公开(公告)号：US11262191B1

公开(公告)日：2022-03-01

申请号：US16509162

申请日：2019-07-11

Applicant: Onto Innovation Inc.

Inventor： James Millerd ,  Eric Frey

IPC: G01B11/24

Abstract: An optical device for characterizing a workpiece combines an interferometer with a polarization rotation pellicle, installed in a stand-alone fashion in a spatial gap between the mirrors of the interferometer, and a polarization based phase-shift sensor.

公开(公告)号：US20210088453A1

公开(公告)日：2021-03-25

申请号：US16927571

申请日：2020-07-13

Applicant: Onto Innovation Inc.

Inventor： Nigel P. SMITH

IPC: G01N21/88

Abstract: Defects are detected using data acquired from an interference channel and a polarization modification channel in an interferometer. The interference objective splits a polarized illumination beam into a reference illumination that is reflected by a reference surface without modification to the polarization, and a sample beam that is reflected by a sample surface, that may modify the polarization. Light from the sample beam with no change in polarization is combined with the reference illumination and directed to the interference channel, which may measure the reflectivity and/or topography of the sample. Light from the sample beam with modified polarization is directed to the polarization modification channel. The intensity of the light detected at the polarization modification channel may be used, along with the reflectivity and topography data to identify defects or other characteristics of the sample.

公开(公告)号：US20200333713A1

公开(公告)日：2020-10-22

申请号：US16955808

申请日：2018-12-26

Applicant: Onto Innovation, Inc.

Inventor： J. Casey DONAHER

IPC: G03F7/20

Abstract: A stepper (100) for lithographic processing of semiconductor substrates includes abase (102), a chuck (104) that moves only along an X axis of a coordinate system, a bridge (114) mounted over the base and the chuck, and at least one projection camera (112) mounted on the bridge. The at least one projection camera is movable along a Y axis of the coordinate system. The combined range of travel of the chuck along the X axis and the at least one projection camera along the Y axis is sufficient to address a field of view of the at least one projection camera to substantially an entire substrate (106) mounted on the chuck.

公开(公告)号：US20200286764A1

公开(公告)日：2020-09-10

申请号：US16650851

申请日：2018-09-13

Applicant: ONTO INNOVATION, INC.

Inventor： J. Casey DONAHER

IPC: H01L21/68 ,  H02K11/21 ,  H02K41/03

Abstract: A mechanism for localizing a substrate relative to a projection camera or other apparatus over large travel distances is described. The mechanism includes one or more trucks that move with the stage in a primary direction and remain stationary when the stage moves in an ancillary direction. The position of the trucks, together with relative distances between the truck(s) and a stage on which the substrate is supported facilitates alignment.

公开(公告)号：US12237198B2

公开(公告)日：2025-02-25

申请号：US17840154

申请日：2022-06-14

Applicant: Onto Innovation Inc.

Inventor： Jason Paul Remillard ,  Neil Casa ,  Stephen W. Into

IPC: G03F7/20 ,  G06T7/00 ,  H01L21/68

Abstract: Various examples include a substrate pre-aligner system that can align substrates by detecting a fiducial on the substrate, determine an amount of bow in the substrate, and determine other characteristics of the substrate. In one example, by imaging both a 0-degree orientation and after a single 180-degree rotation of the substrate, the pre-aligner of the disclosed subject-matter can determine, for example, a location of the fiducial and bow in the substrate. In other embodiments, multiple cameras are used to capture images of the substrate substantially simultaneously and determine, for example, a location of the fiducial and bow in the substrate. The multiple camera embodiment can also allow a higher throughput of substrates as compared with the 0-degree to 180-degree embodiment. Other systems and methods are also disclosed.

公开(公告)号：US20240402074A1

公开(公告)日：2024-12-05

申请号：US18798431

申请日：2024-08-08

Applicant: Onto Innovation Inc.

Inventor： Manjusha Mehendale ,  Marco Alves ,  Robin A. Mair

IPC: G01N21/17

Abstract: Measuring or inspecting samples through non-destructive systems and methods. Multiple light pulses emitted from a light source. The light pulses are split into pump pulses and probe pulses. A first probe pulse reaches the surface of a sample after a first time duration after a first pump pulse reaches the surface. A second pump pulse reaches the surface after a time duration after the first probe pulse. When the second pump pulse reflects off the sample, the second pump pulse may be altered by an acoustic wave generated by the first probe pulse. The reflected second pump pulse may be analyzed to determine a characteristic of the sample.

公开(公告)号：US12111355B2

公开(公告)日：2024-10-08

申请号：US17532700

申请日：2021-11-22

Applicant: Onto Innovation Inc.

Inventor： Xin Song ,  Jian Lu

IPC: G01R31/3185 ,  G01R1/073 ,  G01R31/26 ,  G01R31/28 ,  G06F30/00 ,  H01L21/66

CPC classification number: G01R31/318511 ,  G01R31/2642 ,  G01R31/2831 ,  G01R31/2886 ,  H01L22/14 ,  G01R1/07342 ,  G06F30/00 ,  H01L22/34 ,  H01L2924/00 ,  H01L2924/0002

Abstract: Systems and methods for improving substrate fabrication are provided. Subsets of dies of substrates may be inspected at various points in the fabrication process to generate spectra data. The spectra data can be used to generate data that are input to a machine learning model to predict yields for the substrates.

公开(公告)号：US12092565B2

公开(公告)日：2024-09-17

申请号：US17613318

申请日：2020-05-22

Applicant: Onto Innovation Inc.

Inventor： Manjusha Mehendale ,  Marco Alves ,  Robin Mair

IPC: G01N21/17

CPC classification number: G01N21/1702

Abstract: Measuring or inspecting samples through non-destructive systems and methods. Multiple light pulses emitted from a light source. The light pulses are split into pump pulses and probe pulses. A first probe pulse reaches the surface of a sample after a first time duration after a first pump pulse reaches the surface. A second pump pulse reaches the surface after a time duration after the first probe pulse. When the second pump pulse reflects off the sample, the second pump pulse may be altered by an acoustic wave generated by the first probe pulse. The reflected second pump pulse may be analyzed to determine a characteristic of the sample.

公开(公告)号：US20240219825A1

公开(公告)日：2024-07-04

申请号：US18390424

申请日：2023-12-20

Applicant: Onto Innovation Inc.

Inventor： Keith F. Best ,  John Chang

IPC: G03F1/72 ,  G03F1/84 ,  G03F7/20

CPC classification number: G03F1/72 ,  G03F1/84 ,  G03F7/2022

Abstract: Various examples described herein include a correction for a layer-to-layer or substrate-to-substrate overlay alignment based upon feedback from critical-dimension (CD) measurements of locations of various features that are to be formed on subsequently formed layers of a substrate with regard to locations of similar features on previously formed layers. The layer-to-layer or substrate-to-substrate overlay-alignment feedback can be enhanced by determining positions of multiple ones of the features on each of the formed layers with respect to the first layer in the stack. Further, the layer-to-layer or substrate-to-substrate overlay-alignment feedback can be enhanced by determining positions of multiple ones of the features on each of the formed layers with respect to the previously formed layer. Overlay-alignment errors may be sent back to a photolithographic exposure tool. An accumulated overlay error can be flagged. Other techniques and methods are also disclosed.

公开(公告)号：US12013350B2

公开(公告)日：2024-06-18

申请号：US17308949

申请日：2021-05-05

Applicant: Onto Innovation Inc.

Inventor： Kevin Eduard Heidrich ,  Nicholas James Keller

IPC: G01N21/956 ,  G01N21/21 ,  G01N21/95 ,  G06F30/3308 ,  G06F30/347

CPC classification number: G01N21/95607 ,  G01N21/211 ,  G01N21/9501 ,  G06F30/3308 ,  G06F30/347 ,  G01N2021/95615

Abstract: Characteristics of a standard logic cell, e.g., a random logic cell, are determined using an effective cell approximation. The effective cell approximation is smaller than the standard logic cell and represents the density of lines and spaces of the standard logic cell. The effective cell approximation may be produced based on a selected area from the standard logic cell and include the same non-periodic patterns as the selected area. The effective cell approximation, alternatively, may represent non-periodic patterns in the standard logic cell using periodic patterns having a same density of lines and spaces as found in the standard logic cell. A structure on the sample, such as a logic cell or a metrology target produced based on the effective cell approximation is measured to acquire data, which is compared to the data for the effective cell approximation to determine a characteristic of the standard logic cell.