Specimen inspection equipment and how to make electron beam absorbed current images
    1.
    发明授权
    Specimen inspection equipment and how to make electron beam absorbed current images 有权
    试样检测设备和如何使电子束吸收当前图像

    公开(公告)号:US07663104B2

    公开(公告)日:2010-02-16

    申请号:US12038079

    申请日:2008-02-27

    摘要: An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.

    摘要翻译: 本发明的目的是获得清晰的吸收电流图像,而不涉及放大器在输入之间的增益差异,从吸收的电流通过使用多个探针检测并提高测量效率。 在本发明中,多个探针与试样接触。 在用电子束照射样品的同时,测量在探针中流动的电流。 至少两个探头的信号被输入到差分放大器。 差分放大器的输出被放大。 基于电子束的放大输出和扫描信息,产生吸收的当前图像。 根据本发明,可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。 因此,可以提高半导体器件的故障分析中的测量效率。

    Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images
    2.
    发明申请
    Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images 有权
    标本检测设备和如何使电子束吸收当前图像

    公开(公告)号:US20100116986A1

    公开(公告)日:2010-05-13

    申请号:US12691331

    申请日:2010-01-21

    IPC分类号: G01N23/225

    摘要: An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.

    摘要翻译: 本发明的目的是获得清晰的吸收电流图像,而不涉及放大器在输入之间的增益差异,从吸收的电流通过使用多个探针检测并提高测量效率。 在本发明中,使多个探针与试样接触。 在用电子束照射样品的同时,测量在探针中流动的电流。 至少两个探头的信号被输入到差分放大器。 差分放大器的输出被放大。 基于电子束的放大输出和扫描信息,产生吸收的当前图像。 根据本发明,可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。 因此,可以提高半导体器件的故障分析中的测量效率。

    Specimen inspection equipment and how to make the electron beam absorbed current images
    3.
    发明授权
    Specimen inspection equipment and how to make the electron beam absorbed current images 有权
    试样检查设备和如何使电子束吸收当前图像

    公开(公告)号:US08178840B2

    公开(公告)日:2012-05-15

    申请号:US12691331

    申请日:2010-01-21

    IPC分类号: G01N23/225 H01J37/28

    摘要: An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.

    摘要翻译: 本发明的目的是获得清晰的吸收电流图像,而不涉及放大器在输入之间的增益差异,从吸收的电流通过使用多个探针检测并提高测量效率。 在本发明中,使多个探针与试样接触。 在用电子束照射样品的同时,测量在探针中流动的电流。 至少两个探头的信号被输入到差分放大器。 差分放大器的输出被放大。 基于电子束的放大输出和扫描信息,产生吸收的当前图像。 根据本发明,可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。 因此,可以提高半导体器件的故障分析中的测量效率。

    Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images
    4.
    发明申请
    Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images 有权
    标本检测设备和如何使电子束吸收当前图像

    公开(公告)号:US20080203297A1

    公开(公告)日:2008-08-28

    申请号:US12038079

    申请日:2008-02-27

    IPC分类号: G01N23/00

    摘要: An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.

    摘要翻译: 本发明的目的是获得清晰的吸收电流图像,而不涉及放大器在输入之间的增益差异,从吸收的电流通过使用多个探针检测并提高测量效率。 在本发明中,使多个探针与试样接触。 在用电子束照射样品的同时,测量在探针中流动的电流。 至少两个探头的信号被输入到差分放大器。 差分放大器的输出被放大。 基于电子束的放大输出和扫描信息,产生吸收的当前图像。 根据本发明,可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。 因此,可以提高半导体器件的故障分析中的测量效率。

    METHOD AND APPARATUS FOR INSPECTING SEMICONDUCTOR USING ABSORBED CURRENT IMAGE
    5.
    发明申请
    METHOD AND APPARATUS FOR INSPECTING SEMICONDUCTOR USING ABSORBED CURRENT IMAGE 审中-公开
    使用吸收电流图像检测半导体的方法和装置

    公开(公告)号:US20110291692A1

    公开(公告)日:2011-12-01

    申请号:US13147759

    申请日:2010-01-20

    IPC分类号: G01R31/26

    摘要: Provided is an apparatus for automatically detecting a failure position on a specified wiring line. The apparatus and a method for automatically detecting the failure position even on a long wiring line by applying a probe and an electron beam onto a sample and using an image of the current absorbed by the sample are provided. The apparatus obtains an absorbed current image, while laterally moving at right angle with the probe applied onto the sample, and based on the obtained absorbed current image, correction is performed by means of both an image shift and a stage. Countermeasures are taken, using a stage not having a sample rotating stage, against factors including a hardware factor of not moving at a correct angle, such as backlash, the wiring line is accurately and continuously displayed even when the apparatus moves to the ends of the long wiring line, and the failure position is detected, while the apparatus automatically reciprocates several times between the both ends of the wiring line.

    摘要翻译: 提供一种用于自动检测指定布线上的故障位置的装置。 提供了通过将探针和电子束施加到样品上并使用由样品吸收的电流的图像来自动检测在长布线上的故障位置的装置和方法。 该装置获得吸收的当前图像,同时与施加到样本上的探针成直角地横向移动,并且基于所获得的吸收的当前图像,通过图像偏移和阶段两者进行校正。 使用不具有样品旋转台的阶段,针对包括不以正确角度移动的硬件因素(例如齿隙)的因素进行对策,即使当装置移动到 并且检测到故障位置,同时设备在布线两端之间自动往复运动数次。

    Inspection apparatus and method
    6.
    发明授权
    Inspection apparatus and method 有权
    检验仪器及方法

    公开(公告)号:US07663390B2

    公开(公告)日:2010-02-16

    申请号:US12146029

    申请日:2008-06-25

    IPC分类号: G01R31/02

    CPC分类号: G01R31/2874 G01R31/311

    摘要: There are provided an inspection apparatus and method that can locally perform sample temperature regulation, so that the sample drift can be suppressed. There are included a sample stage 109 that holds a semiconductor sample 118, multiple probes 106 used to measure electrical characteristics of a semiconductor device on the semiconductor sample 118, a power source that applies voltage and/or current to the probe 106, a detector that measures electrical characteristics of the semiconductor device on the sample with which the probe is brought into contact, and an electromagnetic wave irradiating mechanism that irradiates electromagnetic wave on a measurement section of the semiconductor sample 118.

    摘要翻译: 提供了可以局部地进行样品温度调节的检查装置和方法,从而可以抑制样品漂移。 包括保持半导体样品118的样品台109,用于测量半导体样品118上的半导体器件的电特性的多个探针106,向探针106施加电压和/或电流的电源,检测器 测量与探针接触的样品上的半导体器件的电特性,以及在半导体样品118的测量部分上照射电磁波的电磁波照射机构。