公开(公告)号：US20070080641A1

公开(公告)日：2007-04-12

申请号：US10577979

申请日：2004-11-10

申请人： Shinichi Yamamoto

发明人： Shinichi Yamamoto

IPC分类号： H01J1/62 ,  H01J17/49

CPC分类号： H01J11/40 ,  H01J11/12

摘要： An object of the present invention is to reduce power consumption in a plasma display panel (PDP) by reducing the discharge firing voltage, while suppressing the occurrence of discharge variability when the PDP is driven, as well as ensuring the wall-charge holding performance of a protective film surface. To achieve this, a front panel of a PDP of the present invention has a catalyst layer dispersed on a surface of display electrodes formed in stripes on one side of a glass substrate, and needle crystals composed of graphite formed to stand upright on the catalyst layer. The needle crystals form a phase-separated structure with the materials of a dielectric film and a protective film.

摘要翻译： 本发明的目的是通过降低放电点火电压来降低等离子体显示面板（PDP）的功耗，同时抑制PDP驱动时的放电变化的发生，以及确保壁电荷保持性能 保护膜表面。 为了实现这一点，本发明的PDP的前面板具有分散在玻璃基板的一面上形成为条纹的显示电极的表面上的催化剂层，以及在催化剂层上直立形成的由石墨构成的针状晶体 。 针状晶体与介电膜和保护膜的材料形成相分离的结构。

公开(公告)号：US20070001601A1

公开(公告)日：2007-01-04

申请号：US10573282

申请日：2004-10-29

申请人： Mikihiko Nishitani ,  Masaharu Terauchi ,  Yakuhiro Morita ,  Shinichi Yamamoto ,  Masatoshi Kitagawa

发明人： Mikihiko Nishitani ,  Masaharu Terauchi ,  Yakuhiro Morita ,  Shinichi Yamamoto ,  Masatoshi Kitagawa

IPC分类号： H01J17/49

CPC分类号： H01J11/40 ,  H01J11/12

摘要： In the plasma display panel of the present invention, a protective layer covers a dielectric layer covering electrodes in discharge cells and faces a discharge space filled with a discharge gas. Here, the discharge gas includes at least one selected from the group consisting of Xe and Kr. In the protective layer, an electron band including at least electrons having energy level of 4 eV or less below a vacuum level is formed within a forbidden band in energy bands.

摘要翻译： 在本发明的等离子体显示面板中，保护层覆盖在放电单元中覆盖电极的电介质层，并且面向填充有放电气体的放电空间。 这里，放电气体包括选自Xe和Kr中的至少一种。 在保护层中，在能带内的禁止带内形成至少包含能量级别低于真空度4eV以下的电子的电子带。

公开(公告)号：US07049749B2

公开(公告)日：2006-05-23

申请号：US11078856

申请日：2005-03-11

申请人： Makoto Horiuchi ,  Makoto Kai ,  Tomoyuki Seki ,  Tsuyoshi Ichibakase ,  Mamoru Takeda ,  Shinichi Yamamoto ,  Kenichi Sasaki

发明人： Makoto Horiuchi ,  Makoto Kai ,  Tomoyuki Seki ,  Tsuyoshi Ichibakase ,  Mamoru Takeda ,  Shinichi Yamamoto ,  Kenichi Sasaki

IPC分类号： H01J17/18 ,  H01J61/36

CPC分类号： H01J61/368 ,  H01J9/326

摘要： A discharge lamp includes a luminous bulb in which a luminous material is enclosed and a pair of electrodes are opposed in the luminous bulb; and a pair of sealing portions for sealing a pair of metal foils electrically connected to the pair of electrodes, respectively. At least one of the pair of metal foils has a twist structure.

公开(公告)号：US06965107B2

公开(公告)日：2005-11-15

申请号：US10793477

申请日：2004-03-04

申请人： Hiroyoshi Komobuchi ,  Minoru Kubo ,  Masahiko Hashimoto ,  Michio Okajima ,  Shinichi Yamamoto

发明人： Hiroyoshi Komobuchi ,  Minoru Kubo ,  Masahiko Hashimoto ,  Michio Okajima ,  Shinichi Yamamoto

IPC分类号： H01L25/00 ,  B81B7/00 ,  G01J5/10 ,  H01L23/10 ,  H01L27/146 ,  H01L31/0203 ,  G01J5/00 ,  G01J5/02 ,  H01L21/30 ,  H01L21/46

CPC分类号： B81B7/0077 ,  G01J5/10 ,  H01L23/10 ,  H01L27/14609 ,  H01L27/14618 ,  H01L27/14649 ,  H01L27/14687 ,  H01L31/0203 ,  H01L2924/0002 ,  H01L2924/01079 ,  H01L2924/16235 ,  H01L2924/00

摘要： An Al film is formed on a cap wafer and the Al film is patterned into a ring-shaped film. Dry etching is performed by using the ring-shaped film as a mask to form a drum portion enclosing a recess portion to provide a vacuum dome. After forming a depth of cut into the substrate portion of the cap wafer, the cap wafer is placed on a main body wafer having an infrared area sensor formed thereon. Then, the ring-shaped film of the cap wafer and the ring-shaped film of the main body wafer are joined to each other by pressure bonding to form a ring-shaped joining portion.

摘要翻译： 在盖晶片上形成Al膜，将Al膜图案化成环状膜。 通过使用环形膜作为掩模进行干蚀刻以形成包围凹部的鼓部，以提供真空圆顶。 在盖片的基板部分形成切割深度之后，将盖片放置在其上形成有红外区域传感器的主体晶片上。 然后，将盖片的环状膜和主体晶片的环状膜通过压力接合而形成环状的接合部。

公开(公告)号：US06679746B2

公开(公告)日：2004-01-20

申请号：US09891785

申请日：2001-06-25

申请人： Makoto Kai ,  Makoto Horiuchi ,  Tomoyuki Seki ,  Tsuyoshi Ichibakase ,  Mamoru Takeda ,  Shinichi Yamamoto ,  Kenichi Sasaki

发明人： Makoto Kai ,  Makoto Horiuchi ,  Tomoyuki Seki ,  Tsuyoshi Ichibakase ,  Mamoru Takeda ,  Shinichi Yamamoto ,  Kenichi Sasaki

IPC分类号： H01J1720

CPC分类号： H01J9/323 ,  H01J9/02 ,  H01J9/18 ,  H01J61/0732 ,  H01J61/36 ,  H01J61/86

摘要： A method for producing a discharge lamp of the present invention includes the steps of: preparing a glass pipe for a discharge lamp having a luminous bulb portion and a side tube portion, and a single electrode assembly including an electrode structure portion that will be formed into a pair of electrodes of the discharge lamp; inserting the single electrode assembly into the glass pipe for a discharge lamp such that the electrode structure portion of the single electrode assembly is positioned in the luminous bulb portion of the glass pipe for a discharge lamp; forming a luminous bulb in which the electrode structure portion is arranged inside by attaching the side tube portion of the glass pipe for a discharge lamp to a part of the single electrode assembly; and forming a pair of electrodes in the luminous bulb by melting and cutting a part of the electrode structure portion selectively.

摘要翻译： 本发明的放电灯的制造方法包括以下步骤：制备具有发光管部分和侧管部分的放电灯玻璃管，以及包括电极结构部分的单电极组件，该电极结构部分将形成 放电灯的一对电极; 将单电极组件插入用于放电灯的玻璃管中，使得单电极组件的电极结构部分位于用于放电灯的玻璃管的发光管部分中; 通过将用于放电灯的玻璃管的侧管部分附接到单个电极组件的一部分来形成其中电极结构部分布置在其内的发光管; 并且通过选择性地熔化和切割电极结构部分的一部分，在发光管中形成一对电极。

公开(公告)号：US06454194B1

公开(公告)日：2002-09-24

申请号：US09695393

申请日：2000-10-23

申请人： Kenji Hamada ,  Shinichi Yamamoto ,  Yoshihiro Wakamatsu

发明人： Kenji Hamada ,  Shinichi Yamamoto ,  Yoshihiro Wakamatsu

IPC分类号： B02C1510

CPC分类号： B02C15/16

摘要： The object is that of providing a granular material processing apparatus (1) capable of evenly applying energy such as the compressive force and shearing force of pressers (5), due to centrifugal force, while maintaining good circulation conditions for the swirl flow of granular material within a casing (3) wherein, even in cases where granular material for which it is difficult to control the flow thereof in the casing (3) is processed, this is not allowed to accumulate in once place within the casing (3), but is moved to the entire interior wall thereof. In the cylindrical region formed in accordance with the revolution of the pressers (5) in the casing (3), an empty region (6) is formed wherein there is no extension of a shaft (201) etc., allowing for the formation of a center of swirl flow of the granular material; the rotation of the casing (3) and the rotation of a rotor (4) can be rotationally controlled in the same direction at differing speeds; and the pressers (5) are horizontally supported in a cantilevered manner on the rotor (4).

摘要翻译： 目的在于提供能够均匀地施加诸如压力（5）的压缩力和剪切力的能量的粒状材料处理装置（1），由于离心力，同时保持颗粒状物质的涡流的良好的循环条件 在壳体（3）内，即使在处理难以控制其在壳体（3）中的流动的粒状材料的情况下，也不能一次性地在壳体（3）内积聚，但是 移动到其整个内壁。 在根据壳体（3）中的按压（5）的旋转而形成的圆筒区域中，形成有空的区域（6），其中不存在轴（201）等的延伸，从而允许形成 颗粒材料的涡流中心; 壳体（3）的旋转和转子（4）的旋转可以以不同的速度以相同的方向旋转控制; 并且压脚（5）以悬臂方式水平地支撑在转子（4）上。

公开(公告)号：US5262219A

公开(公告)日：1993-11-16

申请号：US613072

申请日：1990-11-15

申请人： Shinichi Yamamoto ,  Masatoshi Tomiki ,  Haruo Hatakeyama

发明人： Shinichi Yamamoto ,  Masatoshi Tomiki ,  Haruo Hatakeyama

IPC分类号： B32B27/00 ,  B32B27/18 ,  C08J7/04 ,  C08L27/12 ,  C08L33/00 ,  C08L61/00 ,  C08L67/00 ,  C08L75/04 ,  C09D161/00 ,  F02B1/04 ,  G11B5/73 ,  G11B5/738 ,  G11B23/087 ,  H01B1/24 ,  G11B5/72 ,  B32B3/14

CPC分类号： H01B1/24 ,  C08J7/047 ,  C08L61/00 ,  C09D161/00 ,  G11B5/738 ,  C08J2461/00 ,  C08L27/12 ,  C08L33/00 ,  C08L67/00 ,  C08L75/04 ,  F02B1/04 ,  Y10T428/24355 ,  Y10T428/24364 ,  Y10T428/24372 ,  Y10T428/25 ,  Y10T428/254 ,  Y10T428/263 ,  Y10T428/265 ,  Y10T428/27 ,  Y10T428/273 ,  Y10T428/30 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31721 ,  Y10T428/31725 ,  Y10T428/3175 ,  Y10T428/31761 ,  Y10T428/31765 ,  Y10T428/31786 ,  Y10T428/31797 ,  Y10T428/31855 ,  Y10T428/31859 ,  Y10T428/31862 ,  Y10T428/3187 ,  Y10T428/31873 ,  Y10T428/31877 ,  Y10T428/31946

摘要： A composite film is disclosed which includes (a) a synthetic resin substrate film having a roughened surface, and (b) a thin, slippery, electrically conducting layer coated over the roughened surface. The conducting layer contains 2-10% by weight of carbon black, 10-40% by weight of a fluorine resin, 25-78% by weight of a hardened binder resin selected from hardened amino resins, hardened phenol resins and mixtures thereof, and 7-25% by weight of a modifying resin selected from polyurethane resins, acrylic resins, polyester resins and mixtures thereof, the total amount of the hardened binder resin and the modifying resin being 50-85% by weight.

摘要翻译： 公开了一种复合膜，其包括（a）具有粗糙表面的合成树脂基底膜，和（b）涂覆在粗糙表面上的薄而光滑的导电层。 导电层含有2-10重量％的炭黑，10-40重量％的氟树脂，25-78重量％的硬化的粘合剂树脂，其选自硬化的氨基树脂，硬化的酚醛树脂及其混合物，以及 7-25重量％的选自聚氨酯树脂，丙烯酸树脂，聚酯树脂及其混合物的改性树脂，硬化粘合剂树脂和改性树脂的总量为50-85重量％。

公开(公告)号：US4252595A

公开(公告)日：1981-02-24

申请号：US891152

申请日：1978-03-28

申请人： Shinichi Yamamoto ,  Yasusuke Sumitomo ,  Yasuhiro Horiike ,  Masahiro Shibagaki

发明人： Shinichi Yamamoto ,  Yasusuke Sumitomo ,  Yasuhiro Horiike ,  Masahiro Shibagaki

IPC分类号： B23K28/00 ,  B65G49/07 ,  H01J37/32 ,  H01L21/00 ,  H01L21/677 ,  C23F1/02

CPC分类号： H01L21/67748 ,  B23K28/00 ,  H01J37/32 ,  H01L21/67069 ,  H01L21/67754

摘要： An etching device uses a gas activated by a plasma for etching semiconductor elements. The apparatus includes etching chamber in which semiconductor elements are horizontally held by a supporting plate or conveyer and etched. The etching gas introduced from the upper side of the semiconductor element to the down side thereof through holes formed in the supporting plate or conveyer.

摘要翻译： 蚀刻装置使用由等离子体激活的气体来蚀刻半导体元件。 该设备包括蚀刻室，其中半导体元件由支撑板或输送机水平地保持并蚀刻。 从半导体元件的上侧向其下侧通过形成在支撑板或输送机上的孔引入的蚀刻气体。

公开(公告)号：US4094722A

公开(公告)日：1978-06-13

申请号：US762386

申请日：1977-01-26

申请人： Shinichi Yamamoto ,  Yasusuke Sumitomo ,  Yasuhiro Horiike ,  Masahiro Shibagaki

发明人： Shinichi Yamamoto ,  Yasusuke Sumitomo ,  Yasuhiro Horiike ,  Masahiro Shibagaki

IPC分类号： C23F4/00 ,  H01J37/18 ,  H01L21/00 ,  H01L21/22 ,  H01L21/302 ,  H01L21/3065 ,  C23F1/02

CPC分类号： H01L21/67069 ,  H01J37/18

摘要： An etching device uses a gas activated by a plasma for etching a semiconductor element. The apparatus includes object feeding and etching chambers formed on the opposite sides of an airtight flat chamber and a support plate rotatably mounted in the flat chamber to bring the semiconductor element from the feeding chamber to the etching chamber in which the semiconductor element is etched by the vertically flowing activated gas.

摘要翻译： 蚀刻装置使用由等离子体激活的气体来蚀刻半导体元件。 该装置包括形成在气密平坦室的相对侧上的物体进料和蚀刻室，以及可旋转地安装在平坦室中的支撑板，以将半导体元件从进料室引入蚀刻室，其中半导体元件被蚀刻 垂直流动的活性气体。

公开(公告)号：US08611198B2

公开(公告)日：2013-12-17

申请号：US13147625

申请日：2010-01-28

申请人： Katsuya Watanabe ,  Shinichi Yamamoto

发明人： Katsuya Watanabe ,  Shinichi Yamamoto

IPC分类号： G11B5/58 ,  G11B7/00

CPC分类号： G11B7/08511 ,  G11B2007/0013

摘要： The present invention provides a method for determining what group a given multilayer optical disc belongs to. The disc is one of a number of multilayer optical discs, which are designed so that information stored is retrievable from any of the discs by irradiating the disc with a light beam having the same wavelength and which have been classified into multiple groups. According to this method, performed first is Step (A) of measuring either a distance from a first one of multiple information layers of the given multilayer optical disc to a second one thereof, which is located adjacent to the first information layer, or a distance from the first information layer to the surface of the optical disc. Next, Step (B) of determining, by the distance measured, what group the given multilayer optical disc belongs to is performed.

摘要翻译： 本发明提供一种用于确定给定的多层光盘属于哪个组的方法。 盘是多个多层光盘之一，其被设计成使得通过用具有相同波长的光束照射盘并且已经被分类为多组的光盘来从任何光盘检索存储的信息。 根据该方法，首先进行步骤（A），其测量与给定多层光盘的多个信息层中的第一个信息层的距离与位于第一信息层相邻的第二个信息层的距离，或距离 从第一信息层到光盘的表面。 接下来，执行通过所测量的距离来执行给定的多层光盘属于哪个组的步骤（B）。