Magnetrons
    44.
    发明授权

    公开(公告)号:US2899604A

    公开(公告)日:1959-08-11

    申请号:US2899604D

    CPC classification number: H01J23/10

    Substrate processing apparatus and substrate processing method

    公开(公告)号:US11542602B2

    公开(公告)日:2023-01-03

    申请号:US16938468

    申请日:2020-07-24

    Inventor: Yoshitaka Miura

    Abstract: A substrate processing apparatus includes: a processing container; an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied; a holder fixed to the injector; a first magnet fixed to the holder and disposed inside the processing container; a second magnet separated from the first magnet by a partition plate and disposed outside the processing container; and a driving part configured to rotate the second magnet, wherein the first magnet and the second magnet are magnetically coupled to each other, and wherein by rotating the second magnet by the driving part, the first magnet magnetically coupled to the second magnet is rotated, and the injector rotates about the longitudinal direction as an axis.

    Apparatus for generating electromagnetic waves

    公开(公告)号:US11373834B2

    公开(公告)日:2022-06-28

    申请号:US16319622

    申请日:2017-07-19

    Abstract: An apparatus for generating electromagnetic waves is envisaged relating to the field of electromagnetic wave generating systems. The apparatus provides efficient radio frequency amplification, facilitates low loss electromagnetic generation, enables efficient utilization of kinetic energy of electrons, and works for different radio frequencies. The apparatus comprises an evacuated envelope, a pair of metal plates, a resonator, an electron gun, a magnetic field generator, and a pick-up loop. The evacuated envelope defines a space therewithin. The pair of metal plates defines a passage therebetween. The resonator is coupled to the pair of metal plates. The electron gun emits controlled bursts of electrons into the passage. The magnetic field generator is configured to generate electromagnetic waves. The pick-up loop extracts the generated electromagnetic waves.

    COMPACT MAGNET DESIGN FOR HIGH-POWER MAGNETRONS
    50.
    发明申请
    COMPACT MAGNET DESIGN FOR HIGH-POWER MAGNETRONS 有权
    用于大功率磁铁的紧凑磁铁设计

    公开(公告)号:US20150270090A1

    公开(公告)日:2015-09-24

    申请号:US14220078

    申请日:2014-03-19

    CPC classification number: H01J23/10 H01J25/50

    Abstract: A high-power magnetron assembly includes a high-power magnetron and a compact magnetic field generator. The high-power magnetron includes a cathode configured to emit electrons in response to receiving a supply of voltage from a power supply. The high-power magnetron includes an anode configured to concentrically surround the cathode and to attract the emitted electrons across an interaction region between the cathode and the anode. The compact magnetic field generator includes a plurality of permanent magnets including: a cathode magnet that has a longitudinal axis of symmetry annularly and that is surrounded by the cathode and disposed within the magnetron; and an anode magnet configured to annularly surround an outer perimeter of the magnetron. An arrangement of the plurality of permanent magnets concentrically about the longitudinal axis of symmetry forms a specified magnetic field within the interaction region that bounds the electrons emitted within the interaction region.

    Abstract translation: 大功率磁控管组件包括大功率磁控管和紧凑型磁场发生器。 大功率磁控管包括配置为响应于从电源接收电压的电源而发射电子的阴极。 高功率磁控管包括阳极,该阳极构造成同心地围绕阴极并且吸引发射的电子穿过阴极和阳极之间的相互作用区域。 小型磁场发生器包括多个永磁体,包括:阴极磁体,其具有环形的对称的纵向轴线并被阴极包围并设置在磁控管内; 以及阳极磁体,其构造成环形地围绕磁控管的外周。 围绕纵向对称轴同心地布置的多个永磁体的布置在相互作用区域内形成限定在相互作用区域内发射的电子的特定磁场。

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