要翻译： 用于测量物体上的元件之间的偏差的方法和装置包括以下步骤和用于执行在物体上形成至少第一物理光学元件的步骤的装置：在物体上形成至少第二物理元件，第一和第二 具有透镜功能的物理光学元件; 将光束投影到物体上的第一和第二物理光学元件上，并且检测从已经经受第一和第二物理光学元件的透镜功能的第一和第二物理光学元件行进的光束的入射位置在预定表面上; 以及根据检测到的光束的入射位置之间的关系来检测物体上的第一和第二物理光学元件之间的偏差。

公开(公告)号：US5162656A

公开(公告)日：1992-11-10

申请号：US841790

申请日：1992-03-02

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

IPC分类号： G03F9/00

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.

摘要翻译： 公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。 该装置包括用于将光投射到第一物体上的光源，使得入射在第一物体上的光由此偏转，并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸，光接收部分可操作以检测其上的光的入射位置，其中， 光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统，用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。