摘要:
Techniques are disclosed that allow for power conservation in integrated circuit memories, such as SRAM. The techniques can be embodied in circuitry that allows for floating of bitlines to eliminate or otherwise reduce power leakage associated with precharging bitlines. For instance, the techniques can be embodied in a bitline floating circuit having a single logic gate for qualifying the precharge control signal with a wake signal, so that precharging of the bitline does not occur if the wake signal is not in an active state. The techniques further allow for the elimination or reduction of unnecessary power consumption by the I/O circuitry or the memory array, such as when the memory array is not being accessed or when the array or a portion thereof is permanently disabled for yield recovery.
摘要:
The embodiment provides a buried bit line process and scheme. The buried bit line is disposed in a trench formed in a substrate. The buried bit line includes a diffusion region formed in a portion of the substrate adjacent the trench. A blocking layer is formed on a portion sidewall of the trench. A conductive plug is formed in the trench, covering sidewalls of the diffusion region and the blocking layer.
摘要:
An electrical connector (100) includes an insulative housing (20), a plurality of conductive contacts retained in the insulative housing, a shielding member (3) covering the insulative housing and an insulative cover (50) molded outside of the shielding member. The insulative cover has a lever portion (53) extending inside the shielding member and being sandwiched between a portion of the shielding member and the insulative housing. The insulative cover defines a slit (510) on an outer surface (51) thereof for anti-mismating. The insulative cover has a floor piece (511) located below the slit. The lever portion is connected to the floor piece for preventing the floor piece from being cracked.
摘要:
The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate consists of first elastomer, the first elastomer comprising a plurality of first holes; wherein the first holes have a drop shape, and each of the first holes has an opening. The buffer substrate consists of second elastomer, the second elastomer comprising a plurality of second holes. The surface substrate and the buffer substrate are adhered with adhesive comprising the first or the second elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.
摘要:
A phase change memory and the method for manufacturing the same are disclosed. The phase change memory includes a word line, a phase change element, a plurality of heating parts, and a plurality of bit lines. The phase change material layer is electrically connected to the word line and the heating parts. Each heating part is electrically connected to a respective bit line.
摘要:
The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要:
The present invention discloses an image preprocessing system, which includes a processing unit; an image preprocessing unit coupled to the processing unit to preprocess image slice data, wherein the image preprocessing unit includes an image fusion module to estimate missing values between different image slice data and an image stitching module to stitch different image slice data into stitched image data; and a database coupled to the processing unit to store the preprocessed image slice data.
摘要:
An optical connector assembly (2) has two optical connectors (3) and a combiner (5). Each optical connector has a connector body (30) with an angled latching arm (4) formed on the connector body. The latching arm has a fixed end (41) on the connector body and a free distal end. A groove (430) is defined on the distal end. The combiner has a combiner body (6) holding the optical connectors and a cantilevered trigger arm (7). The trigger arm has a fixed end on the combiner body and a free distal end. A rod (72) is formed on the distal end of the trigger arm, and is received in the grooves of the optical connectors.
摘要:
An electrical connector assembly comprises an insulative housing defining a receiving cavity extending inwardly from a mating face thereof and a plurality of terminal receiving passages disposed in the insulative housing and in communication with the receiving cavity. A plurality of terminals are received into the corresponding terminal receiving passages. A FFC module defines a pair of FFCs with a pair of first mating portions at one end thereof and an insulative insert having a lower half section disposed between the pair of first mating portions. The FFC module has an inserting portion received into the receiving cavity of the insulative housing.
摘要:
The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles, whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid scratching of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.