公开(公告)号：US08461526B2

公开(公告)日：2013-06-11

申请号：US12958174

申请日：2010-12-01

Applicant: Marian Mankos ,  Liqun Han ,  Xinrong Jiang ,  Rex Runyon ,  Carmela Moreno

Inventor： Marian Mankos ,  Liqun Han ,  Xinrong Jiang ,  Rex Runyon ,  Carmela Moreno

IPC: G01N23/00

CPC classification number: H01J37/04 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/186 ,  H01J2237/24535

Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

Abstract translation: 在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

公开(公告)号：US20120138791A1

公开(公告)日：2012-06-07

申请号：US12958174

申请日：2010-12-01

Applicant: Marian MANKOS ,  Liqun HAN ,  Xinrong JIANG ,  Rex RUNYON ,  Carmela MORENO

Inventor： Marian MANKOS ,  Liqun HAN ,  Xinrong JIANG ,  Rex RUNYON ,  Carmela MORENO

IPC: G01N23/00 ,  H01J1/50

CPC classification number: H01J37/04 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/186 ,  H01J2237/24535

Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

Abstract translation: 在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

公开(公告)号：US20140077077A1

公开(公告)日：2014-03-20

申请号：US13618760

申请日：2012-09-14

Applicant: Xinrong JIANG ,  Liqun HAN

Inventor： Xinrong JIANG ,  Liqun HAN

IPC: G21K5/04 ,  H01J27/02 ,  H01J37/28

CPC classification number: H01J37/063 ,  H01J3/029 ,  H01J3/08 ,  H01J37/09 ,  H01J2237/0458 ,  H01J2237/30472

Abstract: One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种电子束装置，其包括用于发射电子束的双透镜电子枪。 电子束是第一操作模式中的高束流电子束和处于第二操作模式的低束流电子束。 该装置还包括在第一操作模式中超出远光束电子束的路径的列孔径，并且在第二操作模式中围绕电子束装置的光轴居中。 另一个实施例涉及一种电子枪，其包括第一枪形透镜，光束限制孔和第二枪形透镜。 第一个枪形透镜在电子穿过光束限制孔径之前聚焦电子，而第二个枪形透镜在电子通过光束限制孔径后聚焦电子。 还公开了其它实施例，方面和特征。

公开(公告)号：US08664594B1

公开(公告)日：2014-03-04

申请号：US13095574

申请日：2011-04-27

Applicant: Xinrong Jiang ,  Liqun Han ,  Mohammed Tahmassebpur ,  Salam Harb ,  John D. Greene

Inventor： Xinrong Jiang ,  Liqun Han ,  Mohammed Tahmassebpur ,  Salam Harb ,  John D. Greene

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/28 ,  G01N2223/418 ,  G01N2223/611 ,  H01J2237/004 ,  H01J2237/2817

Abstract: The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.

Abstract translation: 本公开提供了一种电子束柱，其具有用于检查制造的基底的显着改善的分辨率和/或通过量。 电子束柱包括电子枪，扫描仪，物镜和检测器。 根据一个实施例，电子枪包括具有翻转极片构造的枪形透镜。 根据另一个实施例，扫描器包括具有预扫描器和主扫描器的双扫描器，并且检测器可以配置在电子枪和预扫描器之间。 根据另一实施例，电子束列包括被配置为选择束电流的连续可变孔径。 其他实施例涉及使用电子束柱来自动检查制造的基板的方法。 在一个实施例中，例如，在给定所选择的束电流和使用列条件域的情况下，调节孔径尺寸以实现最小斑点尺寸。

公开(公告)号：US20120241606A1

公开(公告)日：2012-09-27

申请号：US13095585

申请日：2011-04-27

Applicant: Liqun Han ,  Xinrong Jiang ,  John D. Greene

Inventor： Liqun Han ,  Xinrong Jiang ,  John D. Greene

IPC: G01N23/04 ,  G01N23/00

CPC classification number: G01N23/2251 ,  G01N2223/102 ,  G01N2223/611 ,  H01J37/04 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/04926 ,  H01J2237/1205 ,  H01J2237/15 ,  H01J2237/2446

Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.

Abstract translation: 公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。 分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。 另外，被配置为检测单个二次电子束的检测系统。 所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。 还公开了其它特征和实施例。

公开(公告)号：US07821187B1

公开(公告)日：2010-10-26

申请号：US12204841

申请日：2008-09-05

Applicant: Xinrong Jiang ,  Marian Mankos ,  Liqun Han

Inventor： Xinrong Jiang ,  Marian Mankos ,  Liqun Han

IPC: H01J27/02

CPC classification number: H01J37/063 ,  H01J37/145

Abstract: An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.

Abstract translation: 一种具有用于发射电子的电子发射器的电子枪，包括静电透镜和由极片形成的磁性透镜，该磁极具有设置在磁极片之间的绕组线圈。 磁性透镜在由极片形成的间隙中形成旋转对称的磁场。 磁场形成磁透镜并聚焦从发射器发射的电子。 真空管将电子枪与磁性透镜分开。 电子枪由真空管密封在真空中，磁性透镜在空气中被屏蔽。

公开(公告)号：US08362425B2

公开(公告)日：2013-01-29

申请号：US13095585

申请日：2011-04-27

Applicant: Liqun Han ,  Xinrong Jiang ,  John D. Greene

Inventor： Liqun Han ,  Xinrong Jiang ,  John D. Greene

IPC: G01N23/04 ,  G01N23/00

CPC classification number: G01N23/2251 ,  G01N2223/102 ,  G01N2223/611 ,  H01J37/04 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/04926 ,  H01J2237/1205 ,  H01J2237/15 ,  H01J2237/2446

Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.

Abstract translation: 公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。 分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。 另外，被配置为检测单个二次电子束的检测系统。 所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。 还公开了其它特征和实施例。

公开(公告)号：US20110114838A1

公开(公告)日：2011-05-19

申请号：US12634444

申请日：2009-12-09

Applicant: Liqun HAN ,  Marian MANKOS ,  Xinrong JIANG ,  Rex RUNYON ,  John GREENE

Inventor： Liqun HAN ,  Marian MANKOS ,  Xinrong JIANG ,  Rex RUNYON ,  John GREENE

IPC: G01N23/00

CPC classification number: H01J37/09 ,  G01B15/00 ,  H01J37/28 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/2817 ,  H01L22/12

Abstract: One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.

Abstract translation: 一个实施例涉及一种用于缺陷检查和/或检查基板或用于测量基板上的特征的关键尺寸的电子束装置。 该装置包括电子枪和电子柱。 电子枪包括被配置为产生用于电子束的电子的电子源和可调节的光束限制孔，其被配置为从一定范围的孔径尺寸中选择和使用一个孔径尺寸。 另一实施例涉及在装置中提供电子束。 有利地，所公开的装置和方法在保持高光束电流的同时减少斑点模糊，以便获得高灵敏度和高吞吐量。

公开(公告)号：US07262418B2

公开(公告)日：2007-08-28

申请号：US10825696

申请日：2004-04-15

Applicant: Chiwoei Wayne Lo ,  Xinrong Jiang

Inventor： Chiwoei Wayne Lo ,  Xinrong Jiang

IPC: G21K1/08 ,  G01J5/02

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.

Abstract translation: 用于半导体晶片检查或光刻的多电荷粒子束工具包括每个具有其自己的电子或离子源的电子束列阵列。 各个电子束列的物镜虽然各自具有自己的极片，共享共同的单个电磁线圈，其产生围绕整个电子束列阵列的均匀磁场。 这有利地改善了光束之间的间隔，同时提供了强磁性物镜的优异的光学特性。 当用作检查工具时，每列还具有其自己的相关检测器，以检测来自晶片的次级和反向散射电子。 在一个版本中，枪式镜头类似地具有用于每列的单独的极片并且共享公共的电磁线圈。

公开(公告)号：US09053900B2

公开(公告)日：2015-06-09

申请号：US13438543

申请日：2012-04-03

Applicant: Xinrong Jiang ,  Liqun Han

Inventor： Xinrong Jiang ,  Liqun Han

IPC: G21K5/04 ,  H01J37/153 ,  H01J37/05 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/1534

Abstract: One embodiment relates to an apparatus for high-resolution electron beam imaging. The apparatus includes an energy filter configured to limit an energy spread of the electrons in the incident electron beam. The energy filter may be formed using a stigmatic Wien filter and a filter aperture. Another embodiment relates to a method of forming an incident electron beam for a high-resolution electron beam apparatus. Another embodiment relates to a stigmatic Wien filter that includes curved conductive electrodes. Another embodiment relates to a stigmatic Wien filter that includes a pair of magnetic yokes and a multipole deflector. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及用于高分辨率电子束成像的装置。 该装置包括被配置为限制入射电子束中的电子的能量扩散的能量过滤器。 能量滤波器可以使用固定的维恩滤波器和滤波器孔来形成。 另一实施例涉及形成用于高分辨率电子束装置的入射电子束的方法。 另一实施例涉及一种包括弯曲导电电极的标准维恩滤波器。 另一实施例涉及一种包括一对磁轭和多极偏转器的标准维恩滤波器。 还公开了其它实施例，方面和特征。