公开(公告)号：US07248352B2

公开(公告)日：2007-07-24

申请号：US10724750

申请日：2003-12-02

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板，或圆柱形的屏蔽板或 板形。

公开(公告)号：US20060124874A1

公开(公告)日：2006-06-15

申请号：US10536715

申请日：2003-11-27

申请人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

发明人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

IPC分类号： G01N21/00 ,  G01N21/88

CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： A defects inspecting apparatus having: a scanning stage for running into a predetermined direction while mounting an inspection target substrate thereon; an illumination optic system for irradiating an illumination light beam upon a surface of the inspection target substrate at a predetermined angle inclined thereto; a detection optic system including, an upper-directed photo-detector for receiving upper-directed reflected/scattered lights emitting upwards from the inspection target substrate, thereby converting them into an upper-directed image signal, and a side-directed photo-detector for receiving side-directed reflected/scattered lights emitting for the inspection target substrate into an inclined direction, so as to flatly intersects the illumination light beam, and thereby converting into a side-directed image signal; and a signal processing system-for detecting defects upon basis of the upper-directed image signal and the side-directed image signal.

摘要翻译： 一种缺陷检查装置，具有：在其上安装检查对象基板的同时沿预定方向行进的扫描台; 照明光学系统，用于以与其倾斜的预定角度将照明光束照射在检查对象基板的表面上; 检测光学系统，包括：用于接收从检查对象基板向上发射的上方反射/散射光的上方光检测器，从而将其转换为高定向图像信号;以及侧向光检测器， 将检测对象基板发射的侧向反射/散射光倾斜到倾斜方向，以与照明光束平坦地相交，从而转换为侧向图像信号; 以及信号处理系统 - 用于基于上限图像信号和侧向图像信号来检测缺陷。

公开(公告)号：US06650409B1

公开(公告)日：2003-11-18

申请号：US08617270

申请日：1996-03-14

申请人： Minori Noguchi ,  Yukio Kembo ,  Hiroshi Morioka ,  Hidetoshi Nishiyama ,  Hideaki Doi ,  Masataka Shiba ,  Yoshiharu Shigyo ,  Kazuhiko Matsuoka ,  Kenji Watanabe ,  Yoshimasa Ohshima ,  Fumiaki Endo ,  Yuzo Taniguchi

发明人： Minori Noguchi ,  Yukio Kembo ,  Hiroshi Morioka ,  Hidetoshi Nishiyama ,  Hideaki Doi ,  Masataka Shiba ,  Yoshiharu Shigyo ,  Kazuhiko Matsuoka ,  Kenji Watanabe ,  Yoshimasa Ohshima ,  Fumiaki Endo ,  Yuzo Taniguchi

IPC分类号： G01N2189

CPC分类号： H01L21/67288 ,  G01N21/9501 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/681

摘要： A semiconductor device producing method and a semiconductor device producing system employs a processing apparatus provided with a dust particle detecting apparatus. The dust particle detecting apparatus measures the condition of adhesion of dust particles adhering to a work at least before or after processing the work, manages the condition of incremental adhesion of dust particles to the work resulting from processing for each lot of works or for each work on the basis of the measured condition of adhesion of dust particles measured before or after processing the work, and determines the time when the processing apparatus is to be cleaned or the cycle of cleaning the processing apparatus on the basis of the managed condition of adhesion of dust particles.

摘要翻译： 半导体器件制造方法和半导体器件制造系统采用具有灰尘粒子检测装置的处理装置。 尘埃粒子检测装置至少在工件加工之前或之后测量附着在工件上的灰尘颗粒的附着状态，管理灰尘颗粒对于每批工件或每个工件的加工产生的增加粘附的条件 基于在处理工件之前或之后测量的粉尘颗粒的粘附测量条件，并根据管理的粘附条件确定处理设备要清洁的时间或清洁处理设备的循环 灰尘颗粒。

公开(公告)号：US20050264797A1

公开(公告)日：2005-12-01

申请号：US11136664

申请日：2005-05-25

申请人： Hiroyuki Nakano ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Akira Hamamatsu ,  Hisafumi Iwata ,  Tetsuya Watanabe ,  Takahiro Jingu ,  Hideki Fukushima

发明人： Hiroyuki Nakano ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Akira Hamamatsu ,  Hisafumi Iwata ,  Tetsuya Watanabe ,  Takahiro Jingu ,  Hideki Fukushima

IPC分类号： G01B11/30 ,  G01N21/88 ,  G01N21/89 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/956 ,  G01N2021/8905 ,  G01N2021/9513

摘要： The present invention relates to a defect detection apparatus and method by which foreign particles and circuit pattern defects can be detected in distinction from the edge roughness of wiring on the substrate. The defect detection apparatus comprises an irradiation optical system includes: a beam expander; an optical member group formed by stacking multiple plate-like optical members each having a different optical path length at least in a beam-converging direction in order to admit the laser beam with the beam diameter extended by the beam expander and emit multiple slit-like beams each spatially reduced in coherence in the beam-converging direction; and beam-converging optical system by which the multiple slit-like beams each emitted from the optical member group is converged into a slit-like beam in the beam-converging direction and the slit-like beam is irradiated from an oblique direction onto the surface of the subject.

摘要翻译： 本发明涉及一种缺陷检测装置和方法，通过该缺陷检测装置和方法可以检测与基板上的布线的边缘粗糙度相关的异物和电路图案缺陷。 缺陷检测装置包括：照射光学系统，包括：扩束器; 光学构件组，其通过至少在束会聚方向上堆叠具有不同光程长度的多个板状光学构件而形成，以便允许具有由扩束器延伸的光束直径的激光束并且发射多个狭缝状 光束在束收敛方向上的相干性在空间上减小; 以及束光聚光光学系统，其中从光学构件组发射的多个狭缝状光束在束会聚方向上会聚到狭缝状光束中，并且狭缝状光束从倾斜方向照射到表面上 的主题。

公开(公告)号：US07177020B2

公开(公告)日：2007-02-13

申请号：US11128352

申请日：2005-05-13

申请人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

发明人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC分类号： G01J3/00

CPC分类号： H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

摘要： An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction on a surface of a specimen than in a transverse direction, a table unit which mounts the specimen and which is movable, a detection optical unit which detects light from the specimen illuminated by the laser with an image sensor while the table is moving, and a signal processor. The signal processor processes a signal outputted from the image sensor of the detection optical unit and converted to a digital signal and extracts defects of the specimen by comparing the converted digital signal with a reference digital signal. A display unit displays information of defects extracted by the signal processor.

摘要翻译： 用于检测试样缺陷的装置和方法包括照射光学单元，其将激光倾斜地突出到在一个方向上在一个方向上比在横向方向上更长的区域，安装样本的台单元， 可移动的检测光学单元，检测光学单元，其在桌子移动时利用图像传感器检测由激光照射的样本的光，以及信号处理器。 信号处理器处理从检测光学单元的图像传感器输出的信号并转换为数字信号，并通过将转换的数字信号与参考数字信号进行比较来提取样本的缺陷。 显示单元显示由信号处理器提取的缺陷的信息。

公开(公告)号：US5463459A

公开(公告)日：1995-10-31

申请号：US46720

申请日：1993-04-16

申请人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

发明人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC分类号： G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68 ,  G01N21/89 ,  G02B27/46 ,  G06F15/46

CPC分类号： H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01R31/308 ,  H01J37/00 ,  H01L21/67253 ,  H01L21/67288 ,  G01N2021/8822 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L22/12

摘要： A defect detecting apparatus including an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by the illumination system; a spatial filter disposed intermediate the focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a detector for detecting the light image formed by the focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through the spatial filter, out of signals detected by the detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by the detector, as well as a method applied to the said apparatus.

摘要翻译： 一种缺陷检测装置，包括用于将平面波的光线线性地发射到具有不同间距的重复图案的基板的照明系统; 聚焦光学系统，用于聚焦由照明系统照射的从基板反射的光图像; 设置在聚焦光学系统之间的空间滤光器，以便屏蔽来自基板上的小间距的重复图案的衍射光; 用于检测由聚焦光学系统形成的光图像的检测器; 擦除装置，用于根据由检测器检测到的信号，比较和擦除基于大间距的重复图案并通过空间滤波器获得的信号; 以及缺陷检测装置，用于根据由检测器检测的信号检测基板上的缺陷，以及应用于所述装置的方法。

公开(公告)号：US20050206887A1

公开(公告)日：2005-09-22

申请号：US11128352

申请日：2005-05-13

申请人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

发明人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC分类号： G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68

CPC分类号： H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

摘要： An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction on a surface of a specimen than in a transverse direction, a table unit which mounts the specimen and which is movable, a detection optical unit which detects light from the specimen illuminated by the laser with an image sensor while the table is moving, and a signal processor. The signal processor processes a signal outputted from the image sensor of the detection optical unit and converted to a digital signal and extracts defects of the specimen by comparing the converted digital signal with a reference digital signal. A display unit displays information of defects extracted by the signal processor.

摘要翻译： 用于检测试样缺陷的装置和方法包括照射光学单元，其将激光倾斜地突出到在一个方向上在一个方向上比在横向方向上更长的区域，安装样本的台单元， 可移动的检测光学单元，检测光学单元，其在桌子移动时利用图像传感器检测由激光照射的样本的光，以及信号处理器。 信号处理器处理从检测光学单元的图像传感器输出的信号并转换为数字信号，并通过将转换的数字信号与参考数字信号进行比较来提取样本的缺陷。 显示单元显示由信号处理器提取的缺陷的信息。

公开(公告)号：US06894773B2

公开(公告)日：2005-05-17

申请号：US09805188

申请日：2001-03-14

申请人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

发明人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC分类号： G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68

CPC分类号： H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

摘要： A processing method for semiconductor devices in a semiconductor fabrication line includes processing a substrate in a first processing apparatus, transferring the substrate processed in the first processing apparatus to a detecting apparatus without removal of the substrate from the semiconductor fabrication line while continuing fabrication of the semiconductor devices, detecting foreign particle defects on the substrate transferred to the detecting apparatus, and determining a foreign particle generation condition of the processing apparatus based on a data from the detecting.

摘要翻译： 半导体制造线中的半导体器件的处理方法包括在第一处理设备中处理衬底，将在第一处理设备中处理的衬底转移到检测设备，而不从半导体制造线移除衬底，同时继续制造半导体 检测转移到检测装置的基板上的异物缺陷，以及根据来自检测的数据确定处理装置的异物生成条件。

公开(公告)号：US08289507B2

公开(公告)日：2012-10-16

申请号：US13118004

申请日：2011-05-27

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

公开(公告)号：US07952700B2

公开(公告)日：2011-05-31

申请号：US12907895

申请日：2010-10-19

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。