公开(公告)号：US08377764B2

公开(公告)日：2013-02-19

申请号：US13459122

申请日：2012-04-28

申请人： Shunpei Yamazaki ,  Hideaki Kuwabara ,  Masakazu Murakami

发明人： Shunpei Yamazaki ,  Hideaki Kuwabara ,  Masakazu Murakami

IPC分类号： H01L21/84

CPC分类号： H01L51/56 ,  C23C14/046 ,  C23C14/12 ,  C23C14/246 ,  C23C14/564 ,  H01L27/3244 ,  H01L33/44

摘要： The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.

摘要翻译： 本发明提供一种可以更有效地使用EL材料的成膜系统的气相沉积方法和气相沉积系统，并且形成具有高生产率的均匀性优异的EL材料。 根据本发明，在成膜室内部，将密封蒸发材料的多个容器以一定间距移动到基板上的矩形状的蒸发源保持器和蒸发材料蒸镀在基板上。 此外，蒸发源保持器的纵向方向可以在基板的一侧倾斜，同时蒸发源保持器被移动。 此外，优选的是，蒸镀源夹持器在气相沉积期间的移动方向与形成TFT的激光束的扫描方向不同。

公开(公告)号：US08237164B2

公开(公告)日：2012-08-07

申请号：US12759999

申请日：2010-04-14

申请人： Toru Takayama ,  Junya Maruyama ,  Yumiko Ohno ,  Masakazu Murakami ,  Toshiji Hamatani ,  Hideaki Kuwabara ,  Shunpei Yamazaki

发明人： Toru Takayama ,  Junya Maruyama ,  Yumiko Ohno ,  Masakazu Murakami ,  Toshiji Hamatani ,  Hideaki Kuwabara ,  Shunpei Yamazaki

IPC分类号： H01L29/772

CPC分类号： H01L27/3276 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1266 ,  H01L27/14634 ,  H01L27/14643 ,  H01L27/14683 ,  H01L27/3272 ,  H01L29/66757 ,  H01L29/78603 ,  H01L31/105 ,  H01L51/0024 ,  H01L51/003 ,  H01L51/5212 ,  H01L51/5253 ,  H01L2221/68368

摘要： (OBJECT) The object is to provide a lightened semiconductor device and a manufacturing method thereof by pasting a layer to be peeled to various base materials.(MEANS FOR SOLVING THE PROBLEM) In the present invention, a layer to be peeled is formed on a substrate, then a seal substrate provided with an etching stopper film is pasted with a binding material on the layer to be peeled, followed by removing only the seal substrate by etching or polishing. The remaining etching stopper film is functioned as a blocking film. In addition, a magnet sheet may be pasted as a pasting member.

摘要翻译： （目的）本发明的目的是提供一种减轻半导体器件及其制造方法，该方法是将待剥离的层粘贴到各种基材上。 （解决问题的手段）在本发明中，在基板上形成被剥离层，然后将具有蚀刻阻挡膜的密封基板上的粘合材料粘贴在被剥离层上，然后仅除去 密封衬底通过蚀刻或抛光。 剩余的蚀刻阻挡膜用作阻挡膜。 此外，可以将磁片作为粘贴部件粘贴。

公开(公告)号：US08206507B2

公开(公告)日：2012-06-26

申请号：US12487843

申请日：2009-06-19

申请人： Shunpei Yamazaki ,  Masakazu Murakami

发明人： Shunpei Yamazaki ,  Masakazu Murakami

IPC分类号： C23C16/00

CPC分类号： C23C14/00 ,  C23C14/042 ,  C23C14/12 ,  C23C14/24 ,  C23C14/243 ,  C23C14/246 ,  C23C14/505 ,  C23C14/564 ,  C23C14/568 ,  H01L51/001 ,  H05B33/10

摘要： The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.

摘要翻译： 本发明提供一种蒸发装置，其能够提高蒸发材料的效率，沉积膜的均匀性和蒸发过程的通过量。 公开了一种蒸发源保持器，其安装在蒸发室中并构造成保持蒸发材料，以及移动机构，其构造成在蒸发材料蒸发期间移动蒸发源保持器。 蒸发装置的特征还在于蒸发源支架上的快门，快门上的过滤器和围绕过滤器的加热器。

公开(公告)号：US20110130516A1

公开(公告)日：2011-06-02

申请号：US13055280

申请日：2009-07-23

申请人： Masakazu Murakami ,  Tomoyuki Ando ,  Seiichi Kobayashi

发明人： Masakazu Murakami ,  Tomoyuki Ando ,  Seiichi Kobayashi

IPC分类号： C08G75/08 ,  C07F9/00 ,  C08L81/02

CPC分类号： C08G75/08 ,  C07F9/005 ,  C07F9/90 ,  C08G75/06

摘要： Disclosed is a compound represented by the following general formula (1), wherein, in the formula, M1 represents Sb or Bi; X1 and X2 each independently represent a sulfur atom or an oxygen atom; R1 represents a divalent organic group; Y1 represents a monovalent inorganic or organic group; a represents a number of 1 or 2; b represents a number of 0 or an integer of not less than 1; c represents an integer of not less than 1 and not more than d; d represents a valence of M1; when d−c is not less than 2, a plurality of Y1s each independently represent a monovalent inorganic or organic group and may be bonded to each other to form an M1-containing ring; and e represents a number of 0 or an integer of not less than 1.

摘要翻译： 公开了由以下通式（1）表示的化合物，其中，在式中，M1表示Sb或Bi; X1和X2各自独立地表示硫原子或氧原子; R1表示二价有机基团; Y1表示一价无机或有机基团; a代表1或2的数字; b表示0或不小于1的整数; c表示不小于1且不大于d的整数; d表示M1的化合价; 当d-c不小于2时，多个Y1各自独立地表示一价无机或有机基团，并且可以彼此键合以形成含有M1的环; e表示0或1以上的整数。

公开(公告)号：US07943443B2

公开(公告)日：2011-05-17

申请号：US11876968

申请日：2007-10-23

申请人： Shunpei Yamazaki ,  Hideaki Kuwabara ,  Masakazu Murakami

发明人： Shunpei Yamazaki ,  Hideaki Kuwabara ,  Masakazu Murakami

IPC分类号： H01L21/84

CPC分类号： H01L51/56 ,  C23C14/046 ,  C23C14/12 ,  C23C14/246 ,  C23C14/564 ,  H01L27/3244 ,  H01L33/44

摘要： The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.

摘要翻译： 本发明提供一种可以更有效地使用EL材料的成膜系统的气相沉积方法和气相沉积系统，并且形成具有高生产率的均匀性优异的EL材料。 根据本发明，在成膜室内部，将密封蒸发材料的多个容器以一定间距移动到基板上的矩形状的蒸发源保持器和蒸发材料蒸镀在基板上。 此外，蒸发源保持器的纵向方向可以在基板的一侧倾斜，同时蒸发源保持器被移动。 此外，优选的是，蒸镀源夹持器在气相沉积期间的移动方向与形成TFT的激光束的扫描方向不同。

公开(公告)号：US20100230664A1

公开(公告)日：2010-09-16

申请号：US12724475

申请日：2010-03-16

申请人： Shunpei Yamazaki ,  Masaaki Hiroki ,  Masakazu Murakami ,  Hideaki Kuwabara

发明人： Shunpei Yamazaki ,  Masaaki Hiroki ,  Masakazu Murakami ,  Hideaki Kuwabara

IPC分类号： H01L51/52

CPC分类号： H01L27/3248 ,  H01L27/3211 ,  H01L27/3216 ,  H01L27/322 ,  H01L27/3246 ,  H01L27/3272 ,  H01L27/3276 ,  H01L27/3279 ,  H01L51/5212 ,  H01L51/5228 ,  H01L51/5253 ,  H01L2251/5315 ,  Y10S257/929

摘要： To provide a light emitting device high in reliability with a pixel portion having high definition with a large screen. According to a light emitting device of the present invention, on an insulator (24) provided between pixel electrodes, an auxiliary electrode (21) made of a metal film is formed, whereby a conductive layer (20) made of a transparent conductive film in contact with the auxiliary electrode can be made low in resistance and thin. Also, the auxiliary electrode (21) is used to achieve connection with an electrode on a lower layer, whereby the electrode can be led out with the transparent conductive film formed on an EL layer. Further, a protective film (32) made of a film containing hydrogen and a silicon nitride film which are laminated is formed, whereby high reliability can be achieved.

摘要翻译： 通过大屏幕提供具有高清晰度的像素部分的可靠性高的发光装置。 根据本发明的发光器件，在设置在像素电极之间的绝缘体（24）上形成由金属膜构成的辅助电极（21），由此形成由透明导电膜形成的导电层（20） 与辅助电极接触可以使电阻较小，薄。 此外，辅助电极（21）用于实现与下层电极的连接，由此可以用形成在EL层上的透明导电膜将电极引出。 此外，形成由层压的含有氢的膜和氮化硅膜构成的保护膜（32），由此可以实现高可靠性。

公开(公告)号：US07742186B2

公开(公告)日：2010-06-22

申请号：US11366586

申请日：2006-03-03

申请人： Masakazu Murakami ,  Yoichi Kawabuchi ,  Yoshikazu Ikenoue

发明人： Masakazu Murakami ,  Yoichi Kawabuchi ,  Yoshikazu Ikenoue

IPC分类号： G06F15/00 ,  G06F3/12 ,  G06K1/00

CPC分类号： H04N1/3255 ,  G03G15/5075 ,  G03G2215/00126 ,  H04N1/00954 ,  H04N1/32502

摘要： An image forming apparatus is provided with an attribution information obtaining portion for obtaining application module list information on a function that resides in another image forming apparatus when the image forming apparatus is connected to the other image forming apparatus via a communication line, an unequipped function determining portion for determining whether or not the other image forming apparatus has a predetermined function that resides in the image forming apparatus based on the obtained application module list information of the other image forming apparatus, and a function expansion commanding portion for instructing the other image forming apparatus to perform a function expansion process to provide the other image forming apparatus with the predetermined function when the other image forming apparatus does not have the predetermined function.

摘要翻译： 图像形成装置具有归属信息获取部分，用于当图像形成装置经由通信线路连接到另一图像形成装置时，获取关于位于另一图像形成装置中的功能的应用模块列表信息，未装备的功能确定 基于所获得的另一图像形成装置的应用模块列表信息来确定另一图像形成装置是否具有位于图像形成装置中的预定功能的部分，以及用于指示另一图像形成装置的功能扩展命令部 以执行功能扩展处理以在另一图像形成装置不具有预定功能时提供具有预定功能的另一图像形成装置。

公开(公告)号：US07741642B2

公开(公告)日：2010-06-22

申请号：US11702058

申请日：2007-02-05

申请人： Toru Takayama ,  Junya Maruyama ,  Yumiko Ohno ,  Masakazu Murakami ,  Toshiji Hamatani ,  Hideaki Kuwabara ,  Shunpei Yamazaki

发明人： Toru Takayama ,  Junya Maruyama ,  Yumiko Ohno ,  Masakazu Murakami ,  Toshiji Hamatani ,  Hideaki Kuwabara ,  Shunpei Yamazaki

IPC分类号： H01L29/04 ,  H01L29/15

CPC分类号： H01L27/3276 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1266 ,  H01L27/14634 ,  H01L27/14643 ,  H01L27/14683 ,  H01L27/3272 ,  H01L29/66757 ,  H01L29/78603 ,  H01L31/105 ,  H01L51/0024 ,  H01L51/003 ,  H01L51/5212 ,  H01L51/5253 ,  H01L2221/68368

摘要： The object is to provide a lightened semiconductor device and a manufacturing method thereof by pasting a layer to be peeled to various base materials.In the present invention, a layer to be peeled is formed on a substrate, then a seal substrate provided with an etching stopper film is pasted with a binding material on the layer to be peeled, followed by removing only the seal substrate by etching or polishing. The remaining etching stopper film is functioned as a blocking film. In addition, a magnet sheet may be pasted as a pasting member.

摘要翻译： 本发明的目的是通过将要剥离的层粘贴到各种基材上来提供照明的半导体器件及其制造方法。 在本发明中，在基板上形成被剥离层，然后将具有蚀刻阻挡膜的密封基板用粘合材料粘贴在被剥离层上，然后通过蚀刻或抛光仅去除密封基板 。 剩余的蚀刻阻挡膜用作阻挡膜。 此外，可以将磁片作为粘贴部件粘贴。

公开(公告)号：US20090124062A1

公开(公告)日：2009-05-14

申请号：US12259748

申请日：2008-10-28

申请人： Shunpei Yamazaki ,  Masakazu Murakami ,  Toru Takayama ,  Junya Maruyama

发明人： Shunpei Yamazaki ,  Masakazu Murakami ,  Toru Takayama ,  Junya Maruyama

IPC分类号： H01L21/50

CPC分类号： H01L27/1218 ,  G02F1/133305 ,  G02F1/1339 ,  G02F1/13394 ,  G02F1/1341 ,  G02F1/1368 ,  H01L21/2007 ,  H01L21/67092 ,  H01L21/6835 ,  H01L21/76251 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1259 ,  H01L27/1262 ,  H01L27/1266 ,  H01L27/156 ,  H01L27/3244 ,  H01L27/3248 ,  H01L27/3262 ,  H01L27/3276 ,  H01L29/66757 ,  H01L29/78603 ,  H01L51/0024 ,  H01L51/003 ,  H01L51/0097 ,  H01L51/56 ,  H01L2221/6835 ,  H01L2221/68363 ,  H01L2227/323 ,  H01L2227/326 ,  H01L2251/5338 ,  H01L2924/30105 ,  H01L2924/3025 ,  Y02E10/549

摘要： The object of the invention is to provide a method for fabricating a semiconductor device having a peeled layer bonded to a base material with curvature. Particularly, the object is to provide a method for fabricating a display with curvature, more specifically, a light emitting device having an OLED bonded to a base material with curvature. An external force is applied to a support originally having curvature and elasticity, and the support is bonded to a peeled layer formed over a substrate. Then, when the substrate is peeled, the support returns into the original shape by the restoring force, and the peeled layer as well is curved along the shape of the support. Finally, a transfer object originally having curvature is bonded to the peeled layer, and then a device with a desired curvature is completed.

摘要翻译： 本发明的目的是提供一种用于制造半导体器件的方法，该半导体器件具有以曲率结合到基底材料上的剥离层。 特别地，本发明的目的是提供一种用于制造具有曲率的显示器的方法，更具体地说，提供一种发光器件，该发光器件具有键合到具有曲率的基底材料的OLED。 对原来具有曲率和弹性的支撑件施加外力，并且将支撑件结合到形成在基板上的剥离层。 然后，当基板被剥离时，支撑件通过恢复力返回到原始形状，并且剥离层也沿着支撑件的形状弯曲。 最后，原来具有曲率的转印体被粘合到剥离层上，然后完成具有所需曲率的装置。

公开(公告)号：US20080246993A1

公开(公告)日：2008-10-09

申请号：US12073444

申请日：2008-03-05

申请人： Masakazu Murakami ,  Atsushi Ohshima ,  Tomonari Yoshimura ,  Masami Yamada ,  Takahiro Ikeda

发明人： Masakazu Murakami ,  Atsushi Ohshima ,  Tomonari Yoshimura ,  Masami Yamada ,  Takahiro Ikeda

IPC分类号： G06K15/00

CPC分类号： H04N1/00068 ,  G06F3/1207 ,  G06F3/1259 ,  G06F3/1273 ,  G06F3/1288 ,  H04N1/32122 ,  H04N2201/0094 ,  H04N2201/3202 ,  H04N2201/3205 ,  H04N2201/3212 ,  H04N2201/3216 ,  H04N2201/3223 ,  H04N2201/3273 ,  H04N2201/3274

摘要： Upon reception of a job, a control unit of an image processing apparatus executes processing for judging whether any cancellation factor exists. If there is no cancellation factor, the control unit outputs pages relating to the job, stores page information thereof, and updates execution history information after outputting all the pages. If there is any cancellation factor, the control unit performs only preparation for output of the pages, stores page information obtained through the preparation, and updates cancellation history information after storing the page information of all the pages. A message as a result of evaluation of the cancellation history information is displayed on an operation panel. The message prompts an administrator to change management condition as needed.

摘要翻译： 在接收到作业时，图像处理装置的控制单元执行用于判断是否存在任何取消因子的处理。 如果没有消除因素，则控制单元输出与作业相关的页面，存储其页面信息，并且在输出所有页面之后更新执行历史信息。 如果存在任何取消因素，则控制单元仅执行页面的输出准备，存储通过准备获得的页面信息，并且在存储所有页面的页面信息之后更新取消历史信息。 作为评估取消历史信息的结果的消息被显示在操作面板上。 消息提示管理员根据需要更改管理条件。