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    RINSING METHOD AND DEVELOPING METHOD
    51.
    发明申请
    RINSING METHOD AND DEVELOPING METHOD 有权
    冲洗方法与开发方法

    公开(公告)号：US20110229120A1

    公开(公告)日：2011-09-22

    申请号：US13117483

    申请日：2011-05-27

    申请人： Yasuhiro TAKAKI ,  Osamu Miyahara ,  Keiichi Tanaka ,  Shinya Wakamizu ,  Takashi Terada

    发明人： Yasuhiro TAKAKI ,  Osamu Miyahara ,  Keiichi Tanaka ,  Shinya Wakamizu ,  Takashi Terada

    IPC分类号： G03D5/00

    CPC分类号： H01L21/67051 ,  G03F7/3021

    摘要： A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto the substrate; a step (STEP 7) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP 8) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEP 8 is arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEP 9 is arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.

    摘要翻译： 在对其上设置的曝光图案进行显影处理之后，在基板上进行漂洗处理的漂洗方法包括在显影后从显影基板抛出显影液的工序（步骤5） 向基板供给水性清洗液的工序（工序6） 将含表面活性剂的冲洗液供给到基板上以用含表面活性剂的冲洗液取代残留在基板上的液体的步骤（STEP7） 以及使基板旋转以使基板上含表面活性剂的冲洗液体膨胀和脱落的工序（步骤8）。 步骤8被布置成供给含有表面活性剂的冲洗液，供给时间为5秒以下。 步骤9被布置成包括具有较低转数的第一周期和具有较高转数的第二周期，并且将第一周期中的基板的转数设定为大于300rpm且小于1,000rpm。

    Rinse Treatment Method and Development Process Method
    52.
    发明申请
    Rinse Treatment Method and Development Process Method 有权
    冲洗处理方法和开发过程方法

    公开(公告)号：US20080274433A1

    公开(公告)日：2008-11-06

    申请号：US11578055

    申请日：2005-03-02

    申请人： Yasuhiro Takaki ,  Osamu Miyahara ,  Keiichi Tanaka ,  Shinya Wakamizu ,  Takashi Terada

    发明人： Yasuhiro Takaki ,  Osamu Miyahara ,  Keiichi Tanaka ,  Shinya Wakamizu ,  Takashi Terada

    IPC分类号： G03F7/20 ,  B08B3/10

    CPC分类号： H01L21/67051 ,  G03F7/3021

    摘要： A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto the substrate; a step (STEP 7) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP 8) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEP 8 is arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEP 9 is arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.

    摘要翻译： 在对其上设置的曝光图案进行显影处理之后，在基板上进行漂洗处理的漂洗方法包括在显影后从显影基板抛出显影液的工序（步骤5） 向基板供给水性清洗液的工序（工序6） 将含表面活性剂的冲洗液供给到基板上以用含表面活性剂的冲洗液取代残留在基板上的液体的工序（STEP7） 以及使基板旋转以使基板上含表面活性剂的冲洗液体膨胀和脱落的工序（步骤8）。 步骤8被布置成供给含有表面活性剂的冲洗液，供给时间为5秒以下。 步骤9被布置成包括具有较低转数的第一周期和具有较高转数的第二周期，并且将第一周期中的基板的转数设定为大于300rpm且小于1,000rpm。

    Flat tube and process for producing heat exchanger with use of the flat tube
    53.
    发明申请
    Flat tube and process for producing heat exchanger with use of the flat tube 审中-公开
    扁平管和使用扁平管制造热交换器的工艺

    公开(公告)号：US20060162919A1

    公开(公告)日：2006-07-27

    申请号：US10523394

    申请日：2003-08-11

    申请人： Takashi Terada

    发明人： Takashi Terada

    IPC分类号： F28F1/00

    CPC分类号： F28F1/022 ,  F28D1/0391 ,  F28F1/045 ,  F28F2225/04 ,  F28F2250/04

    摘要： A flat tube 1 comprises an upper wall 2, a lower wall 3, left and right side walls 4, 5 interconnecting the upper and lower walls 2, 3 at respective left and right side edges thereof, and a plurality of reinforcing walls 6 interconnecting the upper and lower walls 2, 3 and positioned between the left and right side walls 4, 5. The tube 1 has parallel fluid channels 7 inside thereof, and each of the reinforcing walls 6 has communication holes 8 for holding the adjacent fluid channels 7 in communication with each other therethrough. The reinforcing wall 6 is formed from a downward ridge 11 integral with the upper wall 2 and an upward ridge 12 integral with the lower wall 3, by brazing the two ridges to each other. Only one of the downward ridge 11 and the upward ridge 12 forming the reinforcing wall 6 is provided with a plurality of cutouts 13, 14. The openings of the cutouts 13, 14 are closed with the other ridge 11, 12 having no cutouts to thereby form the communication holes 8. The ridges 11, 12 forming the reinforcing wall 6 are brazed with an enhanced strength.

    摘要翻译： 扁平管1包括上壁2，下壁3，在相应的左侧边缘和右侧边缘处将上壁和下壁2,3互连的左右侧壁4,5和多个加强壁6， 上下壁2,3位于左右侧壁4,5之间。 管1在其内部具有平行的流体通道7，并且每个加强壁6具有用于保持相邻的流体通道7彼此连通的连通孔8。 加强壁6由与上壁2一体的向下的脊11和与下壁3成一体的向上的脊12形成，通过彼此钎焊两个脊。 形成加强壁6的向下的脊11和向上的脊12中只有一个设置有多个切口13,14。 切口13,14的开口被另一个脊11,12没有切口关闭，从而形成连通孔8。 形成加强壁6的隆起部11,12以增强的强度进行钎焊。

    Evaporator, manufacturing method of the same, header for evaporator and refrigeration system
    54.
    发明申请
    Evaporator, manufacturing method of the same, header for evaporator and refrigeration system 审中-公开
    蒸发器，制造方法相同，蒸发器和制冷系统的头

    公开(公告)号：US20060162918A1

    公开(公告)日：2006-07-27

    申请号：US11389642

    申请日：2006-03-27

    申请人： Hirofumi Horiuchi ,  Ryoichi Hoshino ,  Noboru Ogasawara ,  Takashi Tamura ,  Takashi Terada ,  Futoshi Watanabe

    发明人： Hirofumi Horiuchi ,  Ryoichi Hoshino ,  Noboru Ogasawara ,  Takashi Tamura ,  Takashi Terada ,  Futoshi Watanabe

    IPC分类号： F28D7/06

    CPC分类号： F25B39/02 ,  F28D1/05391 ,  F28D2021/0085 ,  F28F9/0214 ,  F28F9/0278 ,  F28F21/089

    摘要： The evaporator includes the upper side and lower header members 10 and 50 disposed at the upper and lower end of the core 1. One end of each tube 6 constituting the upstream-side tube group P1 is connected to the inlet-side tank 11, while the other end to the lower header member 50. One end of each tube 7 constituting the downstream-side tube group P2 is connected to the outlet-side tank 12, while the other end to the lower header member 50. The refrigerant flowed into the inlet-side tank 11 is introduced into the outlet-side tank 12 by passing through the upstream-side tube group P1, the lower header member 50 and the downstream-side tube group P2, so that the refrigerant evaporates by exchanging heat with ambient air A. Accordingly, it improves the heat exchange performance and decreases the thickness.

    摘要翻译： 蒸发器包括设置在芯体1的上端和下端的上侧和下集管构件10和50.构成上游侧管组P 1的每个管6的一端连接到入口侧罐11， 同时另一端连接到下集管构件50.构成下游侧管组P 2的每个管7的一端连接到出口侧箱12，而另一端连接到下集管构件50.制冷剂流过 入口侧罐11通过上游侧管组P 1，下集管部件50和下游侧管组P 2被引入出口侧罐12，使得制冷剂通过交换 与环境空气一起发热A.因此，它提高了热交换性能并减小了厚度。

    Method of manufacturing semiconductor device
    55.
    发明授权
    Method of manufacturing semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号：US06849484B2

    公开(公告)日：2005-02-01

    申请号：US10435046

    申请日：2003-05-12

    申请人： Takashi Terada ,  Motoi Ashida ,  Tomohiro Hosokawa ,  Yasuichi Masuda

    发明人： Takashi Terada ,  Motoi Ashida ,  Tomohiro Hosokawa ,  Yasuichi Masuda

    IPC分类号： H01L21/28 ,  H01L21/00 ,  H01L21/338 ,  H01L21/4763 ,  H01L21/60 ,  H01L21/768 ,  H01L21/8234 ,  H01L21/8244 ,  H01L27/088 ,  H01L27/11

    CPC分类号： H01L21/76897 ,  H01L21/76895

    摘要： As an opening exposing a surface of an element-forming region positioned in a region lying between two gate electrodes, a first opening is formed based on a resist pattern formed such that a portion of a region where the opening is formed overlaps two-dimensionally with a portion of one gate electrode. As an opening exposing a surface of one gate electrode, a second opening is formed based on a resist pattern formed such that a region where the opening is formed overlaps two-dimensionally solely with one gate electrode. Here, the first opening is covered with a non-photosensitive, organic film and the resist pattern. Thereafter, a tungsten interconnection is formed in the first and second openings. Thus, a semiconductor device, of which production cost is reduced, and in which electrical short-circuit and falling off of an interconnection are suppressed, can be obtained.

    摘要翻译： 作为露出位于两个栅极之间的区域中的元件形成区域的表面的开口，基于抗蚀剂图案形成第一开口，该抗蚀剂图案形成为使得形成开口的区域的一部分与二维地重叠二维地与 一个栅电极的一部分。 作为露出一个栅电极的表面的开口，基于形成为使得形成开口的区域仅用一个栅电极二维重叠的区域形成第二开口。 这里，第一开口被非光敏有机膜和抗蚀剂图案覆盖。 此后，在第一和第二开口中形成钨互连。 因此，可以获得抑制生产成本降低并且互连的电短路和掉电的半导体器件。

    Automatic tapping machine
    60.
    发明授权
    Automatic tapping machine 失效
    自动攻丝机

    公开(公告)号：US4037828A

    公开(公告)日：1977-07-26

    申请号：US701876

    申请日：1976-07-01

    申请人： Takashi Terada ,  Isamu Amemiya ,  Shinsaku Kubota ,  Koji Asada

    发明人： Takashi Terada ,  Isamu Amemiya ,  Shinsaku Kubota ,  Koji Asada

    IPC分类号： C21B7/12 ,  F27D3/15

    CPC分类号： C21B7/12 ,  F27D3/1527

    摘要： An automatic tapping machine for a tapping operation includes a movable truck; a lower frame rotatably mounted on the truck, an upper frame arranged always in parallel with the lower frame, and a pressure actuatable device for moving the upper frame towards, and away from the lower frame. A jig-supporting mechanism is adapted to hold a jig for use in the tapping operation, and a device is provided for supporting the jig-supporting mechanism above the frame and for actuating the jig-supporting mechanism as required in a tapping operation; the jig to be held in the jig-supporting mechanism has a diameter ranging from 40 mm to 100 mm.

    摘要翻译： 用于攻丝操作的自动攻丝机包括可移动卡车; 可转动地安装在卡车上的下框架，总体上与下框架平行布置的上框架，以及用于将上框架朝着下框架移动并且远离下框架的压力致动装置。 夹具支撑机构适于保持用于攻丝操作的夹具，并且设置有用于将夹具支撑机构支撑在框架上方并用于在攻丝操作中根据需要致动夹具支撑机构的装置; 保持在夹具支撑机构中的夹具的直径为40mm至100mm。