公开(公告)号：US5440394A

公开(公告)日：1995-08-08

申请号：US193880

申请日：1994-02-09

申请人： Noriyuki Nose ,  Kenji Saito ,  Mitsuaki Amemiya

发明人： Noriyuki Nose ,  Kenji Saito ,  Mitsuaki Amemiya

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/02 ,  G01B11/26

CPC分类号： G03F7/70616 ,  G03F7/70633 ,  G03F9/7023 ,  G03F9/7049

摘要： A length measuring device for performing length measurement and an exposure apparatus for performing an exposure operation on a first object having a plurality of alignment patterns thereon, includes an alignment detector for detecting the relative positional relation between the first object and a second object having a plurality of reference alignment patterns used for aligning the first object therewith, and for detecting an alignment condition between the alignment patterns of the first and second objects, a movement device for moving the first and second objects relative to each other, a measurement device for measuring the amount of movement of the movement device, and a length measurement device for performing measurement of the space between the plurality of alignment patterns formed on the first object. The length measurement device performs length measurement on the basis of successive alignment conditions detected by successive alignment condition detection operations of the alignment detector between the plurality of reference alignment patterns on the second object and the plurality of alignment patterns on the first object, as well as the amount of movement of the movement device measured by the measurement device during the successive alignment condition detection operations of the alignment detector.

摘要翻译： 用于进行长度测量的长度测量装置和用于对其上具有多个对准图案的第一物体进行曝光操作的曝光装置包括：对准检测器，用于检测第一物体与具有多个对准图案的第二物体之间的相对位置关系; 用于对准第一物体的参考对准图案，并且用于检测第一和第二物体的对准图案之间的对准状态，用于使第一和第二物体相对于彼此移动的移动装置，用于测量第一物体的测量装置 移动装置的移动量，以及用于进行形成在第一物体上的多个排列图案之间的间隔的测量的长度测量装置。 长度测量装置基于通过对准检测器在第二物体上的多个参考对准图案与第一物体上的多个对准图案之间的对准检测器的连续对准条件检测操作检测到的连续对准条件进行长度测量，以及 在对准检测器的连续对准状态检测操作期间由测量装置测量的移动装置的移动量。

公开(公告)号：US07465936B2

公开(公告)日：2008-12-16

申请号：US11359303

申请日：2006-02-21

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G01T1/16

CPC分类号： G03F7/7085 ,  G01J1/26 ,  G01J1/429 ,  G03F7/70558

摘要： A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light includes the steps of measuring an output of the measurement apparatus continuously, stopping or starting an emission of the light source in the measuring step, calculating a first extreme value t→t0−0 and a second extreme value t→t0+0 in the output of the measurement apparatus at time t0 where t is time in the measuring step, and t0 is time when the emission of the light source stops; and calculating a difference between the first extreme value t→t0−0 and the second extreme value t→t0+0.

摘要翻译： 一种利用带通滤波器和测量装置测量从光源发出的光中的具有预定波长的光的强度的测量方法，所述带通滤光器透射具有预定波长的光，所述测量装置测量绝对强度 入射光包括在测量步骤中连续地测量测量设备的输出，停止或开始光源的发射的步骤，计算第一极值t-> t0-0和第二极值t-> t0 + 0在测量装置的时间t0，其中t是测量步骤中的时间，t0是光源的发射停止的时间; 并计算第一极值t→t0-0与第二极值t→t0 + 0之差。

公开(公告)号：US20070002474A1

公开(公告)日：2007-01-04

申请号：US11082404

申请日：2005-03-17

申请人： Mitsuaki Amemiya ,  Akira Miyake

发明人： Mitsuaki Amemiya ,  Akira Miyake

IPC分类号： G02B5/08

CPC分类号： G02B17/0631 ,  B82Y10/00 ,  G02B5/22 ,  G02B17/0642 ,  G02B17/0663 ,  G21K2201/061

摘要： Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.

摘要翻译： 公开了一种用于测量EUV光源的聚光点的位置，大小和/或形状的测量装置。 在一个优选形式中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，用于将EUV光引向光接收装置的光学系统，设置在光路的一部分中的遮光构件，用于 EUV光并且具有多个开口，以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统， 基于由光接收装置接收到的EUV光，在光会聚点检测EUV光的空间分布。

公开(公告)号：US20060044538A1

公开(公告)日：2006-03-02

申请号：US11214252

申请日：2005-08-29

申请人： Mitsuaki Amemiya ,  Masahito Shinohara

发明人： Mitsuaki Amemiya ,  Masahito Shinohara

IPC分类号： G03B27/52

CPC分类号： G03F9/7088 ,  G03F9/7065 ,  G03F9/7096

摘要： An alignment apparatus for aligning with each other a mask stage that supports a mask that has an exposure pattern and a wafer stage that supports an object by using a light with wavelength of 1 nm to 50 nm, said alignment apparatus including a substrate for forming a first reference pattern similar to a second reference pattern formed on the mask or the mask stage, and a detection part for detecting a light from the substrate, wherein said substrate and detection part form a hollow housing, in which a gas is filled.

摘要翻译： 一种对准装置，用于将通过使用波长为1nm至50nm的光来支撑具有曝光图案的掩模的掩模台和支撑物体的对准装置，所述对准装置包括用于形成 与掩模或掩模台上形成的第二参考图案相似的第一参考图案，以及用于检测来自基板的光的检测部分，其中所述基板和检测部分形成填充有气体的中空壳体。

公开(公告)号：US06647087B2

公开(公告)日：2003-11-11

申请号：US09981080

申请日：2001-10-18

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： G21K500

CPC分类号： G03F7/7035 ,  G03F1/70 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/70466

摘要： An exposure method for exposing a workpiece in a proximity exposure system, includes a first exposure step for printing, by exposure, an image of a first mask pattern on a predetermined portion of the workpiece, and a second exposure step for printing, by exposure, an image of a second mask pattern, different from the first mask pattern, on the predetermined portion of the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

公开(公告)号：US06327332B1

公开(公告)日：2001-12-04

申请号：US09425223

申请日：1999-10-22

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： H01L2130

CPC分类号： G03F7/7035 ,  G03F1/70 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/70466

摘要： An exposure method for posing a workpiece in a proximity exposure system, includes a first exposure step for printing, by exposure, an image of a first mask pattern on a predetermined portion of the workpiece, and a second exposure step for printing, by exposure, an image of a second mask pattern, different from the first mask pattern, on the predetermined portion of the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

摘要翻译： 一种用于在接近曝光系统中曝光工件的曝光方法包括：第一曝光步骤，用于通过曝光打印在工件的预定部分上的第一掩模图案的图像;以及第二曝光步骤，用于通过曝光打印， 在工件的预定部分上的与第一掩模图案不同的第二掩模图案的图像，其中在显影处理之前，重叠地执行第一和第二曝光步骤中的曝光。

公开(公告)号：US5680428A

公开(公告)日：1997-10-21

申请号：US519755

申请日：1995-08-28

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  B32B31/04

CPC分类号： G03F7/70716 ,  G03F7/70783 ,  G03F7/70866 ,  G03F7/70875 ,  Y10T279/11

摘要： Disclosed are an object holding process and and an apparatus therefor in which a process strain of the object can be accurately compensated for. When the exposure operation is started, the bottom surface of the object is held by a holding unit. If the object has a strain, the process strain is calculated. Here, if the process strain is larger than a tolerance, the temperature of the object is set to an object setting temperature in a position other than an exposure position in order to contract or expand the object by a predetermined amount for a magnification correction. The bottom surface of the object is then held by the holding unit again, and the exposure of the object is performed in the exposure position.

摘要翻译： 公开了一种物体保持过程及其装置，其中可以精确地补偿物体的过程应变。 当曝光操作开始时，物体的底面由保持单元保持。 如果物体有应变，则计算过程应变。 这里，如果过程应变大于公差，则将物体的温度设定为除曝光位置以外的位置的物体设定温度，以使物体收缩或扩大预定量用于倍率校正。 然后，物体的底面再次被保持单元保持，并且在曝光位置进行物体的曝光。

公开(公告)号：US5581590A

公开(公告)日：1996-12-03

申请号：US272374

申请日：1994-07-06

申请人： Makiko Mori ,  Kunitaka Ozawa ,  Mitsuaki Amemiya

发明人： Makiko Mori ,  Kunitaka Ozawa ,  Mitsuaki Amemiya

IPC分类号： G03F7/20 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/708

摘要： In an SOR exposure system for transferring patterns on masks to semiconductor wafers by using SOR radiation reflected by an X-ray reflecting mirror, a first shutter device for shielding at least .gamma. rays and a second shutter device for shielding X-rays are provided between the SOR ring and the mirror inside a beam port, and an exposure adjustment device for adjusting the amount of exposure when a circuit pattern on a mask is transferred to a wafer is provided between the mirror and the wafer. As a result, the human body can be protected against radiation rays, such as gamma rays, generated from the SOR ring when electrons are implanted thereto or when the SOR ring is stopped. Damage to the X-ray reflecting mirror caused by radiation rays is reduced, and stable reflectance of the mirror can be obtained. Maintenance of the SOR exposure system is also made easier.

摘要翻译： 在通过使用由X射线反射镜反射的SOR辐射将掩模上的图案转印到半导体晶片的SOR曝光系统中，至少屏蔽至少伽马射线的第一快门装置和用于屏蔽X射线的第二快门装置 SOR环和光束端口内的反射镜，以及用于当将掩模上的电路图案转印到晶片时调节曝光量的曝光调节装置设置在反射镜和晶片之间。 结果，当电子被植入其中时或当SOR环停止时，可以保护人体免受从SOR环产生的辐射线，例如γ射线。 由放射线引起的对X射线反射镜的伤害降低，反射镜的反射率稳定。 SOR曝光系统的维护也变得更加容易。

公开(公告)号：US07312459B2

公开(公告)日：2007-12-25

申请号：US11082404

申请日：2005-03-17

申请人： Mitsuaki Amemiya ,  Akira Miyake

发明人： Mitsuaki Amemiya ,  Akira Miyake

IPC分类号： G01J1/42 ,  G21K5/00

CPC分类号： G02B17/0631 ,  B82Y10/00 ,  G02B5/22 ,  G02B17/0642 ,  G02B17/0663 ,  G21K2201/061

摘要： Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.

摘要翻译： 公开了一种用于测量EUV光源的聚光点的位置，大小和/或形状的测量装置。 在一个优选形式中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，用于将EUV光引向光接收装置的光学系统，设置在光路的一部分中的遮光构件，用于 EUV光并且具有多个开口，以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统， 基于由光接收装置接收到的EUV光，在光会聚点检测EUV光的空间分布。

公开(公告)号：US20050270509A1

公开(公告)日：2005-12-08

申请号：US11144319

申请日：2005-06-03

申请人： Nobuaki Ogushi ,  Mitsuaki Amemiya

发明人： Nobuaki Ogushi ,  Mitsuaki Amemiya

IPC分类号： G03F7/20 ,  G03B27/52 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7088 ,  G03F9/7076

摘要： A measuring apparatus according for measuring relative positions between a first mark on a movable reticle stage to hold a reticle, and a second mark on a movable object stage to hold an object to be exposed, the apparatus includes a detector for detecting light that has passed the first and second marks, and a processor for calculating the relative positions based on an output of the detector, wherein each of the first and second marks includes plural patterns to direct the light, at least ones of widths and intervals of the plural patterns being non-uniform.

摘要翻译： 一种测量装置，用于测量可动掩模台上的第一标记以保持掩模版之间的相对位置，以及在可移动物体台上的第二标记以保持待曝光的物体，该装置包括用于检测已经通过的光的检测器 第一和第二标记，以及用于基于检测器的输出来计算相对位置的处理器，其中第一和第二标记中的每一个包括多个图案以引导光，多个图案中的至少一个宽度和间隔是 不均匀