Substrate treatment method
    51.
    发明授权
    Substrate treatment method 失效
    底物处理方法

    公开(公告)号:US6068000A

    公开(公告)日:2000-05-30

    申请号:US891137

    申请日:1997-07-10

    摘要: The present invention provides a substrate treatment method to be performed after the steps of forming a desired resist pattern on a substrate and etching thereof, wherein said method comprises steps of: (I) removing the resist pattern on the substrate using a remover solution principally containing a salt derived from hydrofluoric acid and a metal-free base; (II) rinsing said substrate with a lithographic rinsing solution containing a water-soluble organic solvent and water; and (III) washing said substrate with water. According to the present invention, metallic films on the substrate are not corroded in the substrate treatment method, and the method can be performed at a low cost and with a reduced volume of labor for disposal of waste solution used for washing the substrate.

    摘要翻译: 本发明提供了一种在基板上形成期望的抗蚀剂图案和蚀刻步骤之后执行的基板处理方法,其中所述方法包括以下步骤:(I)使用主要包含 衍生自氢氟酸和无金属碱的盐; (II)用含有水溶性有机溶剂和水的平版印刷冲洗溶液冲洗所述基材; 和(III)用水洗涤所述基材。 根据本发明,在基板处理方法中,基板上的金属膜不会被腐蚀,并且可以以低成本执行该方法,并且减少了用于清洗基板的废溶液处理的劳动量。

    Thermoelectric power generating apparatus and method for driving same
    52.
    发明授权
    Thermoelectric power generating apparatus and method for driving same 失效
    热电发电装置及其驱动方法

    公开(公告)号:US6028263A

    公开(公告)日:2000-02-22

    申请号:US69981

    申请日:1998-04-30

    CPC分类号: H01L35/28 H01L35/00

    摘要: An apparatus for generating a thermoelectric power and method for driving the same. The disclosed apparatus comprises: a plurality of power generation units, each power generator unit including at least one thermocouple and being capable of mutually generating an equal output voltage; a connection form switch for switching an electrical connection form of each one of the power generator units between a serial connection of the corresponding one of the power generator units to another of the remaining power generator units and a parallel connection thereof to another of the remaining power generator units; a parallel voltage detector for measuring a parallel voltage when the plurality of power generator units are connected in parallel to each other; a connection form detector for determining the connection form of all of the power generator units in one of three forms consisting of a serial connection, a parallel connection, and a combination of the serial and parallel connections, so as to generate a thermoelectric power according to a load connected to the thermoelectric power generating apparatus on the basis of a value of the parallel voltage measured by the parallel voltage measuring block; and a broken wire detector for detecting whether a wire breakage in each of the power generator units occurs.

    摘要翻译: 一种用于产生热电功率的装置及其驱动方法。 所公开的装置包括:多个发电单元,每个发电机单元包括至少一个热电偶并且能够相互产生相等的输出电压; 连接形式开关,用于在发电机单元中的相应一个发电机单元的串联连接到另一个剩余的发电机单元之间切换每个发电机单元的电连接形式,以及将其并联连接到剩余电力中的另一个 发电机组; 并联电压检测器,用于当多个发电机单元彼此并联连接时测量并联电压; 连接形式检测器,用于以由串联连接,并联连接和串联和并联连接的组合构成的三种形式中的一种形式确定所有发电机单元的连接形式,以便产生根据 基于由并联电压测量块测量的并联电压的值连接到所述热电发电装置的负载; 以及用于检测每个发电机单元中的断线是否发生的断线检测器。

    Remover solution composition for resist and method for removing resist
using the same
    53.
    发明授权
    Remover solution composition for resist and method for removing resist using the same 失效
    去除抗蚀剂的溶液组合物及使用其去除抗蚀剂的方法

    公开(公告)号:US5905063A

    公开(公告)日:1999-05-18

    申请号:US89661

    申请日:1998-06-03

    CPC分类号: G03F7/423 G03F7/425

    摘要: A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH or 5 to 8. A method for removing resist which comprises the steps of (I) forming a resist layer on a substrate having a metal film, (II) light-exposing the resist layer through a mask pattern and subsequently developing the resist layer to form a resist pattern, and (III) dry-etching the substrate using the resist pattern as a mask and then removing the unnecessary resist and modified resist film with the remover solution composition.

    摘要翻译: 一种抗蚀剂去除剂溶液组合物,其包含(a)氢氟酸与无金属碱的盐,(b)水溶性有机溶剂和(c)水和任选的(d)防腐蚀剂,并具有pH 或5〜8。一种除去抗蚀剂的方法,其包括以下步骤:(I)在具有金属膜的基材上形成抗蚀剂层,(II)通过掩模图案曝光抗蚀剂层,随后将抗蚀剂层显影 形成抗蚀剂图案,(III)使用抗蚀剂图案作为掩模对基板进行干蚀刻,然后用去除剂溶液组合物除去不需要的抗蚀剂和改性的抗蚀剂膜。

    Manufacturing management system having SMT line
    54.
    发明授权
    Manufacturing management system having SMT line 失效
    具有SMT生产线的生产管理系统

    公开(公告)号:US5822210A

    公开(公告)日:1998-10-13

    申请号:US815635

    申请日:1997-03-13

    摘要: Disclosed is a manufacturing management system for controlling an SMT line to manufacture printed circuit boards the manufacture of which has been designated. A source data management file created by CAD data for a printed circuit board, an inventory parts management file, a cartridge management file and an SMT line information file which includes manufacturing conditions of the SMT manufacturing equipment and equipment arrangement are registered in a database. An SMT set-up support unit creates a set-up instruction manual, which specifies set-up for manufacturing printed circuit boards on the SMT line, by referring to the various files that have been stored in the database. Further, a mounting data creating unit creates mounting data, which are for allowing the mounting machine to mount parts on printed circuit boards, using part setting position addresses of the mounting machine contained in set-up information and part mounting position coordinates contained in the source data management file.

    摘要翻译: 公开了一种用于控制SMT线以制造其制造已被指定的印刷电路板的制造管理系统。 在数据库中登记由印刷电路板的CAD数据创建的源数据管理文件,库存部件管理文件,盒管理文件和包括SMT制造设备和设备布置的制造条件的SMT线信息文件。 SMT设置支持单元通过参考存储在数据库中的各种文件创建一个设置说明手册,该手册指定了在SMT生产线上制造印刷电路板的设置。 此外,安装数据创建单元使用包含在设置信息中的安装机的部件设置位置地址和源中包含的部件安装位置坐标来创建用于允许安装机将部件安装在印刷电路板上的安装数据 数据管理文件。

    Negative-working radiation-sensitive resist composition
    56.
    发明授权
    Negative-working radiation-sensitive resist composition 失效
    负性辐射敏感抗蚀剂组合物

    公开(公告)号:US5368783A

    公开(公告)日:1994-11-29

    申请号:US52484

    申请日:1993-04-23

    CPC分类号: G03F7/038 G03F7/0045

    摘要: Disclosed is a novel negative-working radiation-sensitive resist composition useful in the photolithographic patterning works of resist layers on substrate surfaces in the manufacture of semiconductor devices and capable of giving a finely patterned resist layer with high resolution and having an excellently orthogonal cross sectional profile of the line-wise patterned resist layer with an outstandingly high sensitivity to various actinic rays. The composition comprises, as the essential ingredients, (a) an alkali-soluble resin such as a cresol novolac resin, (b) a specific alkoxymethylated amino resin, e.g., methoxymethylated melamine resin, and (c) a specific triazine compound in a limited weight proportion.

    摘要翻译: 公开了一种新颖的负性辐射敏感抗蚀剂组合物,其可用于半导体器件制造中的衬底表面上的抗蚀剂层的光刻图案化工作,并且能够以高分辨率给出精细图案化的抗蚀剂层并且具有非常正交的横截面轮廓 的线形图案化抗蚀剂层,对各种光化射线具有极高的灵敏度。 组合物包含(a)碱溶性树脂如甲酚酚醛清漆树脂,(b)特定烷氧基甲基化氨基树脂,例如甲氧基甲基化三聚氰胺树脂和(c)有限制的三嗪化合物作为必要成分 重量比例。

    Method and apparatus for freeze drying
    57.
    发明授权
    Method and apparatus for freeze drying 失效
    冷冻干燥方法和装置

    公开(公告)号:US5090132A

    公开(公告)日:1992-02-25

    申请号:US521309

    申请日:1990-05-09

    IPC分类号: F26B5/06

    CPC分类号: F26B5/06

    摘要: A freeze drying apparatus comprises a heat-transfer medium container having heat-transfer medium inlet/outlet pipes, a plurality of tubes extending through the heat-transfer medium container from its lower plate to upper plate, a lower space formed beneath the heat-transfer medium container and being in communication with the tubes and a product liquid inlet/outlet conduit, an openable bottom lid defining the bottom of the lower space, an upper space formed above the upper plate of the heat-transfer medium container, a trap chamber being in communication with the upper space, pressure regulation lid means operable to airtightly cover part of the tubes at their upper ends, and a pressure regulation conduit with pressure regulation valve operable to regulate pressure in the tubes covered with the pressure regulation lid means.

    摘要翻译: 冷冻干燥装置包括具有传热介质入口/出口管的传热介质容器,从其下板向上板延伸穿过传热介质容器的多个管,在传热下方形成的下部空间 中间容器并与管连通,产品液体入口/出口导管,限定下部空间底部的可打开的底盖,形成在传热介质容器的上板上方的上部空间,捕集室 与上部空间连通,压力调节盖装置可操作以在其上端气密地覆盖管的一部分,以及压力调节导管,其具有可调节压力的压力调节阀,该压力调节导管用于调节被压力调节盖装置覆盖的管中的压力。

    Crossed coil meter driving device having a plurality of input parameters
    58.
    发明授权
    Crossed coil meter driving device having a plurality of input parameters 失效
    具有多个输入参数的交叉线圈表驱动装置

    公开(公告)号:US5051688A

    公开(公告)日:1991-09-24

    申请号:US625927

    申请日:1990-12-11

    IPC分类号: G01R7/06

    CPC分类号: G01R7/06

    摘要: A meter driving device for indicating angular positions corresponding to input values. The device includes a memory for storing previously given input values, angular directions corresponding to the input values, and coefficients representative of the grades of change in angular direction depending on the change between adjacent two input values, as parameters. Based on these parameters and the frequency of input pulse signal giving the input values, the angular direction corresponding thereto is calculated. The angular direction signal receives PWM process and then supplies to a pair of crossed exciting coils via a driver. During a predetermined time period from the turning ON and OFF of the power source, the transference of the angular direction signals to the driver is shut out by logic gates, thereby inhibiting malfunctional meter indication.

    Containing an arylsulfonic acid, a phenol and a naphalenic solvent
    59.
    发明授权
    Containing an arylsulfonic acid, a phenol and a naphalenic solvent 失效
    含有芳基磺酸,苯酚和萘酸溶剂

    公开(公告)号:US4844832A

    公开(公告)日:1989-07-04

    申请号:US149971

    申请日:1988-02-03

    CPC分类号: G03F7/426 C09D9/005

    摘要: The remover solution for photoresist layers comprises: (a) from 30 to 70% by weight of an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70.degree. C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid. The remover solution is effective for a variety of photoresist compositions with less problems in respect to the workers' health and danger of fire and explosion than conventional remover solutions.

    摘要翻译: 光致抗蚀剂层的去除剂溶液包括:(a)30至70重量%的芳族烃化合物或闪点为70℃或更高的含至少一半的萘的芳族烃化合物的组合 选自萘,甲基萘和二甲基萘的化合物; (b)5〜40重量%的酚类化合物; 和(c)10至50重量%的芳基磺酸。 去除剂溶液对于各种光刻胶组合物是有效的,与常规去除剂溶液相比,相对于工人的健康和火灾和爆炸危险的问题较少。