Abstract:
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the positions of edges (303, 305) are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges (303, 305) is the core gap (211) or the spacer gap (212) is determined. Furthermore, the waveform profile of the spacer (207) is previously stored, the secondary electron profile of the sample (201) is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer (207) is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer (207) is the core gap (211) or the spacer gap (212) is determined.
Abstract:
Arbitrarily deploying scanning polarized RF reference sources and using them to establish a full position and angular orientation reference coordinate system or a full angular orientation reference coordinate system that objects property equipped with polarized RF sensors could use to determine their angular position and/or orientation relative to the reference coordinate system.
Abstract:
One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.
Abstract:
With little cost and time, this invention makes high-precision measurements over an entire surface of a substrate to check how well devices are fabricated. The devices include integrated circuits, magnetic heads, magnetic discs, solar cells, optical modules, light emitting diodes and liquid crystal display panels—the ones that are fabricated on a substrate by repetitively performing deposition, resist application, exposure, development and etching. The method of this invention involves inputting multipoint measured data and a number of points used for measurement and calculating measuring coordinates by the measuring coordinate calculation program 1161. Next, based on the calculated measuring coordinates, the measuring program 1162 measures device characteristics, such as dimensions of the devices. Next, the curved surface approximation program 1163 calculates approximated values of device characteristics over the entire surface of the substrate, followed by the output program 1164 outputting the approximated values.
Abstract:
Radial gap measurement on turbines by a microwave measuring method and an evaluation of a Doppler effect which varies according to the size of the radial gap is described. At least one radar sensor embodied as a transmission and reception unit is provided in the wall of a turbine housing which is radially oriented towards the centre of the turbine. The relative speed of an outer end of a turbine blade, dependent on the size of the radial gap, is evaluated many times in relation to the radar sensor during the passage of the blade end past the same, and the course of the relative speed over time on the zero crossing constitutes a measure for the radial gap on the basis of the relation between the absolute value of the relative speed and the incline thereof in the zero crossing.
Abstract:
A distance measuring device and method for determining distance, and a suitable reflective member are provided. The distance measuring device includes analysis electronics and a sensor device, which has at least one coupling probe for feeding a transmission signal into a line structure. A reflective member is disposed in the line structure which has a base plate with an attached collar forming a cup-shaped element, and a feed block with a recess into which the collar plunges. The recess has a sealing ring which produces airtightness with the collar, wherein the attached collar is provided on the front face with a plastic plate.
Abstract:
The invention relates to a localization system that can particularly be used to localize an interventional instrument (2) in the body of a patient (1). The localization system comprises an electromagnetic wave source (10) which splits an electromagnetic signal into components propagating along a probe path (20) and a reference path, respectively. Said probe path (20) comprises a signal outlet (22) for emitting the signal at the point to be located and at least one detector (23) for picking up the emitted signal. A correlator (40) is used to determine the correlation between the signal components that propagated along the probe path (20) and the reference path (30), respectively. Knowing the length of the reference path, the unknown distance between the signal outlet (22) and the detector (23) in the probe path (20) can be estimated based on the correlation information.
Abstract:
A positioning system having an emitter unit, a plurality of detector units, a computer and a software package is described. The emitter unit is configured to emit an emitter signal. Each detector unit is configured to output a detector signal in response to detecting the emitter signal. The computer is coupled to the emitter unit and to the detector units. The software package is installed in the computer that directs the computer to perform a number of functions such as controlling the emitter unit, controlling the detector units, inputting positional information into the computer, and estimating a relative position of the emitter unit relative to a target site within a given workspace. An associated method is also described in which the method includes the steps of calculating, directing, displaying, estimating, identifying, inputting, inserting, mounting, and obtaining.
Abstract:
The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
Abstract:
A standard component for length measurement includes a first diffraction grating and a second diffraction grating. Each of components of the second diffraction grating is disposed between components of the first diffraction grating.