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    Managing recurring appointments
    52.
    发明授权
    Managing recurring appointments 有权
    管理定期约会

    公开(公告)号：US08577959B2

    公开(公告)日：2013-11-05

    申请号：US12828355

    申请日：2010-07-01

    申请人： Prabhat Kumar Pandey ,  Abhishek Kumar Gupta ,  Sandhya Vankamamidi ,  Sutirtha Saha ,  Kulo Rajasekaran ,  David Robert Shutt ,  Derik Bjorn Stenerson ,  Niraj Yadav ,  Ramesh Prasad Pandey ,  Sharad Sharma

    发明人： Prabhat Kumar Pandey ,  Abhishek Kumar Gupta ,  Sandhya Vankamamidi ,  Sutirtha Saha ,  Kulo Rajasekaran ,  David Robert Shutt ,  Derik Bjorn Stenerson ,  Niraj Yadav ,  Ramesh Prasad Pandey ,  Sharad Sharma

    IPC分类号： G06F15/16

    CPC分类号： G06Q10/109

    摘要： Concepts and technologies are described herein for managing recurring appointments without losing historical data associated with the recurring appointments. In accordance with the concepts and technologies disclosed herein, a recurring appointment definition can be modified without deleting the recurring appointment definition and/or losing exceptions, notes, and/or other data associated with the recurring appointment definition. Additionally, the concepts and technologies disclosed herein allow the modification of an existing recurring appointment definition without creating a new recurring appointment definition. Thus, synchronization between rules-based calendaring applications and expansion-based calendaring applications can be accomplished without creating multiple instances of related recurring appointments created due to modifications of the recurring appointment definition.

    摘要翻译： 这里描述了管理定期约会的概念和技术，而不丢失与循环约会相关联的历史数据。 根据本文公开的概念和技术，可以修改循环约会定义而不删除循环约会定义和/或丢失与循环约会定义相关联的异常，注释和/或其他数据。 此外，本文公开的概念和技术允许修改现有的循环约会定义，而不创建新的定期约会定义。 因此，可以实现基于规则的日历应用程序和基于扩展的日历应用程序之间的同步，而不会创建由于定期约定定义的修改而创建的相关重复约会的多个实例。

    PATTERNED ALUMINUM BACK CONTACTS FOR REAR PASSIVATION
    53.
    发明申请
    PATTERNED ALUMINUM BACK CONTACTS FOR REAR PASSIVATION 审中-公开
    图案化的铝合金后退联系人

    公开(公告)号：US20130233379A1

    公开(公告)日：2013-09-12

    申请号：US13784043

    申请日：2013-03-04

    申请人： David Tanner ,  Prabhat Kumar

    发明人： David Tanner ,  Prabhat Kumar

    IPC分类号： H01L31/18 ,  H01L31/0224

    CPC分类号： H01L31/1868 ,  H01L31/02167 ,  H01L31/022425 ,  H01L31/022433 ,  H01L31/068 ,  H01L31/1864 ,  Y02E10/547 ,  Y02P70/521

    摘要： Embodiments of the invention generally relate to solar cells having reduced carrier recombination and methods of forming the same. The solar cells have eutectic local contacts and passivation layers which reduce recombination by facilitating formation of a back surface field (BSF). A patterned aluminum back contact is disposed on the passivation layer for removing current form the solar cell. The patterned back contact reduces the cost-per-watt of the solar cell by using less material than a full-surface back contact. The methods of forming the solar cells include depositing a passivation layer including aluminum oxide and silicon nitride on a back surface of a solar cell, and then forming openings through the passivation layer. A patterned aluminum back contact is disposed on the passivation layer over the holes, and thermally processed to form a silicon-aluminum eutectic within the openings.

    摘要翻译： 本发明的实施方案通常涉及具有减少的载体重组的太阳能电池及其形成方法。 太阳能电池具有共晶的局部接触和钝化层，通过促进背面场（BSF）的形成来减少复合。 图案化的铝背接触设置在钝化层上以去除太阳能电池的电流。 图案化的背面接触通过使用比全表面背面接触更少的材料来降低太阳能电池的每瓦成本。 形成太阳能电池的方法包括在太阳能电池的背面上沉积包括氧化铝和氮化硅的钝化层，然后通过钝化层形成开口。 图案化的铝背接触器设置在孔上的钝化层上，并且被热处理以在开口内形成硅铝共晶体。

    MANAGING RECURRING APPOINTMENTS
    55.
    发明申请
    MANAGING RECURRING APPOINTMENTS 有权
    管理重组任命

    公开(公告)号：US20120005261A1

    公开(公告)日：2012-01-05

    申请号：US12828355

    申请日：2010-07-01

    申请人： Prabhat Kumar Pandey ,  Abhishek Kumar Gupta ,  Sandhya Vankamamidi ,  Sutirtha Saha ,  Kulo Rajasekaran ,  David Robert Shutt ,  Derik Bjorn Stenerson ,  Niraj Yadav ,  Ramesh Prasad Pandey ,  Sharad Sharma

    发明人： Prabhat Kumar Pandey ,  Abhishek Kumar Gupta ,  Sandhya Vankamamidi ,  Sutirtha Saha ,  Kulo Rajasekaran ,  David Robert Shutt ,  Derik Bjorn Stenerson ,  Niraj Yadav ,  Ramesh Prasad Pandey ,  Sharad Sharma

    IPC分类号： G06F15/16

    CPC分类号： G06Q10/109

    摘要： Concepts and technologies are described herein for managing recurring appointments without losing historical data associated with the recurring appointments. In accordance with the concepts and technologies disclosed herein, a recurring appointment definition can be modified without deleting the recurring appointment definition and/or losing exceptions, notes, and/or other data associated with the recurring appointment definition. Additionally, the concepts and technologies disclosed herein allow the modification of an existing recurring appointment definition without creating a new recurring appointment definition. Thus, synchronization between rules-based calendaring applications and expansion-based calendaring applications can be accomplished without creating multiple instances of related recurring appointments created due to modifications of the recurring appointment definition.

    摘要翻译： 这里描述了管理定期约会的概念和技术，而不丢失与循环约会相关联的历史数据。 根据本文公开的概念和技术，可以修改循环约会定义而不删除循环约会定义和/或丢失与循环约会定义相关联的异常，注释和/或其他数据。 此外，本文公开的概念和技术允许修改现有的循环约会定义，而不创建新的定期约会定义。 因此，可以实现基于规则的日历应用程序和基于扩展的日历应用程序之间的同步，而不会创建由于定期约定定义的修改而创建的相关重复约会的多个实例。

    Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials
    57.
    发明授权
    Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials 有权
    制备MoO2粉末的方法，由MoO 2粉末制成的产品，MoO 2薄膜的沉积以及使用这种材料的方法

    公开(公告)号：US07754185B2

    公开(公告)日：2010-07-13

    申请号：US11334140

    申请日：2006-01-18

    申请人： Lawrence F. McHugh ,  Prabhat Kumar ,  David Meendering ,  Richard Wu ,  Gerhard Wötting ,  Richard Nicholson

    发明人： Lawrence F. McHugh ,  Prabhat Kumar ,  David Meendering ,  Richard Wu ,  Gerhard Wötting ,  Richard Nicholson

    IPC分类号： C01G39/02 ,  B22F3/15

    CPC分类号： C01G39/02 ,  C01P2006/10 ,  C01P2006/12 ,  C01P2006/40 ,  H01L51/5206

    摘要： The invention relates to high purity MoO2 powder by reduction of ammonium molybdate or molybdenum trioxide using hydrogen as the reducing agent in a rotary or boat furnace. Consolidation of the powder by press/sintering, hot pressing, and/or HIP is used to make discs, slabs, or plates, which are used as sputtering targets. The MoO2 disc, slab, or plate form is sputtered on a substrate using a suitable sputtering method or other physical means to provide a thin film having a desired film thickness. The thin films have properties such as electrical, optical, surface roughness, and uniformity comparable or superior to those of indium-tin oxide (ITO) and zinc-doped ITO in terms of transparency, conductivity, work function, uniformity, and surface roughness. The MoO2 and MoO2 containing thin films can be used in organic light-emitting diodes (OLED), liquid crystal display (LCD), plasma display panel (PDP), field emission display (FED), thin film solar cell, low resistivity ohmic contacts, and other electronic and semiconductor devices.

    摘要翻译： 本发明涉及通过在旋转或船式炉中使用氢作为还原剂还原钼酸铵或三氧化钼的高纯度MoO 2粉末。 使用通过压制/烧结，热压和/或HIP将粉末固结制成用作溅射靶的盘，板或板。 使用合适的溅射方法或其它物理方法将MoO 2盘，板或板形式溅射在基板上，以提供具有所需膜厚度的薄膜。 在透明性，导电性，功函数，均匀性和表面粗糙度方面，薄膜具有与铟锡氧化物（ITO）和掺杂锌的ITO相当或优于电，光学，表面粗糙度和均匀性的性质。 含有MoO2和MoO2的薄膜可用于有机发光二极管（OLED），液晶显示器（LCD），等离子体显示面板（PDP），场发射显示器（FED），薄膜太阳能电池，低电阻率欧姆接触 ，以及其他电子和半导体器件。

    Fine Grained, Non Banded, Refractory Metal Sputtering Targets with a Uniformly Random Crystallographic Orientation, Method for Making Such Film, and Thin Film Based Devices and Products Made Therefrom
    59.
    发明申请
    Fine Grained, Non Banded, Refractory Metal Sputtering Targets with a Uniformly Random Crystallographic Orientation, Method for Making Such Film, and Thin Film Based Devices and Products Made Therefrom 有权
    具有均匀随机晶体取向的细晶粒，非带状耐火金属溅射靶，制造这种膜的方法以及由此制成的薄膜基器件和产品

    公开(公告)号：US20080271779A1

    公开(公告)日：2008-11-06

    申请号：US11937164

    申请日：2007-11-08

    申请人： Steven A. Miller ,  Olaf Schmidt-Park ,  Prabhat Kumar ,  Richard Wu ,  Shuwei Sun ,  Stefan Zimmermann

    发明人： Steven A. Miller ,  Olaf Schmidt-Park ,  Prabhat Kumar ,  Richard Wu ,  Shuwei Sun ,  Stefan Zimmermann

    IPC分类号： C23C14/00 ,  B05D1/12 ,  G11B5/62

    CPC分类号： C23C14/3414 ,  B22F1/0014 ,  C22C1/045 ,  C23C4/134 ,  C23C14/0057 ,  C23C14/0089 ,  C23C14/0641 ,  C23C14/08 ,  C23C14/14 ,  C23C24/04 ,  H01J37/3426 ,  H01J2237/332

    摘要： The invention relates to a sputtering target which has a fine uniform equiaxed grain structure of less than 44 microns, no preferred texture orientation as measured by electron back scattered diffraction (“EBSD”) and that displays no grain size banding or texture banding throughout the body of the target. The invention relates a sputtering target with a lenticular or flattened grain structure, no preferred texture orientation as measured by EBSD and that displays no grain size or texture banding throughout the body of the target and where the target has a layered structure incorporating a layer of the sputtering material and at least one additional layer at the backing plate interface, said layer has a coefficient of thermal expansion (“CTE”) value between the CTE of the backing plate and the CTE of the layer of sputtering material. The invention also relates to thin films and their use of using the sputtering target and other applications, such as coatings, solar devices, semiconductor devices etc. The invention further relates to a process to repair or rejuvenate a sputtering target.

    摘要翻译： 本发明涉及一种溅射靶，其具有小于44微米的均匀均匀的晶粒结构，不受电子背散射衍射（“EBSD”）测量的优选纹理取向，并且在整个体内不显示晶粒尺寸条带或纹理条带 的目标。 本发明涉及一种具有透镜或扁平晶粒结构的溅射靶，没有通过EBSD测量的优选的织构定向，并且在靶的整个体内不显示晶粒尺寸或纹理条纹，并且其中靶具有结合有层 溅射材料和在背板界面处的至少一个附加层，所述层在背板的CTE和溅射材料层的CTE之间具有热膨胀系数（“CTE”）。 本发明还涉及薄膜及其使用溅射靶和其它应用的应用，例如涂层，太阳能装置，半导体器件等。本发明还涉及一种修复或恢复溅射靶的方法。

    Refractory metal substrate with improved thermal conductivity
    60.
    发明授权
    Refractory metal substrate with improved thermal conductivity 有权
    具有改善导热性的耐火金属基材

    公开(公告)号：US07416789B2

    公开(公告)日：2008-08-26

    申请号：US10978940

    申请日：2004-11-01

    申请人： Henry F. Breit ,  Rong-Chein Richard Wu ,  Prabhat Kumar

    发明人： Henry F. Breit ,  Rong-Chein Richard Wu ,  Prabhat Kumar

    IPC分类号： B32B3/20 ,  B32B3/24 ,  B32B3/30 ,  B32B15/01 ,  B32B15/04 ,  B32B15/20 ,  H01L23/36

    CPC分类号： H01L23/3736 ,  H01L23/3733 ,  H01L23/3735 ,  H01L2924/0002 ,  Y10T428/12361 ,  Y10T428/12486 ,  Y10T428/12528 ,  Y10T428/12535 ,  Y10T428/12806 ,  Y10T428/12861 ,  Y10T428/12903 ,  Y10T428/31678 ,  H01L2924/00

    摘要： A substrate for semiconductor and integrated circuit components including: a core plate containing a Group VIB metal from the periodic table of the elements and/or an anisotropic material, having a first major surface and a second major surface and a plurality of openings extending, at least partially, from the first major surface to the second major surface; and a Group IB metal from the periodic table of the elements or other high thermally conductive material filling at least a portion of the space encompassed by at least some of the openings; and optionally, a layer containing a Group IB metal from the periodic table or other high thermally conductive material disposed over at least a portion of the first major surface and at least a portion of the second major surface. The substrate can be used in electronic devices, which can also include one or more semiconductor components.

    摘要翻译： 一种用于半导体和集成电路部件的衬底，包括：含有来自元件的周期表的VIB族金属和/或各向异性材料的芯板，具有第一主表面和第二主表面，以及多个开口， 最少部分地从第一主表面到第二主表面; 和来自元件周期表的IB族金属或其它高导​​热材料填充由至少一些开口包围的空间的至少一部分; 以及任选地，包含来自周期表的IB族金属或设置在第一主表面的至少一部分和第二主表面的至少一部分上的其它高导热材料的层。 该基板可用于电子设备中，其也可包括一个或多个半导体部件。