公开(公告)号：US20100007867A1

公开(公告)日：2010-01-14

申请号：US12367193

申请日：2009-02-06

申请人： Marinus Aart VAN DEN BRINK ,  Hans BUTLER ,  Emiel Jozef Melanie EUSSEN ,  Engelbertus Antonius Fransiscu VAN DER PASCH ,  Marc Wilhelmus Maria VAN DER WIJST ,  Georgo ANGELIS ,  Renatus Gerardus KLAVER ,  Martijn Robert HAMERS ,  Boudewijn Theodorus VERHAAR ,  Peter HOEKSTRA

发明人： Marinus Aart VAN DEN BRINK ,  Hans BUTLER ,  Emiel Jozef Melanie EUSSEN ,  Engelbertus Antonius Fransiscu VAN DER PASCH ,  Marc Wilhelmus Maria VAN DER WIJST ,  Georgo ANGELIS ,  Renatus Gerardus KLAVER ,  Martijn Robert HAMERS ,  Boudewijn Theodorus VERHAAR ,  Peter HOEKSTRA

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70775 ,  G03F7/70516

摘要： In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.

摘要翻译： 在一个实施例中，舞台系统校准方法包括响应于设定点信号相对于编码器网格移动舞台，并通过与编码器网格协作的传感器头测量舞台的位置。 舞台的位置由舞台控制器控制。 记录表示由传感器头测量的设定点信号和台的位置之间的差异的信号。 舞台系统根据代表差异的注册信号进行校准。

公开(公告)号：US20090316129A1

公开(公告)日：2009-12-24

申请号：US12479145

申请日：2009-06-05

申请人： Hans Butler ,  Martinus Van Duijnhoven ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Hans Butler ,  Martinus Van Duijnhoven ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/54 ,  G03B27/62 ,  G03F7/20

CPC分类号： G03B27/54 ,  G03B27/62 ,  G03F7/70716 ,  G03F7/709

摘要： A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a metrology frame supported by a vibration isolation support device; an object movable with respect to the metrology frame; and a displacement determining unit to determine positions, speeds and/or accelerations of the object with respect to the metrology frame and/or the projection system. At least one actuator is provided for applying correcting forces and/or torques on the metrology frame, and a controller is provided which is configured to calculate the correcting forces and/or torques to be applied to the metrology frame based on the determined positions, speeds and/or accelerations of the object in order to compensate for pressure pulses exerted on the metrology frame due to movements of the object with respect to the metrology frame.

摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上; 由隔振支撑装置支撑的计量框架; 相对于计量框架可移动的物体; 以及位移确定单元，用于确定物体相对于计量框架和/或投影系统的位置，速度和/或加速度。 提供至少一个致动器用于在计量框架上施加校正力和/或扭矩，并且提供控制器，该控制器被配置为基于所确定的位置，速度来计算要施加到计量框架的校正力和/或扭矩 和/或物体的加速度，以便补偿由于物体相对于计量框架的移动而施加在计量框架上的压力脉冲。

公开(公告)号：US20090262325A1

公开(公告)日：2009-10-22

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etienne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etienne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  H05K7/02

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US20090091725A1

公开(公告)日：2009-04-09

申请号：US12244879

申请日：2008-10-03

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Erik Roelof Loopstra ,  Cornelius Adrianus Lambertus De Hoon

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Erik Roelof Loopstra ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/709 ,  F16F7/1005

摘要： A lithographic apparatus comprises an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further comprises a substrate table constructed to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system comprises a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency of a signal provided by the sensor. The active damping system is corrected to a damping mass, the damping mass being connected to the projection system.

摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统。 光刻设备还包括被构造成保持衬底的衬底台; 以及投影系统，被配置为将图案化的光束投影到基板的目标部分上。 提供主动阻尼系统以抑制至少部分投影系统的振动。 主动阻尼系统包括用于测量投影系统的位置量的传感器和根据由传感器提供的信号在投影系统上施加力的致动器的组合。 主动阻尼系统被校正为阻尼质量，阻尼块连接到投影系统。

公开(公告)号：US20090061361A1

公开(公告)日：2009-03-05

申请号：US12262647

申请日：2008-10-31

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.

摘要翻译： 公开了通过光刻设备制造集成电路的方法。 所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。 在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。 在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。 在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。 这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。

公开(公告)号：US07471373B2

公开(公告)日：2008-12-30

申请号：US10876786

申请日：2004-06-25

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。

公开(公告)号：US07049592B2

公开(公告)日：2006-05-23

申请号：US10615421

申请日：2003-07-09

申请人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

发明人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

IPC分类号： G21K7/00 ,  G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.