SHEET FOR SOLAR CELL ENCAPSULANT AND SOLAR CELL MODULE
    42.
    发明申请
    SHEET FOR SOLAR CELL ENCAPSULANT AND SOLAR CELL MODULE 有权
    太阳能电池和太阳能电池模块

    公开(公告)号:US20120048354A1

    公开(公告)日:2012-03-01

    申请号:US13318540

    申请日:2010-05-13

    IPC分类号: H01L31/048 C08L33/10

    摘要: A sheet for solar cell encapsulant including (A) an ethylene copolymer selected from 1a to 5a; and (B) an ethylene copolymer selected from 1b to 3b, the copolymer (A) having a melting point of 90° C. or higher and containing constituent unit derived from ethylene [1a: ethylene-vinyl acetate (VA) copolymer, 2a: ethylene-acrylate copolymer, 3a: high-pressure method low-density polyethylene, 4a: ethylene-α-olefin copolymer, 5a: ethylene-G(M)A copolymer other than the below-described 1b, 1b: ethylene-G(M)A copolymer, 2b: ethylene-VA-G(M)A copolymer, 3b: ethylene-acrylate-G(M)A copolymer]. In the ethylene copolymer (B), the total ratio of the constituent unit derived from glycidyl(meth)acrylate (G(M)A) is preferably from 2% to 30% by mass. As a result of this, crosslinking treatment is substantially unnecessary, and practical adhesion and adhesion stability are achieved without heat treatment for crosslinking.

    摘要翻译: 一种用于太阳能电池密封剂的片材,包括(A)选自1a至5a的乙烯共聚物; 和(B)选自1b至3b的乙烯共聚物,共聚物(A)的熔点为90℃或更高,并含有由乙烯衍生的构成单元[1a:乙烯 - 乙酸乙烯酯(VA)共聚物,2a: 乙烯 - 丙烯酸酯共聚物,3a:高压法低密度聚乙烯,4a:乙烯-α-烯烃共聚物,5a:乙烯-G(M)A以外的共聚物1b,1b:乙烯-G(M )共聚物,2b:乙烯-VA-G(M)A共聚物,3b:乙烯 - 丙烯酸酯-G(M)A共聚物)。 在乙烯共聚物(B)中,衍生自(甲基)丙烯酸缩水甘油酯(G(M)A)的构成单元的总比例优选为2质量%〜30质量%。 作为其结果,基本上不需要交联处理,并且在没有交联的热处理的情况下实现实际的粘附和粘合稳定性。

    RADIATION SIGNAL-PROCESSING UNIT AND RADIATION DETECTOR PROVIDED WITH THE SAME
    44.
    发明申请
    RADIATION SIGNAL-PROCESSING UNIT AND RADIATION DETECTOR PROVIDED WITH THE SAME 有权
    辐射信号处理单元和辐射检测器

    公开(公告)号:US20110220803A1

    公开(公告)日:2011-09-15

    申请号:US13042560

    申请日:2011-03-08

    IPC分类号: G01T1/202 G06F19/00

    CPC分类号: G01T1/202 G01T1/2928

    摘要: A radiation signal-processing unit including a position identifying device for identifying an incident radiation position in a radiation detector; a count data-memory device for storing positional information outputted from the position identifying device, a count ratio-calculation device for calculating a count ratio based on the positional information stored in the count data-memory device, a reference count ratio-memory device for memorizing a reference count ratio as the count ratio calculated under a state where fluorescence to be detected does not overlap each other temporally, and a correction instruction device for reading the reference count ratio from the reference count ratio-memory device and comparing the ratio with the count ratio, thereby instructing execution of correction of a radiation generating position to the position identifying device.

    摘要翻译: 一种辐射信号处理单元,包括用于识别辐射检测器中的入射辐射位置的位置识别装置; 计数数据存储装置,用于存储从位置识别装置输出的位置信息;计数比计算装置,用于根据存储在计数数据存储装置中的位置信息计算计数比;计数比计算装置,用于 将参考计数比存储为在待检测荧光的状态下在时间上不重叠的计数比;以及校正指示装置,用于从参考计数比存储装置读取参考计数比,并将比率与 计数比,从而指示执行对位置识别装置的辐射产生位置的校正。

    TWO-DIMENSIONAL POSITION MAP CORRECTING METHOD (AS AMENDED)
    45.
    发明申请
    TWO-DIMENSIONAL POSITION MAP CORRECTING METHOD (AS AMENDED) 有权
    二维位置校正方法(如修改)

    公开(公告)号:US20110001050A1

    公开(公告)日:2011-01-06

    申请号:US12919431

    申请日:2008-03-21

    IPC分类号: G01T1/20 G01T1/161

    摘要: A radiation detecting apparatus of this invention includes an arithmetic processing device which has a first adding step for adding signal strengths in one portion of a two-dimensional position map, draws respective boundaries based on results of addition in the first adding step, and corrects the two-dimensional position map based on signal strengths enclosed by these boundaries. The signal strengths of one portion of the two-dimensional position map, and not all the areas of the two-dimensional position map, are added. As a result, incident positions can be discriminated efficiently, and radiation detecting positions can be determined efficiently.

    摘要翻译: 本发明的放射线检测装置包括运算处理装置,该运算处理装置具有第一加法步骤,用于在二维位置图的一部分中加入信号强度,根据第一加法步骤中的相加结果绘制相应的边界,并校正 基于由这些边界包围的信号强度的二维位置图。 添加二维位置图的一部分的信号强度,而不是二维位置图的全部区域。 结果,可以有效地区分入射位置,并且可以有效地确定放射线检测位置。

    Thin film magnetic head having a thermal plastic deformation portion and manufacturing the same
    46.
    发明授权
    Thin film magnetic head having a thermal plastic deformation portion and manufacturing the same 失效
    具有热塑性变形部分并制造其的薄膜磁头

    公开(公告)号:US07738216B2

    公开(公告)日:2010-06-15

    申请号:US11486779

    申请日:2006-07-14

    IPC分类号: G11B5/60

    摘要: A thin film magnetic head includes a slider that floats from a surface of a recording medium by an airflow generated on the surface of the recording medium to be rotated, and a thin film magnetic head element structure that is formed on an air discharging end face of the slider. A thermal plastic deformation portion is provided in the vicinity of the air discharging end face on a back surface of a recording medium facing surface of a slider so that a part of the thin film magnetic head element structure is further spaced from the surface of the recording medium than the recording medium facing surface of the slider.

    摘要翻译: 薄膜磁头包括滑块,其通过在要旋转的记录介质的表面上产生的气流从记录介质的表面漂浮;以及薄膜磁头元件结构,其形成在空气排出端面上 滑块。 在滑块的记录介质相对表面的后表面上的排气端面附近设置热塑性变形部分,使得薄膜磁头元件结构的一部分与记录表面进一步间隔开 比介于滑块的面向记录介质的介质。

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    48.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
    基板处理装置和基板处理方法

    公开(公告)号:US20080070418A1

    公开(公告)日:2008-03-20

    申请号:US11853231

    申请日:2007-09-11

    IPC分类号: B08B3/04 H01L21/461

    CPC分类号: H01L21/67051

    摘要: A substrate processing apparatus has a cup part for receiving processing liquid which is applied from a processing liquid applying part and is splashed from a substrate, and the cup part is formed of electrical insulation material. Hydrophilic treatment is performed on an outer annular surface of the cup part and water is held on the outer annular surface of the cup part while processing the substrate. With this structure, charged potential of the cup part generated in splashing of pure water can be suppressed by the water held on the outer annular surface, without greatly increasing the manufacturing cost of the substrate processing apparatus by forming the cup part with special conductive material. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate.

    摘要翻译: 基板处理装置具有用于接收从处理液施加部施加并从基板溅出的处理液的杯部,杯部由电绝缘材料形成。 在杯部的外环形表面上进行亲水处理,并且在处理基板的同时将水保持在杯部的外环形表面上。 通过这种结构,通过保持在外环形表面上的水可以抑制在纯水溅出中产生的杯部分的带电电位,而不会通过用特殊导电材料形成杯部而大大增加基板处理装置的制造成本。 结果,可以在将处理液施加到基板上时防止由于基板的感应充电而在基板上发生放电。

    SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
    49.
    发明申请
    SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD 审中-公开
    基板处理装置和基板处理方法

    公开(公告)号:US20070169793A1

    公开(公告)日:2007-07-26

    申请号:US11626673

    申请日:2007-01-24

    IPC分类号: B08B3/00

    摘要: The substrate treatment apparatus includes a substrate holder mechanism for holding a substrate to be treated, and a bifluid nozzle for supplying liquid droplets on a surface of the substrate held by the substrate holder mechanism. The bifluid nozzle has a casing, a liquid outlet port for discharging a treatment liquid, and gas outlet port for discharging a gas, and is adapted to introduce the treatment liquid and the gas into the casing, to generate droplets of the treatment liquid by mixing the treatment liquid discharged from the liquid outlet port with the gas discharged from the gas outlet port outside the casing, and to supply the liquid droplets on the substrate. The density of the liquid droplets supplied from the bifluid nozzle on the substrate surface is not less than 108 droplets/m2 per minute.

    摘要翻译: 基板处理装置包括用于保持待处理基板的基板保持机构和用于在由基板保持机构保持的基板的表面上提供液滴的双流喷嘴。 双流喷嘴具有壳体,用于排出处理液的液体出口和用于排出气体的气体出口,并且将处理液和气体引入壳体中,通过混合产生处理液的液滴 所述处理液体从所述液体出口排出,所述气体从所述气体排出口从所述壳体外部排出,并且将所述液滴供应到所述基板上。 从基板表面上的双流喷嘴供给的液滴的密度不小于每分钟10滴/小时/秒。

    Substrate treating method and apparatus
    50.
    发明申请
    Substrate treating method and apparatus 审中-公开
    基板处理方法及装置

    公开(公告)号:US20050229946A1

    公开(公告)日:2005-10-20

    申请号:US11157330

    申请日:2005-06-15

    摘要: A substrate treating method for cleaning a substrate by supplying a cleaning solution thereto. The method comprises the steps of supplying the cleaning solution having ozone dissolved therein to the substrate, and irradiating the cleaning solution with ultraviolet light. By irradiating the cleaning solution having ozone dissolved therein with ultraviolet light, oxygen radicals are generated easily to increase the activity of the cleaning solution. Thus, a significantly improved cleaning capability is achieved even with low concentration ozone water. This method is applicable also to a piecemeal treatment for cleaning large substrates. Since the cleaning solution supplied to the substrate contains ozone in a low concentration, a filter and piping materials for supplying the cleaning solution need not have strong ozone resistance.

    摘要翻译: 一种用于通过向其提供清洁溶液来清洁基板的基板处理方法。 该方法包括以下步骤:将具有溶解在其中的臭氧的清洗溶液供给到基板上,并用紫外线照射清洗液。 通过用紫外线照射其中溶解有臭氧的清洁溶液,容易产生氧自由基以增加清洁溶液的活性。 因此,即使使用低浓度臭氧水也可实现显着改善的清洗能力。 该方法也适用于清洗大基材的零碎处理。 由于供给到基板的清洗液含有低浓度的臭氧,所以用于供给清洗液的过滤器和管道材料不需要具有很强的耐臭氧性。