Gas supply system equipped with pressure-type flow rate control unit
    52.
    发明授权
    Gas supply system equipped with pressure-type flow rate control unit 有权
    供气系统配有压力式流量控制单元

    公开(公告)号:US06289923B1

    公开(公告)日:2001-09-18

    申请号:US09463514

    申请日:2000-06-02

    IPC分类号: G05D706

    摘要: An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, and to raise the flow rate control accuracy and reliability of facilities. That eliminates non-uniformity of products or semiconductors and raises the production efficiency. The gas supply system equipped with a pressure-type flow rate control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream side pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculation control unit where on the basis of the pressure P1 detected by the pressure detector, the flow rate Qc is calculated with an equation Qc=KP1 (K: constant) and the difference between the flow-rate specifying signal Qs and the calculated flow rate Qc is then input as control signal Qy in the drive for the control valve, thereby regulating the opening of the control valve for adjusting the pressure P1 so that the flow rate of the gas to supply can be controlled.

    摘要翻译: 公开了一种改进的,尺寸较小的低成本的气体供应系统,其配备有例如半导体制造设备中使用的压力式流量控制单元。 提高瞬态流量特性,防止气体开始时气体过冲,提高设备的流量控制精度和可靠性。 这消除了产品或半导体的不均匀性并提高了生产效率。 配置有压力式流量控制单元的气体供给系统被配置为使得在孔口的上游侧的压力保持为比下游侧压力高大约两倍或更多的气体,气体流量被控制以供应气体 通过孔口相关阀进行气体使用过程,所述气体供应系统包括用于接收来自气体供应源的气体的控制阀,设置在控制阀的下游侧的孔附件阀,设置在控制阀之间的压力检测器 所述控制阀和所述节流孔相关阀,设置在所述节流阀相关阀的阀机构的下游侧的孔口和计算控制单元,其中,基于由所述压力检测器检测到的压力P1,流量Qc 用公式Qc = KP1(K:常数)计算,然后输入流量指定信号Qs和计算流量Qc之间的差作为控制信号Qy i n是用于控制阀的驱动器,由此调节用于调节压力P1的控制阀的打开,从而可以控制供给气体的流量。

    Orifice for pressure type flow rate control unit and process for
manufacturing orifice
    53.
    发明授权
    Orifice for pressure type flow rate control unit and process for manufacturing orifice 有权
    用于压力式流量控制单元的孔口和用于制造孔口的工艺

    公开(公告)号:US06158679A

    公开(公告)日:2000-12-12

    申请号:US284372

    申请日:1999-06-16

    IPC分类号: G01F1/40 G05D7/01 A62C31/02

    CPC分类号: G01F1/40 G05D7/0186

    摘要: An orifice for a pressure-type flow rate controller, which can be produced by a simple method at a low cost, that provides a linearity--between the pressure P1 on the upstream side of the orifice and the flow rate--over a wide range of the pressure ratio P2/P1 of the pressure P2 on the downstream side of the orifice to the upstream pressure P1 and that permits adjustment with ease of flow characteristics among a plurality of orifices. The orifice comprises an inlet taper 1 in the shape of a bugle and a short narrowed straight section 2 adjoining the inlet taper 1, both formed by cutting one opening end of a preliminary hole 6 made in an orifice plate D, and further comprises a short inner taper 3 and an enlarged straight section 4 connecting with the taper 3 which are formed by enlarging the preliminary hole 6 at the other opening end, the short inner taper 3 adjoining the narrowed straight section 2 on one side and neighboring the enlarged straight section 4 on the other side.

    摘要翻译: PCT No.PCT / JP98 / 03621 Sec。 371日期1999年6月16日第 102(e)1999年6月16日PCT PCT 1998年8月13日PCT公布。 出版物WO99 /​​ 09324 日期1999年2月25日,一种用于压力式流量控制器的孔口,其可以通过简单的方法以低成本生产,其在孔口上游侧的压力P1和流量 - 在孔的下游侧的压力P2的压力比P2 / P1的宽范围到上游压力P1,并且允许在多个孔中容易地调节流动特性。 孔口包括一个具有插针形状的入口锥形1和邻近入口锥形1的短缩窄直线部分2,两者都是通过切割在孔板D中制成的预备孔6的一个开口端而形成的,还包括一个短 内圆锥体3和与锥体3连接的扩大的直线部分4,其通过在另一个开口端扩大预备孔6而形成,短内锥形件3在一侧邻接变窄的直线部分2并且与扩大的直线部分4相邻 另一方面。

    Corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed
    54.
    发明授权
    Corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed 失效
    用于流体的耐腐蚀金属制传感器和使用传感器的流体供应装置

    公开(公告)号:US07654137B2

    公开(公告)日:2010-02-02

    申请号:US10598290

    申请日:2005-01-13

    IPC分类号: G01F1/68

    摘要: The present invention provides a corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed.More specifically, the corrosion-resistant metal made sensor for fluid is equipped with a corrosion-resistant metal substrate, a mass flow rate sensor part comprising a corrosion resistant metal substrate, a thin film forming a temperature sensor and a heater mounted on the back face side of the fluid contacting surface of the corrosion-resistant metal substrate, and a pressure sensor part comprising a thin film forming a strain sensor element mounted on the back face side of the fluid contacting surface of the corrosion-resistant metal substrate, and the sensor is so constituted that the mass flow rate and pressure of the fluid are measured.

    摘要翻译: 本发明提供了用于流体的耐腐蚀金属制传感器和使用该传感器的流体供应装置。 更具体地说,用于流体的耐腐蚀金属制传感器配备有耐腐蚀金属基板,包含耐腐蚀金属基板的质量流量传感器部件,形成温度传感器的薄膜和安装在背面上的加热器 耐压金属基板的流体接触面的一侧,以及包含形成安装在耐腐蚀金属基板的流体接触面的背面侧的应变传感器元件的薄膜的压力传感器部,以及传感器 如此构成,即测量流体的质量流量和压力。

    Mixed gas supply device
    55.
    发明授权
    Mixed gas supply device 有权
    混合供气装置

    公开(公告)号:US09233347B2

    公开(公告)日:2016-01-12

    申请号:US13520824

    申请日:2010-10-22

    摘要: A mixed gas supply device includes a plurality of gas supply lines arranged in parallel that include flow rate control devices and outlet side switching valves, wherein gas outlets of respective outlet side switching valves communicate with a manifold, and another gas supply line at a position close to a mixed gas outlet of the manifold supplies a low flow rate gas, wherein an outlet side of the flow rate control device and an inlet side of the outlet side switching valve are hermetically connected via an outlet side connecting fitting of the flow rate control device and a mounting table having a gas passage, wherein a small hole portion is provided at a part of a flow passage at the outlet side connecting fitting and/or a flow passage, which makes the outlet side switching valve and a mixed gas flow passage in the manifold communicate with one another.

    摘要翻译: 混合气体供给装置包括并列布置的多个气体供给管线,包括流量控制装置和出口侧切换阀,其中各个出口侧切换阀的气体出口与歧管连通,另一个气体供给管线位于关闭位置 到歧管的混合气体出口供给低流量气体,其中流量控制装置的出口侧和出口侧切换阀的入口侧经由流量控制装置的出口侧连接配件气密地连接 以及具有气体通道的安装台,其中在出口侧连接配件和/或流路的流路的一部分处设置有小孔部,其使出口侧切换阀和混合气体流路成为 歧管彼此通信。

    Flow rate ratio variable type fluid supply apparatus
    56.
    发明授权
    Flow rate ratio variable type fluid supply apparatus 有权
    流量比可变型流体供给装置

    公开(公告)号:US08555920B2

    公开(公告)日:2013-10-15

    申请号:US12303841

    申请日:2007-06-13

    IPC分类号: F17D1/04

    摘要: A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.

    摘要翻译: 流量比可变型流体供给装置包括:流量控制系统,其将具有规定流量Q1 / Q0的第一分流管路和第二分流管路的流量Q的气体供给到气室, 并且具有开口面积S1的第一孔口安装在第一分流通道上,第二分流通道连接到并联连接的多个支管通道,开口区域安装在分支通道上的开口/ 安装在所有或一些分支通道上的关闭阀,使得气体转向流动转向通道,流量比Q1 / Q0等于第一孔口与第二流量的可流通孔口的总开口面积S2o的比值 通过调节流通孔的总开口面积来分流通道。

    Piezoelectric element driven metal diaphragm control valve
    57.
    发明授权
    Piezoelectric element driven metal diaphragm control valve 有权
    压电元件驱动金属隔膜控制阀

    公开(公告)号:US08191856B2

    公开(公告)日:2012-06-05

    申请号:US12852220

    申请日:2010-08-06

    IPC分类号: F16K31/02

    摘要: A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

    摘要翻译: 控制阀具有形成阀室和阀座的主体,安装在阀室内部并与阀座接触和离开的金属隔膜,固定在主体侧的致动器盒,安装在压缩元件侧的压电元件 在致动器箱内部,通过金属隔膜压板的调节,通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构,其在金属隔膜与阀座接触时吸收压电元件的伸长, 规定的推力被施加到阀座等,以及预压机构,其向压电元件施加向上的压缩力,其中施加到压电元件的压缩力是外部可调节的。

    Normally open type piezoelectric element driven metal diaphragm control valve
    58.
    发明授权
    Normally open type piezoelectric element driven metal diaphragm control valve 有权
    常开式压电元件驱动金属隔膜控制阀

    公开(公告)号:US08181932B2

    公开(公告)日:2012-05-22

    申请号:US12161549

    申请日:2006-11-13

    IPC分类号: F16K31/02

    摘要: A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

    摘要翻译: 控制阀具有形成阀室和阀座的主体,安装在阀室内部并与阀座接触和离开的金属隔膜,固定在主体侧的致动器盒,安装在压缩元件侧的压电元件 在致动器箱内部,通过金属隔膜压板的调节,通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构,其在金属隔膜与阀座接触时吸收压电元件的伸长, 规定的推力被施加到阀座等,以及预压机构,其向压电元件施加向上的压缩力,其中施加到压电元件的压缩力是外部可调节的。

    FLOW RATE RATIO VARIABLE TYPE FLUID SUPPLY APPARATUS
    59.
    发明申请
    FLOW RATE RATIO VARIABLE TYPE FLUID SUPPLY APPARATUS 有权
    流量比可变型流体供应装置

    公开(公告)号:US20100229976A1

    公开(公告)日:2010-09-16

    申请号:US12303841

    申请日:2007-06-13

    IPC分类号: F16L41/00 G01F1/42

    摘要: A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.

    摘要翻译: 流量比可变型流体供给装置包括:流量控制系统,其将具有规定流量Q1 / Q0的第一分流管路和第二分流管路的流量Q的气体供给到气室, 并且具有开口面积S1的第一孔口安装在第一分流通道上,第二分流通道连接到并联连接的多个支管通道,开口区域安装在分支通道上,开口/ 安装在所有或一些分支通道上的关闭阀,使得气体转向流动转向通道,流量比Q1 / Q0等于第一孔口与第二流量的可流通孔口的总开口面积S2o的比值 通过调节流通孔的总开口面积来分流通道。

    CALIBRATION METHOD AND FLOW RATE MEASUREMENT METHOD FOR FLOW RATE CONTROLLER FOR GAS SUPPLY DEVICE
    60.
    发明申请
    CALIBRATION METHOD AND FLOW RATE MEASUREMENT METHOD FOR FLOW RATE CONTROLLER FOR GAS SUPPLY DEVICE 有权
    用于气体供应装置的流量控制器的校准方法和流量测量方法

    公开(公告)号:US20130186471A1

    公开(公告)日:2013-07-25

    申请号:US13813219

    申请日:2011-06-28

    IPC分类号: G01F7/00

    摘要: In a gas supply device supplying many different gases to a gas use portion through many flow rate controllers, a flow rate controller calibration unit includes a build-up tank with inner volume, an inlet side on-off valve and an outlet side on-off valve V2 of the tank, and a gas pressure detector and a gas temperature detector for gas inside the tank, joined in a branched form to a gas supply line, with the valve V2 connected to vacuum. The calibration unit is used to calibrate a flow rate controller based on performing a first measurement of gas temperature and pressure inside the tank, and then building-up gas into the tank, and then performing a second measurement of gas temperature and pressure, and from respective measured values, calculating gas flow rate Q and by comparing a set gas flow rate and calculated gas flow rate Q, performing flow rate calibration.

    摘要翻译: 在通过许多流量控制器向气体使用部分供应许多不同气体的气体供应装置中,流量控制器校准单元包括具有内部容积的积聚罐,入口侧开关阀和出口侧开关 阀的阀V2,以及气罐内的气体的气体压力检测器和气体温度检测器,以分支形式连接到气体供给管线,阀V2连接到真空。 校准单元用于基于对罐内的气体温度和压力进行第一次测量,然后将气体积聚到罐中,然后对气体温度和压力进行第二次测量,并从 各个测量值,计算气体流量Q,并通过比较设定的气体流量和计算出的气体流量Q进行流量校准。