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89 条记录 (耗时 0.031 秒)

    Method of manufacturing a semiconductor device having a polycide structure
    51.
    发明授权
    Method of manufacturing a semiconductor device having a polycide structure 失效
    具有多晶硅结构的半导体器件的制造方法

    公开(公告)号：US5332692A

    公开(公告)日：1994-07-26

    申请号：US47632

    申请日：1993-04-19

    申请人： Kenji Saitoh

    发明人： Kenji Saitoh

    IPC分类号： H01L21/203 ,  H01L21/28 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/52 ,  H01L21/283

    CPC分类号： H01L21/76838 ,  H01L21/76889 ,  Y10S148/017 ,  Y10S148/019

    摘要： A sputtering technique is conducted within a sputtering device the inside of which is in the state of vacuum, whereby a second polycrystal silicon film (7) is deposited on a first polycrystal silicon film (3) on the surface of which a natural oxide film (4) exists. The inside of the sputtering device is maintained to be in the state of vacuum after the second polycrystal silicon film (7) is formed. With the same sputtering device, a metal silicide film (5) is deposited on the second polycrystal film under vacuum. When a silicon oxide film is formed on the silicide film, silicons to be oxidized are uniformly supplied through the silicide film. Therefore, the polycrystal silicon film and the silicide film are not separated from each other at the boundary face between them. Further, product yield rate is improved since it is not necessary to perform sputter etching.

    摘要翻译： 溅射技术在其内部处于真空状态的溅射装置内进行，由此第二多晶硅膜（7）沉积在第一多晶硅膜（3）上，该第一多晶硅膜（3）的表面上具有天然氧化物膜（ 4）存在。 在第二多晶硅膜（7）形成之后，溅射装置的内部保持在真空状态。 使用相同的溅射装置，在真空下在第二多晶膜上沉积金属硅化物膜（5）。 当在硅化物膜上形成氧化硅膜时，通过硅化物膜均匀地供给被氧化的硅。 因此，多晶硅膜和硅化物膜在它们之间的边界面处不分离。 此外，由于不需要进行溅射蚀刻，产品产率提高。

    Corner cube member illumination device and inspection system having the same
    54.
    发明授权
    Corner cube member illumination device and inspection system having the same 失效
    角立方会员照明装置及其检查系统

    公开(公告)号：US07988309B2

    公开(公告)日：2011-08-02

    申请号：US11863649

    申请日：2007-09-28

    申请人： Kenji Saitoh ,  Hiroshi Yoshikawa

    发明人： Kenji Saitoh ,  Hiroshi Yoshikawa

    IPC分类号： G03B15/02 ,  G03B15/06 ,  F21V7/05

    CPC分类号： G03B15/02 ,  G01N21/8806

    摘要： An illumination device has a light source that supplies illumination light to an object to be illuminated and also has a corner cube member disposed at the opposite side of the light source with respect to the object to be illuminated. With this feature, efficient illumination of the object to be illuminated is achieved without need for high precision in positioning.

    摘要翻译： 照明装置具有将照明光提供给被照射物体的光源，并且还具有相对于被照射物体设置在光源的相反侧的角部立方体部件。 利用该特征，可以实现对要被照明的物体的高效照明，而不需要高精度的定位。

    Illuminating apparatus and surface inspection system using illuminating apparatus
    55.
    发明授权
    Illuminating apparatus and surface inspection system using illuminating apparatus 有权
    照明装置和使用照明装置的表面检查系统

    公开(公告)号：US07965917B2

    公开(公告)日：2011-06-21

    申请号：US11764555

    申请日：2007-06-18

    申请人： Hiroshi Yoshikawa ,  Kenji Saitoh

    发明人： Hiroshi Yoshikawa ,  Kenji Saitoh

    IPC分类号： G02B6/10 ,  G01N21/00 ,  F21S6/00 ,  F21V7/00

    CPC分类号： G02B17/086 ,  G01N21/47

    摘要： At least one exemplary embodiment is directed to an illuminating apparatus, configured to uniformly illuminate a surface of an object, and includes a light-guiding member configured to guide light emitted from a source to a surface to be illuminated, and a reflecting member disposed between the light-guiding member and the surface to be illuminated. The reflecting member includes a pair of reflection surfaces disposed so as to face each other in a long side direction of the surface to be illuminated, and reflects light emitted from the light-guiding member in directions having directional components parallel to a short side direction of the surface to be illuminated toward the surface to be illuminated.

    摘要翻译： 至少一个示例性实施例涉及一种被配置为均匀地照射物体的表面的照明装置，并且包括导光构件，其被配置为将从源发射的光引导到待照亮的表面，以及反射构件， 导光构件和被照射的表面。 反射构件包括一对反射面，其被布置为在被照射表面的长边方向上彼此面对，并且将从导光构件发射的光沿具有平行于短边方向的方向分量的方向反射 要照亮的表面被照亮的表面。

    Wireless imaging apparatus and its control method
    56.
    发明授权
    Wireless imaging apparatus and its control method 有权
    无线成像设备及其控制方法

    公开(公告)号：US07508417B2

    公开(公告)日：2009-03-24

    申请号：US10677623

    申请日：2003-10-02

    申请人： Naoki Nishimura ,  Kenji Saitoh ,  Masaaki Shibata

    发明人： Naoki Nishimura ,  Kenji Saitoh ,  Masaaki Shibata

    IPC分类号： H04N9/04 ,  H04N5/225 ,  H04N5/228 ,  G03B17/24

    CPC分类号： H04N5/232 ,  H01Q1/22 ,  H04N1/00103 ,  H04N5/2251 ,  H04N5/2254

    摘要： To realize a wireless imaging apparatus having excellent sensitivity to an environmental change, a wireless imaging device has an imaging unit with a function of imaging a subject and a communication unit with a wireless communication function. The imaging unit has, at least, an optical lens, an aperture 2 to limit incident light from the optical lens, an optical sensor 4 to convert the incident light passed through the aperture 2 into an electric signal, and an antenna for wireless communication, integrally formed with the aperture.

    摘要翻译： 为了实现对环境变化具有优异灵敏度的无线成像设备，无线成像设备具有具有对被摄体成像的功能的成像单元和具有无线通信功能的通信单元。 成像单元至少具有光学透镜，用于限制来自光学透镜的入射光的光圈2，将通过孔2的入射光转换为电信号的光学传感器4和用于无线通信的天线， 与孔一体形成。

    Mask and manufacturing method thereof and exposure method
    57.
    发明授权
    Mask and manufacturing method thereof and exposure method 有权
    掩模及其制造方法及曝光方法

    公开(公告)号：US07399558B2

    公开(公告)日：2008-07-15

    申请号：US10896538

    申请日：2004-07-22

    申请人： Kenji Yamazoe ,  Kenji Saitoh

    发明人： Kenji Yamazoe ,  Kenji Saitoh

    IPC分类号： G03F1/00 ,  G03C5/00

    CPC分类号： G03F1/36

    摘要： A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are arrayed is illuminated, and the light which passed through the mask onto a member to be exposed is projected via a projection optical system, said method comprising a selecting step for selecting one of the following three supplementary patterns, a first supplementary pattern wherein said supplementary pattern is disposed at a position where a line extending in the vertical direction as to the pitch direction from a certain desired pattern hole of said desired pattern, and a line connecting the supplementary pattern hole closest to said certain desired pattern hole in the vertical direction with said certain desired pattern hole, intersect at an angle of 0°, a second supplementary pattern wherein said angle is 0° or more but less than 45°, and a third supplementary pattern wherein said supplementary pattern supplementary pattern is disposed at a position where said is disposed at a position where said angle is 45°.

    摘要翻译： 照射适用于曝光方法的掩模制造方法，其中排列有期望图案和具有小于期望图案的图案的辅助图案的掩模，并且将通过掩模的光穿过待暴露的构件是 通过投影光学系统投影，所述方法包括选择步骤，用于选择以下三个补充图案中的一个：第一补充图案，其中所述辅助图案设置在从垂直方向延伸的关于俯仰方向的线的位置 所述期望图案的特定期望图形孔和将所述特定所需图案孔最靠近所述特定期望图案孔的所述图案孔与所述特定所需图案孔连接的线以0°的角度相交，第二辅助图案，其中所述 辅助图案设置在所述角度为0°以上且小于45°的位置 °和第三辅助图案，其中所述辅助图案设置在所述角度为45°的位置。

    Exposure method and apparatus
    60.
    发明申请
    Exposure method and apparatus 失效

    公开(公告)号：US20060033900A1

    公开(公告)日：2006-02-16

    申请号：US11255559

    申请日：2005-10-21

    申请人： Kenji Saitoh ,  Miyoko Kawashima

    发明人： Kenji Saitoh ,  Miyoko Kawashima

    IPC分类号： G03C5/00 ,  G03B27/42 ,  G03F1/00

    CPC分类号： G03F1/30 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70283 ,  G03F7/70433

    摘要： There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy pattern's line width, illuminating the phase shift mask by using illumination light having a peak near or on an optical axis in an intensity distribution to transfer the desired pattern onto the exposure plane by projecting light having passed through the phase shift mask onto the exposure plane.