Ferritic stainless steel sheet superior in shapeability and method of production of the same
    53.
    发明授权
    Ferritic stainless steel sheet superior in shapeability and method of production of the same 有权
    铁素体不锈钢板的成型性优良,生产方法相同

    公开(公告)号:US08048239B2

    公开(公告)日:2011-11-01

    申请号:US12229825

    申请日:2008-08-26

    IPC分类号: C21D8/02 C22C38/22 C22C38/26

    摘要: The present invention provides a ferritic stainless steel sheet superior in shapeability containing, by wt %, C: 0.001 to 0.010%, Si: 0.01 to 1.0%, Mn: 0.01 to 1.0%, P: 0.01 to 0.04%, Cr: 10 to 20%, N: 0.001 to 0.020%, Nb: 0.3 to 1.0%, and Mo: 0.5 to 2.0%, wherein the total precipitates are, by wt %, 0.05 to 0.60%. A method of production of a ferritic stainless steel sheet superior in shapeability comprising producing a cold rolling material in the production process so that the Nb-based precipitates become, by vol %, 0.15% to 0.6% and have a diameter of 0.1 μm to 1 μm and/or so that the recrystallized grain size becomes 1 μm to 40 μm and the recrystallization rate becomes 10 to 90%, then cold rolling and annealing it at 1010 to 1080° C.

    摘要翻译: 本发明提供一种成形性优异的铁素体系不锈钢板,其含有C:0.001〜0.010%,Si:0.01〜1.0%,Mn:0.01〜1.0%,P:0.01〜0.04%,Cr:10〜 20%,N:0.001〜0.020%,Nb:0.3〜1.0%,Mo:0.5〜2.0%,其中总重量为0.05〜0.60%。 一种制造成型性优异的铁素体系不锈钢板的制造方法,其特征在于,包括在制造工序中制造冷轧材料,使得Nb系析出物以体积%计为0.15〜0.6%,直径为0.1μm〜1 和/或使得再结晶晶粒尺寸为1μm〜40μm,再结晶率为10〜90%,然后冷轧并在1010〜1080℃退火。

    ELECTRICAL CONNECTING APPARATUS
    55.
    发明申请
    ELECTRICAL CONNECTING APPARATUS 有权
    电气连接装置

    公开(公告)号:US20090021274A1

    公开(公告)日:2009-01-22

    申请号:US11814945

    申请日:2005-02-08

    申请人: Ken Kimura

    发明人: Ken Kimura

    IPC分类号: G01R1/073 G01R31/02

    CPC分类号: G01R1/0466

    摘要: An electrical connecting apparatus comprises a plurality of plate-shaped probes. Each probe has a cut-off portion opening on its inside surface side and both sides in the thickness direction of the probe and is engaged with a dropout preventing member disposed in a plate-shaped housing at the cut-off portion, thereby being prevented from dropping out of the housing.

    摘要翻译: 电连接装置包括多个板状探针。 每个探针具有在其内表面侧和探针的厚度方向上的两侧开口的切口部分,并且与设置在截止部分的板状壳体中的防脱出部件接合,从而防止 辍学。

    Ferritic stainless steel sheet excellent in press formability and workability and method for production thereof
    56.
    发明授权
    Ferritic stainless steel sheet excellent in press formability and workability and method for production thereof 有权
    压制成型性和加工性优异的铁素体不锈钢板及其制造方法

    公开(公告)号:US07341637B2

    公开(公告)日:2008-03-11

    申请号:US10467120

    申请日:2002-12-06

    IPC分类号: C22C38/18

    摘要: A ferritic stainless steel sheet excellent in press formability and operability, characterized by: containing appropriate amounts of C, N, Cr, Si, Mn, P, S, Al, Ti and V, with the balance consisting of Fe and unavoidable impurities; having a solid lubricating film or films on one or both of the surfaces; and having a ratio Z, defined as Z=Z1/Z2, of less than 0.5, a tensile strength of 450 MPa or less and an average r-value of 1.7 or more, wherein Z1 is a friction coefficient of the surface of a solid lubricating film and Z2 that of the surface of a reference material coated with neither a coating nor lubricating oil. In the ferritic stainless steel sheet, the amounts of Sol-Ti and Insol-V may be regulated to appropriate ranges, wherein Sol-Ti means the amount of Ti existing in the state of solid solution in steel and Insol-V means the amount of V existing in the state of precipitation in steel.

    摘要翻译: 一种压制成型性和可操作性优异的铁素体系不锈钢板,其特征在于:含有适量的C,N,Cr,Si,Mn,P,S,Al,Ti和V,余量由Fe和不可避免的杂质构成; 在一个或两个表面上具有固体润滑膜或膜; 并且具有定义为Z = Z 1 / Z 2 2的比Z小于0.5,拉伸强度为450MPa以下,平均r值为 1.7或更高,其中Z 1是固体润滑膜的表面的摩擦系数,Z 2是涂覆既不涂层的参考材料表面的摩擦系数 润滑油。 在铁素体不锈钢板中,可以将Sol-Ti和Insol-V的量调节到合适的范围,其中Sol-Ti是指在钢中固溶态的Ti量,Insol-V是指 V存在于钢中沉淀状态。

    Ferritic stainless steel sheet excellent in formability and method for production thereof
    57.
    发明申请
    Ferritic stainless steel sheet excellent in formability and method for production thereof 审中-公开
    成型性优异的铁素体不锈钢板及其制造方法

    公开(公告)号:US20060225820A1

    公开(公告)日:2006-10-12

    申请号:US10562995

    申请日:2005-03-29

    IPC分类号: C22C38/26

    摘要: The present invention provides a ferritic stainless steel sheet superior in shapeability containing, by wt %, C: 0.001 to 0.010%, Si: 0.01 to 1.0%, Mn: 0.01 to 1.0%, P: 0.01 to 0.04%, Cr: 10 to 20%, N: 0.001 to 0.020%, Nb: 0.3 to 1.0%, and Mo: 0.5 to 2.0%, wherein the total precipitates are, by wt %, 0.05 to 0.60%. A method of production of a ferritic stainless steel sheet superior in shapeability comprising producing a cold rolling material in the production process so that the Nb-based precipitates become, by vol %, 0.15% to 0.6% and have a diameter of 0.1 μm to 1 μm and/or so that the recrystallized grain size becomes 1 μm to 40 μm and the recrystallization rate becomes 10 to 90%, then cold rolling and annealing it at 1010 to 1080° C.

    摘要翻译: 本发明提供一种成形性优异的铁素体系不锈钢板,其含有C:0.001〜0.010%,Si:0.01〜1.0%,Mn:0.01〜1.0%,P:0.01〜0.04%,Cr:10〜 20%,N:0.001〜0.020%,Nb:0.3〜1.0%,Mo:0.5〜2.0%,其中总重量为0.05〜0.60%。 一种制造成型性优异的铁素体系不锈钢板的制造方法,其特征在于,包括在制造工序中制造冷轧材料,以使Nb系析出物以体积%计为0.15%〜0.6%,直径为0.1〜1质量% 和/或使得再结晶粒径为1〜40μm,再结晶率为10〜90%,然后冷轧并在1010〜1080℃退火。

    Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
    58.
    发明授权
    Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating 有权
    辐射吸收聚合物,用于辐射吸收涂层的组合物,辐射吸收涂层及其作为抗反射涂层的应用

    公开(公告)号:US06737492B2

    公开(公告)日:2004-05-18

    申请号:US10229219

    申请日:2002-08-27

    IPC分类号: C08F11636

    摘要: A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc., and the resulting solution is applied to a wafer and baked to form a radiation absorbing coating such as an anti-reflective coating. On this coating is coated, for example, a chemically amplified resist. This coated substrate is then exposed to deep UV rays and is developed to form a fine resist pattern excluding the influence of standing wave.

    摘要翻译: 一种辐射吸收聚合物,其化学键合有辐射吸收染料,该辐射吸收染料在预定波长辐射下具有高吸收性,其对基底具有良好的粘附性,并且与溶于溶剂的抗蚀剂无关的良好的薄膜形成 用于光致抗蚀剂,但在烘烤后变得不溶; 公开了含有这种聚合物的辐射吸收涂层用组合物和由该组合物形成的抗反射涂层等吸收辐射涂层。 辐射吸收聚合物包括共聚物,其至少包含由侧链中含有酮基和二价基团(优选亚甲基)的单体构成的重复单元,以及由含有直接键合的有机发色团的单体构成的重复单元 或通过连接组到主链。 将这种辐射吸收聚合物溶于醇,芳族烃,酮,酯等溶剂中,将所得溶液施加到晶片上并烘烤以形成抗辐射涂层等吸收辐射的涂层。 在该涂层上涂覆例如化学放大抗蚀剂。 然后将该涂覆的基材暴露于深紫外线,并显影以形成除了驻波的影响之外的精细抗蚀剂图案。

    Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
    59.
    发明授权
    Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating 有权
    辐射吸收聚合物,用于辐射吸收涂层的组合物,辐射吸收涂层及其作为抗反射涂层的应用

    公开(公告)号:US06468718B1

    公开(公告)日:2002-10-22

    申请号:US09244358

    申请日:1999-02-04

    IPC分类号: G03C173

    摘要: A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc., and the resulting solution is applied to a wafer and baked to form a radiation absorbing coating such as an anti-reflective coating. On this coating is coated, for example, a chemically amplified resist. This coated substrate is then exposed to deep UV rays and is developed to form a fine resist pattern excluding the influence of standing wave.

    摘要翻译: 一种辐射吸收聚合物,其化学键合有辐射吸收染料,该辐射吸收染料在预定波长辐射下具有高吸收性,其对基底具有良好的粘附性,并且与溶于溶剂的抗蚀剂无关的良好的薄膜形成 用于光致抗蚀剂,但在烘烤后变得不溶; 公开了含有这种聚合物的辐射吸收涂层用组合物和由该组合物形成的抗反射涂层等吸收辐射涂层。 辐射吸收聚合物包括共聚物,其至少包含由侧链中含有酮基和二价基团(优选亚甲基)的单体构成的重复单元,以及由含有直接键合的有机发色团的单体构成的重复单元 或通过连接组到主链。 将这种辐射吸收聚合物溶于醇,芳族烃,酮,酯等溶剂中,将所得溶液施加到晶片上并烘烤以形成抗辐射涂层等吸收辐射的涂层。 在该涂层上涂覆例如化学放大抗蚀剂。 然后将该涂覆的基材暴露于深紫外线,并显影以形成除了驻波的影响之外的精细抗蚀剂图案。

    Method for forming resist pattern
    60.
    发明授权
    Method for forming resist pattern 失效
    形成抗蚀剂图案的方法

    公开(公告)号:US06465161B1

    公开(公告)日:2002-10-15

    申请号:US09600612

    申请日:2000-07-17

    IPC分类号: G03F700

    CPC分类号: G03F7/16 G03F7/0045 G03F7/091

    摘要: In a process for manufacturing integrated circuit elements or the like by photolithography, a method for reducing detrimental influence on resist shape due to properties of a substrate or acidity of substrate surface in case where a chemically amplified resist or the like is used as a photoresist, and a substrate-treating agent composition to be used for this method are described. The substrate-treating agent composition comprises a solution containing a salt between at least one basic compound selected from among primary, secondary and tertiary amines and nitrogen-containing heterocyclic compounds and an organic acid such as a sulfonic acid or a carboxylic acid. This composition is coated on a substrate surface having thereon a bottom anti-reflective coating such as SiON layer, baked and, if necessary washed, then a chemically amplified resist is coated on the thus-treated substrate, exposed and developed to form a resist pattern on the substrate.

    摘要翻译: 在通过光刻制造集成电路元件等的方法中,使用化学放大型抗蚀剂等作为光致抗蚀剂的情况下,由于基板性质或基板表面的酸度降低对抗蚀剂形状的有害影响的方法, 并描述用于该方法的底物处理剂组合物。 底物处理剂组合物包含含有至少一种选自伯胺,仲胺和叔胺的碱性化合物和含氮杂环化合物之间的盐和有机酸如磺酸或羧酸的溶液。 将该组合物涂布在其上具有诸如SiON层的底部抗反射涂层的基底表面上,烘烤并且如果需要洗涤,然后将化学放大的抗蚀剂涂覆在如此处理的基底上,暴露并显影以形成抗蚀剂图案 在基板上。