公开(公告)号：US08273697B2

公开(公告)日：2012-09-25

申请号：US12476388

申请日：2009-06-02

Applicant: Victor Seita ,  Roger Sicot ,  Vincent Delaire ,  Yann Denolle

Inventor： Victor Seita ,  Roger Sicot ,  Vincent Delaire ,  Yann Denolle

IPC: C11D3/20 ,  C11D3/395 ,  B08B9/00 ,  C08B7/00 ,  C09K13/04

CPC classification number: C11D3/40 ,  B08B3/08 ,  C11D3/042 ,  C11D7/08

Abstract: The present invention relates to a liquid pipe unblocker comprising at least one strong acid, and a colored indicator capable of assuming different colors, depending on the acid concentration and on the polarity of the pipe unblocker solution.

Abstract translation: 本发明涉及一种包含至少一种强酸的液体管道封闭剂，以及根据酸浓度和管道封闭剂溶液的极性，能够呈现不同颜色的着色指示剂。

公开(公告)号：US20120234352A1

公开(公告)日：2012-09-20

申请号：US13472177

申请日：2012-05-15

Applicant: Gregory A. Konishi ,  Kristen Jacokes ,  Nicole Akre

Inventor： Gregory A. Konishi ,  Kristen Jacokes ,  Nicole Akre

IPC: B08B9/087 ,  B08B9/093 ,  B08B3/08

CPC classification number: B05B11/0037 ,  A47L13/26 ,  B05B11/0059 ,  B05B11/3009 ,  B05B11/3011 ,  C11D1/14 ,  C11D1/146 ,  C11D1/24 ,  C11D1/29 ,  C11D1/662 ,  C11D1/72 ,  C11D1/75 ,  C11D1/83 ,  C11D3/042 ,  C11D3/2075 ,  C11D3/2082 ,  C11D3/2086 ,  C11D3/3956 ,  C11D17/041

Abstract: A multi-surface bathroom cleaning system is described that allows for easier cleaning of all bathroom surfaces from all angles, especially under the rim of a toilet bowl, and which comprises an acid/nonionic composition contained in and dispensable from a package comprising an angled-neck sprayer bottle fitted with an invertible trigger sprayer assembly, wherein the cleaning system may be used in an entirely upside-down orientation to spray upwards at an acute angle.

Abstract translation: 描述了一种多表面卫生间清洁系统，其允许从所有角度，特别是在马桶的边缘下方更容易地清洁所有浴室表面，并且其包括包含在包装中并可从包装中包含角度 - 颈部喷雾器瓶装有可逆式扳机喷雾器组件，其中清洁系统可以以完全颠倒的方向使用，以锐角向上喷射。

公开(公告)号：US20120216834A1

公开(公告)日：2012-08-30

申请号：US13404577

申请日：2012-02-24

Applicant: Bo Yang ,  Peter M. Woyciesjes

Inventor： Bo Yang ,  Peter M. Woyciesjes

IPC: B08B3/08 ,  C11D3/60 ,  B08B9/00 ,  C11D7/60

CPC classification number: C11D11/0041 ,  B08B9/027 ,  C11D1/66 ,  C11D3/0026 ,  C11D3/0073 ,  C11D3/042 ,  C11D3/044 ,  C11D3/048 ,  C11D3/06 ,  C11D3/2075 ,  C11D3/28 ,  C11D3/3757 ,  C11D7/261 ,  C11D7/265 ,  C11D7/3281 ,  C11D11/0029

Abstract: Disclosed herein is a cleaner concentrate comprising: greater than 10 weight percent of a freezing point depressant, 0.5 to 35 weight percent of oxalic acid, and an azole compound, wherein weight percent is based on the total weight of the cleaner concentrate.

Abstract translation: 本文公开了一种清洁剂浓缩物，其包含：大于10重量％的冰点降低剂，0.5至35重量％的草酸和唑化合物，其中重量百分数是基于清洁剂浓缩物的总重量。

公开(公告)号：US20120136051A1

公开(公告)日：2012-05-31

申请号：US13112624

申请日：2011-05-20

Applicant: Junzhong Li ,  Steven J. Lange ,  Richard K. Staub ,  David D. McSherry

Inventor： Junzhong Li ,  Steven J. Lange ,  Richard K. Staub ,  David D. McSherry

IPC: A01N41/02 ,  A01P1/00 ,  A01N25/22 ,  A23B7/153 ,  A01N41/04

CPC classification number: C11D3/48 ,  A23B4/20 ,  A23B7/154 ,  A23L5/57 ,  A23V2002/00 ,  C11D1/008 ,  C11D1/02 ,  C11D1/12 ,  C11D3/0026 ,  C11D3/042 ,  C11D3/2075 ,  C11D3/2086 ,  A23V2200/10 ,  A23V2200/204 ,  A23V2200/222 ,  A23V2200/242 ,  A23V2200/244 ,  A23V2250/02 ,  A23V2250/042

Abstract: The present disclosure relates to rheology modified, low foaming aqueous antimicrobial compositions. The compositions are phase stable under acidic conditions, and do not need to be rinsed from the surface to which they are applied. The present disclosure further relates to methods of use thereof.

Abstract translation: 本公开涉及流变改性的低发泡水性抗微生物组合物。 组合物在酸性条件下是相稳定的，并且不需要从施用它们的表面漂洗。 本公开还涉及其使用方法。

公开(公告)号：US20120108489A1

公开(公告)日：2012-05-03

申请号：US13344982

申请日：2012-01-06

Applicant: Altony Miralles

Inventor： Altony Miralles

IPC: C23G1/08

CPC classification number: C09K15/16 ,  C11D3/0073 ,  C11D3/042 ,  C11D3/2086 ,  C11D3/323 ,  C11D7/08 ,  C11D7/265 ,  C11D7/3272 ,  C11D11/0029 ,  C23G1/06 ,  C23G1/088

Abstract: A biodegradable acid cleaning composition for cleaning stainless steel, and other surfaces is disclosed. The composition comprises urea sulfate in combination with gluconic acid which serves as a corrosion inhibitor. The composition retains the cleaning and corrosion prevention properties of similar phosphoric acid solutions but is safe for the environment and is less expensive to produce. Applicants have surprisingly found that the traditionally alkaline corrosion inhibitor, gluconic acid, can work effectively in an acidic cleaning composition.

Abstract translation: 公开了一种用于清洁不锈钢和其它表面的可生物降解的酸清洗组合物。 该组合物包含与用作腐蚀抑制剂的葡萄糖酸组合的硫酸脲。 该组合物保持类似磷酸溶液的清洁和防腐性能，但对环境是安全的，并且生产成本较低。 申请人惊奇地发现传统的碱性腐蚀抑制剂葡萄糖酸可以在酸性清洁组合物中有效地起作用。

公开(公告)号：US08148310B2

公开(公告)日：2012-04-03

申请号：US12888569

申请日：2010-09-23

Applicant: Wai Mun Lee

Inventor： Wai Mun Lee

IPC: C11D7/36

CPC classification number: C11D11/0047 ,  C11D1/22 ,  C11D3/042 ,  C11D3/2075 ,  C11D3/245 ,  C11D3/3409 ,  C11D3/3418 ,  C11D3/349 ,  C11D3/361 ,  C11D3/365 ,  C11D3/367 ,  C11D7/08 ,  C11D7/265 ,  C11D7/34 ,  C11D7/36

Abstract: The compositions and methods herein relate to the method for the removal of residues and contaminants from metal or dielectric surfaces. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates. A method of cleaning semiconductor substrates comprising contacting the substrates with a solution of water, and sufficient amount of alkyl diphosphonic acid comprising alkyl diphosphonic acid selected from the group of 1 hydroxyethane 1,1 diphosphonic acid, methylene disphosphonic acid, hydroxymethylene diphosphonic acid, dichloromethylene disphosphonic acid, hydroxycyclohexylmethylene disphosphonic acid, 1-hydroxy-3-aminopropane 1,1 diphosphonic acid, 1-hydroxy-4-aminobutane 1,1 diphosphonic acid mixed with dodecylbenzenesulfonic acid, xylenesulfonic acid, toluenesulfonic acid, phosphonoformic acid, sulfamic acid, 2-amino ethane sulfonic acid, or fluoroboric acid or an organic carboxylic acid and pH is adjusted to from greater than 6 to about 10 with a metal ion free base, and a surfactant.

Abstract translation: 本文的组合物和方法涉及从金属或电介质表面去除残余物和污染物的方法。 特别是在对半导体基板的铜或铝表面进行化学机械抛光后清洗残留物的组合物和方法。 一种清洗半导体衬底的方法，包括使底物与水溶液接触，并含有足够量的烷基二膦酸，其选自1-羟基乙烷1,1-二膦酸，亚甲基膦酸，羟基亚甲基二膦酸，二氯亚甲基膦 酸，羟基环己基亚甲基二膦酸，1-羟基-3-氨基丙烷1,1-二膦酸，与十二烷基苯磺酸，二甲苯磺酸，甲苯磺酸，膦酰甲酸，氨基磺酸，2- 氨基乙磺酸或氟硼酸或有机羧酸，并且用金属离子游离碱和表面活性剂将pH调节至大于6至约10。

公开(公告)号：US20120035091A9

公开(公告)日：2012-02-09

申请号：US12282276

申请日：2007-03-01

Applicant: Mattia DeDominicis ,  Dawn Walsh

Inventor： Mattia DeDominicis ,  Dawn Walsh

IPC: C11D3/34

CPC classification number: C11D3/042 ,  C11D1/72 ,  C11D3/2068 ,  C11D3/2075

Abstract: Provided are highly aqueous liquid acidic hard surface cleaning composition having a pH of about 3 or less which comprise: an acid constituent, preferably comprising sulfamic acid and preferably at least one or more further co-acids, and preferably wherein the acid constituent comprises both sulfamic acid and formic acid; at least one nonionic surfactant based on monobranched alkoxylated C10/C11-fatty alcohols; an organic solvent constituent which comprises at least one glycol ether solvent, preferably a glycol ether solvent which desirably mitigates or masks malodors of the acid constituent, especially when the acid constituent comprises formic acid; optionally a cosurfactant constituent, including one or more nonionic, cationic, amphoteric or zwitterionic surfactants; optionally one or more further constituents selected coloring agents, fragrances and fragrance solubilizers, viscosity modifying agents including one or more thickeners, pH adjusting agents and pH buffers including organic and inorganic salts, optical brighteners, opacifying agents, hydrotropes, abrasives, and preservatives, as well as other optional constituents known to the art; and the balance, water, wherein water comprises at least 80% wt. of the composition.

Abstract translation: 提供的pH为约3或更低的高含水液态酸性硬表面清洁组合物，其包含：酸组分，优选包含氨基磺酸，优选至少一种或多种另外的助酸，优选其中酸组分包含氨基磺酸 酸和甲酸; 至少一种基于单链烷氧基化的C10 / C11-脂肪醇的非离子表面活性剂; 包含至少一种二醇醚溶剂，优选二醇醚溶剂的有机溶剂成分，其优选减轻或掩蔽酸组分的恶臭，特别是当酸组分包含甲酸时; 任选的辅助表面活性剂组分，包括一种或多种非离子，阳离子，两性或两性离子表面活性剂; 任选的一种或多种其它成分选择着色剂，香料和香料增溶剂，粘度调节剂，包括一种或多种增稠剂，pH调节剂和pH缓冲剂，包括有机和无机盐，荧光增白剂，遮光剂，水溶助长剂，研磨剂和防腐剂，如 以及本领域已知的其它可选组分; 和余量，水，其中水包含至少80重量％ 的组成。

公开(公告)号：US20120027717A1

公开(公告)日：2012-02-02

申请号：US13253423

申请日：2011-10-05

Applicant: Timothy Michael CUSACK ,  Karen Ann McCUE ,  Hebert W. ULMER

Inventor： Timothy Michael CUSACK ,  Karen Ann McCUE ,  Hebert W. ULMER

IPC: A01N43/36 ,  A01P1/00

CPC classification number: A01N43/36 ,  A01N37/02 ,  A01N37/04 ,  A01N37/06 ,  A01N37/36 ,  C11D1/14 ,  C11D1/29 ,  C11D3/042 ,  C11D3/2075 ,  C11D3/2079 ,  C11D3/2082 ,  C11D3/28 ,  C11D3/30 ,  C11D3/3773 ,  C11D3/3776 ,  A01N2300/00

Abstract: The present invention provides compositions which not only effectively kill a broad spectrum of microorganisms present on surfaces on contact but continue to kill microorganisms for a period of time thereafter.

Abstract translation: 本发明提供了不仅有效杀死接触表面上存在的广谱微生物，而且继续杀死微生物一段时间的组合物。

公开(公告)号：US20110308553A1

公开(公告)日：2011-12-22

申请号：US13096151

申请日：2011-05-20

Applicant: Werner Strothoff ,  Winfried Troll ,  Helmut Maier ,  John P. Furber ,  Bryan A. Maser ,  Michael E. Besse

Inventor： Werner Strothoff ,  Winfried Troll ,  Helmut Maier ,  John P. Furber ,  Bryan A. Maser ,  Michael E. Besse

IPC: A47L15/00 ,  B08B3/00

CPC classification number: A47L15/0002 ,  A47L15/0005 ,  A47L15/0007 ,  A47L15/0076 ,  B08B3/02 ,  B08B3/04 ,  C11D3/042 ,  C11D3/044 ,  C11D3/2075 ,  C11D11/0023 ,  C11D11/0064

Abstract: A method of warewashing for the removal of starch is described herein. The method includes applying an alkaline composition to a dish, then applying an acidic composition to a dish, and then applying a second alkaline composition to the dish. The method may include additional steps. Compositions for using with the method are also disclosed. Finally, dish machines that may be used in accordance with the method are disclosed.

Abstract translation: 本文描述了用于去除淀粉的器皿洗涤方法。 所述方法包括将碱性组合物施用于盘，然后将酸性组合物施用于盘，然后将第二碱性组合物施用于所述盘。 该方法可以包括附加步骤。 还公开了使用该方法的组合物。 最后，公开了可以根据该方法使用的洗碗机。

公开(公告)号：US20110247650A1

公开(公告)日：2011-10-13

申请号：US13164474

申请日：2011-06-20

Applicant: WAI MUN LEE

Inventor： WAI MUN LEE

IPC: C23G1/02 ,  C11D3/60 ,  B08B3/08

CPC classification number: C11D1/22 ,  C11D3/042 ,  C11D3/044 ,  C11D3/2075 ,  C11D3/245 ,  C11D3/30 ,  C11D3/3409 ,  C11D3/3418 ,  C11D3/349 ,  C11D3/361 ,  C11D3/365 ,  C11D3/367 ,  C11D7/06 ,  C11D7/08 ,  C11D7/265 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/34 ,  C11D7/36 ,  C11D11/0047

Abstract: The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a mole ratio of about 1:1 to about 10:1 in water, and pH is adjusted to from about 6 to about 10 with a basic compound, and optionally a surfactant. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates. One of the embodiment is the method of using the compositions in dilution, wherein the solution may be diluted with DI water at dilution ratios, for example, of up to 1:10, up to 1:50, up to 1:100, up to 1:150, up to 1:250, and up to about 1:500 or any ratios therein.

Abstract translation: 用于从金属或电介质表面去除残留物和污染物的组合物和方法包括至少一种烷基二膦酸，至少一种第二酸性物质，其水分摩尔比为约1:1至约10:1，pH为 用碱性化合物和任选的表面活性剂调节至约6至约10。 特别是在对半导体基板的铜或铝表面进行化学机械抛光后清洗残留物的组合物和方法。 其中一个实施方案是在稀释中使用组合物的方法，其中溶液可用稀释比例的DI水稀释，例如至多1:10，最高1:50，至1:100，向上 至1：150，高达1：250，高达约1：500或其中的任何比例。