摘要:
Photonic Band Gap (PBG) structures are utilized in microwave components as filters to suppress unwanted signals because they have the ability to produce a bandstop effect at certain frequency range depending on the structural dimensions. The unique property of PBG structures is due to the periodic change of the dielectric permittivity so interferences are created with the traveling electromagnetic waves. Such periodic arrangement could exist either inside of the dielectric substrate or in the ground plane of a microstrip transmission line structure. This invention provides tunable or switchable planar PBG structures, which contains lattice pattern of periodic perforations inside of the ground plane. The tuning or switching of the bandstop characteristics is achieved by depositing a conducting island surrounded by a layer of controllable thin film with variable conductivities. The controllable thin film layer could be photoconductive or temperature sensitive that allows change in its conductivity to occur by means of light illumination or temperature variation. Instead of depositing the controllable thin film with variable conductivity, freestanding thin film such as MEMS structures can also be utilized as the medium between the conducting islands and the ground plane. According to this invention, bandstop characteristics of the planar PBG structure are switched off when the controllable thin film is conductive or the freestanding thin film is in contact with the conducting islands and the ground plane. Meanwhile the bandstop characteristics are switched on when the controllable thin film is resistive or the freestanding thin film is not in contact with the conducting islands. At the end, switching uniplanar-compact PBG (UC-PBG) structures with photoconductive or temperature sensitive material, which is deposited inside of the gaps located in the ground plane, is also described.
摘要:
Methods for wavelength determination of a monochromatic beam are described. The methods involve a detector unit containing at least one variable filter and at least one pair of photo detectors. The detectors have photo sensitive regions with their areas varying with the position in one direction. The wavelength for maximum transmission of the variable filter varies in the same direction. By comparing the photo current values from the two detectors, wavelength of the incident beam is determined. Methods to construct wavelength discrimination junction photo detector pair and double barrier photo detector pair are also given.
摘要:
Methods for wavelength determination of a monochromatic beam are described. The methods involve a detector unit containing at least one variable filter and at least one pair of photo detectors. The detectors have photo sensitive regions with their areas varying with the position in one direction. The wavelength for maximum transmission of the variable filter varies in the same direction. By comparing the photo current values from the two detectors, wavelength of the incident beam is determined. Methods to construct wavelength discrimination junction photo detector pair and double barrier photo detector pair are also given.
摘要:
The present invention describes a method to detect leaks in a roof or leaks in basement walls or floors of a building. The detection is achieved by placing a two wire detector in the region to be monitored and measuring the current with a voltage applied across the two wires. The location of the leak is determined by placing several wire detector pairs in a mesh fashion and then scanning the leakage current through each wire pair. A complete detection and scanning system is also described.
摘要:
A method for fabricating a thin film field effect transistor is described in this invention. The active layer of the thin film transistor (TFT) is formed by a low cost chemical bath deposition method. The fabrication procedure includes deposition of a metal layer on an insulating substrate, patterning of the metal layer to form a metal gate, formation of the di-electric layer, deposition of the active layer and formation of source and drain contacts.
摘要:
Methods for wavelength determination of a monochromatic light beam are described. The methods involve a detector unit containing at least one pair of photo detectors. One of the detectors in each detector pair is covered with a variable attenuator and the other is not covered by the variable attenuator. The optical transmission coefficient of the variable attenuator is a monotonic function of wavelength. Under illumination of a monochromatic light, the photocurrents produced in the detectors with and without the variable attenuator are compared. The relative values of the photocurrents are used to determine the wavelength of the monochromatic light.
摘要:
Methods of forming a field emission device with self-aligned gate structure, comprising a substrate on which at least one wedge or tip electrode and one accelerating or gate electrode are provided. The only photolithographic step involved is to pattern an integrated gate electrode opening on high quality, thermally grown oxide which can withstand a strong electric field. The formation of the emissive electrode by etching starts at the edge of the integrated gate electrode opening defined by the oxide material layer. As a result, the distance between the emissive electrode and the gate electrode is minimum. Simple wet chemical etching may be used to form the emissive electrode.