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41.发明申请Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images 有权标本检测设备和如何使电子束吸收当前图像公开(公告)号：US20100116986A1
公开(公告)日：2010-05-13
申请号：US12691331
申请日：2010-01-21
申请人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
发明人： Tomoharu Obuki , Hiroshi Toyama , Yasuhiro Mitsui , Munetoshi Fukui , Yasuhiko Nara , Tohru Ando , Katsuo Ooki , Tsutomu Saito , Masaaki Komori
IPC分类号： G01N23/225
CPC分类号： G01N23/225 , H01J2237/2449 , H01J2237/24564 , H01J2237/2817
摘要： An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.
摘要翻译： 本发明的目的是获得清晰的吸收电流图像，而不涉及放大器在输入之间的增益差异，从吸收的电流通过使用多个探针检测并提高测量效率。 在本发明中，使多个探针与试样接触。 在用电子束照射样品的同时，测量在探针中流动的电流。 至少两个探头的信号被输入到差分放大器。 差分放大器的输出被放大。 基于电子束的放大输出和扫描信息，产生吸收的当前图像。 根据本发明，可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。 因此，可以提高半导体器件的故障分析中的测量效率。
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公开(公告)号：US20090045338A1
公开(公告)日：2009-02-19
申请号：US12222606
申请日：2008-08-12
申请人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
发明人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2817
摘要： An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection.
摘要翻译： 检查方法和装置用电子束照射其上形成有图案的样品，使得可以基于样品发射的二次电子或反射电子产生检查图像和参考图像。 基于检查图像和参考图像之间的每个像素的半色调值的差异来确定异常图案。 从异常图案的图像获得异常图案的多个特征量，并且基于异常图案的多个特征量的分布，指定用于对异常图案的类型进行分类的范围。 因此，可以从通过检查提取的许多缺陷中提取期望的缺陷。
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公开(公告)号：US20080237462A1
公开(公告)日：2008-10-02
申请号：US11834207
申请日：2007-08-06
申请人： Tohru ANDO , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
发明人： Tohru ANDO , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
CPC分类号： G01N23/225 , H01J2237/2817 , H01J2237/2826
摘要： A semiconductor testing method capable of quickly counting semiconductor cells with accuracy is achieved. Since an SEM is adjusted in a specific condition, the rotation axis of a stage and the axis of an optical system are deviated from each other in a different observation environment and a different adjustment environment. The deviation between the axes is easily adjusted in each observation environment, so that the deviation is reduced. A seemingly horizontal or vertical line is drawn with a mouse and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell 201 is surrounded in a rectangular frame 205 by a ruler 301 and the number of cells is displayed with a numeric value 302. Thus by using a correct direction and a stable velocity, image correction (501 to 504) is further performed during the movement of the stage (403), so that the cells 201 can be easily counted with accuracy.
摘要翻译： 实现了能够精确地快速计数半导体单元的半导体测试方法。 由于在特定条件下调整SEM，因此在不同的观察环境和不同的调节环境下，台的旋转轴和光学系统的轴线彼此偏离。 在每个观察环境中容易调整轴之间的偏差，从而减小偏差。 用鼠标绘制一个看似水平或垂直的线条，并且与更靠近的轴线对齐进行光栅旋转。 之后，水平移动台，对应该设置图像的位置上的图像执行图案匹配，并且调整角度。 舞台沿着X轴和Y轴均匀移动，实现了像直线一样的目的地移动。 与平台的平滑移动同步，单元201由标尺301在矩形框205中包围，并且以数值302显示单元的数量。 因此，通过使用正确的方向和稳定的速度，在台（403）的移动期间进一步执行图像校正（501〜504），使得可以容易地对单元201进行计数。
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公开(公告)号：US07425704B2
公开(公告)日：2008-09-16
申请号：US11354247
申请日：2006-02-15
申请人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
发明人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
IPC分类号： G01N13/16
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2817
摘要： An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection.
摘要翻译： 检查方法和装置用电子束照射其上形成有图案的样品，使得可以基于样品发射的二次电子或反射电子产生检查图像和参考图像。 基于检查图像和参考图像之间的每个像素的半色调值的差异来确定异常图案。 从异常图案的图像获得异常图案的多个特征量，并且基于异常图案的多个特征量的分布，指定用于对异常图案的类型进行分类的范围。 因此，可以从通过检查提取的许多缺陷中提取期望的缺陷。
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公开(公告)号：US20070124713A1
公开(公告)日：2007-05-31
申请号：US11583983
申请日：2006-10-20
申请人： Tohru Ando , Tsutomu Saito , Yasuhiko Nara , Mikio Takagi , Koichi Takauchi
发明人： Tohru Ando , Tsutomu Saito , Yasuhiko Nara , Mikio Takagi , Koichi Takauchi
IPC分类号： G06F17/50
CPC分类号： G06T7/001 , G06T2200/24 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/2817 , Y10S715/964
摘要： A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed.
摘要翻译： 提供了用于容易地确定缺陷位置的导航系统。 在CAD导航到缺陷位置的情况下，代替用于指示电路设计的物理信息的CAD数据，以CAD格式创建用于指示缺陷位置的逻辑信息。 具体地，通过用软件将诸如矩形，字符或线的标记附加到电子显微镜图像上，使用所需的最小信息进行快速导航。 通过使用创建的CAD数据，执行使用相同设备和CAD导航到异构设备的重新导航。
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公开(公告)号：US20060192117A1
公开(公告)日：2006-08-31
申请号：US11354247
申请日：2006-02-15
申请人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
发明人： Hiroshi Miyai , Ryuichi Funatsu , Taku Ninomiya , Yasuhiko Nara
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2817
摘要： An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection.
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公开(公告)号：US08754664B2
公开(公告)日：2014-06-17
申请号：US13810512
申请日：2011-07-27
申请人： Yasuhiko Nara , Tohru Ando
发明人： Yasuhiko Nara , Tohru Ando
CPC分类号： G01R31/2887 , G01R31/2891 , G01R31/307 , G01R31/311 , H01J37/244 , H01J37/261 , H01J37/28 , H01J2237/20221 , H01J2237/208 , H01J2237/24564 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The high magnification, high resolution and real-time property of an SEM image are realized when the electrical characteristics of an inspection object are measured, without affecting the electrical characteristics of the inspection object. A high-quality, high-magnification first image including an image of a target position in the inspection object on a sample is acquired. Next, a low-quality, low-magnification second image including the image of the target position in the inspection object on the sample and probe images is acquired. Next, data on the first image is built into the second image to generate an image for coarse-access observation which is the same in magnification as the second image. The generation of the image for coarse-access observation is repeated until a probe comes close to the target position in the inspection object.
摘要翻译： 当测量检查对象的电气特性而不影响检查对象的电气特性时，可实现SEM图像的高放大倍数，高分辨率和实时性。 获取包括样本中的检查对象中的目标位置的图像的高质量，高倍率的第一图像。 接下来，获取包括样本上的检查对象中的目标位置的图像和探测图像的低质量，低倍率的第二图像。 接下来，将第一图像上的数据内置到第二图像中，以生成与第二图像放大率相同的粗略观察的图像。 重复进行用于粗略观察的图像的生成，直到探针接近检查对象中的目标位置。
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公开(公告)号：US20130112871A1
公开(公告)日：2013-05-09
申请号：US13810512
申请日：2011-07-27
申请人： Yasuhiko Nara , Tohru Ando
发明人： Yasuhiko Nara , Tohru Ando
IPC分类号： H01J37/26
CPC分类号： G01R31/2887 , G01R31/2891 , G01R31/307 , G01R31/311 , H01J37/244 , H01J37/261 , H01J37/28 , H01J2237/20221 , H01J2237/208 , H01J2237/24564 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The high magnification, high resolution and real-time property of an SEM image are realized when the electrical characteristics of an inspection object are measured, without affecting the electrical characteristics of the inspection object. A high-quality, high-magnification first image including an image of a target position in the inspection object on a sample is acquired. Next, a low-quality, low-magnification second image including the image of the target position in the inspection object on the sample and probe images is acquired. Next, data on the first image is built into the second image to generate an image for coarse-access observation which is the same in magnification as the second image. The generation of the image for coarse-access observation is repeated until a probe comes close to the target position in the inspection object.
摘要翻译： 当测量检查对象的电气特性而不影响检查对象的电气特性时，可实现SEM图像的高放大倍数，高分辨率和实时性。 获取包括样本中的检查对象中的目标位置的图像的高质量，高倍率的第一图像。 接下来，获取包括样本上的检查对象中的目标位置的图像和探测图像的低质量，低倍率的第二图像。 接下来，将第一图像上的数据内置到第二图像中，以生成与第二图像放大率相同的粗略观察的图像。 重复进行用于粗略观察的图像的生成，直到探针接近检查对象中的目标位置。
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公开(公告)号：US20100177954A1
公开(公告)日：2010-07-15
申请号：US12728562
申请日：2010-03-22
申请人： Tohru ANDO , Tsutomu Saito , Yasuhiko Nara , Mikio Takagi , Koichi Takauchi
发明人： Tohru ANDO , Tsutomu Saito , Yasuhiko Nara , Mikio Takagi , Koichi Takauchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2200/24 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/2817 , Y10S715/964
摘要： A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed.
摘要翻译： 提供了用于容易地确定缺陷位置的导航系统。 在CAD导航到缺陷位置的情况下，代替用于指示电路设计的物理信息的CAD数据，以CAD格式创建用于指示缺陷位置的逻辑信息。 具体地，通过用软件将诸如矩形，字符或线的标记附加到电子显微镜图像上，使用所需的最小信息进行快速导航。 通过使用创建的CAD数据，执行使用相同设备和CAD导航到异构设备的重新导航。
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公开(公告)号：US07732791B2
公开(公告)日：2010-06-08
申请号：US11834207
申请日：2007-08-06
申请人： Tohru Ando , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
发明人： Tohru Ando , Yasuhiko Nara , Tsutomu Saito , Shinichi Kato , Takeshi Sunaoshi
CPC分类号： G01N23/225 , H01J2237/2817 , H01J2237/2826
摘要： A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.
摘要翻译： 一种半导体测试方法，其能够快速计算其中用鼠标绘制看似水平或垂直线的半导体单元，并且执行与较近轴线对准的光栅旋转。 之后，水平移动台，对应该设置图像的位置上的图像执行图案匹配，并且调整角度。 舞台沿着X轴和Y轴均匀移动，实现了像直线一样的目的地移动。 与舞台的平滑移动同步，通过标尺将单元围成矩形框，并且以数值显示单元数。
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