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公开(公告)号：US12055862B2
公开(公告)日：2024-08-06
申请号：US17952067
申请日：2022-09-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis LaFarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
IPC: G03F7/20 , C23C16/44 , G03F7/00 , H01L21/687
CPC classification number: G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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公开(公告)号：US11609504B2
公开(公告)日：2023-03-21
申请号：US17119485
申请日：2020-12-11
Applicant: ASML NETHERLANDS B.V.
Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
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公开(公告)号：US11454895B2
公开(公告)日：2022-09-27
申请号：US17313054
申请日：2021-05-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
IPC: G03F7/20 , H01L21/687 , C23C16/44
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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公开(公告)号：US10747125B2
公开(公告)日：2020-08-18
申请号：US16177585
申请日：2018-11-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US20190271920A1
公开(公告)日：2019-09-05
申请号：US16266881
申请日：2019-02-04
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
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Patent Agency Ranking
公开(公告)号：USRE47237E1
公开(公告)日：2019-02-12
申请号：US15182514
申请日：2016-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
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公开(公告)号：US09989867B2
公开(公告)日：2018-06-05
申请号：US15587086
申请日：2017-05-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
CPC classification number: G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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公开(公告)号：US09971255B2
公开(公告)日：2018-05-15
申请号：US15451007
申请日：2017-03-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Rogier Hendrikus Magdalena Cortie , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Michel Riepen , Henricus Jozef Castelijns , Cornelius Maria Rops , Jim Vincent Overkamp
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
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公开(公告)号：US09927715B2
公开(公告)日：2018-03-27
申请号：US14973421
申请日：2015-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
CPC classification number: G03F7/70341
Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
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公开(公告)号：US09857695B2
公开(公告)日：2018-01-02
申请号：US15250658
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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