PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM
    51.
    发明申请
    PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM 有权
    图案测量装置和计算机程序

    公开(公告)号:US20120037801A1

    公开(公告)日:2012-02-16

    申请号:US13263826

    申请日:2010-04-07

    Abstract: Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the positions of edges (303, 305) are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges (303, 305) is the core gap (211) or the spacer gap (212) is determined. Furthermore, the waveform profile of the spacer (207) is previously stored, the secondary electron profile of the sample (201) is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer (207) is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer (207) is the core gap (211) or the spacer gap (212) is determined.

    Abstract translation: 提供了一种图案测量装置和计算机程序,其确定样品(201)中形成的间隙是否为芯间隙(211)或间隔物间隙(212)。 获取样品(201)的二次电子分布,检测边缘(303,305)位置处的二次电子分布的特征量,并且基于检测到的特征量,确定与每个 边缘(303,305)是芯间隙(211)或确定间隔物间隙(212)。 此外,预先存储间隔物(207)的波形图,获取样品(201)的二次电子分布,二次电子分布的匹配度和在每个间隔物(207)的位置处存储的波形分布, 并且基于检测到的匹配度,确定与每个间隔物(207)相邻的每个间隙是否为芯间隙(211)或间隔物间隙(212)。

    High-Sensitivity and High-Throughput Electron Beam Inspection Column Enabled by Adjustable Beam-Limiting Aperture
    53.
    发明申请
    High-Sensitivity and High-Throughput Electron Beam Inspection Column Enabled by Adjustable Beam-Limiting Aperture 有权
    高灵敏度和高通量电子束检测柱由可调节光圈限制孔

    公开(公告)号:US20110114838A1

    公开(公告)日:2011-05-19

    申请号:US12634444

    申请日:2009-12-09

    Abstract: One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.

    Abstract translation: 一个实施例涉及一种用于缺陷检查和/或检查基板或用于测量基板上的特征的关键尺寸的电子束装置。 该装置包括电子枪和电子柱。 电子枪包括被配置为产生用于电子束的电子的电子源和可调节的光束限制孔,其被配置为从一定范围的孔径尺寸中选择和使用一个孔径尺寸。 另一实施例涉及在装置中提供电子束。 有利地,所公开的装置和方法在保持高光束电流的同时减少斑点模糊,以便获得高灵敏度和高吞吐量。

    Measuring Apparatus, Measuring Coordinate Setting Method and Measuring Coordinate Number Calculation Method
    54.
    发明申请
    Measuring Apparatus, Measuring Coordinate Setting Method and Measuring Coordinate Number Calculation Method 审中-公开
    测量装置,测量坐标设定方法和测量坐标数计算方法

    公开(公告)号:US20110060552A1

    公开(公告)日:2011-03-10

    申请号:US12839025

    申请日:2010-07-19

    Applicant: Makoto ONO

    Inventor: Makoto ONO

    CPC classification number: G01B15/00 G01B2210/56 H01J2237/24592

    Abstract: With little cost and time, this invention makes high-precision measurements over an entire surface of a substrate to check how well devices are fabricated. The devices include integrated circuits, magnetic heads, magnetic discs, solar cells, optical modules, light emitting diodes and liquid crystal display panels—the ones that are fabricated on a substrate by repetitively performing deposition, resist application, exposure, development and etching. The method of this invention involves inputting multipoint measured data and a number of points used for measurement and calculating measuring coordinates by the measuring coordinate calculation program 1161. Next, based on the calculated measuring coordinates, the measuring program 1162 measures device characteristics, such as dimensions of the devices. Next, the curved surface approximation program 1163 calculates approximated values of device characteristics over the entire surface of the substrate, followed by the output program 1164 outputting the approximated values.

    Abstract translation: 本发明的成本和时间都很少,在基板的整个表面上进行高精度测量,以检查器件的制造程度。 这些器件包括集成电路,磁头,磁盘,太阳能电池,光学模块,发光二极管和液晶显示面板 - 通过重复执行沉积,抵抗应用,曝光,显影和蚀刻在衬底上制造的器件。 本发明的方法涉及通过测量坐标计算程序1161输入多点测量数据和用于测量和计算测量坐标的点数。接下来,基于所计算的测量坐标,测量程序1162测量设备特性,例如尺寸 的设备。 接下来,曲面近似程序1163计算衬底的整个表面上的器件特性的近似值,随后输出输出近似值的输出程序1164。

    Radial gap measurement on turbines
    55.
    发明授权
    Radial gap measurement on turbines 失效
    涡轮机径向间隙测量

    公开(公告)号:US07889119B2

    公开(公告)日:2011-02-15

    申请号:US12309328

    申请日:2007-07-19

    CPC classification number: G01S13/58 F01D21/003 F05D2260/80 G01B7/14 G01B15/00

    Abstract: Radial gap measurement on turbines by a microwave measuring method and an evaluation of a Doppler effect which varies according to the size of the radial gap is described. At least one radar sensor embodied as a transmission and reception unit is provided in the wall of a turbine housing which is radially oriented towards the centre of the turbine. The relative speed of an outer end of a turbine blade, dependent on the size of the radial gap, is evaluated many times in relation to the radar sensor during the passage of the blade end past the same, and the course of the relative speed over time on the zero crossing constitutes a measure for the radial gap on the basis of the relation between the absolute value of the relative speed and the incline thereof in the zero crossing.

    Abstract translation: 描述了通过微波测量方法对涡轮机进行的径向间隙测量以及根据径向间隙的尺寸而变化的多普勒效应的评估。 在涡轮机壳体的壁中设置有至少一个体现为传动和接收单元的雷达传感器,涡轮机壳体的径向朝向涡轮机的中心。 涡轮叶片的外端的相对速度取决于径向间隙的大小,相对于雷达传感器在叶片端部通过它们之前被多次评估,并且相对速度的过程 过零点的时间是基于相对速度的绝对值与其过零点的倾斜度之间的关系构成径向间隙的量度。

    DISTANCE MEASURING DEVICE AND METHOD FOR DETERMINING A DISTANCE, AND SUITABLE REFLECTIVE MEMBER
    56.
    发明申请
    DISTANCE MEASURING DEVICE AND METHOD FOR DETERMINING A DISTANCE, AND SUITABLE REFLECTIVE MEMBER 有权
    距离测量装置和确定距离的方法和适用的反射构件

    公开(公告)号:US20100219851A1

    公开(公告)日:2010-09-02

    申请号:US12597899

    申请日:2008-04-28

    Inventor: Guenther Trummer

    CPC classification number: G01B15/00 F15B15/2869

    Abstract: A distance measuring device and method for determining distance, and a suitable reflective member are provided. The distance measuring device includes analysis electronics and a sensor device, which has at least one coupling probe for feeding a transmission signal into a line structure. A reflective member is disposed in the line structure which has a base plate with an attached collar forming a cup-shaped element, and a feed block with a recess into which the collar plunges. The recess has a sealing ring which produces airtightness with the collar, wherein the attached collar is provided on the front face with a plastic plate.

    Abstract translation: 提供了一种用于确定距离的距离测量装置和方法以及合适的反射构件。 距离测量装置包括分析电子装置和传感器装置,传感器装置具有至少一个用于将传输信号馈送到线路结构中的耦合探头。 反射构件设置在线结构中,该线结构具有带有形成杯形元件的附接凸缘的基板,以及具有凹口的进给块,所述套环倾斜到该凹槽中。 所述凹部具有密封环,所述密封环与所述套环一起产生气密性,其中所述附接套环在前表面上设置有塑料板。

    LOCALIZATION SYSTEM
    57.
    发明申请
    LOCALIZATION SYSTEM 失效
    本地化系统

    公开(公告)号:US20100145192A1

    公开(公告)日:2010-06-10

    申请号:US12596837

    申请日:2008-04-22

    CPC classification number: A61B5/07 A61B5/06 A61B5/062 G01B15/00

    Abstract: The invention relates to a localization system that can particularly be used to localize an interventional instrument (2) in the body of a patient (1). The localization system comprises an electromagnetic wave source (10) which splits an electromagnetic signal into components propagating along a probe path (20) and a reference path, respectively. Said probe path (20) comprises a signal outlet (22) for emitting the signal at the point to be located and at least one detector (23) for picking up the emitted signal. A correlator (40) is used to determine the correlation between the signal components that propagated along the probe path (20) and the reference path (30), respectively. Knowing the length of the reference path, the unknown distance between the signal outlet (22) and the detector (23) in the probe path (20) can be estimated based on the correlation information.

    Abstract translation: 本发明涉及一种定位系统,其特别可用于将介入器械(2)定位在患者体内(1)。 定位系统包括电磁波源(10),其将电磁信号分解成分别沿着探测路径(20)和参考路径传播的分量。 所述探测路径(20)包括用于在待定位点发射信号的信号出口(22)和用于拾取发射信号的至少一个检测器(23)。 相关器(40)用于确定分别沿着探测路径(20)和参考路径(30)传播的信号分量之间的相关性。 知道参考路径的长度,可以基于相关信息来估计探测路径(20)中的信号出口(22)和检测器(23)之间的未知距离。

    POSITIONING SYSTEM AND METHOD OF USING SAME
    58.
    发明申请
    POSITIONING SYSTEM AND METHOD OF USING SAME 审中-公开
    定位系统及其使用方法

    公开(公告)号:US20100103432A1

    公开(公告)日:2010-04-29

    申请号:US12258656

    申请日:2008-10-27

    CPC classification number: G01B11/03 A61B5/06 G01B15/00 G01B17/00

    Abstract: A positioning system having an emitter unit, a plurality of detector units, a computer and a software package is described. The emitter unit is configured to emit an emitter signal. Each detector unit is configured to output a detector signal in response to detecting the emitter signal. The computer is coupled to the emitter unit and to the detector units. The software package is installed in the computer that directs the computer to perform a number of functions such as controlling the emitter unit, controlling the detector units, inputting positional information into the computer, and estimating a relative position of the emitter unit relative to a target site within a given workspace. An associated method is also described in which the method includes the steps of calculating, directing, displaying, estimating, identifying, inputting, inserting, mounting, and obtaining.

    Abstract translation: 描述了具有发射器单元,多个检测器单元,计算机和软件包的定位系统。 发射器单元被配置为发射发射极信号。 每个检测器单元被配置为响应于检测到发射器信号而输出检测器信号。 计算机耦合到发射器单元和检测器单元。 软件包安装在计算机中,引导计算机执行许多功能,例如控制发射器单元,控制检测器单元,将位置信息输入到计算机中,以及估计发射器单元相对于目标的相对位置 给定工作区内的站点。 还描述了一种相关联的方法,其中该方法包括计算,指导,显示,估计,识别,输入,插入,安装和获取的步骤。

    Sample dimension measuring method and scanning electron microscope
    59.
    发明申请
    Sample dimension measuring method and scanning electron microscope 有权
    样品尺寸测量方法和扫描电子显微镜

    公开(公告)号:US20100038535A1

    公开(公告)日:2010-02-18

    申请号:US12560091

    申请日:2009-09-15

    CPC classification number: H01J37/28 G01B15/00 G01N23/225 H01J2237/2814

    Abstract: The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.

    Abstract translation: 本发明抑制在半导体样品的表面上形成的图案的体积减少,或者执行精确的长度测量,而不管这种减少。 在带电粒子射线装置中,通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子,测量在样品上形成的图案的线宽和其它长度数据,扫描 所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。 或者测量的长度数据由预先存储的近似函数计算。

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