2-bit assisted charge memory device and method for making the same
    51.
    发明授权
    2-bit assisted charge memory device and method for making the same 有权
    2位辅助电荷存储器件及其制造方法

    公开(公告)号:US07723778B2

    公开(公告)日:2010-05-25

    申请号:US11424781

    申请日:2006-06-16

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: H01L29/792 H01L29/76

    摘要: An Assisted Charge (AC) Memory cell comprises a transistor that includes, for example, a p-type substrate with an n+ source region and an n+ drain region implanted on the p-type substrate. A gate electrode can be formed over the substrate and portions of the source and drain regions. The gate electrode can comprise a trapping structure. The trapping structure can be treated as electrically split into two sides. One side can be referred to as the “AC-side” and can be fixed at a high voltage by trapping electrons within the structure. The electrons are referred to as assisted charges. The other side of can be used to store data and is referred to as the “data-side.” The abrupt electric field between AC-side and the data-side can enhance programming efficiency. The memory cell can comprise a dual gate structure, such that the cell is a 2-bit cell.

    摘要翻译: 辅助充电(AC)存储单元包括晶体管,其包括例如p型衬底,其具有n +源极区域和n +漏极区域注入在p型衬底上。 栅电极可以形成在衬底上以及源区和漏区的部分之上。 栅电极可以包括捕获结构。 捕获结构可以被电分为两侧。 一侧可以称为“AC侧”,并且可以通过在结构内捕获电子而将其固定在高电压。 电子被称为辅助电荷。 另一端可用于存储数据,被称为“数据侧”.AC侧和数据侧之间的突发电场可以提高编程效率。 存储器单元可以包括双栅极结构,使得该单元是2位单元。

    METHOD FOR FABRICATING NON-VOLATILE MEMORY
    52.
    发明申请
    METHOD FOR FABRICATING NON-VOLATILE MEMORY 有权
    制造非易失性存储器的方法

    公开(公告)号:US20100055890A1

    公开(公告)日:2010-03-04

    申请号:US12615450

    申请日:2009-11-10

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: H01L21/28

    摘要: A method for fabricating a non-volatile memory is provided. The method includes a stacked structure and a consuming layer are formed in sequence over a substrate. A converting process is performed at a peripheral region of the consuming layer to form a first insulating layer. A conductive layer is formed over the stacked layer and the first insulating layer.

    摘要翻译: 提供了一种用于制造非易失性存储器的方法。 该方法包括层叠结构,并且消耗层依次形成在衬底上。 在消耗层的周边区域进行A转换处理以形成第一绝缘层。 在堆叠层和第一绝缘层上形成导电层。

    METHOD FOR OPERATING MEMORY
    53.
    发明申请
    METHOD FOR OPERATING MEMORY 有权
    操作记忆的方法

    公开(公告)号:US20090129150A1

    公开(公告)日:2009-05-21

    申请号:US11942041

    申请日:2007-11-19

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: G11C16/04

    摘要: A memory operating method includes the following steps. First, a memory including a charge storage structure is provided. Next, first type charges are injected into the charge storage structure such that a threshold level of the memory is higher than an erase level. Then, second type charges are injected into the charge storage structure such that the threshold level of the memory is lower than a predetermined bit level. Next, first type charges are injected into the charge storage structure such that the threshold level of the memory approximates to or is equal to the predetermined bit level.

    摘要翻译: 存储器操作方法包括以下步骤。 首先,提供包括电荷存储结构的存储器。 接下来,将第一类型的电荷注入到电荷存储结构中,使得存储器的阈值电平高于擦除电平。 然后,将第二类型的电荷注入到电荷存储结构中,使得存储器的阈值电平低于预定的位电平。 接下来,将第一类型的电荷注入到电荷存储结构中,使得存储器的阈值水平接近或等于预定的位电平。

    FABRICATION METHOD OF NON-VOLATILE MEMORY
    54.
    发明申请
    FABRICATION METHOD OF NON-VOLATILE MEMORY 有权
    非易失性存储器的制造方法

    公开(公告)号:US20070092997A1

    公开(公告)日:2007-04-26

    申请号:US11614086

    申请日:2006-12-21

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: H01L21/00

    摘要: A method of fabrication a non-volatile memory is provided. A stacked structure is formed on a substrate, the stacked structure including a gate dielectric layer and a control gate. Then, a first dielectric layer, a second dielectric layer and a third dielectric layer are respectively formed on the top and sidewalls of the stacked structure and the exposed substrate. Thereafter, a pair of charge storage layers are formed over the substrate to respectively cover a portion of the top and sidewalls of the stacked structure, and a gap exists between each of the charge storage layers.

    摘要翻译: 提供了制造非易失性存储器的方法。 堆叠结构形成在基板上,层叠结构包括栅极电介质层和控制栅极。 然后,分别在层叠结构的顶部和侧壁和暴露的基板上分别形成第一电介质层,第二电介质层和第三电介质层。 此后,在衬底上形成一对电荷存储层,以分别覆盖层叠结构的顶部和侧壁的一部分,并且每个电荷存储层之间存在间隙。

    NON-VOLATILE MEMORY, FABRICATION METHOD THEREOF AND OPERATION METHOD THEREOF
    55.
    发明申请
    NON-VOLATILE MEMORY, FABRICATION METHOD THEREOF AND OPERATION METHOD THEREOF 有权
    非易失性存储器,其制造方法及其操作方法

    公开(公告)号:US20060237761A1

    公开(公告)日:2006-10-26

    申请号:US11160741

    申请日:2005-07-07

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: H01L29/94

    摘要: A method of fabrication a non-volatile memory is provided. A stacked structure is formed on a substrate, the stacked structure including a gate dielectric layer and a control gate. Then, a first dielectric layer, a second dielectric layer and a third dielectric layer are respectively formed on the top and sidewalls of the stacked structure and the exposed substrate. Thereafter, a pair of charge storage layers are formed over the substrate to respectively cover a portion of the top and sidewalls of the stacked structure, and a gap exists between each of the charge storage layers.

    摘要翻译: 提供了制造非易失性存储器的方法。 堆叠结构形成在基板上,层叠结构包括栅极电介质层和控制栅极。 然后,分别在层叠结构的顶部和侧壁和暴露的基板上分别形成第一电介质层,第二电介质层和第三电介质层。 此后,在衬底上形成一对电荷存储层,以分别覆盖层叠结构的顶部和侧壁的一部分,并且在每个电荷存储层之间存在间隙。

    Electronic apparatus
    56.
    发明授权
    Electronic apparatus 失效
    电子仪器

    公开(公告)号:US08523370B2

    公开(公告)日:2013-09-03

    申请号:US12880153

    申请日:2010-09-13

    IPC分类号: G03B21/28

    摘要: An electronic apparatus includes a main body and a projection mechanism. The main body is used for providing video signals. The projection mechanism includes a built-in mini-projector that can either be stored in the electronic apparatus or extended out of the electronic apparatus for use. The mini-projector is capable of receiving video signals and projecting corresponding images when the projection mechanism is extended, and stops the projection of images when retracted.

    摘要翻译: 电子设备包括主体和投影机构。 主体用于提供视频信号。 投影机构包括内置的微型投影仪,其可以存储在电子设备中或者延伸出电子设备以供使用。 当投影机构延伸时,小型投影机能够接收视频信号并投影相应的图像,并且缩回时停止投影图像。

    Method of making a relay
    57.
    发明授权
    Method of making a relay 有权
    制造继电器的方法

    公开(公告)号:US07996985B2

    公开(公告)日:2011-08-16

    申请号:US11938981

    申请日:2007-11-13

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: H01F7/127 H01R43/20

    摘要: A method of making a relay includes: preparing a relay core member; coupling first, second and third terminals to the relay core member by moving the same horizontally relative to the relay core member such that terminal portions of the first, second and third terminals enter notches formed in the relay core member in a horizontal direction; and enclosing the relay core member, the first terminal, the second terminal, and the third terminal within a housing, and sealing the housing with resin.

    摘要翻译: 制造继电器的方法包括:准备中继铁芯构件; 通过使第一,第二和第三端子相对于继电器芯构件水平移动而将第一,第二和第三端子耦合到继电器芯构件,使得第一,第二和第三端子的端子部分在水平方向上进入形成在中继铁芯构件中的凹口; 并且在壳体内包围中继铁心构件,第一端子,第二端子和第三端子,并且用树脂密封壳体。

    Method and apparatus for operating nonvolatile memory with floating voltage at one of the source and drain regions
    58.
    发明授权
    Method and apparatus for operating nonvolatile memory with floating voltage at one of the source and drain regions 有权
    用于在源极和漏极区域中的一个处工作具有浮动电压的非易失性存储器的方法和装置

    公开(公告)号:US07916550B2

    公开(公告)日:2011-03-29

    申请号:US11560971

    申请日:2006-11-17

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: G11C11/34

    CPC分类号: G11C16/0475

    摘要: Methods and apparatuses are discussed which operate a nonvolatile memory cell or at least one cell in an array of such cells, such that a drain region or a source region is floating while adding charge to the charge storage structure.

    摘要翻译: 讨论了操作非易失性存储器单元或这种单元的阵列中的至少一个单元的方法和装置,使得漏极区域或源极区域在向电荷存储结构增加电荷的同时浮动。

    THREE-DIMENSIONAL SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATING THE SAME
    59.
    发明申请
    THREE-DIMENSIONAL SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATING THE SAME 有权
    三维半导体结构及其制造方法

    公开(公告)号:US20100208503A1

    公开(公告)日:2010-08-19

    申请号:US12372860

    申请日:2009-02-18

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    摘要: A three-dimensional (3D) semiconductor structure with high density and method of fabricating the same are disclosed. The 3D semiconductor structure comprises at least a first memory cell and a second memory cell stacked on the first memory cell. The first memory cell comprises a first conductive line and a second conductive line. The second memory cell comprises another first conductive line opposite to the first conductive line of the first memory cell, and the second conductive line formed between said two first conductive lines of the first and second memory cells. The first and second memory cells share the second conductive line when the 3D semiconductor structure is programming and erasing, and each of the first and second memory cells has a diode.

    摘要翻译: 公开了一种具有高密度的三维(3D)半导体结构及其制造方法。 3D半导体结构包括至少第一存储单元和堆叠在第一存储单元上的第二存储单元。 第一存储单元包括第一导线和第二导线。 第二存储单元包括与第一存储单元的第一导线相对的另一第一导线,以及形成在第一和第二存储单元的所述两个第一导线之间的第二导线。 当3D半导体结构编程和擦除时,第一和第二存储单元共享第二导线,并且第一和第二存储单元中的每一个具有二极管。

    MEMORY DEVICES
    60.
    发明申请
    MEMORY DEVICES 有权
    内存设备

    公开(公告)号:US20100176436A1

    公开(公告)日:2010-07-15

    申请号:US12730266

    申请日:2010-03-24

    申请人: Ming-Chang Kuo

    发明人: Ming-Chang Kuo

    IPC分类号: H01L29/788

    摘要: A memory device is provided. The memory device includes a first control gate, a second control gate, a plurality of first charge storage elements, a plurality of second charge storage elements and a semiconductor. The plurality of first charge storage elements is beside the first control gate, and each of the first charge storage elements is located on the different side of the first control gate. The plurality of second charge storage elements is beside the second control gate. The semiconductor is located between the first and second control gates.

    摘要翻译: 提供存储器件。 存储器件包括第一控制栅极,第二控制栅极,多个第一电荷存储元件,多个第二电荷存储元件和半导体。 多个第一电荷存储元件位于第一控制栅极旁边,并且每个第一电荷存储元件位于第一控制栅极的不同侧。 多个第二电荷存储元件位于第二控制栅极旁边。 半导体位于第一和第二控制门之间。